Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 1/20 | 0.36 |
| ▸ | CCR2 | P41597 | 1/20 | 0.31 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.30 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12787046 | 0.98 | ELANE (0.37) | ELANECCR2CYP4F2CYP4A11 | |
| SCHEMBL13937865 | 0.87 | — | — | |
| SCHEMBL4544328 | 0.87 | ADORA3 (0.33) | — | |
| SCHEMBL47406 | 0.86 | ADORA3 (0.33) | — | |
| SCHEMBL98341 | 0.86 | ADORA3 (0.33) | — | |
| SCHEMBL47405 | 0.86 | ADORA3 (0.33) | — | |
| SCHEMBL12378936 | 0.86 | ADORA3 (0.33) | — | |
| SCHEMBL11911519 | 0.86 | ADORA3 (0.33) | — | |
| SCHEMBL12794960 | 0.85 | — | — | |
| SCHEMBL47494 | 0.84 | HMGCR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11782342-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-11740555-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11675267-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-13 | — | — | US | disclosed |
| US-20230161256-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230152693-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-18 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11782342-B2 | Salt and photoresist composition containing the same | CRY1, REN, SLC6A19 | ELANE 960/4885CCR2 4549/4885CYP4F2 2328/4885 |
| US-11740555-B2 | Resist composition and method for producing resist pattern | RER1, GAR1, REV1 | ELANE 1235/4885CCR2 4430/4885CYP4F2 2749/4885 |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | ELANE 1189/4885CCR2 3411/4885CYP4F2 1892/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | ELANE 2166/4885CCR2 669/4885CYP4F2 1438/4885 |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | HCAR1, H1-0, H1-10 | ELANE 1441/4885CCR2 1328/4885CYP4F2 2967/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.