SCHEMBL78717

SCHEMBL78717

C[Si](C)(C)c1ccccc1O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.47
CA2 P00918 4/20 0.47
TDP1 Q9NUW8 3/20 0.47
ALOX15 P16050 3/20 0.47
LMNA P02545 3/20 0.47
NPC1 O15118 3/20 0.47
HPGD P15428 3/20 0.47
HSD17B10 Q99714 3/20 0.47
EGFR P00533 2/20 0.47
FYN P06241 2/20 0.47
MMP9 P14780 2/20 0.47
RECQL P46063 2/20 0.47
KDM4E B2RXH2 2/20 0.47
MAPT P10636 2/20 0.47
CA4 P22748 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
CA12 O43570 1/20 0.47
GMNN O75496 1/20 0.47
POLB P06746 1/20 0.47
CA3 P07451 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29588864 0.85 ALDH1A1 (0.39) ALDH1A1CA2TDP1ALOX15LMNA
SCHEMBL10340777 0.83 ALDH1A1 (0.47) ALDH1A1CA2TDP1ALOX15LMNA
SCHEMBL18692002 0.81 ALDH1A1 (0.45) ALDH1A1CA2TDP1ALOX15LMNA
SCHEMBL18604569 0.79 ALDH1A1 (0.52) ALDH1A1CA2TDP1ALOX15LMNA
SCHEMBL29726936 0.78 IDO1 (0.41) CA2LMNANPC1MAPTCA4
SCHEMBL1880902 0.78 IDO1 (0.41) CA2LMNANPC1MAPTCA4
SCHEMBL28583070 0.77 TRPA1 (0.52) ALDH1A1CA2TDP1ALOX15LMNA
SCHEMBL9860862 0.77 ALDH1A1 (0.38) ALDH1A1CA2TDP1ALOX15LMNA
SCHEMBL3362043 0.77 LMNA (0.41) ALDH1A1CA2TDP1ALOX15LMNA
SCHEMBL2543212 0.77 ALDH1A1 (0.53) ALDH1A1CA2TDP1ALOX15LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 226 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117903345-A Catalyst system containing trialkyl silicon-based phenol compound and preparation and application thereof 中国石油化工股份有限公司 2024-04-19 CN claimed
US-11780795-B2 Cumene-phenol complex with thermal oxidation system HONEYWELL INTERNATIONAL INC. (US) 2023-10-10 US claimed
EP-4192803-A1 CUMENE-PHENOL COMPLEX WITH THERMAL OXIDATION SYSTEM Honeywell International Inc. (US) 2023-06-14 EP claimed
CN-116157374-A Cumene-phenol complex with thermal oxidation system 霍尼韦尔国际公司 2023-05-23 CN claimed
US-20220041534-A1 CUMENE-PHENOL COMPLEX WITH THERMAL OXIDATION SYSTEM HONEYWELL INTERNATIONAL INC. 2022-02-10 US claimed
US-20190233444-A1 TRISUBSTITUTEDSILYLPHENOXYHETEROCYCLES AND ANALOGUES BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) 2019-08-01 US claimed
CN-108349897-A Trisubstituted silylphenoxyheterocycles and analogs 拜耳作物科学股份公司 2018-07-31 CN claimed
US-8883932-B2 Modified alkoxylation products having at least one non-terminal alkoxysilyl group, with increased storage life and increased stretchability of the polymers prepared using them EVONIK DEGUSSA GMBH (DE) 2014-11-11 US claimed
US-20120029090-A1 Modified alkoxylation products having at least one non-terminal alkoxysilyl group, with increased storage life and increased stretchability of the polymers prepared using them EVONIK GOLDSCHMIDT GMBH (DE) 2012-02-02 US claimed
EP-0735425-B1 Esterification product of aromatic novolak resin with quinone diazide sulfonyl compound SHIPLEY CO LLC (US) 2003-06-04 EP claimed
EP-0737895-B1 Photoresist with photoactive compound mixtures SHIPLEY CO LLC (US) 1999-09-08 EP claimed
US-5723254-A NOVOLAK ESTERIFIED WITH O-NAPHTHOQUINONE DIAZIDE SHIPLEY COMPANY, L.L.C. (US) 1998-03-03 US claimed
US-5723516-A Inorganic particles coated with organic polymeric binders composite sheets including same and methods of making said coated particles MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-03-03 US claimed
US-5589553-A PHOTORESISTS SHIPLEY COMPANY, L.L.C. (US) 1996-12-31 US claimed
EP-0737895-A1 Photoresist with photoactive compound mixtures Shipley Company LLC (US) 1996-10-16 EP claimed
EP-0735425-A2 Esterification product of aromatic novolak resin with quinone diazide sulfonyl compound Shipley Company LLC (US) 1996-10-02 EP claimed
US-5419995-A Photoresist composition with alternating or block copolymer resins and positive-working o-quinone diazide or negative-working azide sensitizer compound SHIPLEY COMPANY INC. (US) 1995-05-30 US claimed
US-5238776-A Improved thermal properties, etch resistance, high speed SHIPLEY COMPANY INC. (US) 1993-08-24 US claimed
