SCHEMBL7049566

SCHEMBL7049566

O=C(O)CCSCCC(F)(F)F

nearest known ligand 0.64

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.64
KMT2A Q03164 1/20 0.64
HSD17B10 Q99714 1/20 0.64
TDP1 Q9NUW8 1/20 0.64
TSHR P16473 2/20 0.46
CYP1A2 P05177 1/20 0.40
CYP2C19 P33261 1/20 0.39
BHMT Q93088 7/20 0.38
CYSLTR2 Q9NS75 1/20 0.37
CYSLTR1 Q9Y271 1/20 0.37
ALKBH5 Q6P6C2 1/20 0.35
SUCNR1 Q9BXA5 1/20 0.35
EGLN1 Q9GZT9 1/20 0.35
PLA2G4B P0C869 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
APEX1 P27695 1/20 0.32
SLC22A6 Q4U2R8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28068029 0.89 LMNA (0.50) LMNAKMT2AHSD17B10TDP1TSHR
SCHEMBL14029119 0.87 LMNA (0.58) LMNAKMT2AHSD17B10TDP1TSHR
SCHEMBL4223263 0.84 BHMT (0.50) LMNAKMT2AHSD17B10TDP1TSHR
SCHEMBL14047289 0.83 LMNA (0.58) LMNAKMT2AHSD17B10TDP1TSHR
SCHEMBL16654415 0.80 KMT2A (0.37) LMNAKMT2AHSD17B10TDP1CYP1A2
SCHEMBL16659430 0.80 ALDH1A1 (0.38) LMNAKMT2AHSD17B10TDP1TSHR
SCHEMBL15346587 0.80 LMNA (0.37) LMNAKMT2AHSD17B10TDP1TSHR
E388 SCHEMBL28696 0.80 LMNA (1.00) LMNAKMT2AHSD17B10TDP1TSHR
E388 SCHEMBL28962323 0.80 LMNA (1.00) LMNAKMT2AHSD17B10TDP1TSHR
SCHEMBL3343830 0.79 CYP2D6 (0.50) LMNAKMT2AHSD17B10TDP1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 324 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3177590-A1 LOW TEMPERATURE FREE RADICAL INITIATED PROCESS FOR THE PREPARATION OF 3-((3,3,3-TRIFLUOROPROPYL)THIO)PROPIONIC ACID AND ESTERS THEREOF Dow AgroSciences LLC (US) 2017-06-14 EP claimed
US-9550751-B2 Processes for the preparation of pesticidal compounds DOW AGROSCIENCES LLC (US) 2017-01-24 US claimed
WO-2016022162-A1 LOW TEMPERATURE FREE RADICAL INITIATED PROCESS FOR THE PREPARATION OF 3-((3,3,3-TRIFLUOROPROPYL)THIO)PROPIONIC ACID AND ESTERS THEREOF DOW AGROSCIENCES LLC (US) 2016-02-11 WO claimed
US-20150336929-A1 PROCESSES FOR THE PREPARATION OF PESTICIDAL COMPOUNDS DOW AGROSCIENCES LLC 2015-11-26 US claimed
WO-2015178954-A1 PHOTOCHEMICAL PROCESS FOR THE PREPARATION OF 3-((3,3,3-TRIFLUOROPROPYL)THIO)PROPIONIC ACID AND ESTERS THEREOF DOW AGROSCIENCES LLC (US) 2015-11-26 WO claimed
US-20150336882-A1 PHOTOCHEMICAL PROCESS FOR THE PREPARATION OF 3-((3,3,3-TRIFLUOROPROPYL)THIO)PROPIONIC ACID AND ESTERS THEREOF DOW AGROSCIENCES LLC 2015-11-26 US claimed
US-20230398058-A1 PARTICLES CONTAINING COLORING AGENTS AND METHODS OF USING THE SAME EPHEMERAL SOLUTIONS, INC. 2023-12-14 US disclosed
US-10315999-B2 Processes for the preparation of pesticidal compounds DOW AGROSCIENCES LLC (US) 2019-06-11 US disclosed
US-10315999-B2 Processes for the preparation of pesticidal compounds DOW AGROSCIENCES LLC (US) 2019-06-11 US disclosed
US-10165775-B2 Pesticidal compositions and processes related thereto DOW AGROSCIENCES LLC (US) 2019-01-01 US disclosed
US-10165775-B2 Pesticidal compositions and processes related thereto DOW AGROSCIENCES LLC (US) 2019-01-01 US disclosed
CN-105636445-B Process for preparing pesticidal compounds 美国陶氏益农公司 2018-12-07 CN disclosed
CN-105732580-B Pesticidal compositions and methods related thereto 陶氏益农公司 2018-12-07 CN disclosed
US-6527970-B1 For extinguishing fires and for decomposing residual organic materials, including hydrocarbons comprises a fluorinated film forming foam surfactant VERDE ENVIRONMENTAL, INC. 2003-03-04 US disclosed
US-5879623-A ANTIFOULING AGENTS FOR BOAT HULLS, MARINE STRUCTURES BUCKMAN LABORATORIES INTERNATIONAL INC. (US) 1999-03-09 US disclosed
EP-0880472-A1 METHODS AND COMPOSITIONS FOR CONTROLLING BIOFOULING USING FLUOROSURFACTANTS BUCKMAN LABORATORIES INTERNATIONAL, INC. (US) 1998-12-02 EP disclosed
WO-1997024290-A1 METHODS AND COMPOSITIONS FOR CONTROLLING BIOFOULING USING FLUOROSURFACTANTS BUCKMAN LABORATORIES INTERNATIONAL, INC. (US) 1997-07-10 WO disclosed
EP-0193407-B1 OXYANION-CATALYZED POLYMERIZATION E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-08-30 EP disclosed
EP-0193407-A1 Oxyanion-catalyzed polymerization E.I. DU PONT DE NEMOURS AND COMPANY (US) 1986-09-03 EP disclosed
US-4588795-A ADDITION POLYMERIZATION OF LIVING POLYMERS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1986-05-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150336882-A1 PHOTOCHEMICAL PROCESS FOR THE PREPARATION OF 3-((3,3,3-TRIFLUOROPROPYL)THIO)PROPIONIC ACID AND ESTERS THEREOF TST, MPST, PCCA LMNA 3850/4885KMT2A 3991/4885HSD17B10 171/4885
US-20230398058-A1 PARTICLES CONTAINING COLORING AGENTS AND METHODS OF USING THE SAME LDHA, CUTA, LIPA LMNA 70/4885KMT2A 612/4885HSD17B10 1401/4885
US-10315999-B2 Processes for the preparation of pesticidal compounds DDT, ACHE, PTMS LMNA 1234/4885KMT2A 3009/4885HSD17B10 1844/4885
US-20150336929-A1 PROCESSES FOR THE PREPARATION OF PESTICIDAL COMPOUNDS DDT, ACHE, PTMS LMNA 1234/4885KMT2A 3009/4885HSD17B10 1844/4885
US-10165775-B2 Pesticidal compositions and processes related thereto ACHE, DDT, PTMS LMNA 2810/4885KMT2A 3565/4885HSD17B10 1414/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.