Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 2/20 | 0.48 |
| ▸ | USP2 | O75604 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | PKM | P14618 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.46 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.46 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.46 |
| ▸ | ADRB2 | P07550 | 10/20 | 0.45 |
| ▸ | TSHR | P16473 | 3/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.45 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.45 |
| ▸ | BACE1 | P56817 | 1/20 | 0.40 |
| ▸ | RXRA | P19793 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.39 |
| ▸ | CASP7 | P55210 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6536206 | 0.95 | ALOX15 (0.48) | ALOX15USP2ALDH1A1GAAPKM | |
| SCHEMBL11671634 | 0.87 | ALDH1A1 (0.48) | ALOX15USP2ALDH1A1GAAPKM | |
| SCHEMBL10138495 | 0.85 | ALDH1A1 (0.42) | ALOX15USP2ALDH1A1GAAPKM | |
| SCHEMBL7878377 | 0.85 | CA12 (0.46) | ALOX15USP2ALDH1A1GAAPKM | |
| SCHEMBL682802 | 0.82 | GABRA1 (0.54) | ALOX15USP2ALDH1A1GAAPKM | |
| SCHEMBL5916418 | 0.81 | ADRB2 (0.46) | ADRB2TSHRHIF1AADRA1ABACE1 | |
| SCHEMBL11686432 | 0.81 | ALDH1A1 (0.46) | ALOX15USP2ALDH1A1GAAPKM | |
| SCHEMBL13898444 | 0.80 | CA12 (0.52) | ALOX15USP2ALDH1A1GAAPKM | |
| SCHEMBL7252315 | 0.80 | HDAC4 (0.40) | ALOX15USP2ALDH1A1GAAPKM | |
| SCHEMBL13898619 | 0.80 | CA5A (0.55) | ALOX15USP2ALDH1A1GAAPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230259029-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| US-20230236502-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-27 | — | — | US | disclosed |
| US-20230174471-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | INHA INDUSTRY PARTNERSHIP INSTITUTE (KR) | 2023-06-08 | — | — | US | disclosed |
| US-20230139891-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230133710-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |
| US-11129781-B2 | Agent for hair deforming treatment | KAO CORPORATION (JP) | 2021-09-28 | — | — | US | disclosed |
| US-20210286264-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |
| US-11045402-B2 | Hair cosmetic composition | KAO CORPORATION (JP) | 2021-06-29 | — | — | US | disclosed |
| US-10959925-B2 | Hair cosmetic composition | KAO CORPORATION (JP) | 2021-03-30 | — | — | US | disclosed |
| EP-3228302-B1 | HAIR DEFORMATION TREATMENT AGENT | KAO CORP (JP) | 2020-09-02 | — | — | EP | disclosed |
| US-7521168-B2 | Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation. | FUJIFILM CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090087776-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090087789-A1 | RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-7432034-B2 | Negative resist composition | FUJIFILM CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-20080241745-A1 | Mixture of alkali soluble polymer, crosslinking agent, acid generator ; radiation with actinic radiation; quaternary ammonium compound | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080193878-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-14 | — | — | US | disclosed |
| EP-0224625-B1 | PROCESS FOR PRODUCING AMINOPHENOLS | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1990-03-28 | — | — | EP | disclosed |
| US-4675444-A | Process for producing aminophenols | MITSUI PETROCHEMICAL IND., LTD. (JP) | 1987-06-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11045402-B2 | Hair cosmetic composition | CUTA, GRHPR, POLR1C | ALOX15 2041/4885USP2 3928/4885ALDH1A1 1188/4885 |
| US-10959925-B2 | Hair cosmetic composition | CUTA, POLR1C, GRHPR | ALOX15 2570/4885USP2 4101/4885ALDH1A1 932/4885 |
| US-20230174471-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | PARP10, ADCY10, APRT | ALOX15 2230/4885USP2 4178/4885ALDH1A1 83/4885 |
| US-11129781-B2 | Agent for hair deforming treatment | GRHPR, SLC26A4, COL1A1 | ALOX15 3131/4885USP2 3086/4885ALDH1A1 1297/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.