Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 3/20 | 0.47 |
| ▸ | CA1 | P00915 | 3/20 | 0.47 |
| ▸ | CA9 | Q16790 | 3/20 | 0.47 |
| ▸ | CA2 | P00918 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.42 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.40 |
| ▸ | CRHBP | P24387 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | MGLL | Q99685 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17956772 | 0.91 | CA12 (0.50) | ALDH1A1ALDH2CA12CA1CA9 | |
| SCHEMBL7514061 | 0.91 | CA12 (0.55) | ALDH1A1ALDH2CA12CA1CA9 | |
| SCHEMBL7508667 | 0.91 | CA12 (0.46) | ALDH1A1ALDH2CA12CA1CA9 | |
| SCHEMBL180742 | 0.89 | CA12 (0.52) | ALDH1A1ALDH2CA12CA1CA9 | |
| SCHEMBL17956743 | 0.87 | CA12 (0.55) | ALDH1A1ALDH2CA12CA1CA9 | |
| SCHEMBL9666773 | 0.87 | CA12 (0.55) | ALDH1A1ALDH2CA12CA1CA9 | |
| SCHEMBL10766414 | 0.87 | CA12 (0.55) | ALDH1A1ALDH2CA12CA1CA9 | |
| SCHEMBL22400003 | 0.86 | L3MBTL1 (0.42) | ALDH1A1CA12CA1CA9CA2 | |
| SCHEMBL15007533 | 0.85 | ALDH1A1 (0.55) | ALDH1A1ALDH2CA12CA1CA9 | |
| SCHEMBL15511328 | 0.84 | L3MBTL1 (0.41) | ALDH1A1ALDH2CA12CA1CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1214 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119899434-A | Composition containing nitrile rubber, manufacturing process and application thereof | 日照市鑫威机械配件有限公司 | 2025-04-29 | — | — | CN | claimed |
| CN-119859416-A | Rubber anti-aging agent and preparation process thereof | 中国石油化工股份有限公司 | 2025-04-22 | — | — | CN | claimed |
| CN-119529222-A | Flexible photosensitive polyurethane film and preparation method thereof | 广东工业大学 | 2025-02-28 | — | — | CN | claimed |
| CN-118105510-A | Preparation and application of polypeptide self-assembled nano-drug carrier targeting cGAS-STING signal pathway | 首都医科大学附属北京儿童医院 | 2024-05-31 | — | — | CN | claimed |
| CN-111417408-B | Process for the preparation of pharmaceutical linker compounds | 思进公司 | 2024-04-23 | — | — | CN | claimed |
| CN-115449136-B | Accelerator composition of rubber nanocomposite as well as preparation method and application thereof | 浙江大学 | 2024-02-27 | — | — | CN | claimed |
| CN-115449136-A | Accelerator composition of rubber nanocomposite and preparation method and application thereof | 浙江大学 | 2022-12-09 | — | — | CN | claimed |
| CN-110408149-B | High-cold-resistance polyvinyl chloride cable material and preparation method thereof | 张媛婷 | 2022-07-12 | — | — | CN | claimed |
| CN-111334206-B | High-temperature-resistant protective film and preparation method thereof | 广东硕成科技有限公司 | 2021-09-03 | — | — | CN | claimed |
| CN-109929156-B | Anti-cracking rubber sole and preparation method thereof | 福建省东协橡塑实业有限公司 | 2021-06-11 | — | — | CN | claimed |
| CN-109929153-B | Anti-cracking master batch for sole rubber and preparation method and application thereof | 福建省东协橡塑实业有限公司 | 2021-06-11 | — | — | CN | claimed |
| CN-111334206-A | High-temperature-resistant protective film and preparation method thereof | 广东硕成科技有限公司 | 2020-06-26 | — | — | CN | claimed |
| CN-109929156-A | A kind of freedom from cracking rubber soles and preparation method thereof | 福建省东协橡塑实业有限公司 | 2019-06-25 | — | — | CN | claimed |
| CN-109929153-A | A kind of sole rubber freedom from cracking master batch and its preparation method and application | 福建省东协橡塑实业有限公司 | 2019-06-25 | — | — | CN | claimed |
| CN-105860328-B | Anti-pollution antibacterial tablecloth | 武汉馨雅美纺织品有限公司 | 2018-06-29 | — | — | CN | claimed |
| CN-105860328-A | Antifouling and antibacterial tablecloth | 武汉馨雅美纺织品有限公司 | 2016-08-17 | — | — | CN | claimed |
| US-20130131243-A1 | RUBBER COMPOSITION FOR GOLF BALL | BRIDGESTONE CORPORATION (JP) | 2013-05-23 | — | — | US | claimed |
| EP-0081326-B1 | CURING COMPOSITIONS | Lingner + Fischer GmbH (DE) | 1986-05-21 | — | — | EP | claimed |
| EP-0081326-A1 | Curing compositions | Lingner + Fischer GmbH (DE) | 1983-06-15 | — | — | EP | claimed |
| CN-122075733-A | Preparation method and application of linker medicine and antibody-medicine conjugate thereof | — | 2026-05-26 | — | — | CN | disclosed |
| CN-116348115-B | Combination of antibody-drug conjugate and PARP1 selective inhibitor | ASTRAZENECA UK LTD. (GB) | 2026-05-26 | — | — | CN | disclosed |
| CN-122059929-A | Quinoxaline derivatives as anticancer agents | 阿斯利康(瑞典)有限公司 | 2026-05-19 | — | — | CN | disclosed |
| WO-2026100281-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, RADIATION-SENSITIVE ACID GENERATOR, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100524-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND, AND POLYMER | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122036687-A | Quinoxaline derivatives as anticancer agents | 阿斯利康(瑞典)有限公司 | 2026-05-15 | — | — | CN | disclosed |
| WO-2026100258-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122031713-A | Preparation method and application of linker medicine and antibody-medicine conjugate thereof | 乐普生物科技股份有限公司 | 2026-05-15 | — | — | CN | disclosed |
| WO-2026100259-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122036686-A | Quinoxaline derivatives as anticancer agents | 阿斯利康(瑞典)有限公司 | 2026-05-15 | — | — | CN | disclosed |
| US-20260132276-A1 | GRIP RUBBER COMPOSITION AND GOLF CLUB GRIP | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260132278-A1 | GRIP RUBBER COMPOSITION AND GOLF CLUB GRIP | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2026-05-14 | — | — | US | disclosed |
| CN-122011162-A | Chemical synthesis method of N-terminal domain of TIMP2 protein | 华南理工大学 | 2026-05-12 | — | — | CN | disclosed |
| CN-122010903-A | Quinoxaline derivatives as anticancer agents | 阿斯利康(瑞典)有限公司 | 2026-05-12 | — | — | CN | disclosed |
| US-12617885-B2 | Ionomer resin, resin sheet, and laminated glass | KURARAY EUROPE GMBH (DE) | 2026-05-05 | — | — | US | disclosed |
| US-20260079396-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260063994-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2026-03-05 | — | — | US | disclosed |
| US-20260054429-A1 | METHOD AND MATERIALS FOR MANUFACTURING HIGH-EFFICIENCY HEATING ENCLOSURES AND APPLIANCES | UT BATTELLE LLC (US) | 2026-02-26 | — | — | US | disclosed |
| US-12517429-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-20250377590-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362596-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | JSR CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-12422748-B2 | Radiation-sensitive resin composition and method for forming resist pattern | JSR CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| US-20250271761-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| US-20250271756-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID-GENERATING AGENT | JSR CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| US-20250271204-A1 | Refrigeration System and Method Enabling Demand Flexibility | UT-BATTELLE, LLC (US) | 2025-08-28 | — | — | US | disclosed |
| US-20250271762-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| EP-3804824-B1 | GOLF CLUB GRIP AND GOLF CLUB | SUMITOMO RUBBER IND (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-20250235757-A1 | GRIP RUBBER COMPOSITION AND GOLF CLUB GRIP | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| EP-3901204-B1 | GREASE-RESISTANT FILM, GREASE-RESISTANT BASE MATERIAL, AND GREASE-RESISTANT PAPER | KURARAY CO (JP) | 2025-07-16 | — | — | EP | disclosed |
| EP-4577599-A1 | FLAME-RETARDANT POLYAMIDE COMPOSITION | BASF SE (DE) | 2025-07-02 | — | — | EP | disclosed |
| US-20250197689-A1 | IONOMER RESIN PARTICULATE PRODUCTION METHOD | KURARAY EUROPE GMBH (DE) | 2025-06-19 | — | — | US | disclosed |
| US-20250164877-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | JSR CORPORATION (JP) | 2025-05-22 | — | — | US | disclosed |
| US-12306538-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2025-05-20 | — | — | US | disclosed |
| CN-119899434-A | Composition containing nitrile rubber, manufacturing process and application thereof | 日照市鑫威机械配件有限公司 | 2025-04-29 | — | — | CN | disclosed |
| CN-119859416-A | Rubber anti-aging agent and preparation process thereof | 中国石油化工股份有限公司 | 2025-04-22 | — | — | CN | disclosed |
| CN-119768739-A | Radiation-sensitive resin composition, pattern forming method, and radiation-sensitive acid generator | JSR株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-119768740-A | Radiation-sensitive resin composition, pattern forming method, and radiation-sensitive acid generator | JSR株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-119768460-A | Flame retardant polyamide composition | 巴斯夫欧洲公司 | 2025-04-04 | — | — | CN | disclosed |
| CN-119768738-A | Radiation-sensitive resin composition, pattern forming method, and radiation-sensitive acid generator | JSR株式会社 | 2025-04-04 | — | — | CN | disclosed |
| US-12252565-B2 | Method for producing ionomer resin | KURARAY EUROPE GMBH (DE) | 2025-03-18 | — | — | US | disclosed |
| US-20250085629-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2025-03-13 | — | — | US | disclosed |
| CN-119585248-A | Heteroaryl derivatives as DDR inhibitors | 奇斯药制品公司 | 2025-03-07 | — | — | CN | disclosed |
| US-20250076762-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2025-03-06 | — | — | US | disclosed |
| US-20250076761-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2025-03-06 | — | — | US | disclosed |
| CN-119562946-A | Heteroaryl derivatives as DDR inhibitors | 奇斯药制品公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-119529222-A | Flexible photosensitive polyurethane film and preparation method thereof | 广东工业大学 | 2025-02-28 | — | — | CN | disclosed |
| EP-3953947-B1 | INTEGRATED ENERGY SYSTEM | TERRAPOWER LLC (US) | 2025-01-15 | — | — | EP | disclosed |
| US-12195613-B2 | Ionomer, resin sheet, and laminated glass | KURARAY EUROPE GMBH (DE) | 2025-01-14 | — | — | US | disclosed |
| US-12187884-B2 | Grease-resistant film, grease-resistant base material, and grease-resistant paper | KURARAY CO., LTD. (JP) | 2025-01-07 | — | — | US | disclosed |
| CN-118146301-B | Active peptide for promoting bone cell differentiation and application thereof | 广州白云山花城药业有限公司 | 2024-12-31 | — | — | CN | disclosed |
| CN-119212974-A | Combination lactic acid and ketoesters for medical and nutritional use | 奥胡斯大学 | 2024-12-27 | — | — | CN | disclosed |
| WO-2024262245-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND ONIUM SALT COMPOUND | JSR株式会社 | 2024-12-26 | — | — | WO | disclosed |
| US-12173134-B2 | Rubber and hydraulic hose comprising a inner tube made of the rubber material | DANFOSS A/S (DK) | 2024-12-24 | — | — | US | disclosed |
| US-12176117-B2 | Thermal energy storage system connected to both a nuclear reactor and a power generator | TERRAPOWER, LLC (US) | 2024-12-24 | — | — | US | disclosed |
| CN-119161323-A | Novel pyridine and pyrazine compounds as inhibitors of cannabinoid receptor 2 | 豪夫迈·罗氏有限公司 | 2024-12-20 | — | — | CN | disclosed |
| CN-119173815-A | Radiation-sensitive composition, resist pattern forming method, and radiation-sensitive acid generator | JSR株式会社 | 2024-12-20 | — | — | CN | disclosed |
| EP-4471258-A2 | INTEGRATED ENERGY SYSTEM | TerraPower LLC (US) | 2024-12-04 | — | — | EP | disclosed |
| CN-115244133-B | Industrial fan or blower comprising flame retardant polyamide composition | 巴斯夫欧洲公司 | 2024-12-03 | — | — | CN | disclosed |
| WO-2024241766-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND ONIUM SALT COMPOUND | JSR株式会社 | 2024-11-28 | — | — | WO | disclosed |
| US-20240393687-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2024-11-28 | — | — | US | disclosed |
| WO-2024241820-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, AND ONIUM SALT COMPOUND | JSR株式会社 | 2024-11-28 | — | — | WO | disclosed |
| CN-119015432-A | Polypeptide-lipid nanocomposite for delivering genetic material, preparation and application | 苏州慧疗生物医药科技有限公司 | 2024-11-26 | — | — | CN | disclosed |
| CN-118754949-A | Polypeptide, polypeptide complex nanoparticle, nucleic acid vaccine and application | 深圳厚存纳米药业有限公司 | 2024-10-11 | — | — | CN | disclosed |
| CN-118754948-A | Polypeptide, polypeptide complex nanoparticle, nucleic acid vaccine and application | 深圳厚存纳米药业有限公司 | 2024-10-11 | — | — | CN | disclosed |
| CN-118754947-A | Polypeptide, polypeptide complex nanoparticle, nucleic acid vaccine and application | 深圳厚存纳米药业有限公司 | 2024-10-11 | — | — | CN | disclosed |
| US-20240319596-A1 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2024-09-26 | — | — | US | disclosed |
| US-20240319597-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING SUBSTRATE, AND COMPOUND | JSR CORPORATION (JP) | 2024-09-26 | — | — | US | disclosed |
| WO-2024190204-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-09-19 | — | — | WO | disclosed |
| WO-2024181434-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATION AGENT | JSR株式会社 | 2024-09-06 | — | — | WO | disclosed |
| CN-118534742-A | Developing roller | 住友橡胶工业株式会社 | 2024-08-23 | — | — | CN | disclosed |
| CN-118534743-A | Developing roller | 住友橡胶工业株式会社 | 2024-08-23 | — | — | CN | disclosed |
| CN-118541011-A | Polymer material for piezoelectric device | 株式会社大阪曹达 | 2024-08-23 | — | — | CN | disclosed |
| US-20240280924-A1 | DEVELOPING ROLLER | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2024-08-22 | — | — | US | disclosed |
| US-20240280925-A1 | DEVELOPING ROLLER | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2024-08-22 | — | — | US | disclosed |
| WO-2024166630-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-08-15 | — | — | WO | disclosed |
| CN-118146301-A | Active peptide for promoting bone cell differentiation and application thereof | 广州白云山花城药业有限公司 | 2024-06-07 | — | — | CN | disclosed |
| WO-2024116576-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID-GENERATING AGENT | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024116577-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024116575-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| EP-4378979-A1 | IONOMER RESIN PARTICULATE PRODUCTION METHOD | Kuraray Europe GmbH (DE) | 2024-06-05 | — | — | EP | disclosed |
| CN-114213508-B | Polypeptide, polypeptide complex nanoparticle, nucleic acid vaccine and application | 深圳厚存纳米药业有限公司 | 2024-06-04 | — | — | CN | disclosed |
| CN-118105510-A | Preparation and application of polypeptide self-assembled nano-drug carrier targeting cGAS-STING signal pathway | 首都医科大学附属北京儿童医院 | 2024-05-31 | — | — | CN | disclosed |
| CN-118027110-A | 3, 5-Bis (4-substituent benzylidene) piperidin-4-one-platinum complex and preparation method and application thereof | 桂林医学院 | 2024-05-14 | — | — | CN | disclosed |
| CN-118005722-A | Deer antler gelatin low-molecular peptide segment for promoting bone cell differentiation and application thereof | 广东工业大学 | 2024-05-10 | — | — | CN | disclosed |
| US-20240126167-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2024-04-18 | — | — | US | disclosed |
| EP-4354460-A2 | NUCLEAR THERMAL PLANT WITH LOAD-FOLLOWING POWER GENERATION | TerraPower LLC (US) | 2024-04-17 | — | — | EP | disclosed |
| CN-117715956-A | Method for producing ionomer resin pellet | 可乐丽欧洲有限责任公司 | 2024-03-15 | — | — | CN | disclosed |
| CN-114133560-B | Process for the preparation of semiaromatic polyamides with improved impact strength, semiaromatic polyamides and moulding compositions | 山东广垠新材料有限公司 | 2024-03-08 | — | — | CN | disclosed |
| WO-2024041977-A1 | FLAME-RETARDANT POLYAMIDE COMPOSITION | BASF SE (DE) | 2024-02-29 | — | — | WO | disclosed |
| EP-4328455-A2 | INDUSTRIAL FAN OR BLOWER COMPRISING A FLAME-RETARDANT POLYAMIDE COMPOSITION | BASF SE (DE) | 2024-02-28 | — | — | EP | disclosed |
| EP-4052274-B1 | NUCLEAR THERMAL PLANT WITH LOAD-FOLLOWING POWER GENERATION | TERRAPOWER LLC (US) | 2024-02-28 | — | — | EP | disclosed |
| CN-114829410-B | Method for producing ionomer resin | 可乐丽欧洲有限责任公司 | 2024-02-27 | — | — | CN | disclosed |
| CN-115449136-B | Accelerator composition of rubber nanocomposite as well as preparation method and application thereof | 浙江大学 | 2024-02-27 | — | — | CN | disclosed |
| WO-2024024801-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-02-01 | — | — | WO | disclosed |
| US-11865419-B2 | Golf club grip and golf club | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2024-01-09 | — | — | US | disclosed |
| US-20240002645-A1 | IONOMER RESIN | KURARAY EUROPE GMBH (DE) | 2024-01-04 | — | — | US | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-20230400768-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| CN-117186510-A | Rubber composition, rubber material, use thereof, and additive | 大塚化学株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-117186509-A | Rubber composition, rubber material, use thereof, and additive | 大塚化学株式会社 | 2023-12-08 | — | — | CN | disclosed |
| US-20230393469-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-12-07 | — | — | US | disclosed |
| WO-2023228842-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023228841-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023228847-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023228843-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| CN-114058009-B | Process for the preparation of semi-aromatic polyamides with reduced diamine monomer loss, semi-aromatic polyamides and molding compositions | 山东广垠新材料有限公司 | 2023-11-10 | — | — | CN | disclosed |
