Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10899304 | 0.90 | ALDH1A1 (0.48) | ALDH1A1TSHRTHRBTDP1 | |
| SCHEMBL786425 | 0.87 | ALDH1A1 (0.38) | ALDH1A1TSHR | |
| SCHEMBL772723 | 0.86 | ALDH1A1 (0.41) | ALDH1A1TSHRTHRB | |
| SCHEMBL772101 | 0.86 | ALDH1A1 (0.41) | ALDH1A1TSHRTHRB | |
| SCHEMBL757380 | 0.85 | ALDH1A1 (0.52) | ALDH1A1TSHR | |
| SCHEMBL9646854 | 0.85 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| SCHEMBL29089854 | 0.85 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| SCHEMBL630211 | 0.85 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| SCHEMBL18789073 | 0.84 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBTDP1 | |
| SCHEMBL145571 | 0.84 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 318 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120137091-A | Fluorine-containing acrylic ester ternary random copolymer modifier, modified boron powder, preparation and application thereof | 南京理工大学 | 2025-06-13 | — | — | CN | claimed |
| CN-119954695-A | Modifier and modified KNO3Powder, and preparation method and application thereof | 国网江苏省电力有限公司超高压分公司 | 2025-05-09 | — | — | CN | claimed |
| CN-118762861-A | High-resistant Wen Lvyin pulp and production process thereof | 安徽黑猫新材料有限公司 | 2024-10-11 | — | — | CN | claimed |
| CN-117092850-A | Polymer dispersed liquid crystal dimming film and preparation method thereof | 北京科技大学 | 2023-11-21 | — | — | CN | claimed |
| CN-115894780-B | High-strength strong-hydrophobicity fluorine-containing propping agent and preparation method thereof | 西南石油大学 | 2023-09-26 | — | — | CN | claimed |
| CN-116333651-A | Low refractive adhesive composition, adhesive tape article and method of making the same | 太仓斯迪克新材料科技有限公司 | 2023-06-27 | — | — | CN | claimed |
| WO-2022228846-A1 | METHOD FOR PRODUCING A TERMINAL-FUNCTIONAL POLYMER | BASF SE (DE) | 2022-11-03 | — | — | WO | claimed |
| WO-2022117389-A1 | METHOD FOR PRODUCING A TERMINAL-FUNCTIONAL POLYMER | BASF SE (DE) | 2022-06-09 | — | — | WO | claimed |
| CN-109135551-B | High-flexibility water-based UV coating | 深圳市前海奇迹新材料有限公司 | 2020-11-20 | — | — | CN | claimed |
| CN-110724477-A | Foaming composition for floor | 浙江杰上杰新材料有限公司 | 2020-01-24 | — | — | CN | claimed |
| CN-109851936-A | A kind of antistatic, anticorrosion power distribution cabinet shell and preparation method thereof | 广东求精电气有限公司 | 2019-06-07 | — | — | CN | claimed |
| CN-109381374-A | A kind of nail polish glue and its preparation and application method | 深圳恒尚美妆贸易有限公司 | 2019-02-26 | — | — | CN | claimed |
| CN-105542583-B | A kind of production method of water-based fluorocarbon-concrete base building coating | 华北理工大学 | 2018-12-25 | — | — | CN | claimed |
| WO-2015026370-A1 | CROSS-LINKED CO-POLYMERS FOR MAKING OPTOELECTRONIC DEVICES | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2015-02-26 | — | — | WO | claimed |
| US-8524800-B2 | Actinically curable silicone hydrogel copolymers and uses thereof | NOVARTIS AG (CH) | 2013-09-03 | — | — | US | claimed |
| EP-2091979-A2 | ACTINICALLY CURABLE SILICONE HYDROGEL COPOLYMERS AND USES THEREOF | Novartis AG (CH) | 2009-08-26 | — | — | EP | claimed |
| WO-2008076736-A2 | ACTINICALLY CURABLE SILICONE HYDROGEL COPOLYMERS AND USES THEREOF | NOVARTIS AG (CH) | 2008-06-26 | — | — | WO | claimed |
| US-20080143003-A1 | Actinically curable silicone hydrogel copolymers and uses thereof | ALCON INC. (CH) | 2008-06-19 | — | — | US | claimed |
| US-4387203-A | COPOLYMER OF AN UNSATURATED NITRILE, CONJUGATED DIENE AND UNSATURATED FLUORINE COMPOUND GASOLINE RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-06-07 | — | — | US | claimed |
| JP-54083038-A | — | — | None | — | — | JP | disclosed |
| WO-2026100525-A1 | BLACK RESIN PARTICLE DISPERSION AND AQUEOUS INK COMPOSITION FOR WRITING IMPLEMENTS CONTAINING SAME | 三菱鉛筆株式会社 | 2026-05-15 | — | — | WO | disclosed |
| EP-4692252-A1 | FUNCTIONAL PARTICLE DISPERSION | MITSUBISHI PENCIL COMPANY, LIMITED (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4097155-B1 | ACTINICALLY-CROSSLINKABLE POLYSILOXANE-POLYGLYCEROL BLOCK COPOLYMERS AND METHODS OF MAKING AND USE THEREOF | CLEARLAB SG PTE LTD (SG) | 2025-08-20 | — | — | EP | disclosed |
| CN-120137091-A | Fluorine-containing acrylic ester ternary random copolymer modifier, modified boron powder, preparation and application thereof | 南京理工大学 | 2025-06-13 | — | — | CN | disclosed |
| WO-2025110169-A1 | RESIN PARTICLE DISPERSION AND AQUEOUS INK COMPOSITION CONTAINING SAME | 三菱鉛筆株式会社 | 2025-05-30 | — | — | WO | disclosed |
| CN-119954695-A | Modifier and modified KNO3Powder, and preparation method and application thereof | 国网江苏省电力有限公司超高压分公司 | 2025-05-09 | — | — | CN | disclosed |
| CN-116333651-B | Low refractive adhesive composition, adhesive tape article and method of making the same | 太仓斯迪克新材料科技有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-119252665-A | Tantalum capacitor | 三星电机株式会社 | 2025-01-03 | — | — | CN | disclosed |
| CN-118762861-A | High-resistant Wen Lvyin pulp and production process thereof | 安徽黑猫新材料有限公司 | 2024-10-11 | — | — | CN | disclosed |
| CN-118762861-A | High-resistant Wen Lvyin pulp and production process thereof | 安徽黑猫新材料有限公司 | 2024-10-11 | — | — | CN | disclosed |
| WO-2024204512-A1 | FUNCTIONAL PARTICLE DISPERSION | 三菱鉛筆株式会社 | 2024-10-03 | — | — | WO | disclosed |
| US-12037463-B2 | Antimicrobial ophthalmic devices comprising polysiloxane-polyglycerol block copolymers and methods of making and use thereof | Clearlab Sg Pte Ltd. (SG) | 2024-07-16 | — | — | US | disclosed |
| US-12024597-B2 | Wound dressings comprising polysiloxane-polyglycerol block copolymers and methods of making and use thereof | Clearlab Sg Pte Ltd. (SG) | 2024-07-02 | — | — | US | disclosed |
| CN-114644805-B | Fluorine-containing auxiliary agent and product thereof | 上海齐润新材料有限公司 | 2024-06-28 | — | — | CN | disclosed |
| WO-2024053449-A1 | PHOTOCHROMIC PARTICLE AQUEOUS DISPERSION AND WATER-BASED INK COMPOSITION CONTAINING SAME | 三菱鉛筆株式会社 | 2024-03-14 | — | — | WO | disclosed |
