Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Dimethylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethylamine SCHEMBL28709192 | 1.00 | — | — | |
| Dimethylamine SCHEMBL1331932 | 1.00 | — | — | |
| Dimethylamine SCHEMBL1332044 | 1.00 | — | — | |
| Dimethylamine SCHEMBL1332094 | 1.00 | — | — | |
| Dimethylamine SCHEMBL11509022 | 1.00 | KDM4E (0.57) | — | |
| Dimethylamine SCHEMBL733 | 1.00 | — | — | |
| Dimethylamine SCHEMBL18115124 | 1.00 | KDM4E (0.57) | — | |
| Dimethylamine SCHEMBL8774280 | 1.00 | — | — | |
| Dimethylamine SCHEMBL8024545 | 1.00 | KDM4E (0.57) | — | |
| Dimethylamine SCHEMBL28084044 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118829699-A | Cerium oxide-based slurry composition for selective and non-selective CMP of silicon oxides, silicon nitrides and polysilicon | CMC材料有限责任公司 | 2024-10-22 | — | — | CN | claimed |
| CN-116209542-A | Silicon oxide-based slurry for selective polishing of carbon-based films | CMC材料股份有限公司 | 2023-06-02 | — | — | CN | claimed |
| CN-115385428-A | Dispersing and preparing process of flocculating agent powder | 上海昂莱机电东台有限公司 | 2022-11-25 | — | — | CN | claimed |
| CN-110461341-A | Hair-treatment composition | OREAL | 2019-11-15 | — | — | CN | claimed |
| CN-109963550-A | For smearing the film-forming composition of skin or hair | 株式会社爱茉莉太平洋 | 2019-07-02 | — | — | CN | claimed |
| CN-105307629-B | Oil in water type emulsion skin cosmetics | 花王株式会社 | 2019-05-07 | — | — | CN | claimed |
| CN-109498507-A | A kind of Haircare composition with moisturizing and improvement hair hair quality | 广东康之辰药物研发有限公司 | 2019-03-22 | — | — | CN | claimed |
| CN-109172494-A | A kind of aloe shampoo and its preparation process of sterilizing and itch-relieving | 绿之韵生物工程集团有限公司 | 2019-01-11 | — | — | CN | claimed |
| CN-108451778-A | A kind of clear gel Haircare composition and preparation method thereof | 名臣健康用品股份有限公司 | 2018-08-28 | — | — | CN | claimed |
| CN-108103461-A | A kind of automobile lamp coating process | 江苏远洋车灯有限公司 | 2018-06-01 | — | — | CN | claimed |
| CN-118829699-A | Cerium oxide-based slurry composition for selective and non-selective CMP of silicon oxides, silicon nitrides and polysilicon | CMC材料有限责任公司 | 2024-10-22 | — | — | CN | disclosed |
| CN-118804960-A | Cerium oxide based slurry composition for selective and non-selective CMP of silicon oxides, silicon nitrides and polysilicon | CMC材料有限责任公司 | 2024-10-18 | — | — | CN | disclosed |
| CN-118772722-A | Plasma cutting protection material, preparation method, cleaning material and application | 浙江奥首材料科技有限公司 | 2024-10-15 | — | — | CN | disclosed |
| CN-116209542-A | Silicon oxide-based slurry for selective polishing of carbon-based films | CMC材料股份有限公司 | 2023-06-02 | — | — | CN | disclosed |
| CN-112661867-B | Modified starch and preparation method and application thereof | 瑞辰星生物技术（广州）有限公司 | 2023-04-07 | — | — | CN | disclosed |
| US-20040214961-A1 | High internal phase polyelectrolyte emulsions for the manufacture of superabsorbent polymers and superabsorbent polymers made therefrom | STOCKHAUSEN GMBH (DE) | 2004-10-28 | — | — | US | disclosed |
| CN-1440269-A | Hair treatment composition | UNILEVER NV (NL) | 2003-09-03 | — | — | CN | disclosed |
| EP-1156837-A1 | MANUFACTURE OF SUPERABSORBENTS IN HIGH INTERNAL PHASE EMULSIONS | THE DOW CHEMICAL COMPANY (US) | 2001-11-28 | — | — | EP | disclosed |
| WO-2000050096-A1 | MANUFACTURE OF SUPERABSORBENTS IN HIGH INTERNAL PHASE EMULSIONS | THE DOW CHEMICAL COMPANY (US) | 2000-08-31 | — | — | WO | disclosed |
| US-4032596-A | QUATERNARY AMMONIUM SALTS, FREE RADICAL CATALYSTS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1977-06-28 | — | — | US | disclosed |