Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 8/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.53 |
| ▸ | CA1 | P00915 | 5/20 | 0.53 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.38 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.38 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | CA7 | P43166 | 1/20 | 0.37 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | XBP1 | P17861 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31042227 | 0.98 | CA2 (0.52) | CA2MAPK1CA1USP2MEN1 | |
| SCHEMBL29190445 | 0.98 | CA2 (0.52) | CA2MAPK1CA1USP2MEN1 | |
| SCHEMBL27689591 | 0.98 | CA2 (0.52) | CA2MAPK1CA1USP2MEN1 | |
| SCHEMBL29153274 | 0.86 | CA2 (0.64) | CA2MAPK1CA1USP2MEN1 | |
| SCHEMBL409671 | 0.86 | USP2 (0.39) | CA2MAPK1CA1USP2SLC1A3 | |
| SCHEMBL6131028 | 0.84 | CA2 (0.53) | CA2MAPK1CA1USP2MEN1 | |
| SCHEMBL3964956 | 0.80 | CA2 (0.57) | CA2MAPK1CA1USP2MEN1 | |
| SCHEMBL31048063 | 0.78 | CA2 (0.55) | CA2MAPK1CA1USP2MEN1 | |
| SCHEMBL410901 | 0.78 | CA2 (0.55) | CA2MAPK1CA1USP2MEN1 | |
| SCHEMBL10031685 | 0.77 | CA2 (0.64) | CA2MAPK1CA1USP2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 193 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| EP-4130010-B1 | ZINC COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2026-04-29 | — | — | EP | disclosed |
| EP-4067365-B1 | COMPOUND, THIN FILM-FORMING MATERIAL, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12577660-B2 | Compound, thin-film forming raw material, thin-film, and method of producing thin-film | ADEKA CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| US-20260055506-A1 | HALOGEN COMPOUND | ADEKA CORPORATION (JP) | 2026-02-26 | — | — | US | disclosed |
| US-20260055507-A1 | THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM | ADEKA CORPORATION (JP) | 2026-02-26 | — | — | US | disclosed |
| US-12516415-B2 | Reactive material and method of producing thin-film | ADEKA CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-12509764-B2 | Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film | ADEKA CORPORATION (JP) | 2025-12-30 | — | — | US | disclosed |
| EP-4660187-A1 | COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORPORATION (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-12486573-B2 | Thin-film forming raw material, thin-film and method of producing thin-film | ADEKA CORPORATION (JP) | 2025-12-02 | — | — | US | disclosed |
| US-7501153-B2 | Alkoxide compound, thin film-forming material and method for forming thin film | ADEKA CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20080085365-A1 | Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film | ADEKA CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-7335783-B2 | Thin film-forming material and method for producing thin film | ADEKA CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| JP-2007254298-A | RAW MATERIAL FOR FORMING THIN FILM AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP | 2007-10-04 | — | — | JP | disclosed |
| US-20070190249-A1 | Material for chemical vapor deposition and thin film forming method | ADEKA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070178235-A1 | Thin film-forming material and method for producing thin film | ADEKA CORPORATION (JP) | 2007-08-02 | — | — | US | disclosed |
| EP-1770187-A1 | THIN FILM-FORMING MATERIAL AND METHOD FOR PRODUCING THIN FILM | Adeka Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| EP-1754800-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND THIN FILM FORMING METHOD | Adeka Corporation (JP) | 2007-02-21 | — | — | EP | disclosed |
| WO-2006021850-A2 | CVD PRECURSOR SOLUTION USED FOR PRODUCTION OF A THIN FILM COMPRISING A LANTHANIDE SERIES METAL AND A THIN FILM PRODUCING METHOD USING THE SAME | TOSHIMA MFG. CO. LTD. (JP) | 2006-03-02 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260055506-A1 | HALOGEN COMPOUND | SLC9A2, SLC9A1, SLC9B2 | CA2 951/4885MAPK1 833/4885CA1 1083/4885 |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ALKBH5, ALKBH3, ALK | CA2 3585/4885MAPK1 2319/4885CA1 2755/4885 |
| US-12509764-B2 | Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film | FTO, NOS1, NOS3 | CA2 3285/4885MAPK1 3034/4885CA1 2531/4885 |
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | C5, AFF2, AFF4 | CA2 1280/4885MAPK1 1872/4885CA1 2146/4885 |
| US-20260055507-A1 | THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM | TMEM109, FTO, YTHDF2 | CA2 3633/4885MAPK1 1447/4885CA1 3150/4885 |
| US-12577660-B2 | Compound, thin-film forming raw material, thin-film, and method of producing thin-film | METTL14, YTHDF2, YTHDF1 | CA2 2392/4885MAPK1 3423/4885CA1 1085/4885 |
| US-20080085365-A1 | Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film | APOB, C9, C5 | CA2 2099/4885MAPK1 4227/4885CA1 2792/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.