Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CAD | P27708 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | CRBN | Q96SW2 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.30 |
| ▸ | TSHR | P16473 | 2/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36377 | 0.88 | RAB9A (0.42) | CADMAPTRAB9ANPSR1ALDH1A1 | |
| SCHEMBL36655 | 0.82 | CAD (0.44) | CADCRBNALDH1A1ALOX15LMNA | |
| SCHEMBL8174864 | 0.74 | CAD (0.34) | CADMAPTCRBNALDH1A1SMN1; SMN2 | |
| SCHEMBL29236235 | 0.74 | TSHR (0.47) | ALDH1A1MAPK1TSHRTDP1CYP2C19 | |
| SCHEMBL27286440 | 0.72 | CAD (0.41) | CADMAPTHSD17B10RAB9ANPSR1 | |
| SCHEMBL28995832 | 0.72 | — | — | |
| SCHEMBL20188172 | 0.71 | CAD (0.40) | CADMAPTRAB9ANPSR1ALDH1A1 | |
| SCHEMBL25429944 | 0.70 | — | — | |
| SCHEMBL28943049 | 0.70 | — | — | |
| SCHEMBL29287981 | 0.69 | CHRNB2 (0.33) | MAPTHSD17B10RAB9ANPSR1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 291 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | SUMITOMO CHEMICAL ADVANCED TECH LLC D B A SUMIKA ELECTRONIC MATERIALS (US) | 2026-01-15 | — | — | US | claimed |
| EP-4554800-A1 | RUBBER COMPOSITIONS CONTAINING PHLOROGLUCINOLIC RESINS FOR USE IN TIRE TREADS OF HEAVY VEHICLES | Sumitomo Chemical Advanced Technologies LLC (US) | 2025-05-21 | — | — | EP | claimed |
| EP-3877459-B1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | MOMENTIVE PERFORMANCE MAT INC (US) | 2025-01-22 | — | — | EP | claimed |
| WO-2024015956-A1 | RUBBER COMPOSITIONS CONTAINING PHLOROGLUCINOLIC RESINS FOR USE IN TIRE TREADS OF HEAVY VEHICLES | SUMITOMO CHEMICAL ADVANCED TECHNOLOGIES, LLC, D.B.A. SUMIKA ELECTRONIC MATERIALS (US) | 2024-01-18 | — | — | WO | claimed |
| US-11267955-B2 | Polymer network forming silane compositions | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-03-08 | — | — | US | claimed |
| US-20200140662-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2020-05-07 | — | — | US | claimed |
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | SUMITOMO CHEMICAL ADVANCED TECH LLC D B A SUMIKA ELECTRONIC MATERIALS (US) | 2026-01-15 | — | — | US | disclosed |
| US-12527163-B2 | Method for producing light-emitting elements | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-01-13 | — | — | US | disclosed |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003284-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED SILICON-CONTAINING RESIN FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| EP-4667537-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20090142693-A1 | NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-04 | — | — | US | disclosed |
| US-20090111054-A1 | NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-20090081590-A1 | NEGATIVE RESIST COMPOSITION AND PROCESS FOR FORMING RESIST PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090035697-A1 | NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKAKOGYO CO.,LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080124648-A1 | Resist Pattern Forming Method, Supercritical Processing Solution For Lithography Process, And Antireflection Film Forming Method | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080118871-A1 | Resist Pattern Forming Method | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | CAD 1495/4885MAPT 2575/4885HSD17B10 1617/4885 |
| US-20260003284-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED SILICON-CONTAINING RESIN FILM | ASH2L, SEM1, COL1A1 | CAD 291/4885MAPT 3756/4885HSD17B10 1577/4885 |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | CAD 1292/4885MAPT 2567/4885HSD17B10 1672/4885 |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | CAD 989/4885MAPT 2903/4885HSD17B10 3780/4885 |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | RARA, COL1A1, TAS1R1 | CAD 74/4885MAPT 1465/4885HSD17B10 3286/4885 |
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | TST, RIF1, SORD | CAD 1306/4885MAPT 2942/4885HSD17B10 3144/4885 |
| US-20200140662-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | TSN, RIF1, TRHDE | CAD 821/4885MAPT 901/4885HSD17B10 3830/4885 |
| US-11267955-B2 | Polymer network forming silane compositions | TSN, RIF1, TRHDE | CAD 821/4885MAPT 901/4885HSD17B10 3830/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.