SCHEMBL3700486

SCHEMBL3700486

CC(C)(C)OC(=O)c1cc(O)ccn1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRG2 P18507 14/20 0.46
GABRB3 P28472 14/20 0.46
GABRA1 P14867 13/20 0.46
GABRA5 P31644 13/20 0.46
GABRA2 P47869 12/20 0.46
GABRA3 P34903 12/20 0.46
GABRA6 Q16445 11/20 0.46
GABRA4 P48169 5/20 0.46
GABRP O00591 1/20 0.46
GABRD O14764 1/20 0.46
GABRB1 P18505 1/20 0.46
GABRB2 P47870 1/20 0.46
GABRE P78334 1/20 0.46
GABRG1 Q8N1C3 1/20 0.46
GABRG3 Q99928 1/20 0.46
GABRQ Q9UN88 1/20 0.46
ATR Q13535 1/20 0.40
HPGDS O60760 1/20 0.40
AR P10275 1/20 0.38
EGFR P00533 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29563011 1.00 GABRG2 (0.46) GABRG2GABRB3GABRA1GABRA5GABRA2
SCHEMBL163615 0.83 GABRG2 (0.46) GABRG2GABRB3GABRA1GABRA5GABRA2
SCHEMBL13105640 0.83 GABRG2 (0.46) GABRG2GABRB3GABRA1GABRA5GABRA2
SCHEMBL728168 0.81 GABRG2 (0.48) GABRG2GABRB3GABRA1GABRA5GABRA2
SCHEMBL3882564 0.81 GABRG2 (0.45) GABRG2GABRB3GABRA1GABRA5GABRA2
SCHEMBL15114586 0.81 KDM4E (0.56) GABRG2GABRB3GABRA1GABRA5GABRA2
SCHEMBL724883 0.81 ALDH1A1 (0.50) GABRG2GABRB3GABRA1GABRA5GABRA2
SCHEMBL9979936 0.81 GABRG2 (0.56) GABRG2GABRB3GABRA1GABRA5GABRA2
SCHEMBL850841 0.80 ALDH1A1 (0.51) GABRG2GABRB3GABRA1GABRA5GABRA2
SCHEMBL31364143 0.80 FTO (0.61) GABRG2GABRB3GABRA1GABRA5GABRA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118963059-A Photoresist composition, coated substrate comprising photoresist composition, and method of forming electronic device 罗门哈斯电子材料有限责任公司 2024-11-15 CN disclosed
CN-106933030-B Photoresist composition, coated substrate comprising photoresist composition, and method of forming electronic device 罗门哈斯电子材料有限责任公司 2024-08-16 CN disclosed
CN-117945957-A Photoacid generating compounds and related polymers, photoresist compositions, and methods of forming photoresist relief images 罗门哈斯电子材料有限责任公司 2024-04-30 CN disclosed
US-11960206-B2 Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device Rohm and Hass Electronic Materials LLC (US) 2024-04-16 US disclosed
US-20230094313-A1 PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST COMPOSITION, AND METHOD OF FORMING ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-03-30 US disclosed
US-11550217-B2 Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-01-10 US disclosed
CN-108983549-B Acid generator and photoresist containing the same 罗门哈斯电子材料有限公司 2022-04-26 CN disclosed
CN-106187964-B Acid generator compound and photoresist comprising the same 罗门哈斯电子材料有限责任公司 2021-04-06 CN disclosed
US-20190243239-A1 PHOTOACID GENERATOR U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2019-08-08 US disclosed
US-10317795-B2 Photoacid generator ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-06-11 US disclosed
US-20140120471-A1 PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2014-05-01 US disclosed
US-20130344438-A1 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-12-26 US disclosed
US-20130171567-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-07-04 US disclosed
US-20130137038-A1 PHOTORESIST COMPOSITION DOW GLOBAL TECHNOLOGIES LLC (US) 2013-05-30 US disclosed
US-20130084525-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-04-04 US disclosed
US-20120129108-A1 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-05-24 US disclosed
US-20120129104-A1 LACTONE PHOTOACID GENERATORS AND RESINS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-05-24 US disclosed
EP-2452941-A1 Lactone photoacid generators and resins and photoresists comprising same Rohm and Haas Electronic Materials LLC (US) 2012-05-16 EP disclosed
EP-2452932-A2 Base reactive photoacid generators and photoresists comprising same Rohm and Haas Electronic Materials LLC (US) 2012-05-16 EP disclosed
EP-2046292-B1 FORMULATIONS FOR BENZIMIDAZOLYL PYRIDYL ETHERS NOVARTIS AG (CH) 2010-03-03 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140120471-A1 PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE SULT1A1, ARSA, SULT1E1 GABRG2 1830/4885GABRB3 1970/4885GABRA1 1189/4885
US-11960206-B2 Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device PPIG, PARG, EEF1G GABRG2 63/4885GABRB3 1828/4885GABRA1 829/4885
US-10317795-B2 Photoacid generator RARG, PPIG, ATP6V1G1 GABRG2 27/4885GABRB3 1129/4885GABRA1 325/4885
US-11550217-B2 Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device PPIG, PARG, EEF1G GABRG2 63/4885GABRB3 1828/4885GABRA1 829/4885
US-20190243239-A1 PHOTOACID GENERATOR RARG, PPIG, ATP6V1G1 GABRG2 27/4885GABRB3 1129/4885GABRA1 325/4885
US-20130171567-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME F10, C1S, H1-0 GABRG2 2481/4885GABRB3 3311/4885GABRA1 2203/4885
US-20120129108-A1 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME ALAD, APEX1, HMBS GABRG2 456/4885GABRB3 1427/4885GABRA1 651/4885
US-20230094313-A1 PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST COMPOSITION, AND METHOD OF FORMING ELECTRONIC DEVICE PPIG, PARG, EEF1G GABRG2 63/4885GABRB3 1828/4885GABRA1 829/4885
US-20120129104-A1 LACTONE PHOTOACID GENERATORS AND RESINS AND PHOTORESISTS COMPRISING SAME PGLS, GGPS1, GSS GABRG2 217/4885GABRB3 1469/4885GABRA1 537/4885
US-20130084525-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME CRY1, CRY2, CHRM1 GABRG2 1427/4885GABRB3 1719/4885GABRA1 571/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.