Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | F2 | P00734 | 4/20 | 0.37 |
| ▸ | PRSS1 | P07477 | 4/20 | 0.37 |
| ▸ | PRSS2 | P07478 | 4/20 | 0.37 |
| ▸ | PRSS3 | P35030 | 4/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | CA1 | P00915 | 5/20 | 0.33 |
| ▸ | CA2 | P00918 | 5/20 | 0.33 |
| ▸ | MMP1 | P03956 | 5/20 | 0.33 |
| ▸ | MMP2 | P08253 | 5/20 | 0.33 |
| ▸ | MMP9 | P14780 | 5/20 | 0.33 |
| ▸ | MMP8 | P22894 | 5/20 | 0.33 |
| ▸ | MMP13 | P45452 | 5/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10151317 | 0.87 | ALDH1A1 (0.36) | F2PRSS1PRSS2PRSS3ALDH1A1 | |
| SCHEMBL12840941 | 0.79 | SMN1; SMN2 (0.38) | ALDH1A1POLBTSHR | |
| SCHEMBL17285665 | 0.75 | F2 (0.38) | F2PRSS1PRSS2PRSS3ALDH1A1 | |
| SCHEMBL10151314 | 0.74 | ALDH1A1 (0.36) | F2PRSS1PRSS2PRSS3ALDH1A1 | |
| SCHEMBL30900725 | 0.74 | ALDH1A1 (0.36) | F2PRSS1PRSS2PRSS3ALDH1A1 | |
| SCHEMBL10825936 | 0.73 | F2 (0.36) | F2PRSS1PRSS2PRSS3ALDH1A1 | |
| SCHEMBL546314 | 0.73 | ALDH1A1 (0.50) | F2PRSS1PRSS2PRSS3ALDH1A1 | |
| SCHEMBL10212041 | 0.73 | ALDH1A1 (0.50) | F2PRSS1PRSS2PRSS3ALDH1A1 | |
| SCHEMBL11208391 | 0.72 | F2 (0.39) | F2PRSS1PRSS2PRSS3ALDH1A1 | |
| SCHEMBL4849380 | 0.71 | ALDH1A1 (0.48) | F2PRSS1PRSS2PRSS3ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8318403-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-27 | — | — | US | disclosed |
| US-20120258403-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-11 | — | — | US | disclosed |
| US-8278023-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| US-20120070778-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120052443-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20110236827-A1 | RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200940-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110123926-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20100304292-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304294-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110200940-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | FRG1, AFF1, NHERF1 | F2 370/4885PRSS1 872/4885PRSS2 2102/4885 |
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1S, H1-0, H1-2 | F2 38/4885PRSS1 968/4885PRSS2 1275/4885 |
| US-20120258403-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | CLIC4, CLIC1, SLC26A3 | F2 476/4885PRSS1 2278/4885PRSS2 2357/4885 |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | F2 378/4885PRSS1 1828/4885PRSS2 2538/4885 |
| US-20100304294-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | AFF1, F12, AP2A1 | F2 63/4885PRSS1 1328/4885PRSS2 1945/4885 |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | C1R, F12, C1S | F2 81/4885PRSS1 2272/4885PRSS2 3185/4885 |
| US-20110236827-A1 | RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1R, CBR1, RCOR1 | F2 484/4885PRSS1 1537/4885PRSS2 1828/4885 |
| US-20100304292-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | CRY1, CHRM1, C1S | F2 46/4885PRSS1 1685/4885PRSS2 2656/4885 |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | CLIC1, SLC10A6, APOL1 | F2 643/4885PRSS1 2639/4885PRSS2 3465/4885 |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | RER1, AFF1, FRG1 | F2 145/4885PRSS1 1190/4885PRSS2 2449/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.