Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL251279 | 0.97 | — | — | |
| SCHEMBL637371 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL11133442 | 0.69 | — | — | |
| SCHEMBL14227038 | 0.69 | — | — | |
| SCHEMBL27508223 | 0.67 | — | — | |
| SCHEMBL2260752 | 0.67 | — | — | |
| SCHEMBL170397 | 0.65 | — | — | |
| SCHEMBL27551821 | 0.65 | — | — | |
| SCHEMBL4557104 | 0.65 | — | — | |
| SCHEMBL4557102 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-1052746-A | — | — | None | — | — | JP | disclosed |
| US-11891472-B2 | Composition, production method for composition, and production method for unsaturated compound | RESONAC CORPORATION (JP) | 2024-02-06 | — | — | US | disclosed |
| EP-3842417-B1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | RESONAC CORP (JP) | 2024-01-24 | — | — | EP | disclosed |
| US-11661474-B2 | Composition, production method for composition, and production method for unsaturated compound | SHOWA DENKO K.K. (JP) | 2023-05-30 | — | — | US | disclosed |
| EP-3842414-B1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO KK (JP) | 2023-04-05 | — | — | EP | disclosed |
| CN-112533896-B | Composition, method for producing composition, and method for producing unsaturated compound | 昭和电工株式会社 | 2023-03-03 | — | — | CN | disclosed |
| EP-3842416-B1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO KK (JP) | 2023-03-01 | — | — | EP | disclosed |
| CN-112533895-B | Composition, method for producing composition, and method for producing unsaturated compound | 昭和电工株式会社 | 2023-02-17 | — | — | CN | disclosed |
| US-20220119585-A1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO K.K. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20210292469-A1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO K.K. (JP) | 2021-09-23 | — | — | US | disclosed |
| WO-2020040050-A1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | 昭和電工株式会社 | 2020-02-27 | — | — | WO | disclosed |
| WO-2020040049-A1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | 昭和電工株式会社 | 2020-02-27 | — | — | WO | disclosed |
| EP-1866357-B1 | (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF | SHOWA DENKO KK (JP) | 2012-02-22 | — | — | EP | disclosed |
| US-8044235-B2 | (Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof | SHOWA DENKO K.K. (JP) | 2011-10-25 | — | — | US | disclosed |
| CN-101142252-B | Aromatic isocyanate compound containing (meth) acryloyl group and method for producing same | SHOWA DENKO KK | 2011-08-03 | — | — | CN | disclosed |
| US-20090054543-A1 | (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof | SHOWA DENKO K.K. (JP) | 2009-02-26 | — | — | US | disclosed |
| CN-101142252-A | Aromatic isocyanate compound containing (meth) acryloyl group and method for producing same | SHOWA DENKO KK (JP) | 2008-03-12 | — | — | CN | disclosed |
| EP-1866357-A1 | (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF | Showa Denko K.K. (JP) | 2007-12-19 | — | — | EP | disclosed |
| WO-2006103979-A1 | (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF | SHOWA DENKO K.K. (JP) | 2006-10-05 | — | — | WO | disclosed |
| JP-S6452746-A | PRODUCTION OF UNSATURATED CARBOXYLIC ACID ISOCYANATOALKYL ESTER | SHOWA RHODIA CHEM | 1989-02-28 | — | — | JP | disclosed |