US-5130410-A Condencing a bishydroxymethyl phenol with a reactive phenol in the absence of an aldehyde to form an alternating copolymer and reacting in the presence of an aromatic aldehyde SHIPLEY COMPANY INC. (US) 1992-07-14 US claimed
JP-63292129-A None JP disclosed
WO-2025132182-A2 POST-EXPOSURE BAKE LESS CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION MERCK PATENT GMBH (DE) 2025-06-26 WO disclosed
US-20250179098-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES UNIVERSAL DISPLAY CORPORATION (US) 2025-06-05 US disclosed
US-12252499-B2 Organic electroluminescent materials and devices UNIVERSAL DISPLAY CORPORATION (US) 2025-03-18 US disclosed
CN-117903345-A Catalyst system containing trialkyl silicon-based phenol compound and preparation and application thereof 中国石油化工股份有限公司 2024-04-19 CN disclosed
US-11780795-B2 Cumene-phenol complex with thermal oxidation system HONEYWELL INTERNATIONAL INC. (US) 2023-10-10 US disclosed
CN-116283465-A Propylene oxide process waste liquid recovery and refining method 中国成达工程有限公司 2023-06-23 CN disclosed
EP-4192803-A1 CUMENE-PHENOL COMPLEX WITH THERMAL OXIDATION SYSTEM Honeywell International Inc. (US) 2023-06-14 EP disclosed
CN-116157374-A Cumene-phenol complex with thermal oxidation system 霍尼韦尔国际公司 2023-05-23 CN disclosed
CN-109844641-B Environmentally stable thick film chemically amplified resists 默克专利有限公司 2022-10-11 CN disclosed
US-11385543-B2 Enviromentally stable, thick film, chemically amplified resist MERCK PATENT GMBH (DE) 2022-07-12 US disclosed
US-20220098220-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES UNIVERSAL DISPALY CORPORATION (US) 2022-03-31 US disclosed
CN-108349897-B Trisubstituted silylphenoxyheterocycles and analogs 拜耳作物科学股份公司 2022-03-04 CN disclosed
US-20220041534-A1 CUMENE-PHENOL COMPLEX WITH THERMAL OXIDATION SYSTEM HONEYWELL INTERNATIONAL INC. 2022-02-10 US disclosed
EP-3368514-B1 TRISUBSTITUTED SILYLPHENOXYHETEROCYCLES AND ANALOGUES BAYER CROPSCIENCE AG (DE) 2021-08-18 EP disclosed
EP-3821297-A1 PHOTORESIST COMPOSITION FOR LINE DOUBLING Applied Materials, Inc. (US) 2021-05-19 EP disclosed
US-10976659-B2 Photoresists comprising novolak resin blends ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2021-04-13 US disclosed
CN-112424691-A Photoresist composition for line doubling 应用材料公司 2021-02-26 CN disclosed
EP-3497519-B1 ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST MERCK PATENT GMBH (DE) 2020-11-25 EP disclosed
US-10836717-B2 Reagents for fluorosulfating alcohols or amines BIODURO, LLC (US) 2020-11-17 US disclosed
EP-3668495-A1 REAGENTS FOR FLUOROSULFATING ALCOHOLS OR AMINES Bioduro, LLC (US) 2020-06-24 EP disclosed
US-10683311-B2 Trisubstitutedsilylphenoxyheterocycles and analogues BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) 2020-06-16 US disclosed
US-20200183278-A1 ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2020-06-11 US disclosed
EP-1621568-B1 ORGANIC POLYMER CONTAINING REACTIVE SILICON GROUP KANEKA CORP (JP) 2019-11-13 EP disclosed
EP-2203783-B1 THICK FILM RESISTS MERCK PATENT GMBH (DE) 2019-11-13 EP disclosed
US-20190233444-A1 TRISUBSTITUTEDSILYLPHENOXYHETEROCYCLES AND ANALOGUES BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) 2019-08-01 US disclosed
EP-3497519-A1 ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST Ridgefield Acquisition (LU) 2019-06-19 EP disclosed
CN-109563047-A Containing silicon atom according to cutting down Kato analog 蛋白质平衡治疗股份有限公司 2019-04-02 CN disclosed
EP-1371670-B1 NOVEL POLYMER AND LIQUID GASKET FOR IN-PLACE FORMING KANEKA CORP (JP) 2019-03-27 EP disclosed
WO-2019036517-A1 REAGENTS FOR FLUOROSULFATING ALCOHOLS OR AMINES BIODURO, LLC (US) 2019-02-21 WO disclosed
US-20190047950-A1 REAGENTS FOR FLUOROSULFATING ALCOHOLS OR AMINES BIODURO, LLC (US) 2019-02-14 US disclosed
