Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.39 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | DRD2 | P14416 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | DRD3 | P35462 | 1/20 | 0.36 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL684982 | 0.89 | PKM (0.46) | MAPTNPC1L3MBTL1MAPK1RAB9A | |
| SCHEMBL15367942 | 0.86 | MAPT (0.38) | MAPTNPC1L3MBTL1DRD2GAA | |
| SCHEMBL685872 | 0.85 | LTA4H (0.44) | MAPTL3MBTL1MAPK1RAB9A | |
| SCHEMBL6694487 | 0.81 | TSHR (0.37) | MAPTNPC1L3MBTL1GAAMAPK1 | |
| SCHEMBL6689051 | 0.81 | KMT2A (0.35) | MAPTL3MBTL1SMN1; SMN2 | |
| SCHEMBL685743 | 0.79 | CHRNA7 (0.46) | MAPTNPC1HPGDL3MBTL1RAB9A | |
| SCHEMBL6693121 | 0.78 | TP53 (0.42) | MAPTNPC1GAARAB9A | |
| SCHEMBL685750 | 0.77 | KMT2A (0.37) | MAPTHPGDDRD2DRD3SMN1; SMN2 | |
| SCHEMBL6691353 | 0.77 | TP53 (0.44) | MAPTNPC1GAARAB9A | |
| SCHEMBL6689348 | 0.77 | KMT2A (0.41) | MAPTMTNR1AMTNR1BHPGDGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9260407-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9260407-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9063414-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9063414-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-23 | — | — | US | disclosed |
| US-8993210-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8993210-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110111342-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110111342-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | MAPT 1824/4885NPC1 3435/4885MTNR1A 157/4885 |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | CLIC1, SLC10A6, APOL1 | MAPT 1639/4885NPC1 372/4885MTNR1A 1190/4885 |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | RER1, AFF1, FRG1 | MAPT 1883/4885NPC1 221/4885MTNR1A 903/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.