| CN-117500923-A | Rapid design, construction, testing and learning techniques for identification and use of non-viral vectors | 巴特尔纪念研究院 | 2024-02-02 | — | — | CN | disclosed |
| CN-117092850-A | Polymer dispersed liquid crystal dimming film and preparation method thereof | 北京科技大学 | 2023-11-21 | — | — | CN | disclosed |
| CN-115894780-B | High-strength strong-hydrophobicity fluorine-containing propping agent and preparation method thereof | 西南石油大学 | 2023-09-26 | — | — | CN | disclosed |
| US-20230227613-A1 | ANTIMICROBIAL OPHTHALMIC DEVICES COMPRISING POLYSILOXANE-POLYGLYCEROL BLOCK COPOLYMERS AND METHODS OF MAKING AND USE THEREOF | CLEARLAB SG PTE LTD (SG) | 2023-07-20 | — | — | US | disclosed |
| CN-111698946-B | Acoustic lens, acoustic probe, acoustic wave, and related resin material, measurement device, diagnostic device, endoscope, and manufacturing method | 富士胶片株式会社 | 2023-07-18 | — | — | CN | disclosed |
| US-20230212357-A1 | WOUND DRESSINGS COMPRISING POLYSILOXANE-POLYGLYCEROL BLOCK COPOLYMERS AND METHODS OF MAKING AND USE THEREOF | CLEARLAB SG PTE LTD (SG) | 2023-07-06 | — | — | US | disclosed |
| CN-116333651-A | Low refractive adhesive composition, adhesive tape article and method of making the same | 太仓斯迪克新材料科技有限公司 | 2023-06-27 | — | — | CN | disclosed |
| CN-115778851-B | HEMA-free nail polish gel with high hardness, high adhesive force and high wear resistance and preparation method thereof | 东莞市百拓实业有限公司 | 2023-06-02 | — | — | CN | disclosed |
| US-11649325-B2 | Actinically-crosslinkable polysiloxane-polyglycerol block copolymers and methods of making and use thereof | Clearlab Sg Pte Ltd. (SG) | 2023-05-16 | — | — | US | disclosed |
| WO-2023068082-A1 | AROMATIC PARTICLE DISPERSION AND AQUEOUS INK COMPOSITION FOR WRITING INSTRUMENT CONTAINING SAME | 三菱鉛筆株式会社 | 2023-04-27 | — | — | WO | disclosed |
| CN-114805664-B | Bionic modified marine antifouling resin material, and preparation method and application thereof | 江苏苏博特新材料股份有限公司 | 2023-04-14 | — | — | CN | disclosed |
| CN-115778851-A | High-hardness, high-adhesion and high-wear-resistance nail polish gel without HEMA and preparation method thereof | 东莞市百拓实业有限公司 | 2023-03-14 | — | — | CN | disclosed |
| WO-2022270091-A1 | ANTIMICROBIAL PARTICLE DISPERSION | 三菱鉛筆株式会社 | 2022-12-29 | — | — | WO | disclosed |
| EP-4097155-A1 | ACTINICALLY-CROSSLINKABLE POLYSILOXANE-POLYGLYCEROL BLOCK COPOLYMERS AND METHODS OF MAKING AND USE THEREOF | Clearlab SG Pte Ltd (SG) | 2022-12-07 | — | — | EP | disclosed |
| WO-2022230466-A1 | LASER-PRINTED ADHESIVE LAMINATE | 東洋紡株式会社 | 2022-11-03 | — | — | WO | disclosed |
| WO-2022228846-A1 | METHOD FOR PRODUCING A TERMINAL-FUNCTIONAL POLYMER | BASF SE (DE) | 2022-11-03 | — | — | WO | disclosed |
| WO-2022224646-A1 | LASER-PRINTED IN-MOLD LABEL | 東洋紡株式会社 | 2022-10-27 | — | — | WO | disclosed |
| WO-2022191071-A1 | REDUCING PARTICLE DISPERSION AND AQUEOUS INK COMPOSITION FOR WRITING TOOL CONTAINING SAME | 三菱鉛筆株式会社 | 2022-09-15 | — | — | WO | disclosed |
| CN-114805664-A | Bionic modified marine antifouling resin material, and preparation method and application thereof | 江苏苏博特新材料股份有限公司 | 2022-07-29 | — | — | CN | disclosed |
| CN-114644805-A | Fluorine-containing auxiliary agent and product thereof | 上海齐润新材料有限公司 | 2022-06-21 | — | — | CN | disclosed |
| WO-2022117389-A1 | METHOD FOR PRODUCING A TERMINAL-FUNCTIONAL POLYMER | BASF SE (DE) | 2022-06-09 | — | — | WO | disclosed |
| CN-114437649-A | Organic fluorine modified polyacrylic acid pressure-sensitive adhesive and preparation method thereof | 上海保立佳新材料有限公司 | 2022-05-06 | — | — | CN | disclosed |
| EP-3757149-B1 | CURABLE COMPOSITION | KANEKA CORP (JP) | 2022-04-06 | — | — | EP | disclosed |
| CN-113493450-A | Ligand compound, preparation method thereof and application thereof in asymmetric reaction | 中国科学院福建物质结构研究所 | 2021-10-12 | — | — | CN | disclosed |
| CN-109642085-B | Polymer material | 大金工业株式会社 | 2021-09-10 | — | — | CN | disclosed |
| US-20210246270-A1 | ACTINICALLY-CROSSLINKABLE POLYSILOXANE-POLYGLYCEROL BLOCK COPOLYMERS AND METHODS OF MAKING AND USE THEREOF | Clearlab Sg Pte Ltd. (SG) | 2021-08-12 | — | — | US | disclosed |
| WO-2021154692-A1 | ACTINICALLY-CROSSLINKABLE POLYSILOXANE-POLYGLYCEROL BLOCK COPOLYMERS AND METHODS OF MAKING AND USE THEREOF | Clearlab Sg Pte Ltd. (SG) | 2021-08-05 | — | — | WO | disclosed |
| US-11077673-B2 | Electrostatic printing apparatus and electrostatic printing method | HotaluX, Ltd. (JP) | 2021-08-03 | — | — | US | disclosed |
| EP-3757149-A1 | CURABLE COMPOSITION | Kaneka Corporation (JP) | 2020-12-30 | — | — | EP | disclosed |
| CN-109135551-B | High-flexibility water-based UV coating | 深圳市前海奇迹新材料有限公司 | 2020-11-20 | — | — | CN | disclosed |
| US-20200114658-A1 | ELECTROSTATIC PRINTING APPARATUS AND ELECTROSTATIC PRINTING METHOD | HotaluX, Ltd. (JP) | 2020-04-16 | — | — | US | disclosed |
| CN-107001548-B | Curable composition and film | 三菱化学株式会社 | 2020-04-10 | — | — | CN | disclosed |
| CN-110724477-A | Foaming composition for floor | 浙江杰上杰新材料有限公司 | 2020-01-24 | — | — | CN | disclosed |
| CN-110461616-A | Receive solution, receive the ink group of solution containing this and the manufacturing method of the printed matter using the ink group | DNP FINE CHEMICALS CO LTD | 2019-11-15 | — | — | CN | disclosed |
| CN-110461617-A | Receive solution, receive the ink group of solution containing this and the manufacturing method of the printed matter using the ink group | DNP FINE CHEMICALS CO LTD | 2019-11-15 | — | — | CN | disclosed |
| EP-2857436-B1 | POLYMER HAVING TERMINAL STRUCTURE INCLUDING PLURALITY OF REACTIVE SILICON GROUPS, METHOD FOR MANUFACTURING SAME, AND USE FOR SAME | KANEKA CORP (JP) | 2019-10-09 | — | — | EP | disclosed |
| US-10331031-B2 | Resin composition, resist pattern-forming method and polymer | JSR CORPORATION (JP) | 2019-06-25 | — | — | US | disclosed |
| CN-109851936-A | A kind of antistatic, anticorrosion power distribution cabinet shell and preparation method thereof | 广东求精电气有限公司 | 2019-06-07 | — | — | CN | disclosed |