EP-3368514-A1 TRISUBSTITUTEDSILYLPHENOXYHETEROCYCLES AND ANALOGUES Bayer CropScience Aktiengesellschaft (DE) 2018-09-05 EP disclosed
CN-108349897-A Trisubstituted silylphenoxyheterocycles and analogs 拜耳作物科学股份公司 2018-07-31 CN disclosed
US-20180185325-A1 12H-BENZO[b]XANTHEN-12-ONES, COMPOSITIONS CONTAINING, AND USES OF, SAME THESAN PHARMACEUTICALS, INC. (US) 2018-07-05 US disclosed
US-9920070-B2 Spiro-oxazines, indolinones and preparation thereof COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) 2018-03-20 US disclosed
US-20170174706-A1 SPIRO-OXAZINES, INDOLINONES AND PREPARATION THEREOF COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) 2017-06-22 US disclosed
US-9650329-B2 Transition-metal-free N-arylation of tertiary amines using arynes COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) 2017-05-16 US disclosed
US-9643947-B2 7-membered fused heterocycles and methods of their synthesis NORTHWESTERN UNIVERSITY (US) 2017-05-09 US disclosed
WO-2017072283-A1 TRISUBSTITUTEDSILYLPHENOXYHETEROCYCLES AND ANALOGUES BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) 2017-05-04 WO disclosed
US-9617280-B2 Spiro-oxazines, indolinones and preparation thereof COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) 2017-04-11 US disclosed
EP-2623531-B1 COMPOSITION CONTAINING BRANCHED POLYMER FOR VIBRATION-DAMPING MATERIAL KANEKA CORP (JP) 2016-11-16 EP disclosed
EP-2691393-B1 NOVEL BICYCLIC PYRIDINONES PFIZER (US) 2016-09-14 EP disclosed
US-9334354-B2 Modified alkoxylation products which have alkoxysilyl groups and contain urethane groups, and their use EVONIK DEGUSSA GMBH (DE) 2016-05-10 US disclosed
US-9067934-B2 Bicyclic pyridinones PFIZER INC. (US) 2015-06-30 US disclosed
US-9035011-B2 Modified alkoxylation products having at least one non-terminal alkoxysilyl group and a plurality of urethane groups, and their use EVONIK GOLDSCHMIDT GMBH (DE) 2015-05-19 US disclosed
EP-2850152-A1 MECHANISM FOR PRODUCTION OF BIOBASED PRODUCTS FROM PLANT LIGNIN Vertichem Corporation (CA) 2015-03-25 EP disclosed
US-20150057369-A1 MODIFIED ALKOXYLATION PRODUCTS WHICH HAVE ALKOXYSILYL GROUPS AND CONTAIN URETHANE GROUPS, AND THEIR USE EVONIK DEGUSSA GMBH (DE) 2015-02-26 US disclosed
US-8883932-B2 Modified alkoxylation products having at least one non-terminal alkoxysilyl group, with increased storage life and increased stretchability of the polymers prepared using them EVONIK DEGUSSA GMBH (DE) 2014-11-11 US disclosed
US-8715918-B2 Thick film resists AZ ELECTRONIC MATERIALS USA CORP. (US) 2014-05-06 US disclosed
US-8697673-B2 Bicyclic pyridinones PFIZER INC. (US) 2014-04-15 US disclosed
EP-1666536-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2014-03-12 EP disclosed
US-20140045790-A1 Novel Bicyclic Pyridinones PFIZER INC. (US) 2014-02-13 US disclosed
EP-2691393-A1 NOVEL BICYCLIC PYRIDINONES Pfizer Inc (US) 2014-02-05 EP disclosed
US-8618162-B2 Insecticidal carbamates exhibiting species-selective inhibition of acetylcholinesterase (AChE) VIRGINIA TECH INTELLECTUAL PROPERTIES, INC. (US) 2013-12-31 US disclosed
WO-2013173316-A1 MECHANISM FOR PRODUCTION OF BIOBASED PRODUCTS FROM PLANT LIGNIN Vertichem Corporation (CA) 2013-11-21 WO disclosed
EP-1710279-B1 CURING COMPOSITION KANEKA CORP (JP) 2013-11-06 EP disclosed
US-20130253143-A1 COMPOSITION CONTAINING BRANCHED POLYMER FOR DAMPING MATERIAL KANEKA CORPORATION (JP) 2013-09-26 US disclosed
US-20130237616-A1 MODIFIED ALKOXYLATION PRODUCTS HAVING AT LEAST ONE NON-TERMINAL ALKOXYSILYL GROUP AND A PLURALITY OF URETHANE GROUPS, AND THEIR USE EVONIK GOLDSCHMIDT GMBH (DE) 2013-09-12 US disclosed
EP-2623531-A1 COMPOSITION CONTAINING BRANCHED POLYMER FOR VIBRATION-DAMPING MATERIAL Kaneka Corporation (JP) 2013-08-07 EP disclosed
EP-1731549-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2013-07-03 EP disclosed
US-8389630-B2 Curable composition KANEKA CORPORATION (JP) 2013-03-05 US disclosed
