Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 5/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 3/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | LTA4H | P09960 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3201098 | 0.87 | TSHR (0.51) | TSHRL3MBTL1TDP1MEN1KMT2A | |
| SCHEMBL456516 | 0.75 | ALDH1A1 (0.59) | TSHRL3MBTL1TDP1MEN1KMT2A | |
| Toluene SCHEMBL9711835 | 0.73 | NAAA (0.56) | TSHRL3MBTL1TDP1MEN1KMT2A | |
| Hydrochloric Acid SCHEMBL27576461 | 0.73 | L3MBTL1 (0.58) | TSHRL3MBTL1TDP1MEN1KMT2A | |
| SCHEMBL27672935 | 0.73 | ALDH1A1 (0.58) | TSHRL3MBTL1TDP1MEN1KMT2A | |
| SCHEMBL23191566 | 0.72 | TSHR (0.53) | TSHRL3MBTL1TDP1MEN1KMT2A | |
| SCHEMBL7647369 | 0.72 | LTA4H (0.61) | TSHRL3MBTL1TDP1ALDH1A1TP53 | |
| SCHEMBL11655422 | 0.72 | LTA4H (0.61) | TSHRLTA4H | |
| SCHEMBL648865 | 0.72 | TSHR (0.53) | TSHRL3MBTL1TDP1MEN1KMT2A | |
| SCHEMBL10007438 | 0.72 | TDP1 (0.77) | TSHRL3MBTL1TDP1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118459372-A | Preparation method of photoacid generator sulfonate for ARF photoresist | 常州朗芯新材料科技有限公司 | 2024-08-09 | — | — | CN | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8435717-B2 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | TOYO GOSEI CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | TSHR 2626/4885L3MBTL1 4346/4885TDP1 4756/4885 |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | TSHR 3426/4885L3MBTL1 4866/4885TDP1 4653/4885 |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | TSHR 1202/4885L3MBTL1 4479/4885TDP1 2802/4885 |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | CRY1, ASIC1, ASIC3 | TSHR 1768/4885L3MBTL1 3903/4885TDP1 4851/4885 |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | TSHR 988/4885L3MBTL1 4435/4885TDP1 2704/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.