| US-20190155162-A1 | PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT | JSR CORPORATION (JP) | 2019-05-23 | — | — | US | disclosed |
| US-10270048-B2 | Organic EL panel translucent substrate, control method for refractive index anisotrophy of organic EL panel translucent substrate, manufacturing method for organic EL panel translucent substrate, organic EL panel, and organic EL device | NEC LIGHTING, LTD. (JP) | 2019-04-23 | — | — | US | disclosed |
| CN-109601002-A | Metal complex and preparation method thereof, the catalytic component for olefinic polymerization containing the metal complex and the catalyst for olefinic polymerization, and the method using the catalyst preparation alpha-olefine polymers and copolymer for olefinic polymerization | 国立大学法人东京大学 | 2019-04-09 | — | — | CN | disclosed |
| EP-3007252-B1 | SLURRY COMPOSITION FOR LITHIUM-ION SECONDARY BATTERY POSITIVE ELECTRODE, PRODUCTION METHOD FOR LITHIUM-ION SECONDARY BATTERY POSITIVE ELECTRODE, LITHIUM-ION SECONDARY BATTERY POSITIVE ELECTRODE, AND LITHIUM-ION SECONDARY BATTERY | ZEON CORP (JP) | 2018-11-28 | — | — | EP | disclosed |
| US-9969843-B2 | Polymer having terminal structure including plurality of reactive silicon groups, method for manufacturing same, and use for same | KANEKA CORPORATION (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9921474-B2 | Pattern-forming method and composition | JSR CORPORATION (JP) | 2018-03-20 | — | — | US | disclosed |
| EP-2928960-B1 | HEAT AGING RESISTANT ETHYLENE VINYL ACETATE COPOLYMER COMPOSITION AND PROCESS FOR ITS PRODUCTION | DU PONT (US) | 2018-01-31 | — | — | EP | disclosed |
| US-9803052-B2 | Polymer having terminal structure including plurality of reactive silicon groups, method for manufacturing same, and use for same | KANEKA CORPORATION (JP) | 2017-10-31 | — | — | US | disclosed |
| US-20170309845-A1 | ORGANIC EL PANEL TRANSLUCENT SUBSTRATE, CONTROL METHOD FOR REFRACTIVE INDEX ANISOTROPHY OF ORGANIC EL PANEL TRANSLUCENT SUBSTRATE, MANUFACTURING METHOD FOR ORGANIC EL PANEL TRANSLUCENT SUBSTRATE, ORGANIC EL PANEL, AND ORGANIC EL DEVICE | HotaluX, Ltd. (JP) | 2017-10-26 | — | — | US | disclosed |
| US-9703195-B2 | Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound | JSR CORPORATION (JP) | 2017-07-11 | — | — | US | disclosed |
| US-9698361-B2 | Organic EL panel translucent substrate, control method for refractive index anisotropy of organic EL panel translucent substrate, manufacturing method for organic EL panel translucent substrate, organic EL panel, and organic EL device | NEC LIGHTING, LTD. (JP) | 2017-07-04 | — | — | US | disclosed |
| US-9650508-B2 | Heat aging resistant ethylene vinyl acetate copolymer composition and process for its production | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2017-05-16 | — | — | US | disclosed |
| CN-104262933-B | Curable composition | 株式会社钟化 | 2017-05-03 | — | — | CN | disclosed |
| US-20170115570-A1 | RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER | JSR CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-20170066916-A9 | HEAT AGING RESISTANT ETHYLENE VINYL ACETATE COPOLYMER COMPOSITION AND PROCESS FOR ITS PRODUCTION | DUPONT POLYMERS, INC. | 2017-03-09 | — | — | US | disclosed |
| US-20170051108-A1 | POLYMER HAVING TERMINAL STRUCTURE INCLUDING PLURALITY OF REACTIVE SILICON GROUPS, METHOD FOR MANUFACTURING SAME, AND USE FOR SAME | KANEKA CORPORATION (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170044314-A1 | POLYMER HAVING TERMINAL STRUCTURE INCLUDING PLURALITY OF REACTIVE SILICON GROUPS, METHOD FOR MANUFACTURING SAME, AND USE FOR SAME | KANEKA CORPORATION (JP) | 2017-02-16 | — | — | US | disclosed |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9557641-B2 | Photoresist composition, resist pattern-forming method, acid diffusion control agent, and compound | JSR CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9523911-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound | JSR CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-9505879-B2 | Polymer having terminal structure including plurality of reactive silicon groups, method for manufacturing same, and use for same | KANEKA CORPORATION (JP) | 2016-11-29 | — | — | US | disclosed |
| US-20160291462-A1 | PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT | JSR CORPORATION (JP) | 2016-10-06 | — | — | US | disclosed |
| EP-2934878-B1 | LAMINATES OF FLUOROELASTOMER AND HEAT-RESISTANT ACRYLATE ELASTOMER | DU PONT (US) | 2016-09-21 | — | — | EP | disclosed |
| EP-2134379-B1 | MEDICAL DEVICES HAVING IMPROVED PERFORMANCE | BOSTON SCIENT SCIMED INC (US) | 2016-08-24 | — | — | EP | disclosed |
| US-20160200845-A1 | CROSS-LINKED CO-POLYMERS FOR MAKING OPTOELECTRONIC DEVICES | EMPIRE TECHNOLOGY DEV LLC (US) | 2016-07-14 | — | — | US | disclosed |
| US-20160185999-A1 | RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER | JSR CORPORATION (JP) | 2016-06-30 | — | — | US | disclosed |
| EP-3029524-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | JSR Corporation (JP) | 2016-06-08 | — | — | EP | disclosed |
| US-9335630-B2 | Pattern-forming method, and radiation-sensitive composition | JSR CORPORATION (JP) | 2016-05-10 | — | — | US | disclosed |
| US-20160118663-A1 | SLURRY COMPOSITION FOR POSITIVE ELECTRODE OF LITHIUM ION SECONDARY BATTERY, METHOD OF PRODUCING POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY, POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY, AND LITHIUM ION SECONDARY BATTERY | ZEON CORPORATION (JP) | 2016-04-28 | — | — | US | disclosed |
| EP-3007252-A1 | SLURRY COMPOSITION FOR LITHIUM-ION SECONDARY BATTERY POSITIVE ELECTRODE, PRODUCTION METHOD FOR LITHIUM-ION SECONDARY BATTERY POSITIVE ELECTRODE, LITHIUM-ION SECONDARY BATTERY POSITIVE ELECTRODE, AND LITHIUM-ION SECONDARY BATTERY | Zeon Corporation (JP) | 2016-04-13 | — | — | EP | disclosed |
| US-9298090-B2 | — | — | 2016-03-29 | — | — | US | disclosed |
| US-9284443-B2 | Heat-stabilized acrylate elastomer composition and process for its production | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2016-03-15 | — | — | US | disclosed |
