Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 known ✓ | P00918 | 4/20 | 0.34 |
| ▸ | CA12 known ✓ | O43570 | 3/20 | 0.32 |
| ▸ | CA1 known ✓ | P00915 | 3/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.37 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.35 |
| ▸ | DUSP5 | Q16690 | 2/20 | 0.35 |
| ▸ | DUSP6 | Q16828 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 3/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | MGLL | Q99685 | 1/20 | 0.35 |
| ▸ | CA5A | P35218 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1415839 | 0.84 | LMNA (0.43) | LMNATDP1DNMT1PTPN1DUSP5 | |
| SCHEMBL19953365 | 0.83 | LMNA (0.55) | LMNATDP1PTPN1DUSP5DUSP6 | |
| SCHEMBL28993337 | 0.80 | TSHR (0.50) | LMNATDP1HPGDMAPTALDH1A1 | |
| Potassium Ion SCHEMBL978255 | 0.79 | STS (0.41) | LMNATDP1DNMT1PTPN1HPGD | |
| SCHEMBL11337395 | 0.77 | MMP13 (0.51) | LMNATDP1HPGDALDH1A1KMT2A | |
| Potassium Ion SCHEMBL1538011 | 0.76 | LMNA (0.48) | LMNATDP1PTPN1DUSP5DUSP6 | |
| SCHEMBL28934944 | 0.76 | LMNA (0.48) | LMNATDP1PTPN1DUSP5DUSP6 | |
| SCHEMBL3171668 | 0.75 | CA12 (0.52) | LMNATDP1PTPN1DUSP5DUSP6 | |
| SCHEMBL5846996 | 0.75 | CA12 (0.52) | LMNATDP1PTPN1DUSP5DUSP6 | |
| SCHEMBL942878 | 0.74 | ENPP2 (0.54) | DNMT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11746433-B2 | Single step electrolytic method of filling through holes in printed circuit boards and other substrates | MACDERMID ENTHONE INC. (US) | 2023-09-05 | — | — | US | claimed |
| US-9598787-B2 | Method of filling through-holes | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-03-21 | — | — | US | claimed |
| EP-1651801-A2 | AQUEOUS, ACIDIC SOLUTION AND METHOD FOR ELECTROLYTICALLY DEPOSITING COPPER COATINGS AS WELL AS USE OF SAID SOLUTION | ATOTECH Deutschland GmbH (DE) | 2006-05-03 | — | — | EP | claimed |
| US-6911068-B2 | Plating bath and method for depositing a metal layer on a substrate | SHIPLEY COMPANY, L.L.C. (US) | 2005-06-28 | — | — | US | claimed |
| WO-2005014891-A2 | AQUEOUS, ACIDIC SOLUTION AND METHOD FOR ELECTROLYTICALLY DEPOSITING COPPER COATINGS AS WELL AS USE OF SAID SOLUTION | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-02-17 | — | — | WO | claimed |
| US-20040206631-A1 | Plating bath and method for depositing a metal layer on a substrate | SHIPLEY COMPANY, L.L.C. | 2004-10-21 | — | — | US | claimed |
| US-6736954-B2 | A METAL PLATING BATH COMPRISING METAL SALTS AND AN ADDITIVE CONSUMPTION INHIBITOR(A HETEROATOM ORGANIC COMPOUNDS WHICH MAY CONTAIN SULFUR, OXYGEN OR NITROGEN HETEROATOMS) IMPROVE THE BRIGHTNESS OF PLATED METAL AS WELL AS THE DUCTILITY | SHIPLEY COMPANY, L.L.C. | 2004-05-18 | — | — | US | claimed |
| EP-1300488-A2 | Plating path and method for depositing a metal layer on a substrate | Shipley Co. L.L.C. (US) | 2003-04-09 | — | — | EP | claimed |
| US-12635082-B2 | Single step electrolytic method of filling through-holes in printed circuit boards and other substrates | MACDERMID ENTHONE INC. (US) | 2026-05-19 | — | — | US | disclosed |
| CN-114717615-B | Improving photoresist resolution by anisotropic copper plating | 杜邦电子材料国际有限责任公司 | 2025-06-24 | — | — | CN | disclosed |
| US-12325927-B2 | Complex waveform for electrolytic plating | MACDERMID ENTHONE INC. (US) | 2025-06-10 | — | — | US | disclosed |
| CN-112680758-B | Method for enhancing copper electroplating | 罗门哈斯电子材料有限责任公司 | 2024-11-15 | — | — | CN | disclosed |
| US-20240271307-A1 | COMPLEX WAVEFORM FOR ELECTROLYTIC PLATING | MACDERMID ENTHONE INC. | 2024-08-15 | — | — | US | disclosed |
| US-20240224432-A1 | Single Step Electrolytic Method of Filling Through-Holes in Printed Circuit Boards and Other Substrates | MACDERMID ENTHONE INC. | 2024-07-04 | — | — | US | disclosed |
| US-20030070934-A1 | Plating bath and method for depositing a metal layer on a substrate | SHIPLEY COMPANY, L.L.C. | 2003-04-17 | — | — | US | disclosed |
| US-20030066756-A1 | Plating bath and method for depositing a metal layer on a substrate | SHIPLEY COMPANY, L.L.C. | 2003-04-10 | — | — | US | disclosed |
| EP-1300486-A1 | Plating bath and method for depositing a metal layer on a substrate | Shipley Co. L.L.C. (US) | 2003-04-09 | — | — | EP | disclosed |
| EP-1300488-A2 | Plating path and method for depositing a metal layer on a substrate | Shipley Co. L.L.C. (US) | 2003-04-09 | — | — | EP | disclosed |
| EP-1300487-A1 | Plating bath and method for depositing a metal layer on a substrate | Shipley Co. L.L.C. (US) | 2003-04-09 | — | — | EP | disclosed |
| WO-2002044111-A1 | TRANSFER HYDROGENATION PROCESS AND CATALYST | AVECIA LIMITED (GB) | 2002-06-06 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12635082-B2 | Single step electrolytic method of filling through-holes in printed circuit boards and other substrates | DCX, GJB2, PCNA | CA2 1167/4885CA12 1596/4885CA1 521/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.