Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RORC | P51449 | 1/20 | 0.65 |
| ▸ | ESR1 | P03372 | 7/20 | 0.57 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.47 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.43 |
| ▸ | HPGD | P15428 | 3/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.43 |
| ▸ | AR | P10275 | 3/20 | 0.43 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.43 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.43 |
| ▸ | HTR6 | P50406 | 1/20 | 0.43 |
| ▸ | ESRRG | P62508 | 1/20 | 0.43 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.43 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31143653 | 0.93 | ESR1 (0.57) | RORCESR1KLF10ALOX15ALOX12 | |
| SCHEMBL5526772 | 0.91 | RORC (0.56) | RORCESR1KLF10ALOX15ALOX12 | |
| SCHEMBL4595989 | 0.91 | RORC (0.56) | RORCESR1KLF10ALOX15ALOX12 | |
| SCHEMBL2950255 | 0.88 | ALDH1A1 (0.59) | RORCESR1KLF10ALOX15ESR2 | |
| SCHEMBL29395733 | 0.83 | RORC (0.70) | RORCESR1KLF10ALOX15ALOX12 | |
| SCHEMBL29350897 | 0.83 | RORC (0.70) | RORCESR1KLF10ALOX15ALOX12 | |
| SCHEMBL124727 | 0.83 | RORC (0.70) | RORCESR1KLF10ALOX15ALOX12 | |
| SCHEMBL11180575 | 0.82 | RORC (0.68) | RORCESR1KLF10ALOX15ALOX12 | |
| SCHEMBL5523833 | 0.81 | RORC (0.53) | RORCESR1KLF10ALOX15ESR2 | |
| SCHEMBL5709988 | 0.80 | SHBG (0.52) | RORCESR1KLF10ALOX15ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 212 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11520083-B2 | Member, imaging apparatus, and method for producing member | CANON KABUSHIKI KAISHA (JP) | 2022-12-06 | — | — | US | claimed |
| US-12638772-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-26 | — | — | US | disclosed |
| WO-2026105630-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026105628-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026100662-A1 | LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-14 | — | — | US | disclosed |
| US-20260062580-A1 | REVERSIBLY THERMOCHROMIC COMPOSITION, REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT ENCAPSULATING REVERSIBLY THERMOCHROMIC COMPOSITION, AND WRITING INSTRUMENT USING REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT | THE PILOT INK CO., LTD. (JP) | 2026-03-05 | — | — | US | disclosed |
| EP-4692943-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | Nissan Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260022203-A1 | SELF-CROSSLINKABLE POLYMER AND RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-01-22 | — | — | US | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
| US-20030129505-A1 | Krypton fluoride laser lithography; photoresist pattern | RENESAS ELECTRONICS CORPORATION (JP) | 2003-07-10 | — | — | US | disclosed |
| US-20030022109-A1 | Method for forming resist pattern in reverse-tapered shape | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-30 | — | — | US | disclosed |
| EP-1271249-A1 | METHOD FOR FORMING RESIST PATTERN IN REVERSE-TAPERED SHAPE | Clariant International Ltd. (CH) | 2003-01-02 | — | — | EP | disclosed |
| US-20020086222-A1 | Photomask and manufacturing method of an electronic device therewith | RENESAS ELECTRONICS CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-6379862-B1 | PHENOLIC RESINS COMPRISING METHYLOLATED BISPHENOLS CONDENSED WITH PHENOLS; ALKALI-SOLUBLE RESIN, ACID GENERATOR, AND CROSSLINKING AGENT; HEAT RESISTANCE; LIQUID CRYSTAL DISPLAYS; SEMICONDUCTORS | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-04-30 | — | — | US | disclosed |
| US-5084372-A | PROCESS FOR PREPARING PHOTOGRAPHIC ELEMENTS UTILIZING LIGHT-SENSITIVE LAYER CONTAINING CYCLICAL ACID AMIDE THERMO-CROSSLINKING COMPOUND | HOECHST CELANESE CORPORATION (US) | 1992-01-28 | — | — | US | disclosed |
| US-5008175-A | Copying materials | HOECHST CELANESE CORPORATION (US) | 1991-04-16 | — | — | US | disclosed |
| US-4404272-A | Light-sensitive mixture and copying material prepared therefrom with novolak having brominated phenol units | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-09-13 | — | — | US | disclosed |
| US-4387152-A | Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-06-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | ASH2L, ASIC1, RPA1 | RORC 606/4885ESR1 1779/4885KLF10 1589/4885 |
| US-12638772-B2 | Resist underlayer film-forming composition | RFC2, RFC1, RFC4 | RORC 872/4885ESR1 1203/4885KLF10 114/4885 |
| US-20260062580-A1 | REVERSIBLY THERMOCHROMIC COMPOSITION, REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT ENCAPSULATING REVERSIBLY THERMOCHROMIC COMPOSITION, AND WRITING INSTRUMENT USING REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT | TYR, SCO2, HBB | RORC 2516/4885ESR1 4366/4885KLF10 1922/4885 |
| US-20260022203-A1 | SELF-CROSSLINKABLE POLYMER AND RESIST UNDERLAYER FILM FORMING COMPOSITION | SMC2, SMC4, SMC3 | RORC 2328/4885ESR1 333/4885KLF10 1548/4885 |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | RORC 3792/4885ESR1 392/4885KLF10 4547/4885 |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | BHMT, AADAT, PNMT | RORC 4747/4885ESR1 3594/4885KLF10 1387/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.