| US-9223207-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20150328866-A1 | LAMINATES OF FLUOROELASTOMER AND HEAT-STABILIZED ACRYLATE ELASTOMER | E. I. DU PONT DE NEMOURS AND COMPANY | 2015-11-19 | — | — | US | disclosed |
| US-20150323866-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2015-11-12 | — | — | US | disclosed |
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| US-20150309406-A9 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND | JSR CORPORATION (JP) | 2015-10-29 | — | — | US | disclosed |
| CN-102834461-B | Curable composition | KANEKA CORP. (JP) | 2015-10-21 | — | — | CN | disclosed |
| US-9164387-B2 | Pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-10-20 | — | — | US | disclosed |
| US-20150280153-A1 | ORGANIC EL PANEL TRANSLUCENT SUBSTRATE, CONTROL METHOD FOR REFRACTIVE INDEX ANISOTROPY OF ORGANIC EL PANEL TRANSLUCENT SUBSTRATE, MANUFACTURING METHOD FOR ORGANIC EL PANEL TRANSLUCENT SUBSTRATE, ORGANIC EL PANEL, AND ORGANIC EL DEVICE | HotaluX, Ltd. (JP) | 2015-10-01 | — | — | US | disclosed |
| EP-1927882-B1 | Contact lens | NOVARTIS AG (CH) | 2015-09-23 | — | — | EP | disclosed |
| US-20150253670-A1 | PATTERN-FORMING METHOD AND COMPOSITION | JSR CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150247030-A1 | HEAT AGING RESISTANT ETHYLENE VINYL ACETATE COPOLYMER COMPOSITION AND PROCESS FOR ITS PRODUCTION | DU PONT (US) | 2015-09-03 | — | — | US | disclosed |
| US-9122163-B2 | — | — | 2015-09-01 | — | — | US | disclosed |
| US-9122154-B2 | Radiation-sensitive resin composition, and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| EP-2723811-B1 | HEAT-STABILISED POLYAMIDE-FILLED ACRYLATE COPOLYMER AND PROCESS FOR ITS PRODUCTION | DU PONT (US) | 2015-08-26 | — | — | EP | disclosed |
| CN-104870181-A | Laminates of fluoroelastomer and heat-resistant acrylate elastomer | DU PONT | 2015-08-26 | — | — | CN | disclosed |
| US-20150177616-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2015-06-25 | — | — | US | disclosed |
| US-9062193-B2 | Heat aging resistant ethylene vinyl acetate copolymer composition and process for its production | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2015-06-23 | — | — | US | disclosed |
| US-9034559-B2 | Pattern-forming method, and radiation-sensitive composition | JSR CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-20150133622-A1 | POLYMER HAVING TERMINAL STRUCTURE INCLUDING PLURALITY OF REACTIVE SILICON GROUPS, METHOD FOR MANUFACTURING SAME, AND USE FOR SAME | KANEKA CORPORATION (JP) | 2015-05-14 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| EP-2857436-A1 | POLYMER HAVING TERMINAL STRUCTURE INCLUDING PLURALITY OF REACTIVE SILICON GROUPS, METHOD FOR MANUFACTURING SAME, AND USE FOR SAME | Kaneka Corporation (JP) | 2015-04-08 | — | — | EP | disclosed |
| WO-2015026370-A1 | CROSS-LINKED CO-POLYMERS FOR MAKING OPTOELECTRONIC DEVICES | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2015-02-26 | — | — | WO | disclosed |
| US-8940824-B2 | Heat-stabilized acrylate elastomer composition and process for its production | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2015-01-27 | — | — | US | disclosed |
| CN-101738863-B | Photosensitive resin composition and display | SUMITOMO CHEMICAL CO | 2015-01-07 | — | — | CN | disclosed |
| CN-104262933-A | Curable composition | KANEKA CORP | 2015-01-07 | — | — | CN | disclosed |
| US-20150004544-A1 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-8921460-B2 | Heat-stabilized acrylate elastomer composition and process for its production | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2014-12-30 | — | — | US | disclosed |
| US-20140363766-A9 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8901248-B2 | Medical devices having improved performance | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2014-12-02 | — | — | US | disclosed |
| US-20140342288-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8889336-B2 | Radiation-sensitive resin composition and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8815493-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8791180-B2 | Process for production of a heat-stabilized acrylate polymer | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-07-29 | — | — | US | disclosed |
| US-8779044-B2 | Heat-stabilized acrylate elastomer composition and process for its production | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-07-15 | — | — | US | disclosed |
| US-20140154625-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2014-06-05 | — | — | US | disclosed |
| US-20140155552-A1 | HEAT AGING RESISTANT ETHYLENE VINYL ACETATE COPOLYMER COMPOSITION AND PROCESS FOR ITS PRODUCTION | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-06-05 | — | — | US | disclosed |
| US-8721945-B2 | Actinically curable silicone hydrogel copolymers and uses thereof | NOVARTIS AG (CH) | 2014-05-13 | — | — | US | disclosed |
| US-8664317-B2 | Process for production of a heat-stabilized acrylate polymer | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-03-04 | — | — | US | disclosed |
| US-8633273-B2 | Process for production of a heat-stabilized acrylate polymer | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-01-21 | — | — | US | disclosed |
| US-8609745-B2 | Production of ophthalmic devices based on photo-induced step growth polymerization | NOVARTIS AG (CH) | 2013-12-17 | — | — | US | disclosed |
| US-20130313731-A1 | ACTINICALLY CURABLE SILICONE HYDROGEL COPOLYMERS AND USES THEREOF | ALCON INC. (CH) | 2013-11-28 | — | — | US | disclosed |
| US-20130295506-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20130295505-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORP (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20130260316-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| EP-2580285-B1 | PROCESS FOR PREPARATION OF A HEAT-STABILISED POLYAMIDE-FILLED ACRYLATE POLYMER | DU PONT (US) | 2013-09-11 | — | — | EP | disclosed |
