SCHEMBL2357299

SCHEMBL2357299

C=Cc1ccccc1C(C)Oc1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.40
KDM4E B2RXH2 1/20 0.40
ADRA2A P08913 1/20 0.38
ADRA2B P18089 1/20 0.38
ADRA2C P18825 1/20 0.38
MAOA P21397 1/20 0.38
MAOB P27338 1/20 0.38
NISCH Q9Y2I1 1/20 0.38
LTB4R Q15722 5/20 0.38
LTB4R2 Q9NPC1 5/20 0.38
CYP1A2 P05177 2/20 0.37
CYP2C9 P11712 2/20 0.37
CYP2C19 P33261 2/20 0.37
MTNR1A P48039 1/20 0.36
MTNR1B P49286 1/20 0.36
FFAR1 O14842 1/20 0.36
ALDH1A1 P00352 1/20 0.35
LMNA P02545 2/20 0.35
GAA P10253 2/20 0.35
PKM P14618 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7867358 0.79 ALDH1A1 (0.39) POLBKDM4ECYP1A2CYP2C9CYP2C19
SCHEMBL5014091 0.78 MTNR1A (0.36) KDM4ECYP1A2CYP2C9CYP2C19MTNR1A
SCHEMBL1507296 0.77 ALDH1A1 (0.48) CYP1A2ALDH1A1LMNA
SCHEMBL9797719 0.76 KDM4E (0.43) POLBKDM4EADRA2AADRA2BADRA2C
SCHEMBL6322964 0.75 LMNA (0.38) POLBKDM4EADRA2AADRA2BADRA2C
SCHEMBL28767595 0.75 L3MBTL1 (0.36) POLBKDM4EADRA2AADRA2BADRA2C
SCHEMBL28325025 0.75 ALDH1A1 (0.41) CYP2C9ALDH1A1LMNAKMT2A
SCHEMBL29364896 0.74 ALDH1A1 (0.44) CYP1A2ALDH1A1LMNAKMT2A
SCHEMBL29717597 0.74 GABRA1 (0.44) POLBCYP1A2CYP2C9CYP2C19ALDH1A1
SCHEMBL56243 0.74 GABRA1 (0.44) POLBCYP1A2CYP2C9CYP2C19ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12449737-B2 Pattern forming method, resist material, and pattern forming apparatus Oji Holdings Corporation (JP) 2025-10-21 US disclosed
US-12248249-B2 Resist material and pattern forming method Oji Holdings Corporation (JP) 2025-03-11 US disclosed
US-20250004376-A1 RESIST MATERIAL AND PATTERN FORMING METHOD Oji Holdings Corporation (JP) 2025-01-02 US disclosed
US-20220373886-A1 RESIST MATERIAL AND PATTERN FORMING METHOD Oji Holdings Corporation (JP) 2022-11-24 US disclosed
US-20220365448-A1 PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS Oji Holdings Corporation (JP) 2022-11-17 US disclosed
US-20200401044-A1 PATTERN-FORMING MATERIAL, PATTERN-FORMING METHOD, AND MONOMER FOR PATTERN-FORMING MATERIAL Oji Holdings Corporation (JP) 2020-12-24 US disclosed
CN-111788526-A Material for pattern formation, method for pattern formation, and single body for pattern formation material 王子控股株式会社 2020-10-16 CN disclosed
US-9159356-B2 Non-resonant two-photon absorption recording material, non-resonant polymer two-photon absorption optical information recording medium, and recording/reproducing method FUJIFILM CORPORATION (JP) 2015-10-13 US disclosed
US-20140078878-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL, NON-RESONANT POLYMER TWO-PHOTON ABSORPTION OPTICAL INFORMATION RECORDING MEDIUM, AND RECORDING/REPRODUCING METHOD FUJIFILM CORPORATION (JP) 2014-03-20 US disclosed
US-20140064053-A1 NON-RESONANT TWO-PHOTON ABSORPTION MATERIAL, NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL, RECORDING MEDIUM, RECORDING/REPRODUCING METHOD AND NON-RESONANT TWO-PHOTON ABSORPTION COMPOUND FUJIFILM CORPORATION (JP) 2014-03-06 US disclosed
US-8449794-B2 Non-resonant two-photon absorption recording material and non-resonant two-photon absorption compound FUJIFILM CORPORATION (JP) 2013-05-28 US disclosed
US-20120319059-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL AND NON-RESONANT TWO-PHOTON ABSORPTION COMPOUND FUJIFILM CORPORATION (JP) 2012-12-20 US disclosed
WO-2011102545-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL AND NON-RESONANT TWO-PHOTON ABSORPTION COMPOUND FUJIFILM CORPORATION (JP) 2011-08-25 WO disclosed
US-20100078607-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL AND NON-RESONANT TWO-PHOTON ABSORPTION COMPOUND FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100078607-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL AND NON-RESONANT TWO-PHOTON ABSORPTION COMPOUND SIGMAR1, SFN, CRY2 POLB 1402/4885KDM4E 3453/4885ADRA2A 873/4885
US-20140078878-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL, NON-RESONANT POLYMER TWO-PHOTON ABSORPTION OPTICAL INFORMATION RECORDING MEDIUM, AND RECORDING/REPRODUCING METHOD PUF60, PARG, FHIT POLB 2984/4885KDM4E 1254/4885ADRA2A 2355/4885
US-20120319059-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL AND NON-RESONANT TWO-PHOTON ABSORPTION COMPOUND CRY2, KCNJ2, NONO POLB 4214/4885KDM4E 4074/4885ADRA2A 1234/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.