Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL927904 | 0.89 | NPC1 (0.32) | CA2 | |
| SCHEMBL17688495 | 0.71 | NPC1 (0.45) | CA2FAAH | |
| SCHEMBL8357995 | 0.70 | FAAH (0.45) | CA2FAAH | |
| SCHEMBL27508414 | 0.70 | FAAH (0.45) | CA2FAAH | |
| SCHEMBL7846186 | 0.66 | CA2 (0.46) | CA2FAAH | |
| SCHEMBL16829660 | 0.65 | ALDH1A1 (0.52) | CA2FAAH | |
| SCHEMBL14381329 | 0.65 | MMP1 (0.35) | — | |
| SCHEMBL7740349 | 0.64 | CA2 (0.57) | CA2FAAH | |
| SCHEMBL11566341 | 0.64 | CA2 (0.52) | CA2FAAH | |
| SCHEMBL9464587 | 0.64 | CA2 (0.47) | CA2FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3263626-B1 | SILICONE SKELETON-CONTAINING POLYMER, PHOTO-CURABLE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM, LAMINATE, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-03-13 | — | — | EP | disclosed |
| EP-3382453-B1 | RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHINETSU CHEMICAL CO (JP) | 2023-09-20 | — | — | EP | disclosed |
| US-10457779-B2 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-29 | — | — | US | disclosed |
| US-10451970-B2 | Silicone skeleton-containing polymer, photo-curable resin composition, photo-curable dry film, laminate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-22 | — | — | US | disclosed |
| US-10416563-B2 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-09-17 | — | — | US | disclosed |
| EP-3103831-B1 | PHOTO-CURABLE RESIN COMPOSITION AND PHOTO-CURABLE DRY FILM USING THE SAME | SHINETSU CHEMICAL CO (JP) | 2019-09-04 | — | — | EP | disclosed |
| EP-3382454-B1 | RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHINETSU CHEMICAL CO (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-3275857-B1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHINETSU CHEMICAL CO (JP) | 2019-06-05 | — | — | EP | disclosed |
| US-10241412-B2 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-26 | — | — | US | disclosed |
| US-20180284615-A1 | RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-10-04 | — | — | US | disclosed |
| US-20050079446-A1 | Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| US-20040259037-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-6730451-B2 | FLUOROACRYLATE POLYMERS; TRANSPARENCY; PREVENTING NEGATIVE WORKING; LOW ABSORPTION OF FLUORINE EXCIMER LASER LIGHT; HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | disclosed |
| US-6670498-B2 | Norbornene and dimethanonaphthalenes substituted with a branched or cyclic tertiary alkoxycarbonyl hydrocarbyleneoxycarbonyl group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-30 | — | — | US | disclosed |
| US-6566037-B2 | A polymer with monomers of a robust alicyclic structure having both polar and acid labile groups; resist composition of improved reactivity, substrate adhesion and etching resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-20 | — | — | US | disclosed |
| US-20030088115-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-08 | — | — | US | disclosed |
| US-20020004178-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010026904-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-04 | — | — | US | disclosed |
| US-20010010890-A1 | Polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-02 | — | — | US | disclosed |
| US-6156481-A | WITH HYDROXYSTYRENE-(METH)ACRYLIC ACID OR (METH)ACRYLATE COPOLYMER WHERE SOME PHENOLIC HYDROXYL GROUPS ARE CROSSLINKED WITH ETHER CONTAINING ACID LABILE GROUPS; DISSOLUTION INHIBITION AND INCREASED DISSOLUTION CONTRAST AFTER EXPOSURE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-12-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180284615-A1 | RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | GPX4, PLOD1, AQP1 | CA2 2609/4885FAAH 3069/4885 |
| US-10416563-B2 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | PRDX1, PRDX4, QSOX1 | CA2 1091/4885FAAH 3088/4885 |
| US-10457779-B2 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film | ARCN1, COL1A1, F12 | CA2 1663/4885FAAH 2979/4885 |
| US-20030088115-A1 | Novel ester compounds, polymers, resist compositions and patterning process | RER1, ARCN1, H1-0 | CA2 3349/4885FAAH 1512/4885 |
| US-10241412-B2 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | GPX4, PLOD1, AQP1 | CA2 2609/4885FAAH 3069/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.