Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.37 |
| ▸ | MIF | P14174 | 1/20 | 0.35 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | NOS3 | P29474 | 1/20 | 0.33 |
| ▸ | NOS2 | P35228 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
| ▸ | LTA4H | P09960 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL9004554 | 0.97 | TP53 (0.39) | TP53KCNN4MIFPSIP1LMNA | |
| Trifluoromethanesulfonic Acid SCHEMBL926422 | 0.78 | GPR3 (0.43) | PSIP1ACHE | |
| SCHEMBL4237944 | 0.78 | TP53 (0.38) | TP53KCNN4PSIP1LMNATSHR | |
| SCHEMBL9188295 | 0.78 | DNM1 (0.38) | TP53CES2CES1LTA4HMEN1 | |
| SCHEMBL927741 | 0.77 | CYP3A4 (0.47) | TP53LMNAALOX12ACHEATM | |
| SCHEMBL766884 | 0.77 | TP53 (0.41) | TP53KCNN4MIFPSIP1LMNA | |
| Hydrochloric Acid SCHEMBL3838831 | 0.76 | MEN1 (0.40) | TP53CES2CES1LTA4HMEN1 | |
| SCHEMBL12558529 | 0.75 | RIPK1 (0.35) | KCNN4 | |
| SCHEMBL2947917 | 0.74 | TP53 (0.39) | TP53KCNN4MIFPSIP1LMNA | |
| Hydrochloric Acid SCHEMBL60378 | 0.74 | TP53 (0.39) | TP53KCNN4MIFPSIP1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5552132-A | MOLECULAR SIEVES | CHEVRON U.S.A. INC. (US) | 1996-09-03 | — | — | US | claimed |
| WO-1996013460-A1 | PREPARING A CRYSTALLINE ALUMINOPHOSPHATE COMPOSITION | CHEVRON U.S.A. INC. (US) | 1996-05-09 | — | — | WO | claimed |
| US-4225497-A | ACID CATALYSTS FOR IMIDATION | RHONE-POULENC INDUSTRIES (FR) | 1980-09-30 | — | — | US | claimed |
| CN-118459372-A | Preparation method of photoacid generator sulfonate for ARF photoresist | 常州朗芯新材料科技有限公司 | 2024-08-09 | — | — | CN | disclosed |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| WO-2023053877-A1 | PHOTOACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION | 東洋合成工業株式会社 | 2023-04-06 | — | — | WO | disclosed |
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-04-28 | — | — | US | disclosed |
| US-20210179554-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-06-17 | — | — | US | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
| WO-1996013460-A1 | PREPARING A CRYSTALLINE ALUMINOPHOSPHATE COMPOSITION | CHEVRON U.S.A. INC. (US) | 1996-05-09 | — | — | WO | disclosed |
| EP-0442635-B1 | Novel initiators for cationic polymerization | MINNESOTA MINING & MFG (US) | 1995-11-08 | — | — | EP | disclosed |
| US-5124417-A | Comprising an organic onium cation and a nonnucleophilic, partially-fluorinated hydrocarbylsulfonato metallate; high-molecular-weight polymers from epoxides, tetrahydrofurans, oxazolines, vinyls, lactones, etc. | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-06-23 | — | — | US | disclosed |
| US-5084586-A | Polymerization catalysts | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-01-28 | — | — | US | disclosed |
| EP-0442635-A1 | Novel initiators for cationic polymerization | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-08-21 | — | — | EP | disclosed |
| US-4225497-A | ACID CATALYSTS FOR IMIDATION | RHONE-POULENC INDUSTRIES (FR) | 1980-09-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A9, SLC6A5, REN | TP53 4795/4885KCNN4 1871/4885MIF 548/4885 |
| US-20210179554-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A5, LIFR, SLC6A9 | TP53 4861/4885KCNN4 247/4885MIF 661/4885 |
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | CACNA1F, SLC6A5, IDUA | TP53 4265/4885KCNN4 237/4885MIF 485/4885 |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | IDUA, SLC6A5, SLC6A9 | TP53 4838/4885KCNN4 258/4885MIF 369/4885 |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | TP53 4648/4885KCNN4 200/4885MIF 4139/4885 |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | HCN3, HCN1, NHERF1 | TP53 2342/4885KCNN4 13/4885MIF 3790/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.