EP-1715002-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2013-02-13 EP disclosed
CN-102898330-A Colchicine Derivatives UNIV ZHEJIANG 2013-01-30 CN disclosed
EP-2199347-B1 Curable composition KANEKA CORP (JP) 2012-10-24 EP disclosed
WO-2012131539-A1 NOVEL BICYCLIC PYRIDINONES PFIZER INC. (US) 2012-10-04 WO disclosed
US-20120252758-A1 Novel Bicyclic Pyridinones PFIZER INC. 2012-10-04 US disclosed
US-20120122970-A1 INSECTICIDAL CARBAMATES EXHIBITING SPECIES-SELECTIVE INHIBITION OF ACETYLCHOLINESTERASE (AChE) VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY 2012-05-17 US disclosed
EP-1598402-B1 CURABLE COMPOSITIONS KANEKA CORP (JP) 2012-05-02 EP disclosed
EP-1642932-B1 CURING COMPOSITION KANEKA CORP (JP) 2012-03-21 EP disclosed
US-8129428-B2 Insecticidal carbamates exhibiting species-selective inhibition of acetylcholinesterase (AChE) VIRGINIA TECH INTELLECTUAL PROPERTIES, INC. (US) 2012-03-06 US disclosed
US-20120029090-A1 Modified alkoxylation products having at least one non-terminal alkoxysilyl group, with increased storage life and increased stretchability of the polymers prepared using them EVONIK GOLDSCHMIDT GMBH (DE) 2012-02-02 US disclosed
EP-1970408-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2011-12-28 EP disclosed
US-8067498-B2 Transparent curable polymer; one package process; high strength, elongation, weatherproofing, adhesive; blend containing vinyl living polymer, containing crosslinkable silicon groups, graft polymer containing rubber and acrylic ester with vinyl monomer and silica filler KANEKA CORPORATION (JP) 2011-11-29 US disclosed
EP-1619219-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2011-11-09 EP disclosed
EP-1978061-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2011-11-09 EP disclosed
US-8022149-B2 Organic polymer containing reactive silicon group KANEKA CORPORATION (JP) 2011-09-20 US disclosed
US-7977399-B2 Curable composition KANEKA CORPORATION (JP) 2011-07-12 US disclosed
EP-1961786-B1 CURABLE COMPOSITION FOR DAMPING MATERIAL AND DAMPING MATERIAL KANEKA CORP (JP) 2011-04-06 EP disclosed
US-7807746-B2 Curable composition KANEKA CORPORATION (JP) 2010-10-05 US disclosed
US-20100227949-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2010-09-09 US disclosed
US-20100222449-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2010-09-02 US disclosed
EP-2072577-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2010-08-04 EP disclosed
EP-2203783-A2 THICK FILM RESISTS AZ Electronic Materials USA Corp. (US) 2010-07-07 EP disclosed
EP-2199347-A1 Curable composition Kaneka Corporation (JP) 2010-06-23 EP disclosed
US-7737291-B2 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition ADEKA CORPORATION (JP) 2010-06-15 US disclosed
EP-1637565-B1 CURING COMPOSITION KANEKA CORP (JP) 2010-05-05 EP disclosed
US-20100105798-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2010-04-29 US disclosed
US-20090292075-A1 CURABLE COMPOSITION FOR DAMPING MATERIAL AND DAMPING MATERIAL KANEKA CORPORATION (JP) 2009-11-26 US disclosed
US-7601781-B2 Curable compositions KANEKA CORPORATION (JP) 2009-10-13 US disclosed
US-20090234072-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2009-09-17 US disclosed
US-20090192265-A1 Curable composition KANEKA CORPORATION (JP) 2009-07-30 US disclosed
EP-1652884-B1 Curable compositions KANEKA CORP (JP) 2009-07-08 EP disclosed
EP-2072577-A1 CURABLE COMPOSITION Kaneka Corporation (JP) 2009-06-24 EP disclosed
WO-2009040661-A2 THICK FILM RESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-04-02 WO disclosed
US-7511102-B2 Polymer and liquid gasket for In-Place forming KANEKA CORPORATION (JP) 2009-03-31 US disclosed
US-20090081589-A1 THICK FILM RESISTS MERCK PATENT GMBH (DE) 2009-03-26 US disclosed
WO-2009036235-A2 INSECTICIDAL CARBAMATES EXHIBITING SPECIES-SELECTIVE INHIBITION OF ACETYLCHOLINESTERASE (ACHE) VIRGINIA TECH INTELLECTUAL PROPERTIES, INC. (US) 2009-03-19 WO disclosed
