Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Tetrabuthylammonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 3/20 | 0.57 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | CES2 | O00748 | 4/20 | 0.44 |
| ▸ | CES1 | P23141 | 4/20 | 0.44 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.42 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrabuthylammonium SCHEMBL17768455 | 0.92 | SLC22A1 (0.48) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL9505231 | 0.91 | SLC22A1 (0.57) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL16093912 | 0.91 | SLC22A1 (0.57) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL9505251 | 0.91 | SLC22A1 (0.57) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL109269 | 0.90 | SLC22A1 (0.63) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL9315609 | 0.90 | SLC22A1 (0.63) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL106153 | 0.90 | SLC22A1 (0.63) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL16343940 | 0.90 | SLC22A1 (0.63) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL3488441 | 0.88 | SLC22A1 (0.60) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL18109154 | 0.88 | SLC22A1 (0.60) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 273 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115785425-A | Carbon dioxide-based polycarbonate-polyether block polyol and preparation method thereof | 佛山市中天融新材料科技有限公司 | 2023-03-14 | — | — | CN | claimed |
| CN-115073458-A | Preparation method of avibactam sodium | 山东致泰医药技术有限公司 | 2022-09-20 | — | — | CN | claimed |
| EP-2011798-B1 | Preparation of platinum (II) complexes | PLATCO TECHNOLOGIES PROPRIETARY LTD (ZA) | 2011-06-29 | — | — | EP | claimed |
| US-7956208-B2 | Preparation of platinum (II) complexes | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2011-06-07 | — | — | US | claimed |
| US-7888523-B2 | Preparation of platinum(II) complexes | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2011-02-15 | — | — | US | claimed |
| US-20090299085-A1 | PREPARATION OF PLATINUM(II) COMPLEXES | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2009-12-03 | — | — | US | claimed |
| US-20090281319-A1 | PREPARATION OF PLATINUM (II) COMPLEXES | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2009-11-12 | — | — | US | claimed |
| US-7589225-B2 | Preparation of platinum(II) complexes | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2009-09-15 | — | — | US | claimed |
| EP-1789427-B1 | PREPARATION OF PLATINUM(II) COMPLEXES | PLATCO TECHNOLOGIES PROPRIETAR (ZA) | 2009-05-20 | — | — | EP | claimed |
| EP-2011798-A1 | Preparation of platinum (II) complexes | Platco Technologies (Proprietary) Limited (ZA) | 2009-01-07 | — | — | EP | claimed |
| EP-1979369-A1 | PREPARATION OF PLATINUM (LL) COMPLEXES | Platco Technologies (Proprietary) Limited (ZA) | 2008-10-15 | — | — | EP | claimed |
| US-20080064895-A1 | Preparation of Platinum(II) Complexes | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2008-03-13 | — | — | US | claimed |
| WO-2007085957-A1 | PREPARATION OF PLATINUM (LL) COMPLEXES | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2007-08-02 | — | — | WO | claimed |
| EP-1789427-A1 | PREPARATION OF PLATINUM(II) COMPLEXES | Platco Technologies (Proprietary) Limited (ZA) | 2007-05-30 | — | — | EP | claimed |
| WO-2006024897-A1 | PREPARATION OF PLATINUM(II) COMPLEXES | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2006-03-09 | — | — | WO | claimed |
| EP-1142049-B1 | HYDROFLUORIC ACID SCAVENGER | DANIONICS AS (DK) | 2002-09-18 | — | — | EP | claimed |
| WO-2000042672-A9 | HYDROFLUORIC ACID SCAVENGER | DANIONICS AS (DK) | 2001-11-15 | — | — | WO | claimed |
| EP-1142049-A2 | HYDROFLUORIC ACID SCAVENGER | DANIONICS A/S (DK) | 2001-10-10 | — | — | EP | claimed |
| WO-2000042672-A2 | HYDROFLUORIC ACID SCAVENGER | DANIONICS A/S (DK) | 2000-07-20 | — | — | WO | claimed |
| US-12619149-B2 | DNQ-free chemically amplified resist composition | MERCK PATENT GMBH (DE) | 2026-05-05 | — | — | US | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4700067-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-29 | — | — | US | disclosed |
| US-12503552-B2 | Self-blowing isocyanate-free polyurethane foams | UNIVERSITE DE LIEGE (BE) | 2025-12-23 | — | — | US | disclosed |
| EP-4636010-A1 | IMPROVED COMPOSITIONS FOR SELF-BLOWING NON-ISOCYANATE POLYURETHANE FOAMS | Université de Liège (BE) | 2025-10-22 | — | — | EP | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| US-12332565-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| CN-114651212-B | Positive photosensitive material | 默克专利股份有限公司 | 2025-05-02 | — | — | CN | disclosed |
| CN-112526822-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2025-02-28 | — | — | CN | disclosed |
