Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA5A | P35218 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL756609 | 0.87 | KMT2A (0.38) | — | |
| SCHEMBL1263662 | 0.79 | CA1 (0.39) | CA1CA2CA9 | |
| SCHEMBL2990556 | 0.69 | CA1 (0.57) | CA1CA2CA5ACA9PTPN1 | |
| SCHEMBL36178 | 0.68 | CA2 (0.36) | CA1CA2CA5ACA9PTPN1 | |
| SCHEMBL759936 | 0.67 | HTR6 (0.39) | CA1CA2CA5ACA9 | |
| SCHEMBL1406732 | 0.67 | ALDH1A1 (0.41) | CA1CA2CA5ACA9PTPN1 | |
| SCHEMBL2513752 | 0.65 | CES1 (0.36) | PTPN1 | |
| SCHEMBL9795896 | 0.65 | FAAH (0.41) | CA1CA2CA5ACA9PTPN1 | |
| SCHEMBL2228757 | 0.65 | CA2 (0.34) | CA1CA2CA5ACA9PTPN1 | |
| SCHEMBL11172344 | 0.64 | CA2 (0.33) | CA1CA2CA5ACA9PTPN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| EP-3680275-B1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-03-06 | — | — | EP | disclosed |
| EP-4020081-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SHINETSU CHEMICAL CO (JP) | 2023-05-17 | — | — | EP | disclosed |
| US-11485824-B2 | Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-11-01 | — | — | US | disclosed |
| US-20220221793-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| EP-4020081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-06-29 | — | — | EP | disclosed |
| EP-3680275-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-07-15 | — | — | EP | disclosed |
| US-20200216670-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2941781-B1 | PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION | CANON KK (JP) | 2017-08-09 | — | — | EP | disclosed |
| EP-2098583-B1 | Optically isotropic liquid crystal medium and optical device | JNC CORP (JP) | 2012-03-21 | — | — | EP | disclosed |
| US-20110242473-A1 | OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL DEVICE | JNC CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| EP-2360229-A1 | OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL ELEMENT | JNC Corporation (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-2302015-A1 | OPTICALLY ISOTROPIC LIQUID CRYSTALLINE MEDIUM, AND OPTICAL ELEMENT | Chisso Corporation (JP) | 2011-03-30 | — | — | EP | disclosed |
| US-20110069245-A1 | OPTICALLY ISOTROPIC LIQUID CRYSTALLINE MEDIUM, AND OPTICAL ELEMENT | CHISSO PETROCHEMICAL CORPORATION (JP) | 2011-03-24 | — | — | US | disclosed |
| US-20100296029-A1 | CHLOROFLUOROBENZENE COMPOUND, OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM, AND OPTICAL DEVICE | CHISSO CORPORATION (JP) | 2010-11-25 | — | — | US | disclosed |
| US-7722783-B2 | Optically isotropic liquid crystal medium and optical device | CHISSO CORPORATION (JP) | 2010-05-25 | — | — | US | disclosed |
| EP-2098583-A2 | Optically isotropic liquid crystal medium and optical device | Chisso Corporation (JP) | 2009-09-09 | — | — | EP | disclosed |
| US-20090135368-A1 | OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL DEVICE | CHISSO CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20010033990-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SMC1A, CDH1, SMC4 | CA1 710/4885CA2 3442/4885CA5A 4240/4885 |
| US-20220221793-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SMC1A, CDH1, SMC4 | CA1 710/4885CA2 3442/4885CA5A 4240/4885 |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | CA1 3547/4885CA2 1047/4885CA5A 1495/4885 |
| US-20100296029-A1 | CHLOROFLUOROBENZENE COMPOUND, OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM, AND OPTICAL DEVICE | DDT, BRAF, LEF1 | CA1 577/4885CA2 1557/4885CA5A 3201/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.