Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 1/20 | 0.40 |
| ▸ | MMP2 | P08253 | 2/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | MMP1 | P03956 | 1/20 | 0.36 |
| ▸ | MMP9 | P14780 | 1/20 | 0.36 |
| ▸ | MMP8 | P22894 | 1/20 | 0.36 |
| ▸ | MMP13 | P45452 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | ACHE | P22303 | 2/20 | 0.33 |
| ▸ | SOS1 | Q07889 | 1/20 | 0.33 |
| ▸ | F2 | P00734 | 1/20 | 0.33 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.33 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.33 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.33 |
| ▸ | EPAS1 | Q99814 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL503264 | 0.93 | GPR3 (0.43) | GPR3ALDH1A1PTGS2PKMKMT2A | |
| SCHEMBL1801410 | 0.82 | CA2 (0.36) | MMP2CA1CA2MMP1MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL1805120 | 0.82 | KCNH2 (0.42) | GPR3MMP2CA1CA2MMP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL548506 | 0.82 | KIF11 (0.44) | GPR3CA1CA2MMP1ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL31145602 | 0.82 | CA2 (0.41) | GPR3MMP2CA1CA2MMP1 | |
| Toliodium SCHEMBL2898696 | 0.82 | GPR3 (0.44) | GPR3MMP2CA1CA2MMP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL36177 | 0.81 | GPR3 (0.50) | GPR3CA1CA2HSD11B1ALDH1A1 | |
| SCHEMBL3284972 | 0.81 | CA2 (0.39) | MMP2CA1CA2MMP1MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL36627 | 0.79 | ALDH1A1 (0.46) | GPR3CA1CA2HSD11B1ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1592826 | 0.77 | PKM (0.47) | MMP2CA1CA2MMP1MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106936-A1 | POLY(METH)ACRYLIMIDE MATERIALS WITH ENHANCED THERMOMECHANICAL PROPERTIES | GENCORES, INC. (US) | 2025-05-22 | — | — | WO | claimed |
| US-20260132316-A1 | ULTRAVIOLET DETACHABLE ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED USING SAME, AND METHOD FOR PEELING OFF ADHESIVE FILM | SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) | 2026-05-14 | — | — | US | disclosed |
| US-20260117026-A1 | DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES | MERCK PATENT GMBH (DE) | 2026-04-30 | — | — | US | disclosed |
| EP-4726005-A1 | ULTRAVIOLET DETACHABLE ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED USING SAME, AND METHOD FOR PEELING OFF ADHESIVE FILM | Seoul National University R&DB Foundation (KR) | 2026-04-15 | — | — | EP | disclosed |
| US-20260071098-A1 | ULTRAVIOLET-BLOCKING ADHESIVE COMPOSITION, METHOD FOR PREPARING ADHESIVE RESIN BY USING SAME, AND ADHESIVE FILM MANUFACTURED USING SAME | SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) | 2026-03-12 | — | — | US | disclosed |
| EP-4696755-A1 | ULTRAVIOLET-BLOCKING ADHESIVE COMPOSITION, METHOD FOR PREPARING ADHESIVE RESIN BY USING SAME, AND ADHESIVE FILM MANUFACTURED USING SAME | Seoul National University R&DB Foundation (KR) | 2026-02-18 | — | — | EP | disclosed |
| EP-4674834-A1 | HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF COMPOUND AND SOLVATE THEREOF, AND METHOD FOR PRODUCING COMPOUND, SOLVATE THEREOF, OR MIXTURE OF COMPOUND AND SOLVATE THEREOF | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-20250376601-A1 | PHOTOCATALYST COMPOSITION, PHOTOCURABLE COMPOSITION COMPRISING SAME AND METHOD FOR PREPARING PHOTOCURED RESIN BY USING SAME | SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) | 2025-12-11 | — | — | US | disclosed |
| EP-4635963-A1 | ISOPOLYOXOTUNGSTATE SALT COMPOUND, SOLVATE THEREOF OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE OR MIXTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4594290-A1 | METAL COMPLEX AND FORMULATION FOR THE PREPARATION OF METAL OXIDE OPTICAL LAYERS | Merck Patent GmbH (DE) | 2025-08-06 | — | — | EP | disclosed |
| EP-1897869-A1 | NOVEL COMPOUND, POLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-03-12 | — | — | EP | disclosed |
| US-7335457-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| EP-1881371-A1 | PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-01-23 | — | — | EP | disclosed |
| US-7258962-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-21 | — | — | US | disclosed |
| US-20060188812-A1 | Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-08-24 | — | — | US | disclosed |
| EP-1686424-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-08-02 | — | — | EP | disclosed |
| US-20060166138-A1 | Radiation-sensitive resin composition | JSR CORPORATION | 2006-07-27 | — | — | US | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-20050244747-A1 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260132316-A1 | ULTRAVIOLET DETACHABLE ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED USING SAME, AND METHOD FOR PEELING OFF ADHESIVE FILM | CDH1, ICAM1, RAD51 | GPR3 1424/4885MMP2 3629/4885CA1 3437/4885 |
| US-20260071098-A1 | ULTRAVIOLET-BLOCKING ADHESIVE COMPOSITION, METHOD FOR PREPARING ADHESIVE RESIN BY USING SAME, AND ADHESIVE FILM MANUFACTURED USING SAME | CDH1, ITGAM, ICAM1 | GPR3 3392/4885MMP2 2766/4885CA1 3759/4885 |
| US-20260117026-A1 | DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES | KCNE1, GLRB, PBRM1 | GPR3 1715/4885MMP2 4446/4885CA1 597/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.