Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL144839 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL14151505 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL624794 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL4807754 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL8170298 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL8327949 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL11136511 | 0.82 | CA4 (0.50) | — | |
| Hydrochloric Acid SCHEMBL11264260 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL21267985 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL1904354 | 0.82 | CA4 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109053460-B | Method for catalyzing amination of benzyl alcohol compound | 中山大学 | 2022-01-04 | — | — | CN | disclosed |
| US-7767559-B2 | Process for fabricating semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2010-08-03 | — | — | US | disclosed |
| US-20090075460-A1 | PROCESS FOR FABRICATING SEMICONDUCTOR DEVICE | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7470575-B2 | Process for fabricating semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2008-12-30 | — | — | US | disclosed |
| US-20050239240-A1 | Process for fabricating semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| US-6919237-B2 | Process for fabricating thin film transistors | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2005-07-19 | — | — | US | disclosed |
| US-20040005742-A1 | Process for fabricating semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2004-01-08 | — | — | US | disclosed |
| US-6589824-B2 | Process for fabricating semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2003-07-08 | — | — | US | disclosed |
| US-20020055208-A1 | Process for fabricating semiconductor device | OHTANI HISASHI (JP) | 2002-05-09 | — | — | US | disclosed |
| US-6326248-B1 | Process for fabricating semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2001-12-04 | — | — | US | disclosed |
| EP-0329491-A2 | Photographic elements incorporating antihalation and/or acutance dyes | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-08-23 | — | — | EP | disclosed |
| EP-0328391-A2 | Stabilizers for photographic emulsions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-08-16 | — | — | EP | disclosed |
| US-4794070-A | REDUCTION DEVELOPER FLUCTUATION | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-12-27 | — | — | US | disclosed |
| EP-0295079-A1 | Supersensitization of silver halide emulsion | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-12-14 | — | — | EP | disclosed |
| EP-0295078-A2 | Automatically processible photographic element | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-12-14 | — | — | EP | disclosed |
| US-4780404-A | USING S-SUBSTITUTED-1,2,3,4-THIATRIAZOLES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-10-25 | — | — | US | disclosed |
| EP-0203698-A2 | Supersensitization of silver halide emulsions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1986-12-03 | — | — | EP | disclosed |
| US-4603104-A | ARYLMERCAPTOTETRAZOLE, POLYETHYL ACRYLATE, BIS(TRIAZINE-2-YLAMINO)STILBENE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1986-07-29 | — | — | US | disclosed |
| US-4578347-A | WATER SOLUBLE TRIARYL PHOSPHINE, ARSINE, AMINE, BISMUTHINE OR STIBINE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1986-03-25 | — | — | US | disclosed |
| EP-0173563-A2 | Supersensitization of silver halide emulsions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1986-03-05 | — | — | EP | disclosed |