| US-20130230803-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-09-05 | — | — | US | disclosed |
| US-20130230804-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2013-09-05 | — | — | US | disclosed |
| US-8524800-B2 | Actinically curable silicone hydrogel copolymers and uses thereof | NOVARTIS AG (CH) | 2013-09-03 | — | — | US | disclosed |
| US-20130224661-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130129793-A1 | MEDICAL DEVICES HAVING IMPROVED PERFORMANCE | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2013-05-23 | — | — | US | disclosed |
| US-20130106007-A1 | PRODUCTION OF OPHTHALMIC DEVICES BASED ON PHOTO-INDUCED STEP GROWTH POLYMERIZATION | NOVARTIS AG (CH) | 2013-05-02 | — | — | US | disclosed |
| US-8357771-B2 | Production of ophthalmic devices based on photo-induced step growth polymerization | NOVARTIS AG (CH) | 2013-01-22 | — | — | US | disclosed |
| US-20120328813-A1 | HEAT-STABILIZED ACRYLATE ELASTOMER COMPOSITION AND PROCESS FOR ITS PRODUCTION | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-12-27 | — | — | US | disclosed |
| US-20120329914-A1 | HEAT-STABILIZED ACRYLATE ELASTOMER COMPOSITION AND PROCESS FOR ITS PRODUCTION | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-12-27 | — | — | US | disclosed |
| US-20120329926-A1 | PROCESS FOR PRODUCTION OF A HEAT-STABILIZED ACRYLATE POLYMER | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-12-27 | — | — | US | disclosed |
| US-20120329927-A1 | HEAT-STABILIZED ACRYLATE ELASTOMER COMPOSITION AND PROCESS FOR ITS PRODUCTION | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-12-27 | — | — | US | disclosed |
| US-20120329928-A1 | PROCESS FOR PRODUCTION OF A HEAT-STABILIZED ACRYLATE POLYMER | E I DU PONT DE NEMOURS AND COMPANY (DE) | 2012-12-27 | — | — | US | disclosed |
| US-20120329925-A1 | HEAT-STABILIZED ACRYLATE ELASTOMER COMPOSITION AND PROCESS FOR ITS PRODUCTION | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-12-27 | — | — | US | disclosed |
| US-20120328812-A1 | PROCESS FOR PRODUCTION OF A HEAT-STABILIZED ACRYLATE POLYMER | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-12-27 | — | — | US | disclosed |
| US-8338541-B2 | Medical devices having improved performance | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2012-12-25 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120282553-A1 | IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| US-20120277342-A1 | METHACRYLATE-BASED BULKY SIDE-CHAIN SILOXANE CROSS LINKERS FOR OPTICAL MEDICAL DEVICES | MCGEE JOSEPH A (US) | 2012-11-01 | — | — | US | disclosed |
| US-8298746-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-30 | — | — | US | disclosed |
| EP-2092376-B1 | PRODUCTION OF OPHTHALMIC DEVICES BASED ON PHOTO-INDUCED STEP GROWTH POLYMERIZATION | NOVARTIS AG (CH) | 2012-10-17 | — | — | EP | disclosed |
| EP-2503392-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2012-09-26 | — | — | EP | disclosed |
| CN-102662201-A | Production of ophthalmic devices based on photo-induced step growth polymerization | NOVARTIS AG | 2012-09-12 | — | — | CN | disclosed |
| US-20120225385-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-09-06 | — | — | US | disclosed |
| US-8246168-B2 | Methacrylate-based bulky side-chain siloxane cross linkers for optical medical devices | BAUSCH & LOMB INCORPORATED (US) | 2012-08-21 | — | — | US | disclosed |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-12 | — | — | US | disclosed |
| CN-101558329-B | Production of ophthalmic devices based on photo-induced step-growth polymerization | NOVARTIS AG | 2012-07-04 | — | — | CN | disclosed |
| US-20120164579-A1 | SALT, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120156620-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120122032-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-17 | — | — | US | disclosed |
| US-20120122034-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-17 | — | — | US | disclosed |
| US-20120115082-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-10 | — | — | US | disclosed |
| US-8173350-B2 | Oxime compound and resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20120100483-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120100482-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-12 | — | — | US | disclosed |
| US-20120070783-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120070778-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120052443-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120052440-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120028188-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-02 | — | — | US | disclosed |
| US-8062830-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-22 | — | — | US | disclosed |
| US-8057983-B2 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-15 | — | — | US | disclosed |
| US-20110269869-A1 | PRODUCTION OF OPHTHALMIC DEVICES BASED ON PHOTO-INDUCED STEP GROWTH POLYMERIZATION | ALCON INC. (CH) | 2011-11-03 | — | — | US | disclosed |
| US-8017211-B2 | Composition, cured product and article | MITSUBISHI CHEMICAL CORPORATION (JP) | 2011-09-13 | — | — | US | disclosed |
| US-8003296-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-23 | — | — | US | disclosed |
| US-8003710-B2 | Production of ophthalmic devices based on photo-induced step growth polymerization | NOVARTIS AG (CH) | 2011-08-23 | — | — | US | disclosed |
| US-20110144276-A1 | MEDICAL DEVICES HAVING IMPROVED PERFORMANCE | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2011-06-16 | — | — | US | disclosed |
| US-7939579-B1 | Hydrogels and methods of manufacture | CONTAMAC LIMITED (GB) | 2011-05-10 | — | — | US | disclosed |
| US-7914807-B2 | Medical devices having improved performance | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2011-03-29 | — | — | US | disclosed |