US-20090068242-A1 INSECTICIDAL CARBAMATES EXHIBITING SPECIES-SELECTIVE INHIBITION OF ACETYLCHOLINESTERASE (AChE) VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY 2009-03-12 US disclosed
US-20080275112-A1 Invention Concerning Aminoadamantane Compounds SCHREINER PETER R 2008-11-06 US disclosed
EP-1978061-A1 CURABLE COMPOSITION Kaneka Corporation (JP) 2008-10-08 EP disclosed
EP-1970408-A1 CURABLE COMPOSITION Kaneka Corporation (JP) 2008-09-17 EP disclosed
EP-1961786-A1 CURABLE COMPOSITION FOR DAMPING MATERIAL AND DAMPING MATERIAL Kaneka Corporation (JP) 2008-08-27 EP disclosed
US-20080200613-A1 Curable Composition KANEKA CORPORATION (JP) 2008-08-21 US disclosed
US-20080182204-A1 A photosensitive polymeric diazonaphthoquinone and novolaks containing cresol, benzaldehyde and salicylaldehyde; high dissolution rates and photospeeds; flat panel displays, semiconductors ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-07-31 US disclosed
US-20080177001-A1 CURABLE COMPOSITIONS KANEKA CORPORATION (JP) 2008-07-24 US disclosed
US-7388038-B2 Curable compositions KANEKA CORPORATION (JP) 2008-06-17 US disclosed
EP-1923431-A1 CURABLE COMPOSITION Kaneka Corporation (JP) 2008-05-21 EP disclosed
US-20080051517-A1 Curable Composition KANEKA CORPORATION 2008-02-28 US disclosed
EP-1406932-B1 QUICK CURING COMPOSITION KANEKA CORP (JP) 2007-12-12 EP disclosed
US-20070276066-A1 Curing Composition KANEKA CORPORATION (JP) 2007-11-29 US disclosed
US-20070232821-A1 Composition Containing Siloxane Compound and Phenol Compound ADEKA CORPORATION (JP) 2007-10-04 US disclosed
US-20070225436-A1 Curable Composition KANEKA CORPORATION (JP) 2007-09-27 US disclosed
US-20070213459-A1 Curable Composition KANEKA CORPORATION (JP) 2007-09-13 US disclosed
US-20070167583-A1 Curable composition KANEKA CORPORATION (JP) 2007-07-19 US disclosed
US-20070161732-A1 Novel polymer and liquid gasket for In-Place forming KANEKA CORPORATION (JP) 2007-07-12 US disclosed
US-7186780-B2 Polymer and liquid gasket for in-place forming KANEKA CORPORATION (JP) 2007-03-06 US disclosed
US-20070021563-A1 Curable composition KANEKA CORPORATION (JP) 2007-01-25 US disclosed
EP-1739133-A1 CURABLE COMPOSITIONS Kaneka Corporation (JP) 2007-01-03 EP disclosed
EP-1731549-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2006-12-13 EP disclosed
EP-1731544-A1 HARDENABLE COMPOSITION KANEKA CORPORATION (JP) 2006-12-13 EP disclosed
US-20060247376-A1 Curing composition KANEKA CORPORATION (JP) 2006-11-02 US disclosed
EP-1715002-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2006-10-25 EP disclosed
EP-1710279-A1 CURING COMPOSITION Kaneka Corporation (JP) 2006-10-11 EP disclosed
US-20060211821-A1 Organic polymer containing reactive silicon group KANEKA CORPORATION (JP) 2006-09-21 US disclosed
US-20060173121-A1 Curable composition KANEKA CORPORATION (JP) 2006-08-03 US disclosed
US-7081494-B2 Curable compositions KANEKA CORPORATION (JP) 2006-07-25 US disclosed
US-20060160918-A1 Curable compositions KANEKA CORPORATION (JP) 2006-07-20 US disclosed
US-20060135709-A1 Curing composition KANEKA CORPORATION (JP) 2006-06-22 US disclosed
EP-1666536-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2006-06-07 EP disclosed
EP-1652884-A1 Curable compositions Kaneka Corporation (JP) 2006-05-03 EP disclosed
EP-1179567-B1 CURABLE COMPOSITIONS KANEKA CORP (JP) 2006-04-26 EP disclosed
EP-1650261-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2006-04-26 EP disclosed
US-20060079645-A1 Curable compositions KANEKA CORPORATION (JP) 2006-04-13 US disclosed
EP-1642932-A1 CURING COMPOSITION KANEKA CORPORATION (JP) 2006-04-05 EP disclosed
EP-1642172-A2 COMPOSITIONS COMPRISING PHOTOACID GENERATORS AZ Electronic Materials USA Corp. (US) 2006-04-05 EP disclosed
