Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CAD | P27708 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | CRBN | Q96SW2 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | MGAM | O43451 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SI | P14410 | 1/20 | 0.33 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36698 | 0.82 | CAD (0.38) | CADALOX15CRBNALDH1A1LMNA | |
| SCHEMBL36377 | 0.79 | RAB9A (0.42) | CADALDH1A1LMNACYP1A2NPC1 | |
| SCHEMBL8174864 | 0.77 | CAD (0.34) | CADCRBNALDH1A1LMNANPC1 | |
| SCHEMBL11785461 | 0.74 | CAD (0.40) | CADALOX15CRBNALDH1A1HTT | |
| SCHEMBL28142978 | 0.74 | CAD (0.40) | CADALOX15CRBNALDH1A1HTT | |
| SCHEMBL15380994 | 0.73 | ALDH1A1 (0.42) | ALDH1A1THRBMGAMGAASI | |
| SCHEMBL11226218 | 0.73 | CAD (0.39) | CADALOX15HTT | |
| SCHEMBL36898 | 0.72 | — | — | |
| SCHEMBL7695367 | 0.71 | TGFBR1 (0.46) | ALDH1A1THRBMGAMGAASI | |
| SCHEMBL7698482 | 0.71 | TSHR (0.50) | ALDH1A1MGAMGAASIMGAM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 302 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | SUMITOMO CHEMICAL ADVANCED TECH LLC D B A SUMIKA ELECTRONIC MATERIALS (US) | 2026-01-15 | — | — | US | claimed |
| EP-4554800-A1 | RUBBER COMPOSITIONS CONTAINING PHLOROGLUCINOLIC RESINS FOR USE IN TIRE TREADS OF HEAVY VEHICLES | Sumitomo Chemical Advanced Technologies LLC (US) | 2025-05-21 | — | — | EP | claimed |
| CN-119546467-A | Rubber composition containing phloroglucinol resin for heavy vehicle tire tread | 住友化学先进技术有限责任公司即住化电子材料公司 | 2025-02-28 | — | — | CN | claimed |
| EP-3877459-B1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | MOMENTIVE PERFORMANCE MAT INC (US) | 2025-01-22 | — | — | EP | claimed |
| WO-2024015956-A1 | RUBBER COMPOSITIONS CONTAINING PHLOROGLUCINOLIC RESINS FOR USE IN TIRE TREADS OF HEAVY VEHICLES | SUMITOMO CHEMICAL ADVANCED TECHNOLOGIES, LLC, D.B.A. SUMIKA ELECTRONIC MATERIALS (US) | 2024-01-18 | — | — | WO | claimed |
| CN-113227228-B | Silane composition for forming polymer network | 迈图高新材料公司 | 2023-09-05 | — | — | CN | claimed |
| US-11267955-B2 | Polymer network forming silane compositions | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-03-08 | — | — | US | claimed |
| EP-3877459-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | Momentive Performance Materials Inc. (US) | 2021-09-15 | — | — | EP | claimed |
| US-20200140662-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2020-05-07 | — | — | US | claimed |
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | SUMITOMO CHEMICAL ADVANCED TECH LLC D B A SUMIKA ELECTRONIC MATERIALS (US) | 2026-01-15 | — | — | US | disclosed |
| US-12527163-B2 | Method for producing light-emitting elements | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-01-13 | — | — | US | disclosed |
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080124648-A1 | Resist Pattern Forming Method, Supercritical Processing Solution For Lithography Process, And Antireflection Film Forming Method | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080118871-A1 | Resist Pattern Forming Method | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
| CN-1210622-C | Negative photo slushing compound composition for short-wave long light and method for forming image | NIPPON ELECTRIC CO (JP) | 2005-07-13 | — | — | CN | disclosed |
| US-6074801-A | POLYMER WITH REPEATING UNITS, CROSSLINKING AND ADDING PHOTOACID GENERATOR WITH LIGHT | NEC CORPORATION (JP) | 2000-06-13 | — | — | US | disclosed |
| CN-1209570-A | Negative photo slushing compound composition for short-wave long light and method for forming image | NIPPON ELECTRIC CO (JP) | 1999-03-03 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | CAD 1495/4885ALOX15 76/4885CRBN 3591/4885 |
| US-20260003277-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | CAD 1292/4885ALOX15 286/4885CRBN 3247/4885 |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | CAD 989/4885ALOX15 2027/4885CRBN 2301/4885 |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | RARA, COL1A1, TAS1R1 | CAD 74/4885ALOX15 349/4885CRBN 2213/4885 |
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | TST, RIF1, SORD | CAD 1306/4885ALOX15 1986/4885CRBN 2734/4885 |
| US-20200140662-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | TSN, RIF1, TRHDE | CAD 821/4885ALOX15 881/4885CRBN 637/4885 |
| US-11267955-B2 | Polymer network forming silane compositions | TSN, RIF1, TRHDE | CAD 821/4885ALOX15 881/4885CRBN 637/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.