Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL2174511 | 1.00 | — | — | |
| SCHEMBL11547451 | 0.80 | — | — | |
| Fluoride SCHEMBL4659938 | 0.80 | — | — | |
| Ethane SCHEMBL1535923 | 0.52 | — | — | |
| SCHEMBL358482 | 0.52 | — | — | |
| Ethane SCHEMBL6266512 | 0.52 | — | — | |
| Ethane SCHEMBL5922746 | 0.52 | — | — | |
| Ethane SCHEMBL547702 | 0.52 | — | — | |
| Ethane SCHEMBL547701 | 0.52 | — | — | |
| Ethane SCHEMBL1535922 | 0.52 | CA4 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7141488-B2 | Method of depositing germanium-containing films | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-11-28 | — | — | US | claimed |
| US-9187602-B2 | Heteroelement siloxane compounds and polymers | DOW CORNING CORPORATION (US) | 2015-11-17 | — | — | US | disclosed |
| US-9172092-B2 | Binder composition for batteries, slurry for battery electrodes, solid electrolyte composition, electrode, and all-solid-state battery | JSR CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| EP-2648253-A1 | BINDER COMPOSITION FOR BATTERIES, SLURRY FOR BATTERY ELECTRODES, SOLID ELECTROLYTE COMPOSITION, ELECTRODES, AND ALL-SOLID-STATE BATTERIES | JSR Corporation (JP) | 2013-10-09 | — | — | EP | disclosed |
| US-20130260241-A1 | BINDER COMPOSITION FOR BATTERIES, SLURRY FOR BATTERY ELECTRODES, SOLID ELECTROLYTE COMPOSITION, ELECTRODE, AND ALL-SOLID-STATE BATTERY | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| EP-1990345-B1 | Organometallic germanium compounds suitable for use in vapor deposition processes | ROHM & HAAS ELECT MAT (US) | 2010-11-10 | — | — | EP | disclosed |
| US-7767840-B2 | Organometallic compounds | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-08-03 | — | — | US | disclosed |
| US-20100041851-A1 | HETEROELEMENT SILOXANE COMPOUNDS AND POLYMERS | DOW CORNING CORPORATION (US) | 2010-02-18 | — | — | US | disclosed |
| EP-2115039-A2 | HETEROELEMENT SILOXANE COMPOUNDS AND POLYMERS | DOW CORNING CORPORATION (US) | 2009-11-11 | — | — | EP | disclosed |
| US-20090156852-A1 | Organometallic compounds | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-06-18 | — | — | US | disclosed |
| WO-2008097877-A2 | HETEROELEMENT SILOXANE COMPOUNDS AND POLYMERS | DOW CORNING CORPORATION (US) | 2008-08-14 | — | — | WO | disclosed |
| US-20070154637-A1 | Organometallic composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-07-05 | — | — | US | disclosed |
| EP-1798307-A1 | Organometallic composition | Rohm and Haas Electronic Materials LLC (US) | 2007-06-20 | — | — | EP | disclosed |
| US-20070077733-A1 | Germanium compound delivery device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-04-05 | — | — | US | disclosed |
| US-7141488-B2 | Method of depositing germanium-containing films | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-11-28 | — | — | US | disclosed |
| CN-1584108-A | Organometallic compounds | ROHM & HAAS ELECT MAT (US) | 2005-02-23 | — | — | CN | disclosed |
| US-20040194703-A1 | Organometallic compounds | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. | 2004-10-07 | — | — | US | disclosed |
| US-20040197945-A1 | Germanium compounds | ROHM AND HAAS ELECTRONIC MATERIALS L.L.C. | 2004-10-07 | — | — | US | disclosed |
| EP-1464724-A2 | Organometallic compounds suitable for use in vapor deposition processes | Rohm and Haas Electronic Materials, L.L.C. (US) | 2004-10-06 | — | — | EP | disclosed |
| EP-1464725-A2 | Germanium compounds suitable for use in vapor deposition processes | Rohm and Haas Electronic Materials, L.L.C. (US) | 2004-10-06 | — | — | EP | disclosed |