| US-11806665-B2 | Sorbents for the oxidation and removal of mercury | Midwwest Energy Emissions Corp. (US) | 2023-11-07 | — | — | US | disclosed |
| US-20230338799-A1 | GOLF CLUB GRIP AND GOLF CLUB | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2023-10-26 | — | — | US | disclosed |
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-10-26 | — | — | US | disclosed |
| US-11796912-B2 | Radiation-sensitive composition and pattern-forming method | JSR CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-20230331887-A1 | IONOMER RESIN, RESIN SHEET, AND LAMINATED GLASS | KURARAY EUROPE GMBH (DE) | 2023-10-19 | — | — | US | disclosed |
| CN-112533991-B | Rubber composition, rubber material, use thereof, and additive | 大塚化学株式会社 | 2023-10-17 | — | — | CN | disclosed |
| CN-113166516-B | Composition, coating film, film and substrate | 株式会社可乐丽 | 2023-10-10 | — | — | CN | disclosed |
| CN-113166473-B | Oil film-resistant, oil-resistant base material and oil-resistant paper | 株式会社可乐丽 | 2023-10-10 | — | — | CN | disclosed |
| EP-4253428-A1 | IONOMER RESIN | Kuraray Europe GmbH (DE) | 2023-10-04 | — | — | EP | disclosed |
| US-11771967-B2 | Golf club grip and golf club | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| EP-3112410-B1 | CROSS-LINKABLE NITRILE RUBBER COMPOSITION AND CROSS-LINKED RUBBER PRODUCT | ZEON CORP (JP) | 2023-09-13 | — | — | EP | disclosed |
| US-20230280652-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | JSR CORPORATION (JP) | 2023-09-07 | — | — | US | disclosed |
| US-11747725-B2 | Radiation-sensitive resin composition and method for forming resist pattern | JSR CORPORATION (JP) | 2023-09-05 | — | — | US | disclosed |
| WO-2023153294-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| CN-116574092-A | Benzimidazole or azabenzimidazole compound, preparation method and application thereof | 成都地奥九泓制药厂 | 2023-08-11 | — | — | CN | disclosed |
| EP-4223795-A1 | IONOMER RESIN, RESIN SHEET, AND LAMINATED GLASS | Kuraray Europe GmbH (DE) | 2023-08-09 | — | — | EP | disclosed |
| CN-111157739-B | IV type collagen antibody latex particles, preparation method and combined coupling agent | 王贤俊 | 2023-08-01 | — | — | CN | disclosed |
| CN-111157740-B | Detection kit for IV type collagen and preparation method thereof | 王贤俊 | 2023-08-01 | — | — | CN | disclosed |
| US-11709428-B2 | Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound | JSR CORPORATION (JP) | 2023-07-25 | — | — | US | disclosed |
| EP-3916074-B1 | SYNERGISTIC ANTIKNOCK FUEL ADDITIVE AND GASOLINE COMPOSITION COMPRISING THE SAME | REPSOL SA (ES) | 2023-07-05 | — | — | EP | disclosed |
| CN-116348430-A | Ionomer resin, resin sheet and laminated glass | 可乐丽欧洲有限责任公司 | 2023-06-27 | — | — | CN | disclosed |
| US-11687003-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| CN-116348115-A | Combination of antibody-drug conjugate and PARP1 selective inhibitor | 阿斯利康(英国)有限公司 | 2023-06-27 | — | — | CN | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| WO-2023100574-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING SUBSTRATE, AND COMPOUND | JSR株式会社 | 2023-06-08 | — | — | WO | disclosed |
| WO-2023095563-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-01 | — | — | WO | disclosed |
| WO-2023095561-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-01 | — | — | WO | disclosed |
| CN-115768803-B | Ionomer resins | 株式会社可乐丽 | 2023-05-12 | — | — | CN | disclosed |
| CN-116018337-A | Pseudomonas aeruginosa virulence factor LasB inhibitor | 亥姆霍兹感染研究中心有限公司 | 2023-04-25 | — | — | CN | disclosed |
| CN-115960452-A | Rubber composition for paper feed roller and paper feed roller | 住友橡胶工业株式会社 | 2023-04-14 | — | — | CN | disclosed |
| US-20230104260-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| US-20230106095-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| CN-115768803-A | Ionomer resins | 株式会社可乐丽 | 2023-03-07 | — | — | CN | disclosed |
| CN-110382652-B | Resistance regulator | 株式会社大阪曹达 | 2023-02-28 | — | — | CN | disclosed |
| US-11590446-B2 | Methods for treating a flue gas stream using a wet scrubber unit | ADA CARBON SOLUTIONS, LLC (US) | 2023-02-28 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| WO-2023008485-A1 | IONOMER RESIN PARTICULATE PRODUCTION METHOD | 株式会社クラレ | 2023-02-02 | — | — | WO | disclosed |
| US-20230025550-A1 | IONOMER RESIN, RESIN SHEET, AND LAMINATED GLASS | KURARAY CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
| US-20230024585-A1 | MULTI-FUNCTIONAL COMPOSITION OF MATTER FOR REMOVAL OF MERCURY FROM HIGH TEMPERATURE FLUE GAS STREAMS | ARQ SOLUTIONS, LLC (F/K/A ADA CARBON SOLUTIONS, LLC) | 2023-01-26 | — | — | US | disclosed |
| US-20230018856-A1 | METHOD FOR PRODUCING IONOMER RESIN | KURARAY CO., LTD. (JP) | 2023-01-19 | — | — | US | disclosed |
| US-20230014510-A1 | INDUSTRIAL FAN OR BLOWER COMPRISING A FLAME-RETARDANT POLYAMIDE COMPOSITION | BASF SE (DE) | 2023-01-19 | — | — | US | disclosed |
| WO-2023276538-A1 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | JSR株式会社 | 2023-01-05 | — | — | WO | disclosed |
| WO-2022270540-A1 | RESIN SHEET HAVING LAYER THAT CONTAINS IONOMER RESIN COMPOSITION, AND LAMINATED GLASS | 株式会社クラレ | 2022-12-29 | — | — | WO | disclosed |
| WO-2022270545-A1 | IONOMER RESIN COMPOSITION, RESIN SHEET, AND LAMINATED GLASS | 株式会社クラレ | 2022-12-29 | — | — | WO | disclosed |
| CN-115449136-A | Accelerator composition of rubber nanocomposite and preparation method and application thereof | 浙江大学 | 2022-12-09 | — | — | CN | disclosed |
| US-20220389208-A1 | GOLF CLUB GRIP AND GOLF CLUB | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2022-12-08 | — | — | US | disclosed |
| EP-3960495-B1 | SEALANT RUBBER COMPOSITION AND PNEUMATIC TIRE | SUMITOMO RUBBER IND (JP) | 2022-11-09 | — | — | EP | disclosed |
| EP-4079699-A1 | IONOMER RESIN, RESIN SHEET, AND LAMINATED GLASS | Kuraray Co., Ltd. (JP) | 2022-10-26 | — | — | EP | disclosed |
| EP-4077542-A1 | INDUSTRIAL FAN OR BLOWER COMPRISING A FLAME-RETARDANT POLYAMIDE COMPOSITION | BASF SE (DE) | 2022-10-26 | — | — | EP | disclosed |
| CN-115244133-A | Industrial fan or blower comprising a flame retardant polyamide composition | 巴斯夫欧洲公司 | 2022-10-25 | — | — | CN | disclosed |
| US-11480877-B2 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-10-25 | — | — | US | disclosed |
| CN-113993909-B | Ionomer resin, resin sheet, and laminated glass | 株式会社可乐丽 | 2022-10-04 | — | — | CN | disclosed |
| US-11453734-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2022-09-27 | — | — | US | disclosed |
| WO-2022190964-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2022-09-15 | — | — | WO | disclosed |
| WO-2022186048-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | JSR株式会社 | 2022-09-09 | — | — | WO | disclosed |
| US-20220283498-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2022-09-08 | — | — | US | disclosed |
| EP-4052274-A1 | NUCLEAR THERMAL PLANT WITH LOAD-FOLLOWING POWER GENERATION | TerraPower, LLC (US) | 2022-09-07 | — | — | EP | disclosed |
| WO-2022172736-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2022-08-18 | — | — | WO | disclosed |
| WO-2022172685-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTER USING SAME, AND SULFONIUM SALT COMPOUND AND RADIATION-SENSITIVE ACID GENERATOR COMPRISING SAME | JSR株式会社 | 2022-08-18 | — | — | WO | disclosed |
| US-11400434-B2 | Multi-functional composition of matter for removal of mercury from high temperature flue gas streams | ADA CARBON SOLUTIONS, LLC (US) | 2022-08-02 | — | — | US | disclosed |
| CN-114829410-A | Method for producing ionomer resin | 株式会社可乐丽 | 2022-07-29 | — | — | CN | disclosed |
| WO-2022149349-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2022-07-14 | — | — | WO | disclosed |
| CN-110408149-B | High-cold-resistance polyvinyl chloride cable material and preparation method thereof | 张媛婷 | 2022-07-12 | — | — | CN | disclosed |
| WO-2022145188-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION | 昭和電工株式会社 | 2022-07-07 | — | — | WO | disclosed |
| WO-2022145187-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION | 昭和電工株式会社 | 2022-07-07 | — | — | WO | disclosed |
| WO-2022145189-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION | 昭和電工株式会社 | 2022-07-07 | — | — | WO | disclosed |
| US-20220204735-A1 | IONOMER, RESIN SHEET, AND LAMINATED GLASS | KURARAY CO., LTD. (JP) | 2022-06-30 | — | — | US | disclosed |
| WO-2022138044-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2022-06-30 | — | — | WO | disclosed |
| CN-112961209-B | caspase inhibitors and uses thereof | 中国科学院武汉病毒研究所 | 2022-06-24 | — | — | CN | disclosed |
| WO-2022130869-A1 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | JSR株式会社 | 2022-06-23 | — | — | WO | disclosed |
| WO-2022131095-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND WATER REPELLENCY-IMPROVING AGENT | JSR株式会社 | 2022-06-23 | — | — | WO | disclosed |
| WO-2022113906-A1 | IONOMER RESIN | 株式会社クラレ | 2022-06-02 | — | — | WO | disclosed |
| WO-2022113663-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN FORMATION METHOD | JSR株式会社 | 2022-06-02 | — | — | WO | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-11300877-B2 | Radiation-sensitive resin composition, resist pattern-forming method and acid diffusion control agent | JSR CORPORATION (JP) | 2022-04-12 | — | — | US | disclosed |
| WO-2022071065-A1 | IONOMER RESIN, RESIN SHEET, AND LAMINATED GLASS | 株式会社クラレ | 2022-04-07 | — | — | WO | disclosed |
| US-20220106463-A1 | RUBBER COMPOSITION, RUBBER MATERIAL, USE OF SAME, AND ADDITIVE | OTSUKA CHEMICAL CO., LTD. (JP) | 2022-04-07 | — | — | US | disclosed |
| WO-2022070823-A1 | CLEAR COATING COMPOSITION | 日本ペイントホールディングス株式会社 | 2022-04-07 | — | — | WO | disclosed |
| WO-2022071281-A1 | RUBBER COMPOSITION | 株式会社大阪ソーダ | 2022-04-07 | — | — | WO | disclosed |
| WO-2022071279-A1 | RUBBER COMPOSITION | 株式会社大阪ソーダ | 2022-04-07 | — | — | WO | disclosed |
| EP-3978238-A1 | IONOMER, RESIN SHEET, AND LAMINATED GLASS | Kuraray Co., Ltd. (JP) | 2022-04-06 | — | — | EP | disclosed |
| US-11281100-B2 | Radiation-sensitive resin composition, onium salt compound and method for forming resist pattern | JSR CORPORATION (JP) | 2022-03-22 | — | — | US | disclosed |
| US-20220081546-A1 | COMPOSITION, COATING, FILM, AND BASE MATERIAL | KURARAY CO., LTD. (JP) | 2022-03-17 | — | — | US | disclosed |
| WO-2022049911-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2022-03-10 | — | — | WO | disclosed |
| CN-114133560-A | Process for preparing semiaromatic polyamides with improved impact strength, semiaromatic polyamides and moulding compositions | 山东广垠新材料有限公司 | 2022-03-04 | — | — | CN | disclosed |
| CN-114133559-A | Process for preparing semiaromatic polyamides with reduced salt formation cycle, semiaromatic polyamides and moulding compositions | 山东广垠新材料有限公司 | 2022-03-04 | — | — | CN | disclosed |
| EP-3960495-A2 | SEALANT RUBBER COMPOSITION AND PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES LIMITED (JP) | 2022-03-02 | — | — | EP | disclosed |
| CN-114106475-A | Rubber composition for sealing material, and pneumatic tire | 住友橡胶工业株式会社 | 2022-03-01 | — | — | CN | disclosed |
| CN-109890890-B | Rubber composition | 花王株式会社 | 2022-02-22 | — | — | CN | disclosed |
| US-11256170-B2 | Compound, resist composition, and method for forming resist pattern using it | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-22 | — | — | US | disclosed |
| CN-114058010-A | Process for preparing low-energy semiaromatic polyamides, semiaromatic polyamides and moulding compositions | 山东广垠新材料有限公司 | 2022-02-18 | — | — | CN | disclosed |
| CN-114058009-A | Process for preparing semi-aromatic polyamides with reduced loss of diamine monomer, semi-aromatic polyamides and molding compositions | 山东广垠新材料有限公司 | 2022-02-18 | — | — | CN | disclosed |
| CN-114058008-A | Process for preparing semi-aromatic polyamides end-capped with monocarboxylic acids, semi-aromatic polyamides and molding compositions | 山东广垠新材料有限公司 | 2022-02-18 | — | — | CN | disclosed |
| EP-3953947-A2 | NUCLEAR THERMAL PLANT WITH LOAD-FOLLOWING POWER GENERATION | TerraPower LLC (US) | 2022-02-16 | — | — | EP | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| US-20220033637-A1 | GREASE-RESISTANT FILM, GREASE-RESISTANT BASE MATERIAL, AND GREASE-RESISTANT PAPER | KURARAY CO., LTD. (JP) | 2022-02-03 | — | — | US | disclosed |
| CN-113993909-A | Ionomer resin, resin sheet, and laminated glass | 株式会社可乐丽 | 2022-01-28 | — | — | CN | disclosed |
| EP-3943580-A1 | GASOLINE COMPOSITION COMPRISING INDOLINE | Repsol, S.A. (ES) | 2022-01-26 | — | — | EP | disclosed |
| CN-113929607-A | Preparation method of aliphatic asymmetric thiourea compound | 鹤壁元昊化工有限公司 | 2022-01-14 | — | — | CN | disclosed |
| US-11220588-B2 | Fluoroelastomer composition | SOLVAY SPECIALTY POLYMERS ITALY S.P.A. (IT) | 2022-01-11 | — | — | US | disclosed |
| CN-113874205-A | Ionomer, resin sheet, and laminated glass | 株式会社可乐丽 | 2021-12-31 | — | — | CN | disclosed |
| US-11204552-B2 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2021-12-21 | — | — | US | disclosed |
| WO-2021239755-A1 | SYNERGISTIC ANTIKNOCK FUEL ADDITIVE AND GASOLINE COMPOSITION COMPRISING THE SAME | REPSOL, S.A. (ES) | 2021-12-02 | — | — | WO | disclosed |
| WO-2021241246-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR株式会社 | 2021-12-02 | — | — | WO | disclosed |
| EP-3916074-A1 | SYNERGISTIC ANTIKNOCK FUEL ADDITIVE AND GASOLINE COMPOSITION COMPRISING THE SAME | Repsol, S.A. (ES) | 2021-12-01 | — | — | EP | disclosed |
| EP-3901212-A1 | COMPOSITION, COATING, FILM, AND BASE MATERIAL | Kuraray Co., Ltd. (JP) | 2021-10-27 | — | — | EP | disclosed |
| EP-3901204-A1 | GREASE-RESISTANT FILM, GREASE-RESISTANT BASE MATERIAL, AND GREASE-RESISTANT PAPER | Kuraray Co., Ltd. (JP) | 2021-10-27 | — | — | EP | disclosed |
| US-20210324138-A1 | ELECTRICAL-RESISTANCE ADJUSTING AGENT | OSAKA SODA CO., LTD. (JP) | 2021-10-21 | — | — | US | disclosed |
| CN-108463773-B | Radiation-sensitive resin composition, resist pattern forming method, and acid diffusion controller | JSR株式会社 | 2021-10-19 | — | — | CN | disclosed |
| CN-108137478-B | Compound, composition thereof, purification method, resist pattern formation method, and amorphous film production method | 三菱瓦斯化学株式会社 | 2021-09-28 | — | — | CN | disclosed |
| US-20210284773-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | JSR CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| CN-111334206-B | High-temperature-resistant protective film and preparation method thereof | 广东硕成科技有限公司 | 2021-09-03 | — | — | CN | disclosed |
| CN-107924123-B | Material for lithography, method for producing same, composition for lithography, method for forming pattern, compound, resin, and method for purifying same | 学校法人关西大学 | 2021-08-06 | — | — | CN | disclosed |
| CN-113166473-A | Oil film resistant, oil resistant base material and oil resistant paper | 株式会社可乐丽 | 2021-07-23 | — | — | CN | disclosed |
| CN-113166516-A | Composition, coating film, film and substrate | 株式会社可乐丽 | 2021-07-23 | — | — | CN | disclosed |
| US-11066539-B2 | Rubber composition | KAO CORPORATION (JP) | 2021-07-20 | — | — | US | disclosed |
| US-20210214521-A1 | RUBBER AND HYDRAULIC HOSE COMPRISING A INNER TUBE MADE OF THE RUBBER MATERIAL | DANFOSS A/S (DK) | 2021-07-15 | — | — | US | disclosed |
| EP-3845591-A1 | RUBBER COMPOSITION, RUBBER MATERIAL, USE OF SAME AND ADDITIVE | Otsuka Chemical Co., Ltd. (JP) | 2021-07-07 | — | — | EP | disclosed |
| US-20210200097-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2021-07-01 | — | — | US | disclosed |
| WO-2021124951-A1 | IONOMER RESIN, RESIN SHEET, AND LAMINATED GLASS | 株式会社クラレ | 2021-06-24 | — | — | WO | disclosed |
| WO-2021124950-A1 | METHOD FOR PRODUCING IONOMER RESIN | 株式会社クラレ | 2021-06-24 | — | — | WO | disclosed |
| WO-2021122111-A1 | INDUSTRIAL FAN OR BLOWER COMPRISING A FLAME-RETARDANT POLYAMIDE COMPOSITION | BASF SE (DE) | 2021-06-24 | — | — | WO | disclosed |
| US-11042094-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2021-06-22 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| CN-109929153-B | Anti-cracking master batch for sole rubber and preparation method and application thereof | 福建省东协橡塑实业有限公司 | 2021-06-11 | — | — | CN | disclosed |
| CN-107533291-B | Compound, resist composition, and resist pattern formation method using same | 三菱瓦斯化学株式会社 | 2021-06-11 | — | — | CN | disclosed |
| CN-109929156-B | Anti-cracking rubber sole and preparation method thereof | 福建省东协橡塑实业有限公司 | 2021-06-11 | — | — | CN | disclosed |
| CN-109929156-B | Anti-cracking rubber sole and preparation method thereof | 福建省东协橡塑实业有限公司 | 2021-06-11 | — | — | CN | disclosed |
| CN-109929153-B | Anti-cracking master batch for sole rubber and preparation method and application thereof | 福建省东协橡塑实业有限公司 | 2021-06-11 | — | — | CN | disclosed |
| EP-3279727-B1 | COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN USING IT | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-06-09 | — | — | EP | disclosed |
| EP-3062151-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-05-05 | — | — | EP | disclosed |
| WO-2021079886-A1 | RESIN SHEET AND METHOD FOR PRODUCING SAME | 株式会社クラレ | 2021-04-29 | — | — | WO | disclosed |
| CN-107428717-B | Resist composition, resist pattern forming method, and polyphenol compound used for same | 三菱瓦斯化学株式会社 | 2021-04-23 | — | — | CN | disclosed |
| US-20210106890-A1 | GOLF CLUB GRIP AND GOLF CLUB | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2021-04-15 | — | — | US | disclosed |
| EP-3804824-A1 | GOLF CLUB GRIP AND GOLF CLUB | Sumitomo Rubber Industries, Ltd. (JP) | 2021-04-14 | — | — | EP | disclosed |
| CN-107533290-B | Resist base material, resist composition, and method for forming resist pattern | 三菱瓦斯化学株式会社 | 2021-04-09 | — | — | CN | disclosed |
| WO-2021065350-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING SAME | JSR株式会社 | 2021-04-08 | — | — | WO | disclosed |
| US-10962884-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2021-03-30 | — | — | US | disclosed |
| EP-3141957-B1 | RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-24 | — | — | EP | disclosed |
| CN-112533991-A | Rubber composition, rubber material, use thereof, and additive | 大塚化学株式会社 | 2021-03-19 | — | — | CN | disclosed |
| EP-3279728-B1 | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-17 | — | — | EP | disclosed |
| CN-107690451-B | Fluoroelastomer composition | 索尔维特殊聚合物意大利有限公司 | 2021-03-12 | — | — | CN | disclosed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| US-20200409261-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-31 | — | — | US | disclosed |
| US-20200401043-A1 | PATTERN FORMING METHOD AND DEVELOPER | JSR CORPORATION (JP) | 2020-12-24 | — | — | US | disclosed |
| EP-2485090-B1 | Radiation-sensitive resin composition for forming resist pattern | JSR CORP (JP) | 2020-12-23 | — | — | EP | disclosed |
| CN-105579436-B | Onium salts and compositions comprising the same | 旭化成株式会社 | 2020-12-22 | — | — | CN | disclosed |
| WO-2020241515-A1 | IONOMER, RESIN SHEET, AND LAMINATED GLASS | 株式会社クラレ | 2020-12-03 | — | — | WO | disclosed |
| CN-110951457-B | Ceramic tile anti-slip agent and application thereof | 佛山市善益科技有限公司 | 2020-11-20 | — | — | CN | disclosed |
| EP-3733774-A1 | RUBBER COMPOSITION | OSAKA SODA CO., LTD. (JP) | 2020-11-04 | — | — | EP | disclosed |
| US-10824073-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2020-11-03 | — | — | US | disclosed |
| US-10816898-B2 | — | — | 2020-10-27 | — | — | US | disclosed |
| CN-107471922-B | Pneumatic tire | 住友橡胶工业株式会社 | 2020-10-09 | — | — | CN | disclosed |
| US-10792545-B2 | Golf club grip and golf club | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2020-10-06 | — | — | US | disclosed |
| WO-2020184307-A1 | CORE-SHELL TYPE POLYMER FOR INTERLAYER FILM, RESIN COMPOSITION AND INTERLAYER FILM FOR LAMINATED GLASS | 株式会社クラレ | 2020-09-17 | — | — | WO | disclosed |
| US-10766305-B2 | Pneumatic tire | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2020-09-08 | — | — | US | disclosed |
| WO-2020166517-A1 | POLYMER COMPOSITION, GEL, FILM, AND PARTICLES | 株式会社クラレ | 2020-08-20 | — | — | WO | disclosed |
| US-20200262787-A1 | OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3279190-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-10737156-B2 | Golf club grip and golf club | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2020-08-11 | — | — | US | disclosed |
| CN-111511835-A | Rubber composition | 株式会社大阪曹达 | 2020-08-07 | — | — | CN | disclosed |
| CN-105103051-B | Pattern forming method and method for manufacturing electronic component using the same | 富士胶片株式会社 | 2020-07-31 | — | — | CN | disclosed |
| EP-2955575-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYPHENOL DERIVATIVE USED IN SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| EP-2080750-B1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| CN-106462059-B | Resist material, resist composition, and resist pattern forming method | 三菱瓦斯化学株式会社 | 2020-07-28 | — | — | CN | disclosed |
| CN-106957217-B | Polyhydric phenol compound for resist composition | 三菱瓦斯化学株式会社 | 2020-07-24 | — | — | CN | disclosed |
| CN-111352301-A | Radiation-sensitive resin composition and method for forming microlens | JSR株式会社 | 2020-06-30 | — | — | CN | disclosed |
| CN-111334206-A | High-temperature-resistant protective film and preparation method thereof | 广东硕成科技有限公司 | 2020-06-26 | — | — | CN | disclosed |
| WO-2020130131-A1 | GREASE-RESISTANT FILM, GREASE-RESISTANT BASE MATERIAL, AND GREASE-RESISTANT PAPER | 株式会社クラレ | 2020-06-25 | — | — | WO | disclosed |
| WO-2020130132-A1 | COMPOSITION, COATING, FILM, AND BASE MATERIAL | 株式会社クラレ | 2020-06-25 | — | — | WO | disclosed |
| CN-210728601-U | Grip for golf club and golf club | 住友橡胶工业株式会社 | 2020-06-12 | — | — | CN | disclosed |
| CN-106795365-B | Composition for electrophotographic apparatus member | 株式会社大阪曹达 | 2020-06-12 | — | — | CN | disclosed |
| US-20200166843-A1 | PATTERN FORMING METHOD AND PROCESSING LIQUID | JSR CORPORATION (JP) | 2020-05-28 | — | — | US | disclosed |
| EP-3431308-B1 | METHOD FOR PRODUCING RUBBER COMPOSITION FOR A HEAVY-DUTY TIRE TREAD | SUMITOMO RUBBER IND (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-10642156-B2 | Resist base material, resist composition and method for forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-05-05 | — | — | US | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| CN-111040491-A | Safe and harmless tile anti-slip agent and preparation method thereof | 佛山市善益科技有限公司 | 2020-04-21 | — | — | CN | disclosed |
| US-10620534-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2020-04-14 | — | — | US | disclosed |
| CN-104995559-B | Resist composition, resist pattern forming method, and polyphenol derivative used therefor | 三菱瓦斯化学株式会社 | 2020-04-07 | — | — | CN | disclosed |
| CN-110951457-A | Ceramic tile anti-slip agent and application thereof | 佛山市善益科技有限公司 | 2020-04-03 | — | — | CN | disclosed |
| US-20200102270-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND | JSR CORPORATION (JP) | 2020-04-02 | — | — | US | disclosed |
| EP-3482973-B1 | PNEUMATIC TIRE | SUMITOMO RUBBER IND (JP) | 2020-03-25 | — | — | EP | disclosed |
| WO-2020045575-A1 | RUBBER COMPOSITION, RUBBER MATERIAL, USE OF SAME AND ADDITIVE | 大塚化学株式会社 | 2020-03-05 | — | — | WO | disclosed |
| US-20200048438-A1 | RUBBER COMPOSITION | KAO CORPORATION (JP) | 2020-02-13 | — | — | US | disclosed |
| US-20200041902-A9 | RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2020-02-06 | — | — | US | disclosed |
| EP-3303464-B1 | FLUOROELASTOMER COMPOSITION | SOLVAY SPECIALTY POLYMERS IT (IT) | 2020-01-29 | — | — | EP | disclosed |
| CN-110408149-A | A kind of high cold resistance polyvinyl chloride cable material and preparation method thereof | ZHANG YUANTING | 2019-11-05 | — | — | CN | disclosed |
| CN-110382652-A | Resistance adjustment agent | 株式会社大阪曹达 | 2019-10-25 | — | — | CN | disclosed |
| US-10437148-B2 | Resist material, resist composition and method for forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-10-08 | — | — | US | disclosed |
| WO-2019189877-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2019-10-03 | — | — | WO | disclosed |
| US-20190285983-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2019-09-19 | — | — | US | disclosed |
| US-20190278175-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-09-12 | — | — | US | disclosed |
| US-20190256694-A1 | RUBBER COMPOSITION FOR TIRE AND PNEUMATIC TIRE USING SAME | TOYO TIRE CORPORATION (JP) | 2019-08-22 | — | — | US | disclosed |
| US-20190258168-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2019-08-22 | — | — | US | disclosed |
| US-10377734-B2 | Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-08-13 | — | — | US | disclosed |
| US-20190243244-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-08-08 | — | — | US | disclosed |
| EP-3222440-B1 | PNEUMATIC TIRE | SUMITOMO RUBBER IND (JP) | 2019-07-31 | — | — | EP | disclosed |
| US-20190227432-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-07-25 | — | — | US | disclosed |
| EP-3118684-B1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-2743249-B1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-3181571-B1 | SILICON-CONTAINING AZODICARBOXAMIDES, THEIR PREPARATION AND USE | EVONIK DEGUSSA GMBH (DE) | 2019-07-24 | — | — | EP | disclosed |
| EP-2911002-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-07-17 | — | — | EP | disclosed |
| CN-109929156-A | A kind of freedom from cracking rubber soles and preparation method thereof | 福建省东协橡塑实业有限公司 | 2019-06-25 | — | — | CN | disclosed |
| CN-109929156-A | A kind of freedom from cracking rubber soles and preparation method thereof | 福建省东协橡塑实业有限公司 | 2019-06-25 | — | — | CN | disclosed |
| US-10331031-B2 | Resin composition, resist pattern-forming method and polymer | JSR CORPORATION (JP) | 2019-06-25 | — | — | US | disclosed |
| CN-109929153-A | A kind of sole rubber freedom from cracking master batch and its preparation method and application | 福建省东协橡塑实业有限公司 | 2019-06-25 | — | — | CN | disclosed |
| CN-109929153-A | A kind of sole rubber freedom from cracking master batch and its preparation method and application | 福建省东协橡塑实业有限公司 | 2019-06-25 | — | — | CN | disclosed |
| US-10328320-B2 | Golf club grip and golf club | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2019-06-25 | — | — | US | disclosed |
| CN-109890890-A | Rubber composition | 花王株式会社 | 2019-06-14 | — | — | CN | disclosed |
| US-10303055-B2 | Resist composition and method for forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-05-28 | — | — | US | disclosed |
| US-10303058-B2 | Pattern forming method, treating agent, electronic device, and method for manufacturing the same | FUJIFILM CORPORATION (JP) | 2019-05-28 | — | — | US | disclosed |
| US-20190155162-A1 | PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT | JSR CORPORATION (JP) | 2019-05-23 | — | — | US | disclosed |
| US-20190146340-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-05-16 | — | — | US | disclosed |
| EP-3482973-A1 | PNEUMATIC TIRE | Sumitomo Rubber Industries, Ltd. (JP) | 2019-05-15 | — | — | EP | disclosed |
| US-10286269-B2 | Grip for sporting goods and golf club | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2019-05-14 | — | — | US | disclosed |
| US-10279234-B2 | Golf club grip and golf club | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2019-05-07 | — | — | US | disclosed |
| US-20190126114-A1 | GOLF CLUB GRIP AND GOLF CLUB | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2019-05-02 | — | — | US | disclosed |
| US-20190126111-A1 | GOLF CLUB GRIP AND GOLF CLUB | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2019-05-02 | — | — | US | disclosed |
| US-10272721-B2 | Pneumatic tire including inner liner | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2019-04-30 | — | — | US | disclosed |
| EP-2505576-B1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-24 | — | — | EP | disclosed |
| EP-3007004-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-17 | — | — | EP | disclosed |
| US-20190094689-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| US-20190094691-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| CN-105531630-B | Semi-conductive member for electrophotographic apparatus | 株式会社大阪曹达 | 2019-03-12 | — | — | CN | disclosed |
| US-20190056657-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-02-21 | — | — | US | disclosed |
| US-10189781-B2 | Onium salt and composition comprising the same | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2019-01-29 | — | — | US | disclosed |
| US-20190025695-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-01-24 | — | — | US | disclosed |
| US-20190025699-A1 | FILM-FORMING MATERIAL FOR RESIST PROCESS AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-01-24 | — | — | US | disclosed |
| EP-3431308-A1 | METHOD FOR PRODUCING RUBBER COMPOSITION FOR A HEAVY-DUTY TIRE TREAD | Sumitomo Rubber Industries, Ltd. (JP) | 2019-01-23 | — | — | EP | disclosed |
| US-20190004426-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| US-10158082-B2 | Semiconducting component for electrographic device | OSAKA SODA CO., LTD. (JP) | 2018-12-18 | — | — | US | disclosed |
| CN-104391429-B | Radiation sensitive resin composition, polymer and resist pattern forming method | JSR株式会社 | 2018-12-18 | — | — | CN | disclosed |
| EP-3254872-B1 | PNEUMATIC TIRE | SUMITOMO RUBBER IND (JP) | 2018-11-28 | — | — | EP | disclosed |
| US-20180329298-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2018-11-15 | — | — | US | disclosed |
| EP-3317344-B1 | RUBBER AND HYDRAULIC HOSE COMPRISING A INNER TUBE MADE OF THE RUBBER MATERIAL | EATON INTELLIGENT POWER LTD (IE) | 2018-11-14 | — | — | EP | disclosed |
| US-20180319740-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND | JSR CORPORATION (JP) | 2018-11-08 | — | — | US | disclosed |
| US-20180321585-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND ACID DIFFUSION CONTROL AGENT | JSR CORPORATION (JP) | 2018-11-08 | — | — | US | disclosed |
| US-20180299773-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2018-10-18 | — | — | US | disclosed |
| US-20180284607-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-10-04 | — | — | US | disclosed |
| US-10088750-B2 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | JSR CORPORATION (JP) | 2018-10-02 | — | — | US | disclosed |
| US-20180273721-A1 | RUBBER AND HYDRAULIC HOSE COMPRISING A INNER TUBE MADE OF THE RUBBER MATERIAL | EATON INTELLIGENT POWER LIMITED (IE) | 2018-09-27 | — | — | US | disclosed |
| US-10082733-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2018-09-25 | — | — | US | disclosed |
| US-20180267406-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2018-09-20 | — | — | US | disclosed |
| US-10077335-B2 | Fiber reinforced polyamide resin material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-09-18 | — | — | US | disclosed |
| US-10073344-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2018-09-11 | — | — | US | disclosed |
| US-10065092-B2 | Golf club grip, golf club and method for producing golf club grip | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2018-09-04 | — | — | US | disclosed |
| US-20180246405-A1 | MATERIAL FOR LITHOGRAPHY, PRODUCTION METHOD THEREFOR, COMPOSITION FOR LITHOGRAPHY, PATTERN FORMATION METHOD, COMPOUND, RESIN, AND METHOD FOR PURIFYING THE COMPOUND OR THE RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-08-30 | — | — | US | disclosed |
| EP-2596933-B1 | PNEUMATIC TIRE AND PROCESS FOR PRODUCTION THEREOF, AND TIRE CURING BLADDER | SUMITOMO RUBBER IND (JP) | 2018-08-29 | — | — | EP | disclosed |
| CN-108463773-A | Radiation sensitive resin composition, resist pattern forming method and acid diffusion controlling agent | JSR株式会社 | 2018-08-28 | — | — | CN | disclosed |
| US-20180217499-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-08-02 | — | — | US | disclosed |
| US-20180217503-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-08-02 | — | — | US | disclosed |
| EP-3348542-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING AMORPHOUS FILM, MATERIAL FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, COMPOSTION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-07-18 | — | — | EP | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20180186111-A1 | PNEUMATIC TIRE AND METHOD FOR MANUFACTURING THE SAME, AND TIRE VULCANIZING BLADDER | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2018-07-05 | — | — | US | disclosed |
| EP-3343290-A1 | LITHOGRAPHY MATERIAL AND MANUFACTURING METHOD THEREFOR, LITHOGRAPHY COMPOSITION, PATTERN FORMING METHOD, COMPOUND, RESIN, AND REFINING METHOD FOR COMPOUND AND RESIN | A School Corporation Kansai University (JP) | 2018-07-04 | — | — | EP | disclosed |
| CN-105860328-B | Anti-pollution antibacterial tablecloth | 武汉馨雅美纺织品有限公司 | 2018-06-29 | — | — | CN | disclosed |
| US-20180178097-A1 | GOLF CLUB GRIP AND GOLF CLUB | DUNLOP SPORTS CO. LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180155524-A1 | FLUOROELASTOMER COMPOSITION | SOLVAY SPECIALTY POLYMERS ITALY S.P.A. (IT) | 2018-06-07 | — | — | US | disclosed |
| EP-2476662-B1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-1566693-B1 | Use of a Resist Composition for Immersion Exposure and Pattern Formation Method Using the Composition | FUJIFILM CORP (JP) | 2018-05-23 | — | — | EP | disclosed |
| EP-3317344-A1 | RUBBER AND HYDRAULIC HOSE COMPRISING A INNER TUBE MADE OF THE RUBBER MATERIAL | Eaton Intelligent Power Limited (IE) | 2018-05-09 | — | — | EP | disclosed |
| US-20180107113-A1 | RESIST BASE MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-04-19 | — | — | US | disclosed |
| EP-3303464-A1 | FLUOROELASTOMER COMPOSITION | Solvay Specialty Polymers Italy S.p.A. (IT) | 2018-04-11 | — | — | EP | disclosed |
| EP-2792714-B9 | MOLDED PRODUCTS | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-04-04 | — | — | EP | disclosed |
| US-9931896-B2 | Run flat tire | TOYO TIRE & RUNNER CO., LTD. (JP) | 2018-04-03 | — | — | US | disclosed |
| US-20180081270-A1 | RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-03-22 | — | — | US | disclosed |
| US-9921474-B2 | Pattern-forming method and composition | JSR CORPORATION (JP) | 2018-03-20 | — | — | US | disclosed |
| US-20180074402-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-20180074404-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-20180074406-A1 | COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN USING IT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-9914330-B2 | Run flat tire and method for producing same | TOYO TIRE & RUBBER CO., LTD. (JP) | 2018-03-13 | — | — | US | disclosed |
| EP-2902434-B1 | FIBER-REINFORCED POLYAMIDE RESIN MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-03-07 | — | — | EP | disclosed |
| US-9908831-B2 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-03-06 | — | — | US | disclosed |
| EP-3285119-A1 | RADIATION-SENSITIVE COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-21 | — | — | EP | disclosed |
| EP-2570459-B1 | POLYAMIDE RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-02-21 | — | — | EP | disclosed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-20180043224-A1 | GOLF CLUB GRIP AND GOLF CLUB | DUNLOP SPORTS CO. LTD. (JP) | 2018-02-15 | — | — | US | disclosed |
| EP-2599814-B1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-02-14 | — | — | EP | disclosed |
| CN-107690451-A | FLUOROELASTOMER COMPOSITION | 索尔维特殊聚合物意大利有限公司 | 2018-02-13 | — | — | CN | disclosed |
| EP-3279190-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-3279730-A1 | RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND RESIST PATTERN-FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-3279728-A1 | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-3279727-A1 | COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN IN WHICH SAME IS USED | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-3279731-A1 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| CN-103987782-B | Molded article | 三菱瓦斯化学株式会社 | 2018-02-06 | — | — | CN | disclosed |
| EP-2875968-B1 | PNEUMATIC TIRE PROVIDED WITH INNER LINER | SUMITOMO RUBBER IND (JP) | 2018-01-31 | — | — | EP | disclosed |
| EP-3029109-B1 | CROSSLINKING COMPOSITION EXHIBITING EXCELLENT STORAGE STABILITY | OSAKA SODA CO LTD (JP) | 2018-01-31 | — | — | EP | disclosed |
| CN-104507706-B | Pneumatic tire with inner liner | 住友橡胶工业株式会社 | 2018-01-30 | — | — | CN | disclosed |
| US-9874816-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2018-01-23 | — | — | US | disclosed |
| EP-2468702-B1 | METHOD FOR PRODUCING ARYL, HETEROARYL, OR ALKENYL-SUBSTITUTED UNSATURATED HYDROCARBON | NIPPON SODA CO (JP) | 2018-01-17 | — | — | EP | disclosed |
| CN-104684972-B | Fibre strengthening polyamide resin material | 三菱瓦斯化学株式会社 | 2018-01-16 | — | — | CN | disclosed |
| US-9849735-B2 | Run flat tire | TOYO TIRE & RUBBER CO., LTD. (JP) | 2017-12-26 | — | — | US | disclosed |
| US-20170363961-A9 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| EP-1976926-B1 | RUBBER MIXTURES | EVONIK DEGUSSA GMBH (DE) | 2017-12-20 | — | — | EP | disclosed |
| CN-107471922-A | Pneumatic tire | 住友橡胶工业株式会社 | 2017-12-15 | — | — | CN | disclosed |
| US-9834043-B2 | Run flat tire | TOYO TIRE & RUBBER CO., LTD. (JP) | 2017-12-05 | — | — | US | disclosed |
| US-9817311-B2 | Resist pattern-forming method, substrate-processing method, and photoresist composition | JSR CORPORATION (JP) | 2017-11-14 | — | — | US | disclosed |
| US-20170322492-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| EP-2746064-B1 | Antiozonant for polymers | SUMITOMO RUBBER IND (JP) | 2017-11-01 | — | — | EP | disclosed |
| EP-2993060-B1 | PNEUMATIC TIRE | SUMITOMO RUBBER IND (JP) | 2017-10-11 | — | — | EP | disclosed |
| EP-3229075-A1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR Corporation (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-9785048-B2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-20170285482-A1 | ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| EP-3222440-A1 | PNEUMATIC TIRE | Sumitomo Rubber Industries, Ltd. (JP) | 2017-09-27 | — | — | EP | disclosed |
| US-20170269476-A1 | PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-09-21 | — | — | US | disclosed |
| US-20170267027-A1 | PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2017-09-21 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9746769-B2 | — | — | 2017-08-29 | — | — | US | disclosed |
| EP-2792714-B1 | MOLDED PRODUCTS | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| US-9717965-B2 | Golf club grip and golf club | Dunlop Sports Co. Ltd (JP) | 2017-08-01 | — | — | US | disclosed |
| US-9720322-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| CN-104582979-B | Possesses the pneumatic tire of inner liner | 住友橡胶工业株式会社 | 2017-08-01 | — | — | CN | disclosed |
| US-20170211288-A1 | RUBBER BEARING | DENKA COMPANY LIMITED (JP) | 2017-07-27 | — | — | US | disclosed |
| EP-2003148-B1 | RADIATION-SENSITIVE RESIN COMPOSITION COMPRISING A FLUORINE-CONTAINING POLYMER | JSR CORP (JP) | 2017-07-19 | — | — | EP | disclosed |
| US-20170199453-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-9703195-B2 | Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound | JSR CORPORATION (JP) | 2017-07-11 | — | — | US | disclosed |
| US-20170182386-A1 | GRIP FOR SPORTING GOODS AND GOLF CLUB | DUNLOP SPORTS CO. LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170183279-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-06-29 | — | — | US | disclosed |
| US-9688844-B2 | Polyamide resin-type composite material and method for producing same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-20170174712-A1 | Silicon-containing azodicarboxamides, their preparation and use | EVOINIK DEGUSSA GmbH (DE) | 2017-06-22 | — | — | US | disclosed |
| EP-3181571-A1 | SILICON-CONTAINING AZODICARBOXAMIDES, THEIR PREPARATION AND USE | Evonik Degussa GmbH (DE) | 2017-06-21 | — | — | EP | disclosed |
| CN-103865191-B | Poly (vinyl chloride) resin composition and the insulated electric conductor of the poly (vinyl chloride) resin composition is used | 日立金属株式会社 | 2017-06-16 | — | — | CN | disclosed |
| US-20170145142-A1 | RESIST MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-05-25 | — | — | US | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9651864-B2 | Negative resist composition, method for producing relief pattern using the same, and electronic component using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2017-05-16 | — | — | US | disclosed |
| US-20170131632-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | JSR CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-20170115570-A1 | RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER | JSR CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9630077-B2 | Grip for sporting goods and golf club | DUNLAP SPORTS CO. LTD. (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9624367-B2 | Pneumatic tire | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2017-04-18 | — | — | US | disclosed |
| EP-2586813-B1 | REACTIVE POLYAMIDE RESIN AND POLYAMIDE RESIN COMPOSITIONS | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-04-05 | — | — | EP | disclosed |
| EP-2743769-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYPHENOL COMPOUND USED THEREIN, AND ALCOHOL COMPOUND CAPABLE OF BEING DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-03-22 | — | — | EP | disclosed |
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-9598392-B2 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-03-21 | — | — | US | disclosed |
| US-20170075220-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-03-16 | — | — | US | disclosed |
| EP-3141957-A1 | RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-03-15 | — | — | EP | disclosed |
| US-9588423-B2 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | JSR CORPORATION (JP) | 2017-03-07 | — | — | US | disclosed |
| US-20170058079-A1 | POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD | A SCHOOL CORPORATION KANSAI UNIVERSITY (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20170059989-A1 | POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2017-02-09 | — | — | US | disclosed |
| EP-2883714-B1 | PNEUMATIC TIRE PROVIDED WITH INNER LINER | SUMITOMO RUBBER IND (JP) | 2017-02-01 | — | — | EP | disclosed |
| US-9557641-B2 | Photoresist composition, resist pattern-forming method, acid diffusion control agent, and compound | JSR CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| EP-2474538-B1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-01-25 | — | — | EP | disclosed |
| EP-3118684-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-01-18 | — | — | EP | disclosed |
| EP-2436733-B1 | POLYAMIDE RESIN COMPOSITION AND MOLDED ARTICLE | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-01-11 | — | — | EP | disclosed |
| US-9540339-B2 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-01-10 | — | — | US | disclosed |
| EP-3112410-A1 | CROSS-LINKABLE NITRILE RUBBER COMPOSITION AND CROSS-LINKED RUBBER PRODUCT | Zeon Corporation (JP) | 2017-01-04 | — | — | EP | disclosed |
| EP-2781504-B1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-01-04 | — | — | EP | disclosed |
| US-9529259-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2016-12-22 | — | — | US | disclosed |
| US-9523911-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound | JSR CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160363859-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-12-15 | — | — | US | disclosed |
| WO-2016193202-A1 | FLUOROELASTOMER COMPOSITION | SOLVAY SPECIALTY POLYMERS ITALY S.P.A. (IT) | 2016-12-08 | — | — | WO | disclosed |
| US-20160339311-A1 | GOLF CLUB GRIP, GOLF CLUB AND METHOD FOR PRODUCING GOLF CLUB GRIP | DUNLOP SPORTS CO., LTD. (JP) | 2016-11-24 | — | — | US | disclosed |
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| EP-1652692-B1 | Rubber composition for tire tread and pneumatic tire comprising the same | SUMITOMO RUBBER IND (JP) | 2016-11-16 | — | — | EP | disclosed |
| US-20160327866-A1 | PATTERN FORMING METHOD, TREATING AGENT, ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20160320705-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-9477149-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2016-10-25 | — | — | US | disclosed |
| US-20160299432-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2016-10-13 | — | — | US | disclosed |
| EP-1580598-B1 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORP (JP) | 2016-10-12 | — | — | EP | disclosed |
| CN-106029767-A | Cross-linkable nitrile rubber composition and cross-linked rubber product | 日本瑞翁株式会社 | 2016-10-12 | — | — | CN | disclosed |
| US-20160291462-A1 | PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT | JSR CORPORATION (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160266489-A1 | RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHOTORESIST COMPOSITION | JSR CORPORATION (JP) | 2016-09-15 | — | — | US | disclosed |
| US-9434609-B2 | Method for forming pattern, and polysiloxane composition | JSR CORPORATION (JP) | 2016-09-06 | — | — | US | disclosed |
| US-20160252818-A9 | PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION METHOD | JSR CORPORATION (JP) | 2016-09-01 | — | — | US | disclosed |
| EP-3062151-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-08-31 | — | — | EP | disclosed |
| EP-1739485-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2016-08-31 | — | — | EP | disclosed |
| CN-105860328-A | Antifouling and antibacterial tablecloth | 武汉馨雅美纺织品有限公司 | 2016-08-17 | — | — | CN | disclosed |
| US-9417527-B2 | Resist pattern-forming method, substrate-processing method, and photoresist composition | JSR CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-20160229801-A1 | ONIUM SALT AND COMPOSITION COMPRISING THE SAME | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2016-08-11 | — | — | US | disclosed |
| CN-103772774-B | Chlorine-containing resin composition, use its resin-formed body, electric wire and cable | 日立金属株式会社 | 2016-08-10 | — | — | CN | disclosed |
| US-20160222161-A1 | CROSSLINKING COMPOSITION EXHIBITING EXCELLENT STORAGE STABILITY | OSAKA SODA CO., LTD. (JP) | 2016-08-04 | — | — | US | disclosed |
| US-20160225997-A1 | SEMICONDUCTING COMPONENT FOR ELECTROGRAPHIC DEVICE | OSAKA SODA CO., LTD. (JP) | 2016-08-04 | — | — | US | disclosed |
| EP-3051350-A2 | ALCOHOLIC COMPOUND AND METHOD FOR PRODUCING ALCOHOLIC COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-08-03 | — | — | EP | disclosed |
| US-9403959-B2 | Antiozonant for polymers | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20160202608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-07-14 | — | — | US | disclosed |
| CN-103173226-B | Method for forming wiring, distribution formation etching solution | MEC股份有限公司 | 2016-07-06 | — | — | CN | disclosed |
| US-20160185999-A1 | RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER | JSR CORPORATION (JP) | 2016-06-30 | — | — | US | disclosed |
| US-20160176840-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-06-23 | — | — | US | disclosed |
| EP-3029524-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | JSR Corporation (JP) | 2016-06-08 | — | — | EP | disclosed |
| EP-3029109-A1 | CROSSLINKING COMPOSITION EXHIBITING EXCELLENT STORAGE STABILITY | Osaka Soda Co., Ltd. (JP) | 2016-06-08 | — | — | EP | disclosed |
| US-9354516-B2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-05-31 | — | — | US | disclosed |
| US-9354523-B2 | Composition for resist pattern-refinement, and fine pattern-forming method | JSR CORPORATION (JP) | 2016-05-31 | — | — | US | disclosed |
| US-20160145231-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160136492-A1 | GRIP FOR SPORTING GOODS AND GOLF CLUB | DUNLOP SPORTS CO. LTD. (JP) | 2016-05-19 | — | — | US | disclosed |
| CN-105579436-A | Onium salt, and composition containing same | ASAHI KASEI E MATERIALS CORP | 2016-05-11 | — | — | CN | disclosed |
| US-9335630-B2 | Pattern-forming method, and radiation-sensitive composition | JSR CORPORATION (JP) | 2016-05-10 | — | — | US | disclosed |
| US-20160124303-A1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-05-05 | — | — | US | disclosed |
| CN-105531630-A | Semi-conductive member for electrophotographic apparatus | DAISO CO LTD | 2016-04-27 | — | — | CN | disclosed |
| US-9323146-B2 | Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base | JSR CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| EP-3007004-A1 | RESIST COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2016-04-13 | — | — | EP | disclosed |
| US-20160097978-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-04-07 | — | — | US | disclosed |
| EP-2615139-B1 | POLYAMIDE RESIN-BASED COMPOSITE MATERIAL AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2016-03-30 | — | — | EP | disclosed |
| US-9298090-B2 | — | — | 2016-03-29 | — | — | US | disclosed |
| US-20160068666-A1 | PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2016-03-10 | — | — | US | disclosed |
| US-20160068672-A1 | PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2016-03-10 | — | — | US | disclosed |
| EP-2993060-A1 | PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2016-03-09 | — | — | EP | disclosed |
| EP-2993059-A1 | PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2016-03-09 | — | — | EP | disclosed |
| US-20160062237-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9268219-B2 | Photoresist composition and resist pattern-forming method | JSR CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9268229-B2 | Composition for forming resist underlayer film, and pattern-forming method | JSR CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9261780-B2 | Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound | JSR CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9259969-B2 | Pneumatic tire including inner liner | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20160041465-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-11 | — | — | US | disclosed |
| US-20160031268-A1 | RUN FLAT TIRE | TOYO TIRE & RUBBER CO., LTD. (JP) | 2016-02-04 | — | — | US | disclosed |
| US-9250526-B2 | Composition for forming resist underlayer film, and pattern-forming method | JSR CORPORATION (JP) | 2016-02-02 | — | — | US | disclosed |
| US-9239517-B2 | Compound, radiation-sensitive composition and resist pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-01-19 | — | — | US | disclosed |
| US-20160011517-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20160009146-A1 | RUN FLAT TIRE | TOYO TIRE & RUBBER CO., LTD. (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20160011513-A1 | COMPOSITION FOR FORMING FINE RESIST PATTERN, AND FINE PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20150376157-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOL DERIVATIVE FOR USE IN THE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-12-31 | — | — | US | disclosed |
| US-9223207-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| EP-1698937-B1 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORP (JP) | 2015-12-23 | — | — | EP | disclosed |
| EP-2955575-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYPHENOL DERIVATIVE USED IN SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2015-12-16 | — | — | EP | disclosed |
| US-9213236-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-20150355550-A1 | PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION METHOD | JSR CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |
| US-20150355539-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |
| US-20150355546-A1 | COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING METHOD, AND POLYSILOXANE COMPOUND | JSR CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |
| US-20150352910-A1 | RUN FLAT TIRE | TOYO TIRE & RUBBER CO., LTD. (JP) | 2015-12-10 | — | — | US | disclosed |
| US-20150343854-A1 | RUN FLAT TIRE AND METHOD FOR PRODUCING SAME | TOYO TIRE & RUBBER CO., LTD. (JP) | 2015-12-03 | — | — | US | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| CN-103068541-B | Pneumatic tire, method for manufacturing same, and bladder for tire vulcanization | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2015-11-25 | — | — | CN | disclosed |
| US-9188862-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20150323866-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150322206-A1 | FIBER REINFORCED POLYAMIDE RESIN MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150322245-A1 | GOLF CLUB GRIP AND GOLF CLUB | DUNLOP SPORTS CO., LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-9182666-B2 | Cyclic compound, method for producing the same, radiation-sensitive composition, and resist pattern formation method | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2015-11-10 | — | — | US | disclosed |
| US-20150306921-A1 | RUN FLAT TIRE | TOYO TIRE & RUBBER CO., LTD. (JP) | 2015-10-29 | — | — | US | disclosed |
| US-20150309406-A9 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND | JSR CORPORATION (JP) | 2015-10-29 | — | — | US | disclosed |
| US-9170488-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| US-9164387-B2 | Pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9158196-B2 | Radiation-sensitive resin composition and pattern-forming method | JSR CORPORATION (JP) | 2015-10-13 | — | — | US | disclosed |
| US-20150286136-A1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-10-08 | — | — | US | disclosed |
| EP-2644637-B1 | POLYAMIDE RESIN AND METHOD FOR MOLDING SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-10-07 | — | — | EP | disclosed |
| EP-2530119-B1 | ACRYLIC RUBBER COMPOSITION AND RUBBER CROSSLINKED PRODUCT | ZEON CORP (JP) | 2015-09-30 | — | — | EP | disclosed |
| US-9146466-B2 | Resist composition, resist pattern-forming method, and resist solvent | JSR CORPORATION (JP) | 2015-09-29 | — | — | US | disclosed |
| CN-102471186-B | Process for preparing aryl-, heteroaryl-or alkenyl-substituted unsaturated hydrocarbons | NIPPON SODA CO.,LTD. (JP) | 2015-09-23 | — | — | CN | disclosed |
| US-9140984-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2015-09-22 | — | — | US | disclosed |
| US-20150253670-A1 | PATTERN-FORMING METHOD AND COMPOSITION | JSR CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| EP-2915835-A1 | Method for producing rubber composition | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2015-09-09 | — | — | EP | disclosed |
| US-9128370-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-09-08 | — | — | US | disclosed |
| CN-102597878-B | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORP. (JP) | 2015-09-02 | — | — | CN | disclosed |
| US-9122153-B2 | Cyclic compound, method for producing same, composition, and method for forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9122154-B2 | Radiation-sensitive resin composition, and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9122163-B2 | — | — | 2015-09-01 | — | — | US | disclosed |
| US-20150239293-A1 | PNEUMATIC TIRE INCLUDING INNER LINER | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2015-08-27 | — | — | US | disclosed |
| EP-2911002-A1 | RESIST COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2015-08-26 | — | — | EP | disclosed |
| CN-102482478-B | Acrylic rubber composition and crosslinked product thereof | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2015-08-26 | — | — | CN | disclosed |
| US-9116427-B2 | Composition for forming resist underlayer film and pattern-forming method | JSR CORPORATION (JP) | 2015-08-25 | — | — | US | disclosed |
| US-9104102-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-08-11 | — | — | US | disclosed |
| US-20150218344-A1 | POLYETHER-POLYAMIDE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-08-06 | — | — | US | disclosed |
| US-20150218348-A1 | POLYETHER POLYAMIDE RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-08-06 | — | — | US | disclosed |
| EP-2902434-A1 | FIBER-REINFORCED POLYAMIDE RESIN MATERIAL | Mitsubishi Gas Chemical Company, Inc. (JP) | 2015-08-05 | — | — | EP | disclosed |
| US-20150202923-A1 | PNEUMATIC TIRE INCLUDING INNER LINER | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2015-07-23 | — | — | US | disclosed |
| CN-102194543-B | Radiation resistant electric wire and radiation resistant cable | HITACHI CABLE | 2015-07-08 | — | — | CN | disclosed |
| US-20150177616-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2015-06-25 | — | — | US | disclosed |
| EP-2886609-A1 | POLYETHER POLYAMIDE RESIN COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2015-06-24 | — | — | EP | disclosed |
| EP-2886607-A1 | POLYETHER-POLYAMIDE COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2015-06-24 | — | — | EP | disclosed |
| EP-2883714-A1 | PNEUMATIC TIRE PROVIDED WITH INNER LINER | Sumitomo Rubber Industries, Ltd. (JP) | 2015-06-17 | — | — | EP | disclosed |
| US-20150160556-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-06-11 | — | — | US | disclosed |
| US-9052600-B2 | Method for forming resist pattern and composition for forming protective film | JSR CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| CN-104672444-A | Polyamide resin and polyamide composition formed by same | KINGFA SCIENCE & TECHNOLOGY CO | 2015-06-03 | — | — | CN | disclosed |
| CN-104684972-A | Fiber-reinforced polyamide resin material | MITSUBISHI GAS CHEMICAL CO | 2015-06-03 | — | — | CN | disclosed |
| EP-2875968-A1 | PNEUMATIC TIRE PROVIDED WITH INNER LINER | Sumitomo Rubber Industries, Ltd. (JP) | 2015-05-27 | — | — | EP | disclosed |
| US-9040221-B2 | Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound | JSR CORPORATION (JP) | 2015-05-26 | — | — | US | disclosed |
| US-9034559-B2 | Pattern-forming method, and radiation-sensitive composition | JSR CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-9028942-B2 | Fluoroelastomer composition and molded article | DAIKIN INDUSTRIES, LTD. (JP) | 2015-05-12 | — | — | US | disclosed |
| US-9029067-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-9023584-B2 | Radiation-sensitive composition, and compound | JSR CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-9023576-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| CN-104508045-A | Polyether-polyamide composition | MITSUBISHI GAS CHEMICAL CO | 2015-04-08 | — | — | CN | disclosed |
| CN-104508044-A | Polyether polyamide resin composition | MITSUBISHI GAS CHEMICAL CO | 2015-04-08 | — | — | CN | disclosed |
| US-20150093703-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-20150093704-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST-PATTERNING METHOD, AND BLOCK COPOLYMER | JSR CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-8993223-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8993677-B2 | Reactive polyamide resins and polyamide resin compositions | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-03-31 | — | — | US | disclosed |
| CN-103068906-B | Fluorine-containing elastomer composition and molded article | DAIKIN IND LTD | 2015-03-25 | — | — | CN | disclosed |
| US-20150079520-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | JSR CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |
| US-8980539-B2 | Developer | JSR CORPORATION (JP) | 2015-03-17 | — | — | US | disclosed |
| CN-104391429-A | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORP | 2015-03-04 | — | — | CN | disclosed |
| US-8969629-B2 | Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8968980-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20150048539-A1 | POLYAMIDE RESIN-TYPE COMPOSITE MATERIAL AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-02-19 | — | — | US | disclosed |
| US-20150050600-A9 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-02-19 | — | — | US | disclosed |
| US-20150048046-A1 | METHOD FOR FORMING PATTERN, AND POLYSILOXANE COMPOSITION | JSR CORPORATION (JP) | 2015-02-19 | — | — | US | disclosed |
| US-20150048051-A1 | RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHOTORESIST COMPOSITION | JSR CORPORATION (JP) | 2015-02-19 | — | — | US | disclosed |
| US-8956807-B2 | Method for forming resist pattern, and composition for forming resist underlayer film | JSR CORPORATION (JP) | 2015-02-17 | — | — | US | disclosed |
| US-20150030980-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-01-29 | — | — | US | disclosed |
| US-20150024215-A1 | SILVER-PLATED COATED BODY | MITSUBISHI PAPER MILLS LIMITED (JP) | 2015-01-22 | — | — | US | disclosed |
| US-8927200-B2 | Double patterning method | JSR CORPORATION (JP) | 2015-01-06 | — | — | US | disclosed |
| US-20150004547-A1 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-20150004544-A1 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-20150004545-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| EP-2487148-B1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2014-12-31 | — | — | EP | disclosed |
| US-20140363769-A1 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363766-A9 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363773-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8895122-B2 | Polyamide resin composition and molded product | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895121-B2 | Polyamide resin composition and molded article | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20140342288-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-20140342145-A1 | MOLDED PRODUCTS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8889335-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889336-B2 | Radiation-sensitive resin composition and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889919-B2 | Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8883937-B2 | Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-11-11 | — | — | US | disclosed |
| US-20140329178-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING THE SAME, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY,INC (JP) | 2014-11-06 | — | — | US | disclosed |
| US-20140329177-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-11-06 | — | — | US | disclosed |
| US-8877429-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| CN-103080188-B | Reactive polyamide resin and polyamide resin composition | MITSUBISHI GAS CHEMICAL CO.,INC. (JP) | 2014-10-29 | — | — | CN | disclosed |
| EP-2792714-A1 | MOLDED ARTICLE | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-10-22 | — | — | EP | disclosed |
| US-20140308615-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-10-16 | — | — | US | disclosed |
| US-20140302438-A1 | RESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, AND RESIST SOLVENT | JSR CORPORATION (JP) | 2014-10-09 | — | — | US | disclosed |
| US-20140295332-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-10-02 | — | — | US | disclosed |
| US-20140295350-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2014-10-02 | — | — | US | disclosed |
| US-8846292-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-09-30 | — | — | US | disclosed |
| EP-2781504-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-09-24 | — | — | EP | disclosed |
| EP-2781501-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-09-24 | — | — | EP | disclosed |
| US-8841407-B2 | Polyamide resins and processes for molding them | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-09-23 | — | — | US | disclosed |
| US-8835566-B2 | Rubber composition for vulcanization | DAISO CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-8829247-B2 | Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-09-09 | — | — | US | disclosed |
| US-20140248561-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-09-04 | — | — | US | disclosed |
| US-8822140-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2014-09-02 | — | — | US | disclosed |
| CN-102959014-B | Polyamide resin composition | MITSUBISHI GAS CHEMICAL CO | 2014-08-27 | — | — | CN | disclosed |
| CN-103180363-B | Polyamide resin and method for molding same | MITSUBISHI GAS CHEMICAL CO | 2014-08-27 | — | — | CN | disclosed |
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8815493-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8808975-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8808974-B2 | Method for forming pattern | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8809476-B2 | Polymer | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| CN-103987782-A | Molded article | MITSUBISHI GAS CHEMICAL CO | 2014-08-13 | — | — | CN | disclosed |
| US-8795954-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| CN-103946337-A | Hygrochromic/thermochromic composition and hygrochromic/thermochromic indicator | SAKURA COLOR PROD CORP | 2014-07-23 | — | — | CN | disclosed |
| US-8771923-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| CN-102803386-B | Polyamide resin composition and molded product | MITSUBISHI GAS CHEMICAL CO | 2014-07-02 | — | — | CN | disclosed |
| CN-102053493-B | Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same | JSR CORP | 2014-07-02 | — | — | CN | disclosed |
| US-8765355-B2 | Radiation sensitive resin composition, method for forming a pattern, polymer and compound | JSR CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-20140178825-A1 | DEVELOPER | JSR CORPORATION (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140179853-A1 | ANTIOZONANT FOR POLYMERS | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| EP-2468817-B1 | ACRYLIC RUBBER COMPOSITION AND CROSSLINKED PRODUCT THEREOF | DENKI KAGAKU KOGYO KK (JP) | 2014-06-25 | — | — | EP | disclosed |
| EP-2746064-A1 | Antiozonant for polymers | Sumitomo Rubber Industries, Ltd. (JP) | 2014-06-25 | — | — | EP | disclosed |
| US-8758978-B2 | Radiation-sensitive resin composition, resist pattern formation method, and polymer | JSR CORPORATION (JP) | 2014-06-24 | — | — | US | disclosed |
| EP-2743769-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYPHENOL COMPOUND USED THEREIN, AND ALCOHOL COMPOUND CAPABLE OF BEING DERIVED THEREFROM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-06-18 | — | — | EP | disclosed |
| EP-2743249-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-06-18 | — | — | EP | disclosed |
| CN-103865191-A | Polyvinyl chloride resin composition and insulated wire using polyvinyl chloride resin composition | HITACHI METALS LTD | 2014-06-18 | — | — | CN | disclosed |
| US-20140162190-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2014-06-12 | — | — | US | disclosed |
| CN-103857746-A | Semi-conductive rubber composition | DAISO CO LTD | 2014-06-11 | — | — | CN | disclosed |
| US-8748078-B2 | Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-06-10 | — | — | US | disclosed |
| US-20140154625-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2014-06-05 | — | — | US | disclosed |
| EP-2738605-A2 | Developer for resist pattern-forming method | JSR Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| US-8741537-B2 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8742179-B2 | Method for producing aryl, heteroaryl, or alkenyl-substituted unsaturated hydrocarbon | NIPPON SODA CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-20140147794-A1 | METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20140134544-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| EP-2415617-B1 | Polymer sheet for inner liner, polymer laminate for inner liner, and pneumatic tire | SUMITOMO RUBBER IND (JP) | 2014-05-14 | — | — | EP | disclosed |
| CN-103772774-A | Chlorine containing resin composition, resin molding body using same, electric wire and cable | HITACHI METALS LTD | 2014-05-07 | — | — | CN | disclosed |
| CN-102449068-B | Polyamide resin composition and molded article | MITSUBISHI GAS CHEMICAL CO | 2014-05-07 | — | — | CN | disclosed |
| CN-103764589-A | Method for producing hydraulic powder | KAO CORP | 2014-04-30 | — | — | CN | disclosed |
| US-8703401-B2 | Method for forming pattern and developer | JSR CORPORATION (JP) | 2014-04-22 | — | — | US | disclosed |
| US-8697343-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-04-15 | — | — | US | disclosed |
| US-8697335-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20140080066-A1 | DOUBLE PATTERNING METHOD | JSR CORPORATION (JP) | 2014-03-20 | — | — | US | disclosed |
| EP-1921511-B1 | Toner supply roller | SUMITOMO RUBBER IND (JP) | 2014-03-19 | — | — | EP | disclosed |
| CN-203485515-U | Automatically vulcanized welding type EPDM (ethylene propylene diene monomer) waterproof roll | WANG YONG | 2014-03-19 | — | — | CN | disclosed |
| US-8669042-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2014-03-11 | — | — | US | disclosed |
| EP-2530525-B1 | Method for forming pattern and developer | JSR CORP (JP) | 2014-02-26 | — | — | EP | disclosed |
| US-8656973-B2 | Polymer sheet for inner liner, polymer laminate for inner liner, and pneumatic tire | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2014-02-25 | — | — | US | disclosed |
| US-8658737-B2 | Acrylic rubber composition and cross-linked product thereof | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2014-02-25 | — | — | US | disclosed |
| US-8653371-B2 | Radiation resistant electric wire and radiation resistant cable | HITACHI CABLE, LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| US-8632945-B2 | Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-01-21 | — | — | US | disclosed |
| US-20140004463-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2014-01-02 | — | — | US | disclosed |
| US-8609318-B2 | Radiation-sensitive resin composition, method for forming resist pattern and polymer | JSR CORPORATION (JP) | 2013-12-17 | — | — | US | disclosed |
| US-8609319-B2 | Radiation-sensitive resin composition and resist film formed using the same | JSR CORPORATION (JP) | 2013-12-17 | — | — | US | disclosed |
| US-8609753-B2 | Acrylic rubber composition and cross-linked rubber product | ZEON CORPORATION (JP) | 2013-12-17 | — | — | US | disclosed |
| US-8603600-B2 | Polyamide resin compositions | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-12-10 | — | — | US | disclosed |
| US-8603726-B2 | Radiation-sensitive resin composition, polymer and compound | JSR CORPORATION (JP) | 2013-12-10 | — | — | US | disclosed |
| US-20130323653-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-12-05 | — | — | US | disclosed |
| US-8580480-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20130295505-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORP (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20130295506-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2013-11-07 | — | — | US | disclosed |
| US-8569404-B2 | Polyamide resin composition and molded article | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-10-29 | — | — | US | disclosed |
| US-20130280658-A1 | RADIATION-SENSITIVE COMPOSITION, AND COMPOUND | JSR CORPORATION (JP) | 2013-10-24 | — | — | US | disclosed |
| CN-101907828-B | Radiation-sensitive composition, protective film and inter layer insulating film, and process for forming the same | JSR CORP | 2013-10-16 | — | — | CN | disclosed |
| CN-102627598-B | Preparation method of N, N'-dipiperidyl thiourea | UNIV SHAANXI SCIENCE & TECH | 2013-10-09 | — | — | CN | disclosed |
| US-20130260316-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130260315-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130256264-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| EP-2644637-A1 | POLYAMIDE RESIN AND METHOD FOR MOLDING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-10-02 | — | — | EP | disclosed |
| US-8535871-B2 | Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer | JSR CORPORATION (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20130233825-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-09-12 | — | — | US | disclosed |
| US-20130233826-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-09-12 | — | — | US | disclosed |
| US-8530146-B2 | Method for forming resist pattern | JSR CORPORATION (JP) | 2013-09-10 | — | — | US | disclosed |
| US-20130230804-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2013-09-05 | — | — | US | disclosed |
| US-20130230803-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-09-05 | — | — | US | disclosed |
| US-20130224661-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224666-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130216948-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-08-22 | — | — | US | disclosed |
| CN-103250100-A | Radiation-sensitive resin composition, pattern formation method using same, polymer, and compound | JSR CORP | 2013-08-14 | — | — | CN | disclosed |
| US-8507575-B2 | Radiation-sensitive resin composition, polymer, and compound | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8501385-B2 | Positive-type radiation-sensitive composition, and resist pattern formation method | JSR CORPORATION (JP) | 2013-08-06 | — | — | US | disclosed |
| US-20130184431-A1 | POLYAMIDE RESINS AND PROCESSES FOR MOLDING THEM | Mitsubishi Gas Chemical Company ,Inc. (JP) | 2013-07-18 | — | — | US | disclosed |
| US-20130183624-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-07-18 | — | — | US | disclosed |
| EP-2615497-A1 | RESIST PATTERN FORMING METHOD | JSR Corporation (JP) | 2013-07-17 | — | — | EP | disclosed |
| EP-2615139-A1 | POLYAMIDE RESIN-BASED COMPOSITE MATERIAL AND METHOD FOR PRODUCING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-07-17 | — | — | EP | disclosed |
| WO-2013100158-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-04 | — | — | WO | disclosed |
| US-20130164695-A1 | METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2013-06-27 | — | — | US | disclosed |
| EP-2607424-A1 | FLUOROELASTOMER COMPOSITION AND MOLDED ARTICLE | Daikin Industries, Ltd. (JP) | 2013-06-26 | — | — | EP | disclosed |
| CN-103173226-A | Wiring forming method and etching solution for wiring formation | MEC TECHNOLOGY CO LTD | 2013-06-26 | — | — | CN | disclosed |
| CN-103180363-A | Polyamide resin and method for molding same | MITSUBISHI GAS CHEMICAL CO | 2013-06-26 | — | — | CN | disclosed |
| US-8470513-B2 | Radiation-sensitive resin composition and polymer | JSR CORPORATION (JP) | 2013-06-25 | — | — | US | disclosed |
| CN-103168080-A | Curable composition | CEMEDINE CO LTD | 2013-06-19 | — | — | CN | disclosed |
| US-20130150503-A1 | FLUOROELASTOMER COMPOSITION AND MOLDED ARTICLE | DAIKIN INDUSTRIES, LTD. (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20130149644-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20130143160-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2013-06-06 | — | — | US | disclosed |
| US-20130139941-A1 | PNEUMATIC TIRE AND METHOD FOR MANUFACTURING THE SAME, AND TIRE VULCANIZING BLADDER | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2013-06-06 | — | — | US | disclosed |
| EP-2599814-A1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-06-05 | — | — | EP | disclosed |
| EP-2596933-A1 | PNEUMATIC TIRE AND PROCESS FOR PRODUCTION THEREOF, AND TIRE CURING BLADDER | Sumitomo Rubber Industries, Ltd. (JP) | 2013-05-29 | — | — | EP | disclosed |
| US-20130131243-A1 | RUBBER COMPOSITION FOR GOLF BALL | BRIDGESTONE CORPORATION (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20130131243-A1 | RUBBER COMPOSITION FOR GOLF BALL | BRIDGESTONE CORPORATION (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20130131243-A1 | RUBBER COMPOSITION FOR GOLF BALL | BRIDGESTONE CORPORATION (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20130122423-A1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-05-16 | — | — | US | disclosed |
| US-20130122426-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2013-05-16 | — | — | US | disclosed |
| US-20130123439-A1 | REACTIVE POLYAMIDE RESINS AND POLYAMIDE RESIN COMPOSITIONS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-05-16 | — | — | US | disclosed |
| US-8440384-B2 | Compound, salt, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-05-14 | — | — | US | disclosed |
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20130108962-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130108965-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (TW) | 2013-05-02 | — | — | US | disclosed |
| EP-2586813-A1 | REACTIVE POLYAMIDE RESIN AND POLYAMIDE RESIN COMPOSITIONS | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-05-01 | — | — | EP | disclosed |
| CN-103080188-A | Reactive polyamide resin and polyamide resin composition | MITSUBISHI GAS CHEMICAL CO | 2013-05-01 | — | — | CN | disclosed |
| US-20130101942-A1 | METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2013-04-25 | — | — | US | disclosed |
| CN-103068906-A | Fluorine-containing elastomer composition and molded article | DAIKIN IND LTD | 2013-04-24 | — | — | CN | disclosed |
| CN-103068541-A | Pneumatic tire, method for manufacturing same, and bladder for tire vulcanization | SUMITOMO RUBBER IND | 2013-04-24 | — | — | CN | disclosed |
| US-20130095428-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-04-18 | — | — | US | disclosed |
| US-20130089817-A1 | PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-04-11 | — | — | US | disclosed |
| US-20130078571-A1 | PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130078402-A1 | POLYAMIDE RESIN COMPOSITIONS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-03-28 | — | — | US | disclosed |
| EP-2570459-A1 | POLYAMIDE RESIN COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2013-03-20 | — | — | EP | disclosed |
| US-20130062806-A1 | POLYAMIDE RESIN-TYPE COMPOSITE MATERIAL AND METHOD OF PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-03-14 | — | — | US | disclosed |
| CN-101659792-B | Radiation-proof resin composition and radiation-proof cable | HITACHI CABLE | 2013-03-13 | — | — | CN | disclosed |
| US-20130059252-A1 | METHOD FOR FORMING RESIST PATTERN AND COMPOSITION FOR FORMING PROTECTIVE FILM | JSR CORPORATION (JP) | 2013-03-07 | — | — | US | disclosed |
| CN-102959014-A | Polyamide resin composition | MITSUBISHI GAS CHEMICAL CO | 2013-03-06 | — | — | CN | disclosed |
| US-8389202-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2013-03-05 | — | — | US | disclosed |
| US-20130053526-A1 | POLYMER | JSR CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-8377627-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8361691-B2 | Radiation-sensitive composition and process for producing low-molecular compound for use therein | JSR CORPORATION (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20130022912-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130017376-A1 | NEGATIVE RESIST COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING THE SAME, AND ELECTRONIC COMPONENT USING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| EP-1645908-B1 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORP (JP) | 2013-01-09 | — | — | EP | disclosed |
| EP-2083048-B1 | RUBBER COMPOSITION FOR VULCANIZATION | DAISO CO LTD (JP) | 2013-01-02 | — | — | EP | disclosed |
| CN-102858879-A | Polyamide resin-based composite material and method for producing same | MITSUBISHI GAS CHEMICAL CO | 2013-01-02 | — | — | CN | disclosed |
| US-8334087-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2012-12-18 | — | — | US | disclosed |
| US-20120308938-A1 | METHOD FOR FORMING PATTERN AND DEVELOPER | JSR CORPORATION (JP) | 2012-12-06 | — | — | US | disclosed |
| EP-2530119-A1 | ACRYLIC RUBBER COMPOSITION AND RUBBER CROSSLINKED PRODUCT | Zeon Corporation (JP) | 2012-12-05 | — | — | EP | disclosed |
| EP-2530525-A1 | Method for forming pattern and developer | JSR Corporation (JP) | 2012-12-05 | — | — | EP | disclosed |
| CN-102812083-A | Acrylic rubber composition and rubber crosslinked product | ZEON CORP | 2012-12-05 | — | — | CN | disclosed |
| US-20120302674-A1 | ACRYLIC RUBBER COMPOSITION AND CROSS-LINKED RUBBER PRODUCT | ZEON CORPORATION (JP) | 2012-11-29 | — | — | US | disclosed |
| CN-102803386-A | Polyamide resin composition and molded product | MITSUBISHI GAS CHEMICAL CO | 2012-11-28 | — | — | CN | disclosed |
| US-20120295198-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| CN-102779572-A | Radiation resistant linear insulating electric wire | HITACHI CABLE KK | 2012-11-14 | — | — | CN | disclosed |
| US-20120282546-A1 | CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-11-08 | — | — | US | disclosed |
| US-20120282550-A1 | RADIATION-SENSITIVE COMPOSITION | JSR Corportion (JP) | 2012-11-08 | — | — | US | disclosed |
| US-20120276482-A1 | RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-11-01 | — | — | US | disclosed |
| US-20120251947-A1 | CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-10-04 | — | — | US | disclosed |
| EP-2505576-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-10-03 | — | — | EP | disclosed |
| CN-101313246-B | Radiation-sensitive resin composition | JSR CORP | 2012-10-03 | — | — | CN | disclosed |
| US-20120244478-A1 | RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2012-09-27 | — | — | US | disclosed |
| EP-2503392-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2012-09-26 | — | — | EP | disclosed |
| US-20120237876-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-8263315-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2012-09-11 | — | — | US | disclosed |
| US-8252863-B2 | Rubber mixtures | EVONIK DEGUSSA GMBH (DE) | 2012-08-28 | — | — | US | disclosed |
| EP-2487148-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-08-15 | — | — | EP | disclosed |
| US-8241833-B2 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2012-08-14 | — | — | US | disclosed |
| US-20120202150-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-08-09 | — | — | US | disclosed |
| EP-2485090-A1 | Radiation-sensitive resin composition for forming resist pattern | JSR Corporation (JP) | 2012-08-08 | — | — | EP | disclosed |
| CN-101570642-B | Radioresistant line jacketing material and radioresistant line cable | HITACHI CABLE | 2012-08-08 | — | — | CN | disclosed |
| CN-102627598-A | Preparation method of N, N'-dipiperidyl thiourea | UNIV SHAANXI SCIENCE & TECH | 2012-08-08 | — | — | CN | disclosed |
| US-20120183908-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| EP-2476662-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-18 | — | — | EP | disclosed |
| CN-102597878-A | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORP | 2012-07-18 | — | — | CN | disclosed |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| EP-2474518-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2474538-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2474565-A1 | CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120171615-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120171612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER | JSR CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120171379-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120171613-A1 | UPPER LAYER FILM-FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-8211624-B2 | Method for pattern formation and resin composition for use in the method | JSR CORPORATION (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20120164575-A1 | CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120164582-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120164576-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-28 | — | — | US | disclosed |
| EP-2468817-A1 | ACRYLIC RUBBER COMPOSITION AND CROSSLINKED PRODUCT THEREOF | Denki Kagaku Kogyo Kabushiki Kaisha (JP) | 2012-06-27 | — | — | EP | disclosed |
| EP-2468702-A1 | METHOD FOR PRODUCING ARYL, HETEROARYL, OR ALKENYL-SUBSTITUTED UNSATURATED HYDROCARBON | Nippon Soda Co., Ltd. (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-8207386-B2 | Rubber-like articles and rubber-like material-containing articles | NITTA CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20120156615-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120156621-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120156612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER | JSR CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120148952-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-8198007-B2 | Negative-working resist composition and pattern forming method using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20120141711-A1 | ACRYLIC RUBBER COMPOSITION AND CROSS-LINKED PRODUCT THEREOF | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2012-06-07 | — | — | US | disclosed |
| US-20120142975-A1 | METHOD FOR PRODUCING ARYL, HETEROARYL, OR ALKENYL-SUBSTITUTED UNSATURATED HYDROCARBON | NIPPON SODA CO., LTD. (JP) | 2012-06-07 | — | — | US | disclosed |
| CN-102482478-A | Acrylic rubber composition and crosslinked product thereof | DENKI KAGAKU KOGYO KK | 2012-05-30 | — | — | CN | disclosed |
| CN-102471186-A | Process for preparing aryl-, heteroaryl-or alkenyl-substituted unsaturated hydrocarbons | NIPPON SODA CO | 2012-05-23 | — | — | CN | disclosed |
| EP-2201852-B1 | Chemical resistant glove | SHOWA GLOVE CO (JP) | 2012-05-16 | — | — | EP | disclosed |
| EP-2182029-B1 | ADHESIVE SHEET MATERIAL FOR AGING PREVENTION AND METHOD OF PREVENTING CROSSLINKED RUBBER FROM AGING | YOKOHAMA RUBBER CO LTD (JP) | 2012-05-16 | — | — | EP | disclosed |
| CN-102459465-A | Polyamide resin composition and molded article | MITSUBISHI GAS CHEMICAL CO | 2012-05-16 | — | — | CN | disclosed |
| US-8178786-B2 | Radiation-proof sheath material and radiation-proof cable | HITACHI CABLE, LTD. (JP) | 2012-05-15 | — | — | US | disclosed |
| CN-102449068-A | Polyamide resin composition and molded article | MITSUBISHI GAS CHEMICAL CO | 2012-05-09 | — | — | CN | disclosed |
| US-8173351-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| EP-1950610-B1 | IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-8163462-B2 | Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device | RENESAS ELECTRONICS CORPORATION (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20120094048-A1 | POLYAMIDE RESIN COMPOSITION AND MOLDED ARTICLE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-04-19 | — | — | US | disclosed |
| US-20120094234-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |
| EP-2441801-A1 | POLYAMIDE RESIN COMPOSITION AND MOLDED PRODUCT | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-04-18 | — | — | EP | disclosed |
| EP-2441800-A1 | POLYAMIDE RESIN COMPOSITION AND MOLDED ARTICLE | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-04-18 | — | — | EP | disclosed |
| US-20120082934-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120082935-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING THE SAME | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| CN-102399380-A | Polymer sheet for inner liner, polymer laminate for inner liner, and pneumatic tire | SUMITOMO RUBBER IND | 2012-04-04 | — | — | CN | disclosed |
| US-20120076964-A1 | POLYAMIDE RESIN COMPOSITION AND MOLDED PRODUCT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120065303-A1 | POLYAMIDE RESIN COMPOSITION AND MOLDED ARTICLE | MITSUBISHI GAS CHEMICAL COMPANY INC (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120065291-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120058429-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120045719-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-02-23 | — | — | US | disclosed |
| US-20120034560-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER | JSR CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| EP-2415617-A1 | Polymer sheet for inner liner, polymer laminate for inner liner, and pneumatic tire | Sumitomo Rubber Industries, Ltd. (JP) | 2012-02-08 | — | — | EP | disclosed |
| US-8110334-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20120024447-A1 | POLYMER SHEET FOR INNER LINER, POLYMER LAMINATE FOR INNER LINER, AND PNEUMATIC TIRE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120028189-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| CN-101563421-B | Rubber composition for vulcanization | DAISO CO.,LTD. (JP) | 2011-12-28 | — | — | CN | disclosed |
| US-8043786-B2 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2011-10-25 | — | — | US | disclosed |
| US-8026444-B2 | Radiation-proof resin composition and radiation-proof cable | HITACHI CABLE, LTD. (JP) | 2011-09-27 | — | — | US | disclosed |
| CN-102194543-A | Radiation resistant electric wire and radiation resistant cable | HITACHI CABLE | 2011-09-21 | — | — | CN | disclosed |
| US-20110209898-A1 | RADIATION RESISTANT ELECTRIC WIRE AND RADIATION RESISTANT CABLE | HITACHI CABLE, LTD. | 2011-09-01 | — | — | US | disclosed |
| US-20110198730-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION | 2011-08-18 | — | — | US | disclosed |
| EP-1764647-B1 | Use of a positive resist composition for immersion exposure, positive resist composition and immersion lithographic pattern-forming method using the same | FUJIFILM CORP (JP) | 2011-08-17 | — | — | EP | disclosed |
| CN-101153395-B | Metal removing solution and metal removing method using the same | MEC CO LTD | 2011-07-20 | — | — | CN | disclosed |
| US-7977442-B2 | Radiation-sensitive composition, polymer and monomer | JSR CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20110160344-A1 | RUBBER COMPOSITION FOR VULCANIZATION | Daisco Co. Ltd (JP) | 2011-06-30 | — | — | US | disclosed |
| US-20110151378-A1 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20110123936-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110117489-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2011-05-19 | — | — | US | disclosed |
| US-20110111349-A1 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME | JSR CORPORATION (JP) | 2011-05-12 | — | — | US | disclosed |
| CN-102053493-A | Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same | JSR CORP | 2011-05-11 | — | — | CN | disclosed |
| US-20110101503-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-20110104612-A1 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| EP-2309332-A1 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2011-04-13 | — | — | EP | disclosed |
| US-20110076622-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-7906268-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-03-15 | — | — | US | disclosed |
| CN-101178561-B | Foamed rubber roller | SUMITOMO RUBBER IND | 2011-01-26 | — | — | CN | disclosed |
| US-7871751-B2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-01-18 | — | — | US | disclosed |
| CN-101939705-A | Cleaning blade for image-forming apparatus | SUMITOMO RUBBER IND | 2011-01-05 | — | — | CN | disclosed |
| US-7863363-B2 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2011-01-04 | — | — | US | disclosed |
| US-20100331440-A1 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER | JSR CORPORATION (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100323292-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100316424-A1 | CLEANING BLADE FOR IMAGE-FORMING APPARATUS | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100310991-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| US-20100310987-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| CN-101907828-A | Radiation-ray sensitive composition, diaphragm, interlayer dielectric and their formation method | JSR CORP | 2010-12-08 | — | — | CN | disclosed |
| US-20100297553-A1 | POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-11-25 | — | — | US | disclosed |
| EP-2251744-A1 | CLEANING BLADE FOR IMAGE-FORMING APPARATUS | Sumitomo Rubber Industries, Ltd. (JP) | 2010-11-17 | — | — | EP | disclosed |
| US-7817956-B2 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2010-10-19 | — | — | US | disclosed |
| CN-1916760-B | Acid generator, sulfonic acid derivative and radiation-sensitive resin composition | JSR CORP | 2010-10-13 | — | — | CN | disclosed |
| US-7811740-B2 | comprising acrylate resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, and a surfactant containing a fluorine compound or fluorine containing polyethers; resist pattern with good sensitivity, resolution, adhesion, and little in development defects; for an immersion exposure | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| EP-1832940-B1 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER IND (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-20100248167-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-7803511-B2 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJIFILM CORPORATION (JP) | 2010-09-28 | — | — | US | disclosed |
| US-20100239980-A1 | NEGATIVE-WORKING RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100190104-A1 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD | JSR CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| EP-1998233-B1 | Method for producing cleaning blade for use in image-forming apparatus and cleaning blade | SUMITOMO RUBBER IND (JP) | 2010-07-14 | — | — | EP | disclosed |
| EP-2201852-A1 | Chemical resistant glove | SHOWA GLOVE Co. (JP) | 2010-06-30 | — | — | EP | disclosed |
| EP-1253470-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-06-16 | — | — | EP | disclosed |
| US-20100138978-A1 | CHEMICAL RESISTANT GLOVE | SHOWA GLOVE CO. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-7715778-B2 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2010-05-11 | — | — | US | disclosed |
| EP-2182029-A1 | ADHESIVE SHEET MATERIAL FOR AGING PREVENTION AND METHOD OF PREVENTING CROSSLINKED RUBBER FROM AGING | The Yokohama Rubber Co., Ltd. (JP) | 2010-05-05 | — | — | EP | disclosed |
| CN-1890267-B | Rubbery product or rubbery substance containing product | NITTA CORP | 2010-04-28 | — | — | CN | disclosed |
| US-20100084181-A1 | RADIATION-PROOF SHEATH MATERIAL AND RADIATION-PROOF CABLE | HITACHI CABLE, LTD. | 2010-04-08 | — | — | US | disclosed |
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| EP-1225480-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20100051316-A1 | RADIATION-PROOF RESIN COMPOSITION AND RADIATION-PROOF CABLE | HITACHI CABLE, LTD. | 2010-03-04 | — | — | US | disclosed |
| CN-101659792-A | Radiation-proof resin composition and radiation-proof cable | HITACHI CABLE | 2010-03-03 | — | — | CN | disclosed |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| CN-100580581-C | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER IND | 2010-01-13 | — | — | CN | disclosed |
| US-20100003615-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| US-7642378-B2 | Lipid lowering biphenylcarboxamides | JANSSEN PHARMACEUTICA NV (BE) | 2010-01-05 | — | — | US | disclosed |
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090317742-A1 | Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device | NEC ELECTRONICS CORPORATION (JP) | 2009-12-24 | — | — | US | disclosed |
| EP-1238972-B1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORP (JP) | 2009-12-16 | — | — | EP | disclosed |
| US-20090305161-A1 | LIQUID IMMERSION LITHOGRAPHY | JSR CORPORATION (JP) | 2009-12-10 | — | — | US | disclosed |
| EP-2131240-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR Corporation (JP) | 2009-12-09 | — | — | EP | disclosed |
| EP-2128706-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR Corporation (JP) | 2009-12-02 | — | — | EP | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-20090280433-A1 | RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN | JSR CORPORATION (JP) | 2009-11-12 | — | — | US | disclosed |
| US-20090274977-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| CN-101570642-A | Radioresistant line jacketing material and radioresistant line cable | HITACHI CABLE (JP) | 2009-11-04 | — | — | CN | disclosed |
| CN-101563421-A | Rubber composition for vulcanization | DAISO CO LTD (JP) | 2009-10-21 | — | — | CN | disclosed |
| CN-100549869-C | The cleaning doctor that is used for imaging device | SUMITOMO RUBBER IND (JP) | 2009-10-14 | — | — | CN | disclosed |
| US-7592126-B2 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| EP-2100870-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR Corporation (JP) | 2009-09-16 | — | — | EP | disclosed |
| US-20090221751-A1 | Rubber Mixtures | EVONIK DEGUSSA GMBH (DE) | 2009-09-03 | — | — | US | disclosed |
| US-20090215941-A1 | RUBBER COMPOSITION FOR TIRE TREAD AND PNEUMATIC TIRE COMPRISING THE SAME | NAKAZONO TAKEO | 2009-08-27 | — | — | US | disclosed |
| US-20090202945-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| EP-2083048-A1 | RUBBER COMPOSITION FOR VULCANIZATION | DAISO CO., LTD. (JP) | 2009-07-29 | — | — | EP | disclosed |
| EP-2080750-A1 | RADIATION-SENSITIVE COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7544731-B2 | Rubber composition for tire tread and pneumatic tire comprising the same | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2009-06-09 | — | — | US | disclosed |
| EP-2060949-A1 | RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN | JSR Corporation (JP) | 2009-05-20 | — | — | EP | disclosed |
| US-7531286-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| EP-2003148-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2009-04-22 | — | — | EP | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| CN-100478195-C | Pneumatic radial tire | SUMITOMO RUBBER IND (JP) | 2009-04-15 | — | — | CN | disclosed |
| US-7510817-B2 | Photoresist polymer compositions | JSR CORPORATION (JP) | 2009-03-31 | — | — | US | disclosed |
| EP-1840650-B1 | Positive type radiation-sensitive resin composition | JSR CORP (JP) | 2009-03-18 | — | — | EP | disclosed |
| US-7488566-B2 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-02-10 | — | — | US | disclosed |
| CN-100457749-C | Sulfonium salt compound, radiation-sensitive acid generator, and positive-type radiation-sensitive resin composition | JSR CORP (JP) | 2009-02-04 | — | — | CN | disclosed |
| EP-2003148-A2 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-12-17 | — | — | EP | disclosed |
| US-20080300354-A1 | Method for producing cleaning blade for use in image-forming apparatus and cleaning blade | SUMITOMO RUBBER INDUSTRIES, LTD. | 2008-12-04 | — | — | US | disclosed |
| EP-1998233-A1 | Method for producing cleaning blade for use in image-forming apparatus and cleaning blade | Sumitomo Rubber Industries, Ltd. (JP) | 2008-12-03 | — | — | EP | disclosed |
| CN-101314245-A | Method for producing cleaning blade for use in image-forming apparatus and cleaning blade | SUMITOMO RUBBER IND (JP) | 2008-12-03 | — | — | CN | disclosed |
| CN-101313246-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2008-11-26 | — | — | CN | disclosed |
| EP-1640804-B1 | Positive-tone radiation-sensitive resin composition | JSR CORP (JP) | 2008-11-19 | — | — | EP | disclosed |
| EP-1801664-B1 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER IND (JP) | 2008-11-12 | — | — | EP | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| EP-1953595-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| EP-1950610-A1 | COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2008-07-30 | — | — | EP | disclosed |
| US-20080160449-A1 | Photoresist polymer having nano-smoothness and etching resistance, and resist composition | LION CORPORATION (JP) | 2008-07-03 | — | — | US | disclosed |
| US-20080153031-A1 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-06-26 | — | — | US | disclosed |
| EP-1936446-A2 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2008-06-25 | — | — | EP | disclosed |
| CN-101187799-A | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER IND (JP) | 2008-05-28 | — | — | CN | disclosed |
| US-20080118288-A1 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER INDUSTRIES, LTD. | 2008-05-22 | — | — | US | disclosed |
| US-20080111113-A1 | Foamed rubber roller | SUMITOMO RUBBER INDUSTRIES, LTD. | 2008-05-15 | — | — | US | disclosed |
| EP-1921511-A2 | Foamed rubber roller | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2008-05-14 | — | — | EP | disclosed |
| CN-101178561-A | Foamed rubber roller | SUMITOMO RUBBER IND (JP) | 2008-05-14 | — | — | CN | disclosed |
| US-7371505-B2 | Photosensitive composition and method for forming pattern using the same | FUJIFILM CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| EP-1909147-A2 | Cleaning blade for use in image forming apparatus | Sumtiomo Rubber Industries Ltd (JP) | 2008-04-09 | — | — | EP | disclosed |
| US-20080081813-A1 | Lipid Lowering Biphenylcarboxamides | JANSSEN PHARMACEUTICA N.V. (BE) | 2008-04-03 | — | — | US | disclosed |
| US-20080080914-A1 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2008-04-03 | — | — | US | disclosed |
| CN-101153395-A | Metal removing solution and metal removing method using the same | MEC CO LTD (JP) | 2008-04-02 | — | — | CN | disclosed |
| US-20080073614-A1 | Metal removing solution and metal removing method using the same | MEC COMPANY LTD. (JP) | 2008-03-27 | — | — | US | disclosed |
| US-7335457-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| US-7326516-B2 | Resist composition for immersion exposure and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2008-02-05 | — | — | US | disclosed |
| US-20080026314-A1 | Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2008-01-31 | — | — | US | disclosed |
| US-7323284-B2 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2008-01-29 | — | — | US | disclosed |
| US-7314701-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| US-20070269735-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-7297461-B2 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-11-20 | — | — | US | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-7288359-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-10-30 | — | — | US | disclosed |
| US-20070248911-A1 | Pattern forming method and bilayer film | IWASAWA HARUO | 2007-10-25 | — | — | US | disclosed |
| EP-1840650-A1 | Positive type radiation-sensitive resin composition | JSR Corporation (JP) | 2007-10-03 | — | — | EP | disclosed |
| US-7273690-B2 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2007-09-25 | — | — | US | disclosed |
| CN-100337810-C | Method for producing aerated tyre | SUMITOMO RUBBER IND (JP) | 2007-09-19 | — | — | CN | disclosed |
| US-20070212137-A1 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER INDUSTRIES, LTD. | 2007-09-13 | — | — | US | disclosed |
| EP-1832940-A1 | Cleaning blade for use in image-forming apparatus | Sumtiomo Rubber Industries Ltd (JP) | 2007-09-12 | — | — | EP | disclosed |
| CN-101034276-A | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER IND (JP) | 2007-09-12 | — | — | CN | disclosed |
| EP-1641848-B1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORP (JP) | 2007-08-22 | — | — | EP | disclosed |
| US-7258962-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-21 | — | — | US | disclosed |
| US-7244549-B2 | Pattern forming method and bilayer film | JSR CORPORATION (JP) | 2007-07-17 | — | — | US | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| EP-1801664-A1 | Cleaning blade for use in image-forming apparatus | Sumtiomo Rubber Industries Ltd (JP) | 2007-06-27 | — | — | EP | disclosed |
| CN-1987684-A | Cleaning balde for use in image-forming apparatus | SUMITOMO RUBBER IND (JP) | 2007-06-27 | — | — | CN | disclosed |
| US-20070142531-A1 | Cleaning blade for use in image-forming apparatus | SUMITOMO RUBBER INDUSTRIES, LTD. | 2007-06-21 | — | — | US | disclosed |
| US-20070117931-A1 | Rubber-like articles and rubber-like material-containing articles | SHINICHI INOUE (JP) | 2007-05-24 | — | — | US | disclosed |
| US-7217492-B2 | Onium salt compound and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| EP-1764647-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2007-03-21 | — | — | EP | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| CN-1916760-A | Acid generator, sulfonic acid derivative and radiation-sensitive resin composition | JSR CORP (JP) | 2007-02-21 | — | — | CN | disclosed |
| EP-1739485-A1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-01-03 | — | — | EP | disclosed |