| US-20110053082-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20110053086-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY,LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| EP-1323742-B1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORP (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7794914-B2 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-09-14 | — | — | US | disclosed |
| US-20100129587-A1 | COMPOSITION, CURED PRODUCT AND ARTICLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-05-27 | — | — | US | disclosed |
| US-20100118261-A1 | METHACRYLATE-BASED BULKY SIDE-CHAIN SILOXANE CROSS LINKERS FOR OPTICAL MEDICAL DEVICES | VRX HOLDCO LLC | 2010-05-13 | — | — | US | disclosed |
| CN-101681103-A | Photosensitive composition, method, cured product and liquid crystal display device | MITSUBISHI CHEM CORP | 2010-03-24 | — | — | CN | disclosed |
| US-20100062365-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100047712-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-02-25 | — | — | US | disclosed |
| US-20100021847-A1 | Oxime Compound and Resist Composition Containing the Same | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20100010129-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2134379-A2 | MEDICAL DEVICES HAVING IMPROVED PERFORMANCE | Boston Scientific Scimed, Inc. (US) | 2009-12-23 | — | — | EP | disclosed |
| US-20090269695-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-10-29 | — | — | US | disclosed |
| US-7608390-B2 | Photoresists; for immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-10-27 | — | — | US | disclosed |
| US-20090263742-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-10-22 | — | — | US | disclosed |
| CN-101558329-A | Production of ophthalmic devices based on photo-induced step-growth polymerization | NOVARTIS AG (CH) | 2009-10-14 | — | — | CN | disclosed |
| EP-2092376-A1 | PRODUCTION OF OPHTHALMIC DEVICES BASED ON PHOTO-INDUCED STEP GROWTH POLYMERIZATION | Novartis Ag (CH) | 2009-08-26 | — | — | EP | disclosed |
| EP-2091979-A2 | ACTINICALLY CURABLE SILICONE HYDROGEL COPOLYMERS AND USES THEREOF | Novartis AG (CH) | 2009-08-26 | — | — | EP | disclosed |
| US-7575850-B2 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-18 | — | — | US | disclosed |
| US-7566522-B2 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-07-28 | — | — | US | disclosed |
| CN-101432660-A | Curable composition, cured product, color filter, and liquid crystal display device | MITSUBISHI CHEM CORP (JP) | 2009-05-13 | — | — | CN | disclosed |
| US-7495037-B2 | Dental coating materials | IVOCLAR VIVADENT AG (LI) | 2009-02-24 | — | — | US | disclosed |
| WO-2008109098-A2 | MEDICAL DEVICES HAVING IMPROVED PERFORMANCE | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2008-09-12 | — | — | WO | disclosed |
| US-20080220041-A1 | implantable or insertable medical equipment comprising sulfonated and fluorinated block polymers, in the form of a layer that covers substrates, having the ability to serve as a drug delivery reservoirs | BOSTON SCIENTIFIC SCIMED, INC. | 2008-09-11 | — | — | US | disclosed |
| EP-1236068-B1 | CONTACT LENS | NOVARTIS AG (CH) | 2008-08-27 | — | — | EP | disclosed |
| US-20080193874-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-08-14 | — | — | US | disclosed |
| US-7399801-B2 | Curable composition | KANEKA CORPORATION (JP) | 2008-07-15 | — | — | US | disclosed |
| US-20080166660-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-07-10 | — | — | US | disclosed |
| WO-2008076729-A1 | PRODUCTION OF OPHTHALMIC DEVICES BASED ON PHOTO-INDUCED STEP GROWTH POLYMERIZATION | NOVARTIS AG (CH) | 2008-06-26 | — | — | WO | disclosed |
| WO-2008076736-A2 | ACTINICALLY CURABLE SILICONE HYDROGEL COPOLYMERS AND USES THEREOF | NOVARTIS AG (CH) | 2008-06-26 | — | — | WO | disclosed |
| US-20080143958-A1 | Production of ophthalmic devices based on photo-induced step growth polymerization | ALCON INC. (CH) | 2008-06-19 | — | — | US | disclosed |
| US-20080143003-A1 | Actinically curable silicone hydrogel copolymers and uses thereof | ALCON INC. (CH) | 2008-06-19 | — | — | US | disclosed |
| EP-1927882-A2 | Contact lens | Novartis AG (CH) | 2008-06-04 | — | — | EP | disclosed |
| US-7344731-B2 | Rigid gas permeable lens material | BAUSCH & LOMB INCORPORATED (US) | 2008-03-18 | — | — | US | disclosed |
| EP-1889098-A1 | RIGID GAS PERMEABLE LENS MATERIAL | BAUSCH & LOMB INCORPORATED (US) | 2008-02-20 | — | — | EP | disclosed |
| US-20080032228-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-07 | — | — | US | disclosed |
| EP-1403291-B1 | PROCESS FOR PRODUCING POLYMER HAVING CROSSLINKABLE SILYL GROUP AND CURABLE COMPOSITION | KANEKA CORP (JP) | 2007-08-29 | — | — | EP | disclosed |
| US-7211625-B2 | Thermoplastic resin composition and elastomer composition | KANEKA CORPORATION (JP) | 2007-05-01 | — | — | US | disclosed |
| US-7201481-B2 | Interpolymerization product of a (a) hydrophilic monomer with (b) a tris(siloxy)silyl group- containing monomer, (c) a wide variety of hydrophobic monomers (both aliphatic and aromatic) and usually a (d) polyfluorinated monomer | NOVARTIS AG (CH) | 2007-04-10 | — | — | US | disclosed |
| EP-1236068-A4 | CONTACT LENS | NOVARTIS AG (CH) | 2007-03-28 | — | — | EP | disclosed |
| WO-2006132844-A1 | RIGID GAS PERMEABLE LENS MATERIAL | BAUSCH & LOMB INCORPORATED (US) | 2006-12-14 | — | — | WO | disclosed |
| US-20060276605-A1 | Rigid gas permeable lens material | BAUSCH & LOMB INCORPORATED | 2006-12-07 | — | — | US | disclosed |
| US-7094833-B2 | Block copolymer | KANEKA CORPORATION | 2006-08-22 | — | — | US | disclosed |
| US-7081503-B2 | Process producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition | KANEKA CORPORATION (JP) | 2006-07-25 | — | — | US | disclosed |
| EP-0950923-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND FLEXOGRAPHIC RESIN PLATE | TOKYO OHKA KOGYO CO LTD (JP) | 2006-04-19 | — | — | EP | disclosed |
| US-7009004-B2 | Process for producing vinyl polymer having alkenyl group at end vinyl polymer and curable composition | KANEKA CORPORATION (JP) | 2006-03-07 | — | — | US | disclosed |
