Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.44 |
| ▸ | CES1 | P23141 | 3/20 | 0.42 |
| ▸ | CES2 | O00748 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | FAAH | O00519 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.36 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1946353 | 0.94 | HAO1 (0.52) | HAO1CES1CES2KMT2AMEN1 | |
| SCHEMBL11598362 | 0.92 | HAO1 (0.55) | HAO1CES1CES2KMT2AMEN1 | |
| SCHEMBL108545 | 0.89 | CES1 (0.48) | HAO1CES1CES2KMT2AMEN1 | |
| SCHEMBL1948119 | 0.86 | ALDH1A1 (0.40) | CES1CES2KMT2AMEN1FAAH | |
| SCHEMBL9699354 | 0.84 | KMT2A (0.45) | HAO1CES1CES2KMT2AMEN1 | |
| SCHEMBL534933 | 0.83 | CES1 (0.58) | HAO1CES1CES2KMT2AMEN1 | |
| SCHEMBL10728740 | 0.83 | CES1 (0.42) | CES1CES2KMT2AMEN1FAAH | |
| SCHEMBL2092642 | 0.82 | KMT2A (0.52) | HAO1CES1CES2KMT2AMEN1 | |
| SCHEMBL30197621 | 0.81 | CES1 (0.55) | HAO1CES1CES2KMT2AMEN1 | |
| Hydrochloric Acid SCHEMBL29053917 | 0.81 | CES1 (0.55) | HAO1CES1CES2KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 185 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| EP-4130010-B1 | ZINC COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2026-04-29 | — | — | EP | disclosed |
| EP-4067365-B1 | COMPOUND, THIN FILM-FORMING MATERIAL, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12577660-B2 | Compound, thin-film forming raw material, thin-film, and method of producing thin-film | ADEKA CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| US-20260055506-A1 | HALOGEN COMPOUND | ADEKA CORPORATION (JP) | 2026-02-26 | — | — | US | disclosed |
| US-20260055507-A1 | THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM | ADEKA CORPORATION (JP) | 2026-02-26 | — | — | US | disclosed |
| US-12516415-B2 | Reactive material and method of producing thin-film | ADEKA CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-12509764-B2 | Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film | ADEKA CORPORATION (JP) | 2025-12-30 | — | — | US | disclosed |
| EP-4660187-A1 | COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORPORATION (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-12486573-B2 | Thin-film forming raw material, thin-film and method of producing thin-film | ADEKA CORPORATION (JP) | 2025-12-02 | — | — | US | disclosed |
| US-20100126351-A1 | METHOD FOR PRODUCING A MATERIAL FOR CHEMICAL VAPOR DEPOSITION | ADEKA CORPORATION (JP) | 2010-05-27 | — | — | US | disclosed |
| US-7714155-B2 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| US-7501153-B2 | Alkoxide compound, thin film-forming material and method for forming thin film | ADEKA CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20080085365-A1 | Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film | ADEKA CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-7335783-B2 | Thin film-forming material and method for producing thin film | ADEKA CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| US-20070190249-A1 | Material for chemical vapor deposition and thin film forming method | ADEKA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070178235-A1 | Thin film-forming material and method for producing thin film | ADEKA CORPORATION (JP) | 2007-08-02 | — | — | US | disclosed |
| EP-1770187-A1 | THIN FILM-FORMING MATERIAL AND METHOD FOR PRODUCING THIN FILM | Adeka Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| EP-1754800-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND THIN FILM FORMING METHOD | Adeka Corporation (JP) | 2007-02-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260055506-A1 | HALOGEN COMPOUND | SLC9A2, SLC9A1, SLC9B2 | HAO1 4695/4885CES1 4188/4885CES2 1515/4885 |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ALKBH5, ALKBH3, ALK | HAO1 41/4885CES1 1810/4885CES2 2201/4885 |
| US-12509764-B2 | Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film | FTO, NOS1, NOS3 | HAO1 204/4885CES1 3637/4885CES2 4363/4885 |
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | C5, AFF2, AFF4 | HAO1 3287/4885CES1 4399/4885CES2 3742/4885 |
| US-20260055507-A1 | THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM | TMEM109, FTO, YTHDF2 | HAO1 4275/4885CES1 4510/4885CES2 4079/4885 |
| US-12577660-B2 | Compound, thin-film forming raw material, thin-film, and method of producing thin-film | METTL14, YTHDF2, YTHDF1 | HAO1 877/4885CES1 2015/4885CES2 1996/4885 |
| US-20080085365-A1 | Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film | APOB, C9, C5 | HAO1 1941/4885CES1 3415/4885CES2 3187/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.