EP-1637565-A1 CURING COMPOSITION KANEKA CORPORATION (JP) 2006-03-22 EP disclosed
EP-1630186-A1 CURING COMPOSITION Kaneka Corporation (JP) 2006-03-01 EP disclosed
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP disclosed
EP-1621568-A1 ORGANIC POLYMER CONTAINING REACTIVE SILICON GROUP KANEKA CORPORATION (JP) 2006-02-01 EP disclosed
EP-1619219-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2006-01-25 EP disclosed
EP-1598402-A1 CURABLE COMPOSITIONS KANEKA CORPORATION (JP) 2005-11-23 EP disclosed
US-6905809-B2 Photoresist compositions CLARIANT FINANCE (BVI) LIMITED (VG) 2005-06-14 US disclosed
EP-1406932-A4 QUICK CURING COMPOSITION KANEKA CORP (JP) 2005-03-23 EP disclosed
WO-2005003858-A2 COMPOSITIONS COMPRISING PHOTOACID GENERATORS AZ ELECTRONIC MATERIALS USA CORP. (US) 2005-01-13 WO disclosed
US-20040265733-A1 Photoacid generators AZ ELECTRONIC MATERIALS USA CORP. 2004-12-30 US disclosed
US-20040210019-A1 Quick curing compositions KANEKA CORPORATION (JP) 2004-10-21 US disclosed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO disclosed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US disclosed
US-20040197696-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US disclosed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US disclosed
US-20040113311-A1 Novel polymer and liquid gasket for in-place forming KANEKA CORPORATION (JP) 2004-06-17 US disclosed
EP-1406932-A1 QUICK CURING COMPOSITION KANEKA CORPORATION (JP) 2004-04-14 EP disclosed
US-20040029990-A1 Curable compositions KANEKA CORPORATION (JP) 2004-02-12 US disclosed
EP-1371670-A1 NOVEL POLYMER AND LIQUID GASKET FOR IN-PLACE FORMING KANEKA CORPORATION (JP) 2003-12-17 EP disclosed
EP-0718693-B1 Photoresist compositions and components SHIPLEY CO (US) 2003-07-02 EP disclosed
EP-0735425-B1 Esterification product of aromatic novolak resin with quinone diazide sulfonyl compound SHIPLEY CO LLC (US) 2003-06-04 EP disclosed
EP-0889022-B1 PROCESS FOR PRODUCING 2-HYDROXYNAPHTHALENE-3,6-DICARBOXYLIC ACID UENO SEIYAKU OYO KENKYUJO KK (JP) 2003-04-02 EP disclosed
EP-0735424-B1 Photoresist with photoactive compound mixtures SHIPLEY CO LLC (US) 2003-03-19 EP disclosed
WO-2003000749-A1 QUICK CURING COMPOSITION KANEKA CORPORATION (JP) 2003-01-03 WO disclosed
EP-0732338-B1 2,2-Difluoro-3-carbamoyl ribose sulfonate compounds and process for the preparation of beta nucleosides LILLY CO ELI (US) 2002-05-15 EP disclosed
EP-1179567-A1 CURABLE COMPOSITIONS KANEKA CORPORATION (JP) 2002-02-13 EP disclosed
US-6133475-A Process for producing 2-hydroxynaphthalene-3,6-dicarboxylic acid KABUSHIKI KAISHA UENO SEIYAKU OYO KENKUJO (JP) 2000-10-17 US disclosed
EP-1035438-A2 Phenolic resins and photoresist compositions comprising same Shipley Company LLC (US) 2000-09-13 EP disclosed
EP-0737895-B1 Photoresist with photoactive compound mixtures SHIPLEY CO LLC (US) 1999-09-08 EP disclosed
US-5945516-A PRIOR TO ESTERIFICATION OF THE POLYHYDROXY PHENOL WITH THE NAPHTHOQUINONE DIAZIDE SULFONYL HALIDE, THE REACTANTS ARE INITIALLY DISSOLVED IN AN APROTIC SOLVENT TOGETHER WITH STRONG BASE; NONPRECIPITATING, FOR FORMATION OF PHOTORESISTS SHIPLEY COMPANY, L.L.C. (US) 1999-08-31 US disclosed
US-5939511-A A SOLUTION OF THE RESIN IS FORMED IN A WATER INSOLUBLE ORGANIC SOLVENT FOLLOWED BY LIQUID-LIQUID EXTRACTION WITH WATER; REMOVES ACID RESIDUES AND METALLIC IMPURITIES; HIGH PURITY PHENOLIC RESINS FOR PHOTORESISTS SHIPLEY COMPANY, L.L.C. (US) 1999-08-17 US disclosed
US-5932389-A PHENOLIC RESIN SHIPLEY COMPANY, L.L.C. (US) 1999-08-03 US disclosed
EP-0889022-A1 PROCESS FOR PRODUCING 2-HYDROXYNAPHTHALENE-3,6-DICARBOXYLIC ACID KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1999-01-07 EP disclosed
US-5821345-A DISSOLVING WITH A STRONG BASE AND APROTIC SOLVENT; ESTER INTERCHANGE SHIPLEY COMPANY, L.L.C. (US) 1998-10-13 US disclosed
EP-0609118-B1 Water-curable resin compositions MINNESOTA MINING & MFG (US) 1998-10-07 EP disclosed