| US-20250028245-A1 | POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION | EMD PERFORMANCE MATERIALS CORP. | 2025-01-23 | — | — | US | disclosed |
| US-12174541-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-12-24 | — | — | US | disclosed |
| CN-112286000-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-111856882-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| EP-4263672-B1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | UNIV LIEGE (BE) | 2024-10-09 | — | — | EP | disclosed |
| US-20240319598-A1 | Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4435515-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-25 | — | — | EP | disclosed |
| EP-4433874-A1 | POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION | Merck Patent GmbH (DE) | 2024-09-25 | — | — | EP | disclosed |
| CN-112654928-B | Positive photosensitive material | 默克专利股份有限公司 | 2024-09-24 | — | — | CN | disclosed |
| EP-4430105-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2024-09-18 | — | — | EP | disclosed |
| CN-118620392-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-09-10 | — | — | CN | disclosed |
| US-12085857-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-10 | — | — | US | disclosed |
| EP-3770209-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-09-04 | — | — | EP | disclosed |
| CN-118284854-A | Positive ultra-thick photoresist composition | 默克专利股份有限公司 | 2024-07-02 | — | — | CN | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| US-12001138-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| EP-3680275-B1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-03-06 | — | — | EP | disclosed |
| EP-3796086-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-02-28 | — | — | EP | disclosed |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240043647-A1 | Self-blowing isocyanate-free polyurethane foams | Université de Liège (BE) | 2024-02-08 | — | — | US | disclosed |
| US-20230416487-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2023-12-28 | — | — | US | disclosed |
| EP-4263672-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2023-10-25 | — | — | EP | disclosed |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-4250008-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-27 | — | — | EP | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| EP-3994201-B1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | UNIV LIEGE (BE) | 2023-09-06 | — | — | EP | disclosed |
| CN-111208710-B | Iodine-containing thermosetting silicon-containing material, resist underlayer film forming composition for extreme ultraviolet lithography containing the same, and pattern forming method | 信越化学工业株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| EP-3686256-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2023-06-28 | — | — | EP | disclosed |
| WO-2023104362-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2023-06-15 | — | — | WO | disclosed |
| EP-4194481-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2023-06-14 | — | — | EP | disclosed |
| WO-2023088874-A1 | POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2023-05-25 | — | — | WO | disclosed |
| EP-4020081-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SHINETSU CHEMICAL CO (JP) | 2023-05-17 | — | — | EP | disclosed |
| US-20230112024-A1 | DNQ-FREE CHEMICALLY AMPLIFIED RESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2023-04-13 | — | — | US | disclosed |
| CN-108885396-B | Positive working photosensitive material | 默克专利有限公司 | 2023-03-24 | — | — | CN | disclosed |
| CN-115785425-A | Carbon dioxide-based polycarbonate-polyether block polyol and preparation method thereof | 佛山市中天融新材料科技有限公司 | 2023-03-14 | — | — | CN | disclosed |
| US-11592287-B2 | Method for measuring distance of diffusion of curing catalyst | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| US-11555697-B2 | — | — | 2023-01-17 | — | — | US | disclosed |
| US-11485824-B2 | Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-11-01 | — | — | US | disclosed |
| US-20220342308-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIALS | MERCK PATENT GMBH (DE) | 2022-10-27 | — | — | US | disclosed |
| US-11480879-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-25 | — | — | US | disclosed |
| EP-4058848-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | Merck Patent GmbH (DE) | 2022-09-21 | — | — | EP | disclosed |
| CN-115073458-A | Preparation method of avibactam sodium | 山东致泰医药技术有限公司 | 2022-09-20 | — | — | CN | disclosed |
| US-20220221793-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-11385544-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-12 | — | — | US | disclosed |
| EP-4020081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-06-29 | — | — | EP | disclosed |
| CN-114660896-A | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2022-06-24 | — | — | CN | disclosed |
| US-20220195117-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | UNIVERSITE DE LIEGE (BE) | 2022-06-23 | — | — | US | disclosed |
| WO-2022128822-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2022-06-23 | — | — | WO | disclosed |
| EP-4015563-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2022-06-22 | — | — | EP | disclosed |
| CN-114651212-A | Positive photosensitive material | 默克专利股份有限公司 | 2022-06-21 | — | — | CN | disclosed |
| EP-3994201-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2022-05-11 | — | — | EP | disclosed |
| CN-110344062-B | Etching solution for grid titanium-aluminum-titanium laminated metal film | 江阴江化微电子材料股份有限公司 | 2022-03-25 | — | — | CN | disclosed |
| US-20220019141-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | MERCK PATENT GMBH (DE) | 2022-01-20 | — | — | US | disclosed |
| EP-2862024-B1 | POSITIVE PHOTOSENSITIVE MATERIAL | MERCK PATENT GMBH (DE) | 2021-12-01 | — | — | EP | disclosed |
| WO-2021219509-A1 | DNQ-FREE CHEMICALLY AMPLIFIED RESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2021-11-04 | — | — | WO | disclosed |
| EP-3736632-B1 | METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST | SHINETSU CHEMICAL CO (JP) | 2021-09-22 | — | — | EP | disclosed |
| EP-3847506-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | Merck Patent GmbH (DE) | 2021-07-14 | — | — | EP | disclosed |
| EP-3657254-B1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2021-06-16 | — | — | EP | disclosed |
| US-10976662-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2021-04-13 | — | — | US | disclosed |
| CN-112654928-A | Positive photosensitive material | 默克专利股份有限公司 | 2021-04-13 | — | — | CN | disclosed |
| US-20210088908-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-25 | — | — | US | disclosed |
| EP-3796086-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-03-24 | — | — | EP | disclosed |
| US-20210026246-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-01-28 | — | — | US | disclosed |
| EP-3770209-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-01-27 | — | — | EP | disclosed |
| WO-2021004993-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2021-01-14 | — | — | WO | disclosed |
| EP-3760664-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2021-01-06 | — | — | EP | disclosed |
| EP-3736632-A1 | METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-11-11 | — | — | EP | disclosed |
| CN-111855581-A | Method for determining diffusion distance of hardening catalyst | 信越化学工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| US-20200341377-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-29 | — | — | US | disclosed |
| US-20200340806-A1 | METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-29 | — | — | US | disclosed |
| EP-3731017-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-10-28 | — | — | EP | disclosed |
| CN-109276569-B | Stable crystal form pharmaceutical composition and preparation method and application thereof | 四川海思科制药有限公司 | 2020-09-29 | — | — | CN | disclosed |
| EP-3484890-B1 | SELECTIVE PORPHYRIN-CATALYZED ELECTROCHEMICAL REDUCTION OF CO2 INTO CO, IN PARTICULAR IN WATER | CENTRE NAT RECH SCIENT (FR) | 2020-09-02 | — | — | EP | disclosed |
| EP-3686256-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-07-29 | — | — | EP | disclosed |
| US-20200233303-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-23 | — | — | US | disclosed |
| EP-3680275-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-07-15 | — | — | EP | disclosed |
| US-20200216670-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| EP-3657254-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-05-27 | — | — | EP | disclosed |
| US-20200159120-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-05-21 | — | — | US | disclosed |
| EP-3446180-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-04-01 | — | — | EP | disclosed |
| EP-2929397-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-03-18 | — | — | EP | disclosed |
| CN-104781731-B | Positive-working light-sensitive material | AZ电子材料卢森堡有限公司 | 2019-12-03 | — | — | CN | disclosed |
| CN-110344062-A | A kind of folded metal film etching solution of grid titanium aluminium titanium layer | 江阴江化微电子材料股份有限公司 | 2019-10-18 | — | — | CN | disclosed |
| US-20190224660-A1 | SELECTIVE PORPHYRIN-CATALYZED ELECTROCHEMICAL REDUCTION OF CO2 INTO CO, IN PARTICULAR IN WATER | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) (FR) | 2019-07-25 | — | — | US | disclosed |
| EP-3484890-A1 | SELECTIVE PORPHYRIN-CATALYZED ELECTROCHEMICAL REDUCTION OF CO2 INTO CO, IN PARTICULAR IN WATER | Centre National de la Recherche Scientifique (CNRS) (FR) | 2019-05-22 | — | — | EP | disclosed |
| US-10239792-B2 | Method of preparing ceramic powders | EESTOR, INC. (US) | 2019-03-26 | — | — | US | disclosed |
| EP-2897910-B1 | ELECTROCHEMICAL CO-PRODUCTION OF CHEMICALS UTILIZING A HALIDE SALT | AVANTIUM KNOWLEDGE CENTRE BV (NL) | 2019-01-02 | — | — | EP | disclosed |
| EP-2445844-B1 | FUSED QUARTZ HORIZONTAL FURNACE AND ASSEMBLY | EESTOR INC (US) | 2018-10-31 | — | — | EP | disclosed |
| EP-2426558-B1 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-10-24 | — | — | EP | disclosed |
| CN-104380198-B | Positive photosensitive material | AZ电子材料卢森堡有限公司 | 2018-09-21 | — | — | CN | disclosed |
| EP-2935654-B1 | METHOD FOR PRODUCTION OF OXALIC ACID AND OXALIC ACID REDUCTION PRODUCTS | AVANTIUM KNOWLEDGE CENTRE BV (NL) | 2018-02-28 | — | — | EP | disclosed |
| US-9902743-B2 | Copper complex for capturing carbon dioxide | BOARD OF SUPERVISORS OF LOUISISANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE | 2018-02-27 | — | — | US | disclosed |
| WO-2018011229-A1 | SELECTIVE PORPHYRIN-CATALYZED ELECTROCHEMICAL REDUCTION OF CO2 INTO CO, IN PARTICULAR IN WATER | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) (FR) | 2018-01-18 | — | — | WO | disclosed |
| EP-2500775-B1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHINETSU CHEMICAL CO (JP) | 2018-01-03 | — | — | EP | disclosed |
| US-20160257702-A1 | Copper Complex for Capturing Carbon Dioxide | BOARD OF SUPERVISORS OF LOUISISANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE | 2016-09-08 | — | — | US | disclosed |
| US-9267212-B2 | Method and system for production of oxalic acid and oxalic acid reduction products | LIQUID LIGHT, INC. (US) | 2016-02-23 | — | — | US | disclosed |
| US-20160023954-A1 | METHOD OF PREPARING CERAMIC POWDERS | EESTOR, INC. | 2016-01-28 | — | — | US | disclosed |
| EP-2935654-A1 | METHOD AND SYSTEM FOR PRODUCTION OF OXALIC ACID AND OXALIC ACID REDUCTION PRODUCTS | Liquid Light, Inc. (US) | 2015-10-28 | — | — | EP | disclosed |
| EP-2929397-A2 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2015-10-14 | — | — | EP | disclosed |
| EP-2897910-A2 | ELECTROCHEMICAL CO-PRODUCTION OF CHEMICALS UTILIZING A HALIDE SALT | Liquid Light, Inc. (US) | 2015-07-29 | — | — | EP | disclosed |
| CN-104781731-A | Positive working photosensitive material | AZ ELECTRONIC MATERIALS LUXEMBOURG SARL | 2015-07-15 | — | — | CN | disclosed |
| US-9080240-B2 | Electrochemical co-production of a glycol and an alkene employing recycled halide | LIQUID LIGHT, INC. (US) | 2015-07-14 | — | — | US | disclosed |
| WO-2015057559-A1 | COPPER COMPLEX FOR CAPTURING CARBON DIOXIDE | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 2015-04-23 | — | — | WO | disclosed |
| EP-2862024-A1 | POSITIVE PHOTOSENSITIVE MATERIAL | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2015-04-22 | — | — | EP | disclosed |
| US-9012126-B2 | Positive photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2015-04-21 | — | — | US | disclosed |
| CN-102603448-B | Method for performing metal catalytic coupling reaction by utilizing organic anion-cation pair | USTC UNIV SCIENCE TECH CN | 2015-03-04 | — | — | CN | disclosed |
| CN-104380198-A | Positive photosensitive material | AZ ELECTRONIC MATERIALS LUXEMBOURG SARL | 2015-02-25 | — | — | CN | disclosed |
| US-8951711-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| CN-102482136-B | Horizontal fused quartz furnace and assembly | EESTOR INC | 2014-11-26 | — | — | CN | disclosed |
| US-20140342289-A1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8853116-B2 | Method of preparing ceramic powders | EESTOR, INC. (US) | 2014-10-07 | — | — | US | disclosed |
| US-8852844-B2 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| WO-2014160529-A1 | METHOD AND SYSTEM FOR THE CAPTURE AND CONVERSION OF ANODICALLY PRODUCED HALOGEN TO ALCOHOLS | LIQUID LIGHT, INC. (US) | 2014-10-02 | — | — | WO | disclosed |
| US-8841062-B2 | Positive working photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-09-23 | — | — | US | disclosed |
| US-8835102-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-20140221684-A1 | Electrochemical Co-Production of Chemicals Utilizing a Halide Salt | LIQUID LIGHT, INC. (US) | 2014-08-07 | — | — | US | disclosed |
| US-20140206896-A1 | Method and System for Production of Oxalic Acid and Oxalic Acid Reduction Products | LIQUID LIGHT, INC. (US) | 2014-07-24 | — | — | US | disclosed |
| US-20140206895-A1 | Method and System for Production of Oxalic Acid and Oxalic Acid Reduction Products | LIQUID LIGHT, INC. (US) | 2014-07-24 | — | — | US | disclosed |
| US-20140206894-A1 | Method and System for Production of Oxalic Acid and Oxalic Acid Reduction Products | LIQUID LIGHT, INC. (US) | 2014-07-24 | — | — | US | disclosed |
| WO-2014100828-A1 | METHOD AND SYSTEM FOR PRODUCTION OF OXALIC ACID AND OXALIC ACID REDUCTION PRODUCTS | LIQUID LIGHT, INC. (US) | 2014-06-26 | — | — | WO | disclosed |
| EP-2172807-B1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-18 | — | — | EP | disclosed |
| WO-2014086846-A2 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2014-06-12 | — | — | WO | disclosed |
| US-20140154624-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-06-05 | — | — | US | disclosed |
| EP-2172808-B1 | Metal oxide-containing film-forming composition metal oxide-containing film-formed substrate, and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-04 | — | — | EP | disclosed |
| WO-2014046790-A1 | ELECTROCHEMICAL CO-PRODUCTION OF A GLYCOL AND AN ALKENE EMPLOYING RECYCLED HALIDE | LIQUID LIGHT, INC. (US) | 2014-03-27 | — | — | WO | disclosed |
| WO-2014046797-A2 | ELECTROCHEMICAL CO-PRODUCTION OF CHEMICALS UTILIZING A HALIDE SALT | LIQUID LIGHT, INC. (US) | 2014-03-27 | — | — | WO | disclosed |
| US-8652750-B2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| US-8652267-B2 | Coated-type silicon-containing film stripping process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| US-8618595-B2 | Applications of light-emitting nanoparticles | MERCK PATENT GMBH (DE) | 2013-12-31 | — | — | US | disclosed |
| WO-2013185989-A1 | POSITIVE PHOTOSENSITIVE MATERIAL | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2013-12-19 | — | — | WO | disclosed |
| US-20130337380-A1 | POSITIVE PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2013-12-19 | — | — | US | disclosed |
| EP-2196858-B1 | Coated-type silicon-containing film stripping process | SHINETSU CHEMICAL CO (JP) | 2013-12-04 | — | — | EP | disclosed |
| US-20130230435-A1 | Electrochemical Co-Production of a Glycol and an Alkene Employing Recycled Halide | LIQUID LIGHT, INC. (US) | 2013-09-05 | — | — | US | disclosed |
| US-8501386-B2 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-8496893-B2 | Method of forming a dielectric powder using a precipitated precursor powder | EESTOR, INC. (US) | 2013-07-30 | — | — | US | disclosed |
| US-20130137898-A1 | Electrochemical Co-Production of Chemicals Utilizing a Halide Salt | LIQUID LIGHT, INC. (US) | 2013-05-30 | — | — | US | disclosed |
| US-8444844-B1 | Electrochemical co-production of a glycol and an alkene employing recycled halide | LIQUID LIGHT, INC. (US) | 2013-05-21 | — | — | US | disclosed |
| US-20130116474-A1 | Electrochemical Co-Production of a Glycol and an Alkene Employing Recycled Halide | LIQUID LIGHT, INC. (US) | 2013-05-09 | — | — | US | disclosed |
| CN-101475493-B | Preparation method of organic anion-cation pair | USTC UNIV SCIENCE TECH CN | 2013-01-23 | — | — | CN | disclosed |
| US-8329376-B2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-11 | — | — | US | disclosed |
| EP-2274255-B1 | PROCESS FOR PREPARING ADVANCED CERAMIC POWDER USING ONIUM DICARBOXYLATES | SACHEM INC (US) | 2012-10-10 | — | — | EP | disclosed |
| US-20120238095-A1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-09-20 | — | — | US | disclosed |
| EP-2500775-A2 | Patterning process and composition for forming silicon-containing film usable therefor | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-09-19 | — | — | EP | disclosed |
| WO-2012115910-A2 | POWER SUPPLY AND POWER CONTROL CIRCUITRY | EESTOR, INC. (US) | 2012-08-30 | — | — | WO | disclosed |
| US-20120212987-A1 | POWER SUPPLY AND POWER CONTROL CIRCUITRY | EESTOR, INC. (US) | 2012-08-23 | — | — | US | disclosed |
| CN-102603448-A | Method for performing metal catalytic coupling reaction by utilizing organic anion-cation pair | USTC UNIV SCIENCE TECH CN | 2012-07-25 | — | — | CN | disclosed |
| CN-102532176-A | Ammonium oxalyldifluoro borate electrolyte and preparation method and purification method thereof | CHANGCHUN APPLIED CHEMISTRY | 2012-07-04 | — | — | CN | disclosed |
| CN-102482136-A | Horizontal fused quartz furnace and assembly | EESTOR INC | 2012-05-30 | — | — | CN | disclosed |
| EP-2445844-A2 | FUSED QUARTZ HORIZONTAL FURNACE AND ASSEMBLY | Eestor, Inc. (US) | 2012-05-02 | — | — | EP | disclosed |
| US-8163633-B2 | Light-emitting nanoparticles and method of making same | MERCK PATENT GMBH (DE) | 2012-04-24 | — | — | US | disclosed |
| EP-2426558-A1 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-03-07 | — | — | EP | disclosed |
| US-20120052685-A1 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM-FORMED SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-01 | — | — | US | disclosed |
| EP-2063319-B1 | Metal oxide-containing film-forming composition, multilayer resist and method of formation of pattern in a substrate | SHINETSU CHEMICAL CO (JP) | 2011-11-02 | — | — | EP | disclosed |
| US-8029974-B2 | Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-8026038-B2 | Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-27 | — | — | US | disclosed |
| US-20110171789-A1 | LIGHT-EMITTING NANOPARTICLES AND METHOD OF MAKING SAME | PINON TECHNOLOGIES, INC. | 2011-07-14 | — | — | US | disclosed |
| EP-2011798-B1 | Preparation of platinum (II) complexes | PLATCO TECHNOLOGIES PROPRIETARY LTD (ZA) | 2011-06-29 | — | — | EP | disclosed |
| US-7956208-B2 | Preparation of platinum (II) complexes | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2011-06-07 | — | — | US | disclosed |
| US-7888523-B2 | Preparation of platinum(II) complexes | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2011-02-15 | — | — | US | disclosed |
| US-7875417-B2 | Heat curable; mixture of hydrolytic condensation of a silicon compound using acid catalyst; second compound is hydrolytic condensation of a silicon compound in presence of basic catalyst; hydroxide or organic acid salt of Group 1a metal; organic acid; alcohol containing ether groups and solvent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-25 | — | — | US | disclosed |
| EP-2274255-A2 | PROCESS FOR PREPARING ADVANCED CERAMIC POWDER USING ONIUM DICARBOXYLATES | Sachem, Inc. (US) | 2011-01-19 | — | — | EP | disclosed |
| US-7867471-B2 | Process for preparing advanced ceramic powders using onium dicarboxylates | SACHEM, INC. (US) | 2011-01-11 | — | — | US | disclosed |
| US-20100331169-A1 | FUSED QUARTZ HORIZONTAL FURNACE AND ASSEMBLY | EESTOR, INC. (US) | 2010-12-30 | — | — | US | disclosed |
| WO-2010151786-A2 | FUSED QUARTZ HORIZONTAL FURNACE AND ASSEMBLY | EESTOR, INC. (US) | 2010-12-29 | — | — | WO | disclosed |
| US-7855043-B2 | Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-21 | — | — | US | disclosed |
| US-20100285947-A1 | Method of Preparing Ceramic Powders | EESTOR, INC. (US) | 2010-11-11 | — | — | US | disclosed |
| US-20100285316-A1 | Method of Preparing Ceramic Powders | EESTOR, INC. (US) | 2010-11-11 | — | — | US | disclosed |
| US-20100147334-A1 | Coated-type silicon-containing film stripping process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-17 | — | — | US | disclosed |
| EP-2196858-A1 | Coated-type silicon-containing film stripping process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-16 | — | — | EP | disclosed |
| US-7722953-B2 | Light-emitting nanoparticles comprising octanol as a passivating agent, and method of making same | Korgel, Brian A. (US) | 2010-05-25 | — | — | US | disclosed |
| US-20100086870-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20100086872-A1 | Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-2172808-A1 | Metal oxide-containing film-forming composition metal oxide-containing film-formed substrate, and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| EP-2172807-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-7670581-B2 | thermally decomposing organometallic material consisting of of silicon, germanium and tin in fluidic medium of alcohols, amines, and/or mercaptans | Korgel, Brian A. (US) | 2010-03-02 | — | — | US | disclosed |
| WO-2010011373-A2 | PROCESS FOR PREPARING ADVANCED CERAMIC POWDER USING ONIUM DICARBOXYLATES | SACHEM, INC. (US) | 2010-01-28 | — | — | WO | disclosed |
| US-20090299085-A1 | PREPARATION OF PLATINUM(II) COMPLEXES | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2009-12-03 | — | — | US | disclosed |
| US-20090281319-A1 | PREPARATION OF PLATINUM (II) COMPLEXES | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2009-11-12 | — | — | US | disclosed |
| US-20090250850-A1 | PROCESS FOR PREPARING ADVANCED CERAMIC POWDERS USING ONIUM DICARBOXYLATES | SACHEM, INC. | 2009-10-08 | — | — | US | disclosed |
| US-7589225-B2 | Preparation of platinum(II) complexes | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2009-09-15 | — | — | US | disclosed |
| CN-101475493-A | Preparation method of organic anion-cation pair and method for carrying out metal catalytic coupling reaction | USTC UNIV SCIENCE TECH CN (CN) | 2009-07-08 | — | — | CN | disclosed |
| US-20090136869-A1 | METAL OXIDE-CONTAINING FILM-FORMING COMPOSITION, METAL OXIDE-CONTAINING FILM, METAL OXIDE-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-28 | — | — | US | disclosed |
| EP-2063319-A1 | Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-05-27 | — | — | EP | disclosed |
| EP-1789427-B1 | PREPARATION OF PLATINUM(II) COMPLEXES | PLATCO TECHNOLOGIES PROPRIETAR (ZA) | 2009-05-20 | — | — | EP | disclosed |
| US-20090074649-A1 | thermally decomposing organometallic material consisting of of silicon, germanium and tin in fluidic medium of alcohols, amines, and/or mercaptans | MERCK PATENT GMBH (DE) | 2009-03-19 | — | — | US | disclosed |
| US-7501080-B2 | Electrically conductive polymer member, transfer roller, and image forming device | BRIDGESTONE CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| EP-1845132-B1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHINETSU CHEMICAL CO (JP) | 2009-01-21 | — | — | EP | disclosed |
| US-20090011372-A1 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, SILICON-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| EP-2011798-A1 | Preparation of platinum (II) complexes | Platco Technologies (Proprietary) Limited (ZA) | 2009-01-07 | — | — | EP | disclosed |
| EP-2011830-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-01-07 | — | — | EP | disclosed |
| EP-2011829-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-01-07 | — | — | EP | disclosed |
| EP-1867681-B1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHINETSU CHEMICAL CO (JP) | 2008-12-31 | — | — | EP | disclosed |
| US-20080274432-A1 | SILICONE-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, SILICON-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-06 | — | — | US | disclosed |
| EP-1979369-A1 | PREPARATION OF PLATINUM (LL) COMPLEXES | Platco Technologies (Proprietary) Limited (ZA) | 2008-10-15 | — | — | EP | disclosed |
| US-20080064895-A1 | Preparation of Platinum(II) Complexes | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2008-03-13 | — | — | US | disclosed |
| US-20080026322-A1 | Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |
| EP-1867681-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-12-19 | — | — | EP | disclosed |
| EP-1845132-A2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shinetsu Chemical Co., Ltd. (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-20070238300-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-10-11 | — | — | US | disclosed |
| WO-2007085957-A1 | PREPARATION OF PLATINUM (LL) COMPLEXES | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2007-08-02 | — | — | WO | disclosed |
| US-20070152193-A1 | Electrically conductive polymer member, transfer roller, and image forming device | BRIDGESTONE CORPORATION (JP) | 2007-07-05 | — | — | US | disclosed |
| US-20070135565-A1 | COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| EP-1789427-A1 | PREPARATION OF PLATINUM(II) COMPLEXES | Platco Technologies (Proprietary) Limited (ZA) | 2007-05-30 | — | — | EP | disclosed |
| US-7132473-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| WO-2006024897-A1 | PREPARATION OF PLATINUM(II) COMPLEXES | PLATCO TECHNOLOGIES (PROPRIETARY) LIMITED (ZA) | 2006-03-09 | — | — | WO | disclosed |
| US-20050266697-A1 | Light-emitting nanoparticles and method of making same | THE UNIVERSITY OF TEXAS SYSTEM, BOARD OF REGENTS | 2005-12-01 | — | — | US | disclosed |
| US-20050267345-A1 | Applications of light-emitting nanoparticles | THE UNIVERSITY OF TEXAS SYSTEM, BOARD OF REGENTS | 2005-12-01 | — | — | US | disclosed |
| EP-1568744-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-31 | — | — | EP | disclosed |
| US-6918946-B2 | Improved chemical stability/crystal structure; light emitting diodes | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2005-07-19 | — | — | US | disclosed |
| US-6846565-B2 | Heating a mixture of a metal compound, especially a Group IV metal organometallic precursor, and a capping agent (especially one that provides oxidation resistance) at a temperature wherein the precursor decomposes | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2005-01-25 | — | — | US | disclosed |
| US-20040219372-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20030034486-A1 | Applications of light-emitting nanoparticles | MERCK PATENT GMBH (DE) | 2003-02-20 | — | — | US | disclosed |
| US-20030003300-A1 | Heating a mixture of a metal compound, especially a Group IV metal organometallic precursor, and a capping agent (especially one that provides oxidation resistance) at a temperature wherein the precursor decomposes | MERCK PATENT GMBH (DE) | 2003-01-02 | — | — | US | disclosed |
| EP-1142049-B1 | HYDROFLUORIC ACID SCAVENGER | DANIONICS AS (DK) | 2002-09-18 | — | — | EP | disclosed |
| US-6346569-B1 | DISPERSING FEED POLYSUCCINIMIDE WITH DISPERSANT, REACTING DISPERSED POLYSUCCINIMIDE WITH CROSS-LINKING AGENT | MITSUI CHEMICALS, INC. (JP) | 2002-02-12 | — | — | US | disclosed |
| WO-2000042672-A9 | HYDROFLUORIC ACID SCAVENGER | DANIONICS AS (DK) | 2001-11-15 | — | — | WO | disclosed |
| EP-1142049-A2 | HYDROFLUORIC ACID SCAVENGER | DANIONICS A/S (DK) | 2001-10-10 | — | — | EP | disclosed |
| US-6229008-B1 | CHEMICAL INTERMEDIATES FOR VIRICIDES AND ANTICARCINOGENIC AGENTS | SAISCHEK JOERN (AT) | 2001-05-08 | — | — | US | disclosed |
| WO-2000042672-A2 | HYDROFLUORIC ACID SCAVENGER | DANIONICS A/S (DK) | 2000-07-20 | — | — | WO | disclosed |
| US-6072024-A | Production process of cross-linked polyaspartic acid resin | MITSUI CHEMICALS, INC. (JP) | 2000-06-06 | — | — | US | disclosed |
| US-6011133-A | Laminates of glass or metal and poly(alkylene dicarboxylates) and syntheses thereof | BAYLOR UNIVERSITY (US) | 2000-01-04 | — | — | US | disclosed |
| US-5933693-A | Electroconductive elastic member and electrophotographic apparatus using same | BRIDGESTONE CORPORATION (JP) | 1999-08-03 | — | — | US | disclosed |
| US-5911099-A | Electroconductiive member and electrophotogrpahic apparatus | BRIDGESTONE CORPORATION (JP) | 1999-06-08 | — | — | US | disclosed |
| US-5837381-A | MULTILAYER PROTECTIVE COATING; WEAR AND CORROSION RESISTANCE | UNIV BAYLOR (US) | 1998-11-17 | — | — | US | disclosed |
| EP-0866084-A2 | Production process of cross-linked polyaspartic acid resin | Mitsui Chemicals, Inc. (JP) | 1998-09-23 | — | — | EP | disclosed |
| US-5668224-A | TETRAALKYL- OR TRIALKYLAMMONIUM END GROUPS | BAYLOR UNIVERSITY | 1997-09-16 | — | — | US | disclosed |
| US-5561212-A | Poly(methylene oxalate), a new composition of matter | BAYLOR UNIVERSITY (US) | 1996-10-01 | — | — | US | disclosed |
| US-5451643-A | PROTECTIVE COATINGS FOR METALS OR GLASS | BAYLOR UNIVERSITY (US) | 1995-09-19 | — | — | US | disclosed |
| US-5426218-A | Bis (tetraalkylammonium) oxalate | BAYLOR UNIVERSITY (US) | 1995-06-20 | — | — | US | disclosed |
| US-5371171-A | Poly(methylene oxalate) and precursors thereto | BAYLOR UNIVERSITY (US) | 1994-12-06 | — | — | US | disclosed |
| WO-1994020296-A1 | POLY (ALKYLENE DICARBOXYLATES) AND SYNTHESES THEREOF | BAYLOR UNIVERSITY (US) | 1994-09-15 | — | — | WO | disclosed |
| US-3934977-A | COLORIMETRIC, 2,7-BIS(4-CHLORO-2-PHOSPHONOBENZENEAZO)-1,8-DIHYDROXYNAPHTHALENE-3,6 -DISULFONIC ACID | AMERICAN HOSPITAL SUPPLY CORPORATION (US) | 1976-01-27 | — | — | US | disclosed |
| US-3934977-A | COLORIMETRIC, 2,7-BIS(4-CHLORO-2-PHOSPHONOBENZENEAZO)-1,8-DIHYDROXYNAPHTHALENE-3,6 -DISULFONIC ACID | AMERICAN HOSPITAL SUPPLY CORPORATION (US) | 1976-01-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (17 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200159120-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | RPS4X, SIK3, MLX | SLC22A1 1843/4885SLC22A2 1825/4885ALDH1A1 4644/4885 |
| US-20190224660-A1 | SELECTIVE PORPHYRIN-CATALYZED ELECTROCHEMICAL REDUCTION OF CO2 INTO CO, IN PARTICULAR IN WATER | CYC1, TFRC, PYCR1 | SLC22A1 1222/4885SLC22A2 1622/4885ALDH1A1 2261/4885 |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SMC1A, CDH1, SMC4 | SLC22A1 4268/4885SLC22A2 4542/4885ALDH1A1 1586/4885 |
| US-20090299085-A1 | PREPARATION OF PLATINUM(II) COMPLEXES | SLCO4C1, OTC, SLC10A6 | SLC22A1 283/4885SLC22A2 261/4885ALDH1A1 3900/4885 |
| US-20220221793-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SMC1A, CDH1, SMC4 | SLC22A1 4268/4885SLC22A2 4542/4885ALDH1A1 1586/4885 |
| US-20080064895-A1 | Preparation of Platinum(II) Complexes | SLCO4C1, SLC10A6, OTC | SLC22A1 272/4885SLC22A2 254/4885ALDH1A1 3885/4885 |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | SLC22A1 1953/4885SLC22A2 2428/4885ALDH1A1 4472/4885 |
| US-20090281319-A1 | PREPARATION OF PLATINUM (II) COMPLEXES | OAT, OTC, POLR2E | SLC22A1 857/4885SLC22A2 702/4885ALDH1A1 1641/4885 |
| US-12332565-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | SLC22A1 1843/4885SLC22A2 1825/4885ALDH1A1 4644/4885 |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SMC2, F12, SMC1A | SLC22A1 2667/4885SLC22A2 3137/4885ALDH1A1 1644/4885 |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | RPS4X, SIK3, MLX | SLC22A1 1843/4885SLC22A2 1825/4885ALDH1A1 4644/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | SLC22A1 4619/4885SLC22A2 4601/4885ALDH1A1 4452/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | SLC22A1 2467/4885SLC22A2 2619/4885ALDH1A1 1558/4885 |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | SLC22A1 1843/4885SLC22A2 1825/4885ALDH1A1 4644/4885 |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SMURF1, OSR1, SIK1 | SLC22A1 1154/4885SLC22A2 1999/4885ALDH1A1 4150/4885 |
| US-20160257702-A1 | Copper Complex for Capturing Carbon Dioxide | AOC2, AOC3, MT-CO2 | SLC22A1 2549/4885SLC22A2 2460/4885ALDH1A1 2106/4885 |
| US-12619149-B2 | DNQ-free chemically amplified resist composition | POLQ, RECQL, RPA1 | SLC22A1 4808/4885SLC22A2 4800/4885ALDH1A1 983/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.