Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Methacrylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL28913569 | 1.00 | TDP1 (0.50) | — | |
| Methacrylic Acid SCHEMBL11401200 | 1.00 | TDP1 (0.50) | — | |
| Methacrylic Acid SCHEMBL15637905 | 1.00 | — | — | |
| Methacrylic Acid SCHEMBL3248312 | 0.96 | TDP1 (0.47) | — | |
| Methacrylic Acid SCHEMBL11319477 | 0.96 | TDP1 (0.47) | — | |
| Methacrylic Acid SCHEMBL25392450 | 0.96 | — | — | |
| Methacrylic Acid SCHEMBL9547394 | 0.96 | TDP1 (0.47) | — | |
| Methacrylic Acid SCHEMBL4275438 | 0.96 | — | — | |
| Methacrylic Acid SCHEMBL5961934 | 0.96 | TDP1 (0.47) | — | |
| Methacrylic Acid SCHEMBL7887489 | 0.96 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4878 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118703137-B | Ionic polymer binder based on viologen and preparation method and application thereof | 南开大学 | 2025-05-27 | — | — | CN | claimed |
| CN-120040501-A | Double phosphonic acid double salt containing acryloyloxy and quaternary ammonium cations | 江苏海洋大学 | 2025-05-27 | — | — | CN | claimed |
| CN-119708797-B | High-flame-retardance degradable bio-based high polymer material and preparation method thereof | 江苏多上新材料科技有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-120005114-A | Multifunctional polycarboxylate superplasticizer and preparation method and application thereof | 江苏苏博特新材料股份有限公司 | 2025-05-16 | — | — | CN | claimed |
| CN-117717531-B | Pivelum bromide tablet and preparation method thereof | 广州仁恒医药科技股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-119708797-A | High-flame-retardance degradable bio-based high polymer material and preparation method thereof | 江苏多上新材料科技有限公司 | 2025-03-28 | — | — | CN | claimed |
| CN-119141979-A | Yoghurt plastic cup sealing cover film | 安徽紫金新材料科技股份有限公司 | 2024-12-17 | — | — | CN | claimed |
| CN-118852674-A | Carbon fiber waste reinforced engineering plastic and preparation method thereof | 安徽安赛新材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-118834325-A | Acrylic ester polymer emulsion, preparation method and application | 北京慕湖外加剂有限公司 | 2024-10-25 | — | — | CN | claimed |
| CN-118702585-A | Preparation method of small quaternary ammonium salt cation monomer and quaternary ammonium salt type polycarboxylate water reducer adopting small quaternary ammonium salt cation monomer | 江苏苏博特新材料股份有限公司 | 2024-09-27 | — | — | CN | claimed |
| EP-0006938-B1 | POSITIVE TYPE RESIST POLYMER COMPOSITION AND METHOD OF MAKING RESIST PATTERNS | FUJITSU LIMITED (JP) | 1982-08-04 | — | — | EP | claimed |
| EP-0006939-B1 | POSITIVE TYPE RESIST POLYMER COMPOSITION AND METHOD OF MAKING RESIST PATTERNS | FUJITSU LIMITED (JP) | 1982-07-28 | — | — | EP | claimed |
| US-4316974-A | POLYAMIDEIMIDE COPOLYMERS | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1982-02-23 | — | — | US | claimed |
| US-4276365-A | POLYACRYLATE MODIFIED WITH UNSATURATED ACID AND METHACRYLOYL CHLORIDE | FUJITSU LIMITED (JP) | 1981-06-30 | — | — | US | claimed |
| US-4273856-A | ELECTRON AND X-RAY LITHOGRAPHY | FUJITSU LIMITED (JP) | 1981-06-16 | — | — | US | claimed |
| US-4208477-A | POLYAMIDEIMIDE COPOLYMER ENDCAPPED WITH ACRYLIC GROUPS, PHOTOINITIATOR, ETHYLENICALLY UNSATURATED COMPOUND | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1980-06-17 | — | — | US | claimed |
| EP-0006939-A1 | POSITIVE TYPE RESIST POLYMER COMPOSITION AND METHOD OF MAKING RESIST PATTERNS | FUJITSU LIMITED (JP) | 1980-01-23 | — | — | EP | claimed |
| EP-0006938-A1 | POSITIVE TYPE RESIST POLYMER COMPOSITION AND METHOD OF MAKING RESIST PATTERNS | FUJITSU LIMITED (JP) | 1980-01-23 | — | — | EP | claimed |
| US-4060539-A | Sulfurous organic silicon compounds, a process for their preparation, and their use as adhesivizing agents | DYNAMIT NOBEL AKTIENGESELLSCHAFT (DT) | 1977-11-29 | — | — | US | claimed |
| US-3971746-A | Synthetic polyisoprene rubber latex | KURARAY CO., LTD. (JA) | 1976-07-27 | — | — | US | claimed |