SCHEMBL14633498

SCHEMBL14633498

C=C(C)C(=O)OC1(O)C(=O)OCC1(C)C

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1143164 0.82 ALDH1A1 (0.32) ALDH1A1
SCHEMBL27808874 0.78 MAPT (0.30)
SCHEMBL1143134 0.75 ALDH1A1 (0.32) ALDH1A1
SCHEMBL17878790 0.73 MAPT (0.31) ALDH1A1
SCHEMBL10064071 0.71 ALDH1A1 (0.34) ALDH1A1
SCHEMBL15946494 0.71 TSHR (0.32) ALDH1A1
SCHEMBL17245068 0.70 ALDH1A1 (0.30) ALDH1A1
SCHEMBL4150787 0.69 ALDH1A1 (0.42) ALDH1A1
SCHEMBL328598 0.69 LMNA (0.33) ALDH1A1
SCHEMBL685967 0.69 LMNA (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2554555-B1 METHODS FOR PRODUCING AN ADAMANTYL (METH)ACRYLATE MONOMER AND A (METH)ACRYLIC COPOLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER MITSUBISHI GAS CHEMICAL CO (JP) 2019-09-18 EP disclosed
EP-3106477-B1 (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR MITSUBISHI GAS CHEMICAL CO (JP) 2018-08-29 EP disclosed
US-10005714-B2 (Meth)acrylic acid ester compound and production method therefor MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-06-26 US disclosed
US-9994513-B2 Method for producing novel ali cyclic ester compound, novel alicyclic ester compound, (meth)acrylic copolymer produced by polymerizing said compound, and photosensitive resin composition using said copolymer MITSUBISHI GAS CHEMICAL, INC. (JP) 2018-06-12 US disclosed
EP-2990425-B1 NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP disclosed
US-9951163-B2 (Meth)acrylate compound, (meth)acrylic copolymer and photosensitive resin composition containing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-04-24 US disclosed
US-20170008830-A1 (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-01-12 US disclosed
EP-3106454-A1 METHOD FOR PRODUCING NOVEL ALICYCLIC ESTER COMPOUND, NOVEL ALICYCLIC ESTER COMPOUND, (METH)ACRYLIC COPOLYMER PRODUCED BY POLYMERIZING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION USING SAID COPOLYMER Mitsubishi Gas Chemical Company, Inc. (JP) 2016-12-21 EP disclosed
EP-3106477-A1 (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR Mitsubishi Gas Chemical Company, Inc. (JP) 2016-12-21 EP disclosed
US-20160355461-A1 METHOD FOR PRODUCING NOVEL ALI CYCLIC ESTER COMPOUND, NOVEL ALICYCLIC ESTER COMPOUND, (METH)ACRYLIC COPOLYMER PRODUCED BY POLYMERIZING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION USING SAID COPOLYMER MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-12-08 US disclosed
US-20160347896-A1 (METH)ACRYLATE COMPOUND, (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-12-01 US disclosed
US-9477151-B2 Alicyclic ester compound, and (meth)acrylic copolymer and photosensitive resin composition containing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-10-25 US disclosed
US-20160070168-A1 NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-03-10 US disclosed
EP-2990425-A1 NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME Mitsubishi Gas Chemical Company, Inc. (JP) 2016-03-02 EP disclosed
US-8846840-B2 Adamantyl (meth)acrylic monomer and (meth)acrylic polymer containing the same as repeating unit MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-30 US disclosed
EP-2554555-A1 ADAMANTYL (METH)ACRYLATE MONOMER AND (METH)ACRYLIC POLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER Mitsubishi Gas Chemical Company, Inc. (JP) 2013-02-06 EP disclosed
US-20130023638-A1 ADAMANTYL (METH)ACRYLIC MONOMER AND (METH)ACRYLIC POLYMER CONTAINING THE SAME AS REPEATING UNIT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10005714-B2 (Meth)acrylic acid ester compound and production method therefor AMD1, ALDH7A1, TMEM164 ALDH1A1 118/4885
US-20160347896-A1 (METH)ACRYLATE COMPOUND, (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME REV1, EEF1A1, EEF1A2 ALDH1A1 1187/4885
US-20160355461-A1 METHOD FOR PRODUCING NOVEL ALI CYCLIC ESTER COMPOUND, NOVEL ALICYCLIC ESTER COMPOUND, (METH)ACRYLIC COPOLYMER PRODUCED BY POLYMERIZING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION USING SAID COPOLYMER ASPH, LTA, TAS2R42 ALDH1A1 373/4885
US-20170008830-A1 (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR AMD1, ALDH7A1, TMEM164 ALDH1A1 156/4885
US-20130023638-A1 ADAMANTYL (METH)ACRYLIC MONOMER AND (METH)ACRYLIC POLYMER CONTAINING THE SAME AS REPEATING UNIT METTL3, METTL16, METTL14 ALDH1A1 238/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.