SCHEMBL8737652

SCHEMBL8737652

CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13007702 1.00 LMNA (0.38) LMNATHRB
SCHEMBL13007999 1.00 LMNA (0.38) LMNATHRB
SCHEMBL13008133 1.00 LMNA (0.38) LMNATHRB
SCHEMBL13007699 1.00 LMNA (0.38) LMNATHRB
SCHEMBL13007703 1.00 LMNA (0.38) LMNATHRB
SCHEMBL12886083 1.00 LMNA (0.38) LMNATHRB
SCHEMBL13007698 1.00 LMNA (0.38) LMNATHRB
SCHEMBL226215 1.00 LMNA (0.38) LMNATHRB
SCHEMBL61577 1.00 LMNA (0.38) LMNATHRB
SCHEMBL13007701 1.00 LMNA (0.38) LMNATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025013869-A1 FLUORINE-CONTAINING POLYMER HAVING NITROGEN-CONTAINING AROMATIC RING, PRODUCTION METHOD THEREFOR, AND COMPOSITION THEREOF ダイキン工業株式会社 2025-01-16 WO disclosed
WO-2025013870-A1 COMPOSITION CONTAINING FLUORINE-CONTAINING POLYMER AND APROTIC SOLVENT, FLUORINE-CONTAINING POLYMER, METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER SOLUTION, METHOD FOR PRODUCING MIXTURE OF FLUORINE MONOMER AND APROTIC SOLVENT, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER ダイキン工業株式会社 2025-01-16 WO disclosed
WO-2024241998-A1 COMPOSITION CONTAINING FLUORINE-CONTAINING POLYMER, METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER, AND ULTRAVIOLET LIGHT-EMITTING ELEMENT LENS CONTAINING FLUORINE-CONTAINING POLYMER ダイキン工業株式会社 2024-11-28 WO disclosed
US-20230189636-A1 COMPOUND FOR ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTRONIC ELEMENT USING THE SAME, AND AN ELECTRONIC DEVICE THEREOF DUK SAN NEOLUX CO., LTD. (KR) 2023-06-15 US disclosed
EP-4074694-A1 AMINO ACID-, PEPTIDE- AN POLYPEPTIDE-LIPIDS, ISOMERS, COMPOSITIONS, AN USES THEREOF Massachusetts Institute Of Technology (US) 2022-10-19 EP disclosed
EP-2691443-B1 CONJUGATED LIPOMERS AND USES THEREOF MASSACHUSETTS INST TECHNOLOGY (US) 2021-02-17 EP disclosed
WO-2018227012-A9 POLYMER-LIPID MATERIALS FOR DELIVERY OF NUCLEIC ACIDS MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2019-11-14 WO disclosed
EP-3269395-A1 AMINOALCOHOL LIPIDOIDS AND USES THEREOF Massachusetts Institute Of Technology (US) 2018-01-17 EP disclosed
US-20170281542-A1 LIPID FORMULATIONS FOR DELIVERY OF MESSENGER RNA MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2017-10-05 US disclosed
US-20170246319-A1 BIODEGRADABLE LIPIDS FOR DELIVERY OF NUCLEIC ACIDS SHIRE HUMAN GENETIC THERAPIES, INC. 2017-08-31 US disclosed
US-8283104-B2 Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-10-09 US disclosed
US-20120129103-A1 SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-24 US disclosed
US-20110293703-A1 AMINOALCOHOL LIPIDOIDS AND USES THEREOF MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2011-12-01 US disclosed
US-8048610-B2 Sulfonium salt-containing polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-11-01 US disclosed
US-20110003247-A1 PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-01-06 US disclosed
US-20100331234-A1 AMINOALCOHOL LIPIDOIDS AND USES THEREOF MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2010-12-30 US disclosed
US-20100209827-A1 NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-08-19 US disclosed
US-7678530-B2 Lactone-containing compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-16 US disclosed
US-20090269696-A1 SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-29 US disclosed
US-20070160929-A1 photoresists; photomasks; heat treatment; high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography SHIN-ETSU CHEMICAL CO., LTD. 2007-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230189636-A1 COMPOUND FOR ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTRONIC ELEMENT USING THE SAME, AND AN ELECTRONIC DEVICE THEREOF EMC1, EMC2, EPCAM LMNA 2531/4885THRB 4583/4885
US-20170246319-A1 BIODEGRADABLE LIPIDS FOR DELIVERY OF NUCLEIC ACIDS LIPA, SLC67A1, SREBF1 LMNA 411/4885THRB 3407/4885
US-20170281542-A1 LIPID FORMULATIONS FOR DELIVERY OF MESSENGER RNA RNMT, NSUN3, IGF2BP3 LMNA 436/4885THRB 3979/4885
US-20110293703-A1 AMINOALCOHOL LIPIDOIDS AND USES THEREOF PHOSPHO1, PNMT, AASDHPPT LMNA 314/4885THRB 4259/4885
US-20120129103-A1 SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD RER1, SMC4, SMCHD1 LMNA 3083/4885THRB 3567/4885
US-20110003247-A1 PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS GRHPR, GLRA3, GLRA1 LMNA 1984/4885THRB 3549/4885
US-20100209827-A1 NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME DAP3, MRPS23, ASIC3 LMNA 4430/4885THRB 4059/4885
US-20100331234-A1 AMINOALCOHOL LIPIDOIDS AND USES THEREOF PHOSPHO1, PNMT, AASDHPPT LMNA 314/4885THRB 4259/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.