US-5789522-A EXTRACTION OF PHENOLIC RESINS WITH SOLVENT USED FOR PHOTORESIST COATINGS SHIPLEY COMPANY, L.L.C. (US) 1998-08-04 US disclosed
US-5723254-A NOVOLAK ESTERIFIED WITH O-NAPHTHOQUINONE DIAZIDE SHIPLEY COMPANY, L.L.C. (US) 1998-03-03 US disclosed
US-5723516-A Inorganic particles coated with organic polymeric binders composite sheets including same and methods of making said coated particles MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-03-03 US disclosed
EP-0680342-B1 ORTHOPEDIC SUPPORT MATERIALS AND METHOD MINNESOTA MINING & MFG (US) 1997-10-15 EP disclosed
US-5589553-A PHOTORESISTS SHIPLEY COMPANY, L.L.C. (US) 1996-12-31 US disclosed
EP-0737895-A1 Photoresist with photoactive compound mixtures Shipley Company LLC (US) 1996-10-16 EP disclosed
EP-0735424-A2 Photoresist with photoactive compound mixtures Shipley Company LLC (US) 1996-10-02 EP disclosed
EP-0735425-A2 Esterification product of aromatic novolak resin with quinone diazide sulfonyl compound Shipley Company LLC (US) 1996-10-02 EP disclosed
EP-0732338-A1 2,2-Difluoro-3-carbamoyl ribose sulfonate compounds and process for the preparation of beta nucleosides ELI LILLY AND COMPANY (US) 1996-09-18 EP disclosed
EP-0718693-A2 Photoresist compositions and components SHIPLEY COMPANY INC. (US) 1996-06-26 EP disclosed
US-5529880-A NOVOLAK RESINS SHIPLEY COMPANY, L.L.C. (US) 1996-06-25 US disclosed
US-5521294-A 2,2-difluoro-3-carbamoyl ribose sulfonate compounds and process for the preparation of beta nucleosides ELI LILLY AND COMPANY (US) 1996-05-28 US disclosed
EP-0680342-A1 ORTHOPEDIC SUPPORT MATERIALS AND METHOD. MINNESOTA MINING & MFG (US) 1995-11-08 EP disclosed
US-5419995-A Photoresist composition with alternating or block copolymer resins and positive-working o-quinone diazide or negative-working azide sensitizer compound SHIPLEY COMPANY INC. (US) 1995-05-30 US disclosed
US-5364693-A Blend of an organometallic compound and polymer MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-11-15 US disclosed
US-5359065-A Reacting a bromo aromatic compound with an excess of silylating agent; forming metallized intermediate; quenching EASTMAN KODAK COMPANY (US) 1994-10-25 US disclosed
US-5346939-A Wood patch MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-09-13 US disclosed
WO-1994016744-A1 ORTHOPEDIC SUPPORT MATERIALS AND METHOD MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-08-04 WO disclosed
EP-0609118-A2 Water-curable resin compositions MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-08-03 EP disclosed
EP-0601643-A2 Photographic silver halide material and process EASTMAN KODAK COMPANY (US) 1994-06-15 EP disclosed
US-5318884-A Carbocyclic or heterocyclic ring which bears a silyl substituent with silicon atom bonded directly to a ring carbon EASTMAN KODAK COMPANY (US) 1994-06-07 US disclosed
US-5302490-A Thick films, high uniformity SHIPLEY COMPANY INC. (US) 1994-04-12 US disclosed
US-5238776-A Improved thermal properties, etch resistance, high speed SHIPLEY COMPANY INC. (US) 1993-08-24 US disclosed
US-5178986-A And base soluble resin; radiation/light sensitive, resolution, resistance to developer and thermal flow SHIPLEY COMPANY INC. (US) 1993-01-12 US disclosed
US-5130410-A Condencing a bishydroxymethyl phenol with a reactive phenol in the absence of an aldehyde to form an alternating copolymer and reacting in the presence of an aromatic aldehyde SHIPLEY COMPANY INC. (US) 1992-07-14 US disclosed
US-5128230-A Positive working photoresist SHIPLEY COMPANY INC. (US) 1992-07-07 US disclosed
EP-0358517-A2 Compositions including a phenolic resin and a sensitizer ENZYMOL INTERNATIONAL, INC. (US) 1990-03-14 EP disclosed
US-4812200-A Method for generating resist structures SIEMENS AKTIENGESELLSCHAFT (DE) 1989-03-14 US disclosed
