SCHEMBL707310

SCHEMBL707310

CCCc1cccc(-c2ccccc2O[SiH3])c1CCC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CTSL P07711 1/20 0.38
CTSS P25774 1/20 0.38
CTSK P43235 1/20 0.38
LTB4R Q15722 3/20 0.38
LTB4R2 Q9NPC1 3/20 0.38
ELANE P08246 1/20 0.35
HTR1A P08908 2/20 0.34
ADRA2A P08913 2/20 0.34
ADRA2B P18089 2/20 0.34
ADRA2C P18825 2/20 0.34
NISCH Q9Y2I1 1/20 0.34
ALOX5 P09917 1/20 0.33
PTGS2 P35354 1/20 0.33
SLC6A2 P23975 2/20 0.32
SLC6A4 P31645 2/20 0.32
SLC6A3 Q01959 2/20 0.32
PPARD Q03181 1/20 0.32
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32
GAA P10253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704334 0.88 PTGS2 (0.41) LTB4RLTB4R2ELANEALOX5PTGS2
SCHEMBL18784878 0.84 LTB4R (0.42) LTB4RLTB4R2ELANEHTR1AADRA2A
SCHEMBL8674511 0.82 ELANE (0.38) LTB4RLTB4R2ELANEALOX5PTGS2
SCHEMBL4527020 0.81 KDM4E (0.38) CTSLCTSSCTSKLTB4RLTB4R2
SCHEMBL444781 0.80 CTSL (0.39) CTSLCTSSCTSKLTB4RLTB4R2
SCHEMBL704143 0.80 L3MBTL1 (0.39) CTSLCTSSCTSKHTR1ANISCH
SCHEMBL705352 0.79 HTR1A (0.44) LTB4RLTB4R2HTR1AADRA2AADRA2B
SCHEMBL444783 0.78 INPPL1 (0.42) CTSLCTSSCTSKLTB4RLTB4R2
SCHEMBL705396 0.77 ALOX5 (0.41) ELANEALOX5PTGS2PPARACYP1A2
SCHEMBL707177 0.75 L3MBTL1 (0.43) NISCHKDM4EGAAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9546237-B2 Stabilization of polymers that contain a hydrolyzable functionality BRIDGESTONE CORPORATION (JP) 2017-01-17 US disclosed
US-20130331520-A1 STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY BRIDGESTONE CORPORATION (JP) 2013-12-12 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed