Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL7794899 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL16280457 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL892681 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL48670 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL6352272 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL10840673 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL867188 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL7352096 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL21519584 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL22499771 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10457089-B2 | Method of marking a solid state material, and solid state materials marked according to such a method | MASTER DYNAMIC LIMITED (HK) | 2019-10-29 | — | — | US | claimed |
| EP-3131724-B1 | METHOD OF MARKING A SOLID STATE MATERIAL | MASTER DYNAMIC LTD (CN) | 2019-08-14 | — | — | EP | claimed |
| US-20190051939-A1 | POLY(LITHIUM ACRYLATE) AND OTHER MATERIALS FOR MEMBRANES AND OTHER APPLICATIONS | LIONANO INC. (US) | 2019-02-14 | — | — | US | claimed |
| CN-109096671-A | Lithium polyacrylate and other thin-film materials and other purposes | 浙江林奈新能源有限公司 | 2018-12-28 | — | — | CN | claimed |
| CN-108987801-A | A kind of film for electrochemical cell electrolyte | 浙江林奈新能源有限公司 | 2018-12-11 | — | — | CN | claimed |
| US-20170182838-A1 | METHOD OF MARKING A SOLID STATE MATERIAL, AND SOLID STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD | MASTER DYNAMIC LIMITED (HK) | 2017-06-29 | — | — | US | claimed |
| EP-3131724-A1 | METHOD OF MARKING A SOLID STATE MATERIAL, AND SOLID STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD | Master Dynamic Limited (CN) | 2017-02-22 | — | — | EP | claimed |
| WO-2015158290-A1 | METHOD OF MARKING A SOLID STATE MATERIAL, AND SOLID STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD | MASTER DYNAMIC LIMITED (CN) | 2015-10-22 | — | — | WO | claimed |
| EP-0199854-B1 | PROCESS FOR ULTRA-DRYING OF A GAS | EUROPEAN ATOMIC ENERGY COMMUNITY (EURATOM) (LU) | 1990-01-31 | — | — | EP | claimed |
| EP-0199854-A1 | Process for ultra-drying of a gas | EUROPEAN ATOMIC ENERGY COMMUNITY (EURATOM) (LU) | 1986-11-05 | — | — | EP | claimed |
| US-20240379559-A1 | GRAPHENE-ASSISTED LOW-RESISTANCE INTERCONNECT STRUCTURES AND METHODS OF FORMATION THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-11-14 | — | — | US | disclosed |
| US-12113021-B2 | Graphene-assisted low-resistance interconnect structures and methods of formation thereof | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-10-08 | — | — | US | disclosed |
| US-20230369225-A1 | GRAPHENE-ASSISTED LOW-RESISTANCE INTERCONNECT STRUCTURES AND METHODS OF FORMATION THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-11-16 | — | — | US | disclosed |
| US-11710700-B2 | Graphene-assisted low-resistance interconnect structures and methods of formation thereof | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-07-25 | — | — | US | disclosed |
| US-20220020694-A1 | Graphene-Assisted Low-Resistance Interconnect Structures and Methods of Formation Thereof | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2022-01-20 | — | — | US | disclosed |
| EP-1180031-A1 | NOSCAPINE DERIVATIVES AS ADJUVANT COMPOSITIONS AND METHODS OF USE THEREOF | Emory University (US) | 2002-02-20 | — | — | EP | disclosed |
| WO-2000064446-A1 | NOSCAPINE DERIVATIVES AS ADJUVANT COMPOSITIONS AND METHODS OF USE THEREOF | EMORY UNIVERSITY (US) | 2000-11-02 | — | — | WO | disclosed |
| WO-1999008528-A1 | NOSCAPINE DERIVATIVES, USEFUL AS ANTICANCER AGENTS | EMORY UNIVERSITY (US) | 1999-02-25 | — | — | WO | disclosed |
| EP-0199854-B1 | PROCESS FOR ULTRA-DRYING OF A GAS | EUROPEAN ATOMIC ENERGY COMMUNITY (EURATOM) (LU) | 1990-01-31 | — | — | EP | disclosed |
| EP-0199854-A1 | Process for ultra-drying of a gas | EUROPEAN ATOMIC ENERGY COMMUNITY (EURATOM) (LU) | 1986-11-05 | — | — | EP | disclosed |