SCHEMBL17545752

SCHEMBL17545752

CC(C)(C)C(=O)OCC(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.36
POLB P06746 1/20 0.32
GAA P10253 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
HTT P42858 1/20 0.30
ALDH1A1 P00352 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21303906 0.94 PRKCA (0.35) PRKCAPOLBGAANPSR1
SCHEMBL17832157 0.88 PRKCA (0.33) PRKCA
SCHEMBL16547500 0.87 PRKCA (0.32) PRKCA
SCHEMBL2693201 0.87 PRKCA (0.38) PRKCAPOLBGAANPSR1HTT
SCHEMBL2170271 0.87 PRKCA (0.41) PRKCAPOLBGAANPSR1HTT
SCHEMBL17150856 0.86 PRKCA (0.31) PRKCA
SCHEMBL16547515 0.84 POLB (0.33) PRKCAPOLBGAANPSR1
SCHEMBL25442342 0.84
SCHEMBL16547518 0.83
SCHEMBL16213966 0.83 PRKCA (0.38) PRKCAPOLBGAANPSR1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200247826-A1 COMPOUND AND COLOR CONVERSION FILM COMPRISING SAME, BACKLIGHT UNIT, AND DISPLAY DEVICE LG CHEM, LTD. (KR) 2020-08-06 US disclosed
US-20200207788-A1 NITROGEN-CONTAINING COMPOUND, COLOR CONVERSION FILM INCLUDING SAME, AND BACKLIGHT UNIT AND DISPLAY DEVICE INCLUDING SAME LG CHEM, LTD. (KR) 2020-07-02 US disclosed
US-20190263836-A1 NITROGEN-CONTAINING CYCLIC COMPOUND, COLOR CONVERSION FILM COMPRISING SAME, AND BACKLIGHT UNIT AND DISPLAY DEVICE COMPRISING SAME LG CHEM, LTD. (KR) 2019-08-29 US disclosed
US-20170329219-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-11-16 US disclosed
US-9771346-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-26 US disclosed
US-9760005-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-12 US disclosed
US-9671692-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9644056-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-05-09 US disclosed
US-20160244400-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-25 US disclosed
US-20160237190-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-18 US disclosed
US-20160168115-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed
US-20160145186-A1 NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-26 US disclosed
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-19 US disclosed
US-20160130212-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-12 US disclosed
US-20160131971-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-12 US disclosed
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-03 US disclosed
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (12 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN XDH, HAX1, MLX PRKCA 2455/4885POLB 1000/4885GAA 2846/4885
US-20160145186-A1 NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN AFF1, AFF2, RER1 PRKCA 4076/4885POLB 2166/4885GAA 4871/4885
US-20200247826-A1 COMPOUND AND COLOR CONVERSION FILM COMPRISING SAME, BACKLIGHT UNIT, AND DISPLAY DEVICE UROD, ALDH1A2, UBE2I PRKCA 4876/4885POLB 4394/4885GAA 1600/4885
US-20160244400-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION C1R, KISS1R, C1S PRKCA 4364/4885POLB 3993/4885GAA 3770/4885
US-20160131971-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, RXRA, C1R PRKCA 4176/4885POLB 384/4885GAA 2780/4885
US-20200207788-A1 NITROGEN-CONTAINING COMPOUND, COLOR CONVERSION FILM INCLUDING SAME, AND BACKLIGHT UNIT AND DISPLAY DEVICE INCLUDING SAME NOS1, CRY1, NOTCH1 PRKCA 4880/4885POLB 4261/4885GAA 4215/4885
US-20160237190-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION HAX1, F11, RXRA PRKCA 4637/4885POLB 2949/4885GAA 4209/4885
US-20160130212-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN C1R, C9, RER1 PRKCA 4442/4885POLB 1801/4885GAA 4219/4885
US-20160168115-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN FGFR1, RER1, FRG1 PRKCA 3447/4885POLB 2084/4885GAA 4753/4885
US-20190263836-A1 NITROGEN-CONTAINING CYCLIC COMPOUND, COLOR CONVERSION FILM COMPRISING SAME, AND BACKLIGHT UNIT AND DISPLAY DEVICE COMPRISING SAME CRY1, NUDC, CRY2 PRKCA 4863/4885POLB 3828/4885GAA 4521/4885
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN AFF1, AFF2, AFF4 PRKCA 4769/4885POLB 868/4885GAA 4761/4885
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, AFF1, FRG1 PRKCA 3962/4885POLB 3385/4885GAA 4651/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.