Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL6749166 | 1.00 | — | — | |
| SCHEMBL8458318 | 0.97 | — | — | |
| Carbon Monoxide SCHEMBL11121728 | 0.88 | — | — | |
| SCHEMBL8559530 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL28481453 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL27521460 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL29171489 | 0.65 | — | — | |
| Hydrochloric Acid SCHEMBL10980991 | 0.65 | — | — | |
| Hydrochloric Acid SCHEMBL14954185 | 0.65 | — | — | |
| Hydrochloric Acid SCHEMBL781795 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250357120-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE INCLUDING PLASMA ETCHING PROCESS | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-11-20 | — | — | US | claimed |
| US-20120035056-A1 | Nb-DOPED PEROVSKITE FLUX PINNING OF REBCO BASED SUPERCONDUCTORS BY MOCVD | U.S. DEPARTMENT OF ENERGY | 2012-02-09 | — | — | US | claimed |
| US-20250357120-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE INCLUDING PLASMA ETCHING PROCESS | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-11-20 | — | — | US | disclosed |
| US-12473309-B2 | Organometallic compound and method of manufacturing integrated circuit using the same | SAMSUNG ELECTRONICS CO., LTD. | 2025-11-18 | — | — | US | disclosed |
| CN-118437322-A | High-stability modified supported metal catalyst and preparation method and application thereof | 中国科学院大学 | 2024-08-06 | — | — | CN | disclosed |
| US-20210388010-A1 | ORGANOMETALLIC COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT USING THE SAME | ADEKA CORPORATION (JP) | 2021-12-16 | — | — | US | disclosed |
| US-10844073-B2 | Palladium-mediated ketolization | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2020-11-24 | — | — | US | disclosed |
| EP-3074450-B1 | MOISTURE CURABLE COMPOUND WITH METAL-ARENE COMPLEXES | MOMENTIVE PERFORMANCE MAT INC (US) | 2020-11-11 | — | — | EP | disclosed |
| CN-105793326-B | Moisture-curable compositions with metal-arene complexes | 莫门蒂夫性能材料股份有限公司 | 2020-07-21 | — | — | CN | disclosed |
| US-10392400-B2 | Palladium-mediated ketolization | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2019-08-27 | — | — | US | disclosed |
| US-10174169-B2 | Moisture curable compound with metal-arene complexes | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2019-01-08 | — | — | US | disclosed |
| US-20140170526-A1 | PROCESS FOR PRODUCTION AND USE OF CARBONITRIDE MIXTURE PARTICLES OR OXYCARBONITRIDE MIXTURE PARTICLES | SHOWA DENKO K.K. (JP) | 2014-06-19 | — | — | US | disclosed |
| US-8703638-B2 | Process for production and use of carbonitride mixture particles or oxycarbonitride mixture particles | SHOWA DENKO K.K. (JP) | 2014-04-22 | — | — | US | disclosed |
| US-20120035056-A1 | Nb-DOPED PEROVSKITE FLUX PINNING OF REBCO BASED SUPERCONDUCTORS BY MOCVD | U.S. DEPARTMENT OF ENERGY | 2012-02-09 | — | — | US | disclosed |
| US-20110183234-A1 | PROCESS FOR PRODUCTION AND USE OF CARBONITRIDE MIXTURE PARTICLES OR OXYCARBONITRIDE MIXTURE PARTICLES | SHOWA DENKO K.K. (JP) | 2011-07-28 | — | — | US | disclosed |
| EP-2347996-A1 | METHOD FOR PRODUCING CARBONITRIDE MIXTURE PARTICLE OR OXYCARBONITRIDE MIXTURE PARTICLE, AND USE THEREOF | Showa Denko K.K. (JP) | 2011-07-27 | — | — | EP | disclosed |
| US-6790918-B2 | OLEFIN POLYMERIZATION CATALYSTS, PYRIDINE OR QUINOLINE CONTAINING LIGAND WITH GROUP 4 METAL | EQUISTAR CHEMICALS, LP | 2004-09-14 | — | — | US | disclosed |
| US-6759493-B1 | NOVEL BIDENTATE PYRIDINE TRANSITION METAL COMPOUNDS WHICH HAVE EXCELLENT ACTIVITY AS ALPHA-OLEFIN POLYMERIZATION CATALYSTS | EQUISTAR CHEMICALS, LP | 2004-07-06 | — | — | US | disclosed |
| US-20040097670-A1 | Transition metal catalysts containing bidentate ligands and method of using and preparing same | EQUISTAR CHEMICALS, LP | 2004-05-20 | — | — | US | disclosed |
| US-6034027-A | COORDINATION CATALYST | EQUISTAR CHEMICALS, LP (US) | 2000-03-07 | — | — | US | disclosed |