| US-20060032045-A1 | Method for the production of devices for storing electric power based on rechargeable lithium polymer cells | GAIA AKKUMULATORENWERKE GMBH (DE) | 2006-02-16 | — | — | US | disclosed |
| US-6992138-B2 | Polyurethane polymer | KANEKA CORPORATION (JP) | 2006-01-31 | — | — | US | disclosed |
| US-20060012751-A1 | Contact lens | ALCON INC. (CH) | 2006-01-19 | — | — | US | disclosed |
| US-20060004171-A1 | Process for producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition | TSUJI RYOTARO | 2006-01-05 | — | — | US | disclosed |
| US-20050165129-A1 | Dental coating materials | IVOCLAR VIVADENT AG (LI) | 2005-07-28 | — | — | US | disclosed |
| US-6914110-B2 | Process for producing polymer having crosslinkable silyl group and curable composition | KANEKA CORPORATION (JP) | 2005-07-05 | — | — | US | disclosed |
| US-20050004318-A1 | Curable composition | OHSHIRO NOBUAKI (JP) | 2005-01-06 | — | — | US | disclosed |
| US-20040249026-A1 | Curable composition | KANEKA CORPORATION (JP) | 2004-12-09 | — | — | US | disclosed |
| US-6828078-B2 | Photoresist for use in optoelectronic and display fields; porosity; optical fibers | JSR CORPORATION (JP) | 2004-12-07 | — | — | US | disclosed |
| US-20040236020-A1 | Block copolymer | KANEKA CORPORATION (JP) | 2004-11-25 | — | — | US | disclosed |
| US-20040220364-A1 | Process for producing polymer having crosslinkable silyl group and curable composition | KANEKA CORPORATION (JP) | 2004-11-04 | — | — | US | disclosed |
| EP-1462496-A2 | Coating composition and method for application thereof | KANSAI PAINT CO., LTD. (JP) | 2004-09-29 | — | — | EP | disclosed |
| US-6787289-B2 | OPTICS | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| US-20040171765-A1 | Polyurethane polymer | KANEKA CORPORATION (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1452550-A1 | CURABLE COMPOSITION | KANEKA CORPORATION (JP) | 2004-09-01 | — | — | EP | disclosed |
| EP-1447422-A1 | CURABLE COMPOSITION | KANEKA CORPORATION (JP) | 2004-08-18 | — | — | EP | disclosed |
| US-20040106732-A1 | Thermoplastic resin composition and elastomer composition | KANEKA CORPORATION (JP) | 2004-06-03 | — | — | US | disclosed |
| US-20040097678-A1 | Process for producing vinyl polymer having alkenyl group at end vinyl polymer and curable composition | KANEKA CORPORATION (JP) | 2004-05-20 | — | — | US | disclosed |
| EP-1411070-A1 | BLOCK COPOLYMER | KANEKA CORPORATION (JP) | 2004-04-21 | — | — | EP | disclosed |
| EP-1403291-A1 | PROCESS FOR PRODUCING POLYMER HAVING CROSSLINKABLE SILYL GROUP AND CURABLE COMPOSITION | KANEKA CORPORATION (JP) | 2004-03-31 | — | — | EP | disclosed |
| EP-1375531-A1 | PROCESS FOR PRODUCING VINYL POLYMER HAVING ALKENYL GROUP AT END, VINYL POLYMER, AND CURABLE COMPOSITION | KANEKA CORPORATION (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-6649722-B2 | Interpolymerization product of a (a) hydrophilic monomer with (b) a tris(siloxy)silyl group- containing monomer, (c) a wide variety of hydrophobic monomers (both aliphatic and aromatic) and usually a (d) polyfluorinated monomer | NOVARTIS AG (CH) | 2003-11-18 | — | — | US | disclosed |
| US-6613855-B1 | Thin insulating films excellent in heat resistance, solvent resistance, low water absorption, insulating property, low dielectric constant, | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-02 | — | — | US | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| EP-0849283-B1 | Non-aqueous polymer dispersion and curable composition | KANSAI PAINT CO LTD (JP) | 2003-06-18 | — | — | EP | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1236068-A1 | CONTACT LENS | Novartis AG (CH) | 2002-09-04 | — | — | EP | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| US-20020107337-A1 | Contact lens | ALCON INC. (CH) | 2002-08-08 | — | — | US | disclosed |
| US-6319557-B1 | FORMING MULTILAYER OVERCOATING, COLORING, THERMOSETTING RESIN FILMS, EPOXY ACRYLIC RESINS AND CATALYST | KANSAI PAINT CO., LTD. (JP) | 2001-11-20 | — | — | US | disclosed |
| US-20010033981-A1 | Photosensitive resin composition and resin plate for flexography | TOKYO OHKA KOGYO CO., LTD. | 2001-10-25 | — | — | US | disclosed |
| US-6291133-B1 | POLYURETHANES FOR LIGHT SENSITIVE ELEMENTS | TOKYO OHKA KOGYO CO. LTD. (JP) | 2001-09-18 | — | — | US | disclosed |
| US-6262147-B1 | AS TOP COATS TO AUTOMOBILES | KANSAI PAINT CO., LTD. (JP) | 2001-07-17 | — | — | US | disclosed |
| WO-2001042846-A1 | CONTACT LENS | WESLEY JESSEN CORPORATION (US) | 2001-06-14 | — | — | WO | disclosed |
| US-6015848-A | CURABLE MIXTURE OF ALICYCLIC EPOXY COMPOUND, EPOXY GROUP-CONTAINING ACRYLIC RESIN, CATIONIC POLYMERIZATION CATALYST, AND FLUOROPOLYMER | KANSAI PAINT CO., LTD. (JP) | 2000-01-18 | — | — | US | disclosed |
| EP-0950923-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND FLEXOGRAPHIC RESIN PLATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-10-20 | — | — | EP | disclosed |
| US-5929158-A | FLUOROACRYLIC POLYMER WITH A DISPERSANT STABILIZER OF HYDROXY-CONTAINING RESINS AND CURING AGENT; PROTECTIVE COATINGS; WATER- AND WEATHERPROOFING; OIL REPELLANCY; ANTISOILANTS; AUTOMOBILE TOPCOATS | KANSAI PAINT COMPANY, LIMITED (JP) | 1999-07-27 | — | — | US | disclosed |
| EP-0665252-B1 | Two-pack aqueous coating composition | KANSAI PAINT CO LTD (JP) | 1998-12-16 | — | — | EP | disclosed |
| EP-0849283-A2 | Non-aqueous polymer dispersion and curable composition | KANSAI PAINT CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0846739-A2 | Coating composition and method for application thereof | KANSAI PAINT CO., LTD. (JP) | 1998-06-10 | — | — | EP | disclosed |
| US-5534605-A | Hydrophilic oxygen permeable polymers | BAUSCH & LOMB INCORPORATED (US) | 1996-07-09 | — | — | US | disclosed |
| US-5519089-A | ALKOXYSILANE CONTAINING ACRYLIC COPOLYMER AND POLYISOCYANATE | KANSAI PAINT CO., LTD. (JP) | 1996-05-21 | — | — | US | disclosed |
| EP-0378181-B1 | Electrostatic latent image developer | KONISHIROKU PHOTO IND (JP) | 1996-05-08 | — | — | EP | disclosed |
