Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27984282 | 0.84 | KMT2A (0.37) | TSHRALDH1A1KMT2A | |
| SCHEMBL93393 | 0.81 | KMT2A (0.39) | TSHRALDH1A1KMT2A | |
| SCHEMBL4837194 | 0.81 | KMT2A (0.39) | TSHRALDH1A1KMT2A | |
| SCHEMBL17731296 | 0.80 | GAA (0.46) | TSHRALDH1A1DGAT1 | |
| SCHEMBL11377580 | 0.80 | MGAM (0.46) | TSHRALDH1A1KMT2ADGAT1 | |
| SCHEMBL9566006 | 0.78 | KMT2A (0.37) | TSHRALDH1A1KMT2A | |
| SCHEMBL15788961 | 0.78 | NPC1 (0.37) | TSHRALDH1A1KMT2A | |
| SCHEMBL1318242 | 0.78 | KMT2A (0.37) | TSHRALDH1A1KMT2A | |
| SCHEMBL21002308 | 0.78 | KMT2A (0.37) | TSHRALDH1A1KMT2A | |
| SCHEMBL21405194 | 0.78 | KMT2A (0.37) | TSHRALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9663538-B2 | Aluminum compound, thin-film forming raw material, and method for producing thin film | ADEKA CORPORATION (JP) | 2017-05-30 | — | — | US | claimed |
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| EP-4130010-B1 | ZINC COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2026-04-29 | — | — | EP | disclosed |
| EP-4067365-B1 | COMPOUND, THIN FILM-FORMING MATERIAL, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12577660-B2 | Compound, thin-film forming raw material, thin-film, and method of producing thin-film | ADEKA CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| US-20260055507-A1 | THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM | ADEKA CORPORATION (JP) | 2026-02-26 | — | — | US | disclosed |
| US-20260055506-A1 | HALOGEN COMPOUND | ADEKA CORPORATION (JP) | 2026-02-26 | — | — | US | disclosed |
| US-12516415-B2 | Reactive material and method of producing thin-film | ADEKA CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-12509764-B2 | Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film | ADEKA CORPORATION (JP) | 2025-12-30 | — | — | US | disclosed |
| EP-4660187-A1 | COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORPORATION (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20100126351-A1 | METHOD FOR PRODUCING A MATERIAL FOR CHEMICAL VAPOR DEPOSITION | ADEKA CORPORATION (JP) | 2010-05-27 | — | — | US | disclosed |
| US-7714155-B2 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| US-7595414-B2 | complex capable of being used for chemical vapor deposition of thin metal , or metal oxide films | UBE INDUSTRIES, LTD. (JP) | 2009-09-29 | — | — | US | disclosed |
| US-7501153-B2 | Alkoxide compound, thin film-forming material and method for forming thin film | ADEKA CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20080254216-A1 | Metal Complex Compound Comprising B-Diketonato Ligand | UBE INDUSTRIES, LTD. (JP) | 2008-10-16 | — | — | US | disclosed |
| US-20080085365-A1 | Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film | ADEKA CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20070190249-A1 | Material for chemical vapor deposition and thin film forming method | ADEKA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| EP-1770187-A1 | THIN FILM-FORMING MATERIAL AND METHOD FOR PRODUCING THIN FILM | Adeka Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| EP-1754800-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND THIN FILM FORMING METHOD | Adeka Corporation (JP) | 2007-02-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260055506-A1 | HALOGEN COMPOUND | SLC9A2, SLC9A1, SLC9B2 | TSHR 261/4885ALDH1A1 4328/4885KMT2A 414/4885 |
| US-20080254216-A1 | Metal Complex Compound Comprising B-Diketonato Ligand | CAD, APOB, DBI | TSHR 4087/4885ALDH1A1 3881/4885KMT2A 143/4885 |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ALKBH5, ALKBH3, ALK | TSHR 4351/4885ALDH1A1 744/4885KMT2A 868/4885 |
| US-12509764-B2 | Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film | FTO, NOS1, NOS3 | TSHR 2946/4885ALDH1A1 3775/4885KMT2A 1604/4885 |
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | C5, AFF2, AFF4 | TSHR 2193/4885ALDH1A1 940/4885KMT2A 164/4885 |
| US-20260055507-A1 | THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM | TMEM109, FTO, YTHDF2 | TSHR 2702/4885ALDH1A1 4140/4885KMT2A 1732/4885 |
| US-12577660-B2 | Compound, thin-film forming raw material, thin-film, and method of producing thin-film | METTL14, YTHDF2, YTHDF1 | TSHR 3127/4885ALDH1A1 2309/4885KMT2A 224/4885 |
| US-20080085365-A1 | Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film | APOB, C9, C5 | TSHR 3917/4885ALDH1A1 1695/4885KMT2A 957/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.