JP-S63292129-A POSITIVE TYPE PHOTORESIST COMPOSITION KANTO KAGAKU KK 1988-11-29 JP disclosed
EP-0285797-A2 Process for obtaining resist structures SIEMENS AKTIENGESELLSCHAFT (DE) 1988-10-12 EP disclosed
EP-0273026-A2 Solvents for Photoresist compositions SHIPLEY COMPANY INC. (US) 1988-06-29 EP disclosed
US-4675401-A Process for preparing polyisocyanato/polyisocyanurates by catalytic cyclotrimerization of polyisocyanates RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1987-06-23 US disclosed
EP-0185030-A1 AMERICAN TELEPHONE & TELEGRAPH 1986-06-25 EP disclosed
WO-1985005470-A1 BILEVEL RESIST AMERICAN TELEPHONE & TELEGRAPH COMPANY (US) 1985-12-05 WO disclosed
US-4537961-A Catalytic cyclotrimerization of polyisocyanates RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1985-08-27 US disclosed
US-4105648-A CROSSLINKED POLYACRYLAMIDES CONTAINING SILYL GROUPS CIBA-GEIGY CORPORATION (US) 1978-08-08 US disclosed
US-3985783-A Process for ring acylation of phenols THE DOW CHEMICAL COMPANY (US) 1976-10-12 US disclosed
US-3985783-A Process for ring acylation of phenols THE DOW CHEMICAL COMPANY (US) 1976-10-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (18 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10836717-B2 Reagents for fluorosulfating alcohols or amines SRSF9, SNRPF, ARAF ALDH1A1 175/4885CA2 3983/4885TDP1 4498/4885
US-20190047950-A1 REAGENTS FOR FLUOROSULFATING ALCOHOLS OR AMINES SRSF9, SNRPF, ARAF ALDH1A1 175/4885CA2 3983/4885TDP1 4498/4885
US-20170174706-A1 SPIRO-OXAZINES, INDOLINONES AND PREPARATION THEREOF NR3C2, AR, REN ALDH1A1 413/4885CA2 1586/4885TDP1 4235/4885
US-20220098220-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES NPY2R, HNRNPR, C1R ALDH1A1 1955/4885CA2 2844/4885TDP1 3471/4885
US-20060160918-A1 Curable compositions VCL, VIM, DNMT3L ALDH1A1 1207/4885CA2 2821/4885TDP1 3356/4885
US-20250179098-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES NPY2R, HNRNPR, C1R ALDH1A1 1955/4885CA2 2844/4885TDP1 3471/4885
US-20180185325-A1 12H-BENZO[b]XANTHEN-12-ONES, COMPOSITIONS CONTAINING, AND USES OF, SAME AHR, NR1H2, NR1H3 ALDH1A1 1200/4885CA2 4382/4885TDP1 3924/4885
US-20120029090-A1 Modified alkoxylation products having at least one non-terminal alkoxysilyl group, with increased storage life and increased stretchability of the polymers prepared using them TELO2, ALKBH2, SMCHD1 ALDH1A1 319/4885CA2 4084/4885TDP1 1335/4885
US-12252499-B2 Organic electroluminescent materials and devices NPY2R, HNRNPR, C1R ALDH1A1 1955/4885CA2 2844/4885TDP1 3471/4885
US-10683311-B2 Trisubstitutedsilylphenoxyheterocycles and analogues PIK3C3, ERG28, DDT ALDH1A1 3139/4885CA2 1665/4885TDP1 1098/4885
US-20140045790-A1 Novel Bicyclic Pyridinones CYP2B6, CYP2C19, CYP2D6 ALDH1A1 268/4885CA2 3347/4885TDP1 1376/4885
US-20130237616-A1 MODIFIED ALKOXYLATION PRODUCTS HAVING AT LEAST ONE NON-TERMINAL ALKOXYSILYL GROUP AND A PLURALITY OF URETHANE GROUPS, AND THEIR USE ALKBH3, ALKBH2, ALKBH5 ALDH1A1 154/4885CA2 4355/4885TDP1 1256/4885
US-20070232821-A1 Composition Containing Siloxane Compound and Phenol Compound H1-0, CYP2S1, H1-4 ALDH1A1 1381/4885CA2 2210/4885TDP1 4358/4885
US-20090068242-A1 INSECTICIDAL CARBAMATES EXHIBITING SPECIES-SELECTIVE INHIBITION OF ACETYLCHOLINESTERASE (AChE) ACHE, BCHE, CHAT ALDH1A1 960/4885CA2 457/4885TDP1 670/4885
US-20120122970-A1 INSECTICIDAL CARBAMATES EXHIBITING SPECIES-SELECTIVE INHIBITION OF ACETYLCHOLINESTERASE (AChE) ACHE, BCHE, CHAT ALDH1A1 960/4885CA2 457/4885TDP1 670/4885
US-20120252758-A1 Novel Bicyclic Pyridinones CYP2B6, CYP2C19, CYP2D6 ALDH1A1 268/4885CA2 3347/4885TDP1 1376/4885
US-20080275112-A1 Invention Concerning Aminoadamantane Compounds GABRA5, GABRA1, GABRA4 ALDH1A1 570/4885CA2 510/4885TDP1 1495/4885
US-20190233444-A1 TRISUBSTITUTEDSILYLPHENOXYHETEROCYCLES AND ANALOGUES PIK3C3, ERG28, DDT ALDH1A1 3139/4885CA2 1665/4885TDP1 1098/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.