Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1296482 | 0.81 | — | — | |
| SCHEMBL252442 | 0.71 | — | — | |
| SCHEMBL4213064 | 0.71 | ALDH1A1 (0.35) | ALDH1A1TSHRTDP1 | |
| SCHEMBL1251932 | 0.69 | TSHR (0.47) | ALDH1A1TSHRTDP1 | |
| SCHEMBL13571386 | 0.67 | — | — | |
| SCHEMBL31042221 | 0.67 | — | — | |
| SCHEMBL6340903 | 0.67 | — | — | |
| SCHEMBL31602089 | 0.67 | — | — | |
| SCHEMBL6338522 | 0.67 | — | — | |
| SCHEMBL13339802 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1698614-B1 | METAL COMPOUND, MATERIAL FOR FORMING THIN FILM AND METHOD FOR PREPARING THIN FILM | ADEKA CORP (JP) | 2011-07-13 | — | — | EP | claimed |
| US-20070122947-A1 | Metal compound, material for thin film formation, and process of forming thin film | ADEKA CORPORATION (JP) | 2007-05-31 | — | — | US | claimed |
| EP-1698614-A1 | METAL COMPOUND, MATERIAL FOR FORMING THIN FILM AND METHOD FOR PREPARING THIN FILM | Asahi Denka Co., Ltd. (JP) | 2006-09-06 | — | — | EP | claimed |
| US-20050272200-A1 | Bismuth titanium silicon oxide, bismuth titanium silicon oxide thin film, and method for forming the thin film | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-12-08 | — | — | US | claimed |
| EP-3178808-B1 | ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM FORMATION METHOD AND ALCOHOL COMPOUND | ADEKA CORP (JP) | 2024-11-06 | — | — | EP | disclosed |
| US-11618762-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2023-04-04 | — | — | US | disclosed |
| CN-107428677-B | Diazadienyl compound, raw material for forming thin film, method for producing thin film, and diazadiene compound | 株式会社ADEKA | 2022-04-05 | — | — | CN | disclosed |
| US-20220017554-A1 | COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND AMIDINE COMPOUND | ADEKA CORPORATION (JP) | 2022-01-20 | — | — | US | disclosed |
| US-11161867-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2021-11-02 | — | — | US | disclosed |
| EP-3505511-B1 | DIAZADIENYL COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2021-05-26 | — | — | EP | disclosed |
| US-10920313-B2 | Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin film | ADEKA CORPORATION (JP) | 2021-02-16 | — | — | US | disclosed |
| US-10882874-B2 | Vanadium compound | ADEKA CORPORATION (JP) | 2021-01-05 | — | — | US | disclosed |
| US-20110079262-A1 | DIFFUSING AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-07 | — | — | US | disclosed |
| US-7714155-B2 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| US-20100028536-A1 | METAL COMPOUND, MATERIAL FOR THIN FILM FORMATION, AND PROCESS OF FORMING THIN FILM | ADEKA CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| US-20090320771-A1 | IONIC LIQUID MEDIUMS FOR HOLDING SOLID PHASE PROCESS GAS PRECURSORS | MATHESON TRI-GAS (US) | 2009-12-31 | — | — | US | disclosed |
| WO-2009152242-A1 | IONIC LIQUID MEDIUMS FOR HOLDING SOLID PHASE PROCESS GAS PRECURSORS | MATHESON TRI-GAS, INC. (US) | 2009-12-17 | — | — | WO | disclosed |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20070122947-A1 | Metal compound, material for thin film formation, and process of forming thin film | ADEKA CORPORATION (JP) | 2007-05-31 | — | — | US | disclosed |
| EP-1698614-A1 | METAL COMPOUND, MATERIAL FOR FORMING THIN FILM AND METHOD FOR PREPARING THIN FILM | Asahi Denka Co., Ltd. (JP) | 2006-09-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ALKBH5, ALKBH3, ALK | ALDH1A1 744/4885TSHR 4351/4885TDP1 2365/4885 |
| US-20220017554-A1 | COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND AMIDINE COMPOUND | C5, C9, TFRC | ALDH1A1 3062/4885TSHR 2662/4885TDP1 4082/4885 |
| US-20100028536-A1 | METAL COMPOUND, MATERIAL FOR THIN FILM FORMATION, AND PROCESS OF FORMING THIN FILM | TNNT2, TPR, TCF4 | ALDH1A1 2756/4885TSHR 2354/4885TDP1 1590/4885 |
| US-11161867-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | C5, C9, TFRC | ALDH1A1 2965/4885TSHR 2620/4885TDP1 3984/4885 |
| US-10882874-B2 | Vanadium compound | TERT, ADH1A, TERF2 | ALDH1A1 28/4885TSHR 2306/4885TDP1 554/4885 |
| US-10920313-B2 | Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin film | LDLR, APOB, DNMT1 | ALDH1A1 217/4885TSHR 4225/4885TDP1 1232/4885 |
| US-11618762-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | C5, AP1M1, AP3M1 | ALDH1A1 3837/4885TSHR 2278/4885TDP1 3335/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.