Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRL1 | P41146 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3207251 | 0.84 | OPRL1 (0.31) | OPRL1 | |
| SCHEMBL2603142 | 0.79 | EPHX2 (0.40) | — | |
| SCHEMBL6053771 | 0.66 | GRIN2D (0.50) | — | |
| SCHEMBL2603143 | 0.64 | P2RX7 (0.38) | — | |
| SCHEMBL13148540 | 0.63 | PNMT (0.39) | OPRL1 | |
| SCHEMBL12934403 | 0.60 | EPHX2 (0.37) | — | |
| SCHEMBL7632016 | 0.60 | KDM1A (0.35) | — | |
| SCHEMBL4374764 | 0.60 | SLC6A4 (0.33) | — | |
| SCHEMBL8747758 | 0.60 | PNMT (0.56) | OPRL1 | |
| SCHEMBL3049402 | 0.57 | ALOX5AP (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118459372-A | Preparation method of photoacid generator sulfonate for ARF photoresist | 常州朗芯新材料科技有限公司 | 2024-08-09 | — | — | CN | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8435717-B2 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | TOYO GOSEI CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | OPRL1 2358/4885 |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | OPRL1 3233/4885 |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | OPRL1 2653/4885 |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | CRY1, ASIC1, ASIC3 | OPRL1 2368/4885 |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | OPRL1 2647/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.