| EP-0421435-B1 | Ultrathin membrane of polymethacrylate or polycrotonate and device provided with ultrathin membrane | NIPPON OILS & FATS CO LTD (JP) | 1996-01-10 | — | — | EP | disclosed |
| EP-0665252-A2 | Two-pack aqueous coating composition | KANSAI PAINT CO., LTD. (JP) | 1995-08-02 | — | — | EP | disclosed |
| US-5357013-A | (meth) acrylated polysiloxanes copolymerized with vinyl containing oxazolinone wetting agents | BAUSCH & LOMB INCORPORATED (US) | 1994-10-18 | — | — | US | disclosed |
| US-5330874-A | Dry carrier coating and processes | XEROX CORPORATION (US) | 1994-07-19 | — | — | US | disclosed |
| US-5209847-A | ULTRATHIN MEMBRANE OF POLYMETHACRYLATE OR POLYCROTONATE AND DEVICE PROVIDED WITH ULTRATHIN MEMBRANE | NIPPON OIL AND FATS CO., LTD. (JP) | 1993-05-11 | — | — | US | disclosed |
| EP-0328340-B1 | HYDROPHILIC OXYGEN PERMEABLE POLYMERS | BAUSCH & LOMB INCORPORATED (US) | 1993-03-31 | — | — | EP | disclosed |
| US-5093220-A | Toner resin crosslinked with divalent metal; fine inorganic particles surface-treated with ionic silicone | KONICA CORPORATION (JP) | 1992-03-03 | — | — | US | disclosed |
| EP-0421435-A2 | Ultrathin membrane of polymethacrylate or polycrotonate and device provided with ultrathin membrane | NIPPON OIL AND FATS COMPANY, LIMITED (JP) | 1991-04-10 | — | — | EP | disclosed |
| US-4977229-A | ACRYLATED SILOXANE; CONTACT LENSES | THE UNIVERSITY OF SOUTHERN MISSISSIPPI (US) | 1990-12-11 | — | — | US | disclosed |
| EP-0378181-A2 | Electrostatic latent image developer | KONICA CORPORATION (JP) | 1990-07-18 | — | — | EP | disclosed |
| US-4923962-A | SMALL BIREFRINGENCE | IDEMITSU KOSAN CO., LTD. (JP) | 1990-05-08 | — | — | US | disclosed |
| US-4910277-A | Blend of polysiloxane and an interior wetting agent | BAUSCH & LOMB INCORPORATED | 1990-03-20 | — | — | US | disclosed |
| US-4882258-A | Toner for development of electrostatic image and electrostatic latent image developer | KONICA CORPORATION (JP) | 1989-11-21 | — | — | US | disclosed |
| EP-0338656-A2 | Polymeric silicone-based materials with high oxygen permeability | BAUSCH & LOMB INCORPORATED (US) | 1989-10-25 | — | — | EP | disclosed |
| EP-0328340-A2 | Hydrophilic oxygen permeable polymers | BAUSCH & LOMB INCORPORATED (US) | 1989-08-16 | — | — | EP | disclosed |
| US-4812337-A | METALLIC PIGMENT BASE COAT, CLEAR TOP COAT | KANSAI PAINT COMPANY, LIMITED (JP) | 1989-03-14 | — | — | US | disclosed |
| US-4810764-A | CONTACT LENSES | BAUSCH & LOMB INCORPORATED (US) | 1989-03-07 | — | — | US | disclosed |
| US-4732941-A | POLYMER ADDED AS STABILIZER | KANSAI PAINT COMPANY, LIMITED (JP) | 1988-03-22 | — | — | US | disclosed |
| US-4614700-A | FLUOROACRYLATES AND METHACRYLATES, VINYLFLUORO POLYMERS FOR CARRIER COATINGS | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1986-09-30 | — | — | US | disclosed |
| US-4547543-A | N-METHYL-3-METHYLENE-2-PYRROLIDONE-ACRYLATE, METHACRYLATE OR STYRENE CROSSLINKED COPOLYMER | TOYO CONTACT LENS CO., LTD. (JP) | 1985-10-15 | — | — | US | disclosed |
| US-4495345-A | Optical element and optical polycarbonate resin composition for the preparation thereof | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1985-01-22 | — | — | US | disclosed |
| EP-0089801-A1 | Optical element and optical resin composition for the preparation thereof | KONICA CORPORATION (JP) | 1983-09-28 | — | — | EP | disclosed |
| JP-S5483038-A | ADHESIVE COMPOSITION WITH LOW REFRACTIVE INDEX | OKI ELECTRIC IND CO LTD | 1979-07-02 | — | — | JP | disclosed |
| US-4148841-A | IRON, COPPER AND ANTIMONU COMPOUNDS | HOOKER CHEMICALS & PLASTICS CORP. (US) | 1979-04-10 | — | — | US | disclosed |
| US-4046577-A | PHOTOREACTIVE COMPOSITIONS COMPRISING POLYMERS CONTAINING ALKOXYAROMATIC GLYOXY GROUPS | THE RICHARDSON COMPANY (US) | 1977-09-06 | — | — | US | disclosed |
| US-3983185-A | Halogen containing polyester resins having improved smoke-resistance | HOOKER CHEMICALS & PLASTICS CORPORATION (US) | 1976-09-28 | — | — | US | disclosed |
| US-3983185-A | Halogen containing polyester resins having improved smoke-resistance | HOOKER CHEMICALS & PLASTICS CORPORATION (US) | 1976-09-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (13 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120052440-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | C1S, C1R, CLIC1 | ALDH1A1 3659/4885TSHR 791/4885THRB 1977/4885 |
| US-20150323866-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND | RER1, RPA1, RFT1 | ALDH1A1 1025/4885TSHR 2997/4885THRB 4007/4885 |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SULT1A1, SULT1E1, C1S | ALDH1A1 135/4885TSHR 3515/4885THRB 4058/4885 |
| US-20110269869-A1 | PRODUCTION OF OPHTHALMIC DEVICES BASED ON PHOTO-INDUCED STEP GROWTH POLYMERIZATION | CRYAA, CRYZ, CRYAB | ALDH1A1 2409/4885TSHR 3392/4885THRB 4033/4885 |
| US-20050165129-A1 | Dental coating materials | PHOSPHO1, SPTAN1, ITGA1 | ALDH1A1 2568/4885TSHR 4370/4885THRB 3247/4885 |
| US-20110053086-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | OR10J3, C1R, C9 | ALDH1A1 2546/4885TSHR 2675/4885THRB 3102/4885 |
| US-20120225385-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | CLIC1, C1S, FGFR1 | ALDH1A1 1811/4885TSHR 2275/4885THRB 3331/4885 |
| US-20120122032-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | RER1, RCOR1, PNISR | ALDH1A1 2944/4885TSHR 516/4885THRB 2125/4885 |
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | AFF1, FGFR1, FRG1 | ALDH1A1 2566/4885TSHR 834/4885THRB 3196/4885 |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | RER1, ASIC1, GAR1 | ALDH1A1 1136/4885TSHR 2027/4885THRB 3271/4885 |
| US-20120122034-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | C1R, RCOR3, SULT1E1 | ALDH1A1 1929/4885TSHR 1751/4885THRB 3803/4885 |
| US-20100021847-A1 | Oxime Compound and Resist Composition Containing the Same | CYC1, UQCRB, CBR1 | ALDH1A1 1280/4885TSHR 841/4885THRB 714/4885 |
| US-20120164579-A1 | SALT, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | RER1, SPIN1, SPIN2B | ALDH1A1 3242/4885TSHR 1106/4885THRB 2320/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.