| CN-1890267-A | Rubbery product or rubbery substance containing product | NITTA CORP (JP) | 2007-01-03 | — | — | CN | disclosed |
| EP-1379515-B1 | LIPID LOWERING BIPHENYLCARBOXAMIDES | JANSSEN PHARMACEUTICA NV (BE) | 2006-12-27 | — | — | EP | disclosed |
| EP-0897941-B1 | CROSS-LINKED SOLID POLYELECTROLYTE AND USE THEREOF | DAISO CO LTD (JP) | 2006-12-06 | — | — | EP | disclosed |
| US-7144675-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-12-05 | — | — | US | disclosed |
| EP-1726608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-11-29 | — | — | EP | disclosed |
| US-20060257781-A1 | Photoacid generator, and a polymer with units of 2-alkyladamantyl (meth)acrylate, 3-hydroxyadamantyl (meth)acrylate, 1-alkylcyclopentyl (meth)acrylate or 7-oxo-3,8-methano-6-oxabicyclo(3.2.1)octan-4-yl (meth)acrylate, made with a chain transfer agent; e.g. RAFT polymer; narrow polydispersity | FREESLATE, INC. | 2006-11-16 | — | — | US | disclosed |
| EP-1720064-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060223001-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| US-20060223010-A1 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| US-20060210922-A1 | Positive resist composition and pattern forming method using the resist composition | FUJI PHOTO FILM CO., LTD. | 2006-09-21 | — | — | US | disclosed |
| EP-1703322-A2 | Positive resist composition and pattern forming method using the resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-20 | — | — | EP | disclosed |
| CN-1276303-C | Acid generator and radiation-sensitive resin composition | JSR CORP (JP) | 2006-09-20 | — | — | CN | disclosed |
| US-7108955-B2 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| US-7105269-B2 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20060199100-A1 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-09-07 | — | — | US | disclosed |
| EP-1698645-A1 | HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER | Lion Corporation (JP) | 2006-09-06 | — | — | EP | disclosed |
| EP-1698937-A2 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-06 | — | — | EP | disclosed |
| EP-1011029-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-20060188812-A1 | Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-08-24 | — | — | US | disclosed |
| CN-1814435-A | Pneumatic radial tire | SUMITOMO RUBBER IND (JP) | 2006-08-09 | — | — | CN | disclosed |
| EP-1686424-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-08-02 | — | — | EP | disclosed |
| US-20060166138-A1 | Radiation-sensitive resin composition | JSR CORPORATION | 2006-07-27 | — | — | US | disclosed |
| US-7078148-B2 | Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits | JSR CORPORATION (JP) | 2006-07-18 | — | — | US | disclosed |
| EP-1679314-A1 | SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| US-7060414-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-06-13 | — | — | US | disclosed |
| EP-1652692-A1 | Rubber composition for tire tread and pneumatic tire comprising the same | Sumitomo Rubber Industries, Ltd. (JP) | 2006-05-03 | — | — | EP | disclosed |
| US-20060089451-A1 | improved traction under conditions of a high temperature; diene rubber, a basic antioxidant and magnesium acetate; | SUMITOMO RUBBER INDUSTRIES, LTD. | 2006-04-27 | — | — | US | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| US-20060078823-A1 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-04-13 | — | — | US | disclosed |
| EP-1645908-A1 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-12 | — | — | EP | disclosed |
| CN-1249790-C | Ray sensitive compasition for preparing insulation film and display | JSR CORP (JP) | 2006-04-05 | — | — | CN | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-7005231-B2 | Positive type radiosensitive composition and method for forming pattern | JSR CORPORATION (JP) | 2006-02-28 | — | — | US | disclosed |
| US-7005230-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-02-28 | — | — | US | disclosed |
| CN-1738813-A | Sulfonium salt compound, radiation-sensitive acid generator, and positive-type radiation-sensitive resin composition | JSR CORP (JP) | 2006-02-22 | — | — | CN | disclosed |
| CN-1238766-C | Positive type radiation-sensitive composition and method for forming pattern | JSR CORP (JP) | 2006-01-25 | — | — | CN | disclosed |
| EP-1085379-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-01-04 | — | — | EP | disclosed |
| EP-1612602-A2 | Photosensitive composition and method for forming pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-01-04 | — | — | EP | disclosed |
| US-20050287473-A1 | Photosensitive composition and method for forming pattern using the same | FUJI PHOTO FILM CO., LTD. | 2005-12-29 | — | — | US | disclosed |
| EP-1398167-B1 | Anti-ozonants bonded to silicia for use in printing media | HEWLETT PACKARD DEVELOPMENT CO (US) | 2005-12-14 | — | — | EP | disclosed |
| EP-1600437-A1 | ACID GENERATORS, SULFONIC ACIDS, SULFONYL HALIDES, AND RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-11-30 | — | — | EP | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20050244747-A1 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| EP-1580598-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | Fuji Photo Film Co. Ltd. (JP) | 2005-09-28 | — | — | EP | disclosed |
| US-20050208419-A1 | Fluoropolymer containing unsaturated monomer with a adamantyl, decalin, norbornyl, cedrol , cyclohexyl, cycloheptyl, cyclooctyl , a cyclodecanyl, cyclododecanyl and/or tricyclodecanyl group; sulfonium type compound generates acid upon exposure to actinic radiation; semiconductor, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2005-09-22 | — | — | US | disclosed |
| EP-1035436-B1 | Resist pattern formation method | JSR CORP (JP) | 2005-09-07 | — | — | EP | disclosed |
| US-20050186505-A1 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |
| US-20050186503-A1 | Resist composition for immersion exposure and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |
| EP-1566693-A2 | Resist composition for immersion exposure and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-24 | — | — | EP | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20050158657-A1 | Radiation-sensitive resin composition | SUZUKI AKI (JP) | 2005-07-21 | — | — | US | disclosed |
| US-6908722-B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-06-21 | — | — | US | disclosed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | disclosed |
| US-20050095527-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20050053861-A1 | Onium salt compound and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-03-10 | — | — | US | disclosed |
| EP-1099691-B1 | N-Sulfonyloxyimide compound and radiation-sensitive resin composition using the same | JSR CORP (JP) | 2005-03-02 | — | — | EP | disclosed |
| US-6846895-B2 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-25 | — | — | US | disclosed |
| US-6846607-B2 | Carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-25 | — | — | US | disclosed |
| US-6838225-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-04 | — | — | US | disclosed |
| US-6830868-B2 | Useful as a chemically amplified resist responding to active radiation, for example ultraviolet rays such as a KrF excimer laser, ArF excimer laser, and F2 excimer laser | JSR CORPORATION (JP) | 2004-12-14 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6824954-B2 | DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| US-6821705-B2 | USED AS CHEMICALLY AMPLIFIED RESIST, EXHIBITS HIGH SENSITIVITY, RESOLUTION, RADIATION TRANSMITTANCE, AND SURFACE SMOOTHNESS, AND IS FREE FROM THE PROBLEM OF PARTIAL INSOLUBLIZATION DURING OVEREXPOSURE | JSR CORPORATION (JP) | 2004-11-23 | — | — | US | disclosed |
| EP-0901043-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2004-10-27 | — | — | EP | disclosed |
| US-20040197698-A1 | Positive type radiosensitive composition and method for forming pattern | JSR CORPORATION (JP) | 2004-10-07 | — | — | US | disclosed |
| US-6800419-B2 | FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6797453-B2 | WHICH HAS RESOLUTION HIGH ENOUGH TO FORM THROUGH HOLE OR U-SHAPED DEPRESSION; COMPRISES SILANE COUPLING AGENT; FOR ELECTROLUMINESCENT LIQUID CRYSTAL DISPLAYS | JSR CORPORATION (JP) | 2004-09-28 | — | — | US | disclosed |
| US-6770780-B1 | QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS | JSR CORPORATION (JP) | 2004-08-03 | — | — | US | disclosed |
| US-20040146802-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-29 | — | — | US | disclosed |
| US-6767640-B2 | PHENYLENEDIAMINE DERIVATIVES WHEN INCORPORATED IN AN ALKYL BACKBONE ATTACHED TO SILICIC ACID GROUPS ON THE SILICA GEL COATED MEDIA WOULD PROTECT AGAINST COLORANT FUGITIVE AGENTS | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. | 2004-07-27 | — | — | US | disclosed |
| US-20040143082-A1 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| EP-0943657-B1 | Acrylic elastomer composition | NIPPON MEKTRON KK (JP) | 2004-07-14 | — | — | EP | disclosed |
| CN-1507580-A | Positive type radiation-sensitive composition and method for forming pattern | JSR株式会社 | 2004-06-23 | — | — | CN | disclosed |
| US-6753124-B2 | AMPLIFIED POSITIVE PHOTORESISTS | JSR CORPORATION (JP) | 2004-06-22 | — | — | US | disclosed |
| EP-0890610-B1 | HIGHLY SATURATED NITRILE COPOLYMER RUBBER, PROCESS FOR THE PRODUCTION THEREOF, HEAT-RESISTANT RUBBER COMPOSITIONS COMPRISING THE RUBBER AND COMPOSITES COMPRISING THE RUBBER AND FIBERS | ZEON CORP (JP) | 2004-05-12 | — | — | EP | disclosed |
| EP-1411390-A1 | POSITIVE TYPE RADIOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN | JSR Corporation (JP) | 2004-04-21 | — | — | EP | disclosed |
| US-20040072094-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2004-04-15 | — | — | US | disclosed |
| EP-0959389-B1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| EP-1398339-A1 | POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-03-17 | — | — | EP | disclosed |
| EP-1398167-A1 | Anti-ozonants bonded to silicia for use in printing media | Hewlett-Packard Development Company, L.P. (US) | 2004-03-17 | — | — | EP | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| EP-1142928-B1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR CORP (JP) | 2004-02-18 | — | — | EP | disclosed |
| EP-1379515-A1 | LIPID LOWERING BIPHENYLCARBOXAMIDES | JANSSEN PHARMACEUTICA N.V. (BE) | 2004-01-14 | — | — | EP | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| US-20030215737-A1 | Radiation sensitive composition for forming an insulating film, insulating film and display device | JSR CORPORATION (JP) | 2003-11-20 | — | — | US | disclosed |
| EP-0930322-B1 | Pressure-sensitive adhesive sheets and production method thereof | NITTO DENKO CORP (JP) | 2003-11-19 | — | — | EP | disclosed |
| US-20030203309-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| US-20030203307-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| US-20030194634-A1 | Novel anthracene derivative and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-16 | — | — | US | disclosed |
| US-20030191268-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition | IWASAWA HARUO (JP) | 2003-10-09 | — | — | US | disclosed |
| CN-1445315-A | Ray sensitive compasition for preparing insulation film and display | JSR CORP (JP) | 2003-10-01 | — | — | CN | disclosed |
| US-6623907-B2 | Chemical amplified photoresist | JSR CORPORATION (JP) | 2003-09-23 | — | — | US | disclosed |
| US-20030170561-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1343048-A2 | Anthracene derivative and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030157423-A1 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |
| EP-1331518-A2 | Radiation sensitive composition for forming an insulating film, insulating film and display device | JSR Corporation (JP) | 2003-07-30 | — | — | EP | disclosed |
| CN-1432873-A | Acid generator, sulfonic acid derivative and radiation-sensitive resin composition | JSR CORP (JP) | 2003-07-30 | — | — | CN | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030113660-A1 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| EP-0838487-B1 | Polyether copolymer and polymer solid electrolyte | DAISO CO LTD (JP) | 2003-06-18 | — | — | EP | disclosed |
| US-20030073040-A1 | Pattern forming method and bilayer film | JSR CORPORATION (JP) | 2003-04-17 | — | — | US | disclosed |
| EP-0885913-B1 | COPOLYETHER AND SOLID POLYMER ELECTROLYTE | DAISO CO LTD (JP) | 2003-04-16 | — | — | EP | disclosed |
| US-6531260-B2 | Photoresist | JSR CORPORATION (JP) | 2003-03-11 | — | — | US | disclosed |
| EP-0843220-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2003-02-19 | — | — | EP | disclosed |
| US-6517992-B1 | N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same | JSR CORPORATION (JP) | 2003-02-11 | — | — | US | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-20020192593-A1 | Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| US-6489385-B1 | HYDROGENATED ACRYLONITRILE-BUTADIENE HAVING LOWERED MOONEY VISCOSITY BY APPLYING HIGH SHEARING FORCES IN THE PRESENCE OF AGING INHIBITORS; HIGH STRENGTH; WORKABILITY; STORAGE STABILITY | NIPPON ZEON CO., LTD. (JP) | 2002-12-03 | — | — | US | disclosed |
| US-20020172885-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-0856538-B1 | SOLID POLYELECTROLYTE | DAISO CO LTD (JP) | 2002-11-20 | — | — | EP | disclosed |
| US-6482568-B1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-19 | — | — | US | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| WO-2002081460-A1 | LIPID LOWERING BIPHENYLCARBOXAMIDES | JANSSEN PHARMACEUTICA N.V. (BE) | 2002-10-17 | — | — | WO | disclosed |
| US-6465150-B1 | COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | disclosed |
| US-20020132181-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-09-19 | — | — | US | disclosed |
| EP-1238972-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR Corporation (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
| EP-1225480-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-6403288-B1 | COATING WITH COPOLYMER COMPRISING HYDROXYSTYRENE DERIVATIVE MONOMER HAVING ACID DISSOCIABLE GROUP; EXPOSURE TO RADIATION; DEVELOPMENT | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| CN-1350919-A | Method for producing aerated tyre | SUMITOMO RUBBER IND (JP) | 2002-05-29 | — | — | CN | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020037970-A1 | Acrylic elastomer composition | MORIYAMA IWAO (JP) | 2002-03-28 | — | — | US | disclosed |
| CN-1337979-A | Thermoplastic rubber composition | SYH TECHNOLOGY HOLDING COMPANY (AU) | 2002-02-27 | — | — | CN | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20020012849-A1 | Crosslinked polyether; solid electrolyte | MIURA KATSUHITO (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1171524-A1 | THERMOPLASTIC RUBBER COMPOSITION | SYH Technologies Pty. Ltd. (AU) | 2002-01-16 | — | — | EP | disclosed |
| US-6337171-B1 | AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS | JSR CORPORATION (JP) | 2002-01-08 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010041769-A1 | Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-0825224-B1 | Vulcanized rubber composition | NICHIAS CORP (JP) | 2001-11-07 | — | — | EP | disclosed |
| US-6309477-B1 | SULFUR AND PHOSPHORUS COMPOUNDS SUCH AS SULFIDES, TRIAZINETHIOLS, THIOCARBONYLS, THIOSULFATES, PERSULFATES, PHOSPHATES, PHOSPHITES, PHYTATES, HYPOPHOSPHITES AND PHOSPHONATES; CORROSION RESISTANCE; METALS TO BE PAINTED | NIPPON PAINT CO., LTD. (JP) | 2001-10-30 | — | — | US | disclosed |
| EP-1142928-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |
| US-6299975-B1 | COATING ACRYLIC ESTER POLYMER FORMULATION ON A RELEASING-TREATED FILM HAVING A GOOD SURFACE SMOOTHNESS; SUBJECTING THE COATED LAYER TO A PHOTOPOLYMERIZATION TREATMENT TO FORM A PRESSURE-SENSITIVE ADHESIVE LAYER | NITTO DENKO CORPORATION (JP) | 2001-10-09 | — | — | US | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-6287230-B1 | Power transmission belt and elastomer composition | BANDO CHEMICAL INDUSTRIES LTD. (JP) | 2001-09-11 | — | — | US | disclosed |
| US-6281293-B1 | THERMOPLASTIC OR THERMOSETTING RESIN WITH RUBBER | NIPPON ZEON CO., LTD. (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6239204-B1 | COPOLYETHER FROM A GLYCIDYLOXY (POLY)OXYALKYLENE COMPOUND AND AN ALKYLENE EPOXIDE | BAISO CO., LTD. (JP) | 2001-05-29 | — | — | US | disclosed |
| US-6235446-B1 | MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-1099691-A1 | N-Sulfonyloxyimide compound and radiation-sensitive resin composition using the same | JSR Corporation (JP) | 2001-05-16 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6180287-B1 | Polyether copolymer and solid polymer electrolyte | DAISO CO., LTD. (JP) | 2001-01-30 | — | — | US | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-0793144-B1 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-17 | — | — | EP | disclosed |
| US-6162563-A | Polymer Solid Electrolyte | DAISO CO., LTD (JP) | 2000-12-19 | — | — | US | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| US-6120972-A | COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |
| WO-2000034383-A1 | THERMOPLASTIC RUBBER COMPOSITION | SYH TECHNOLOGIES PTY. LTD. (AU) | 2000-06-15 | — | — | WO | disclosed |
| EP-1008625-A1 | Power transmission belt and elastomer composition | Bando Chemical Industries Ltd. (JP) | 2000-06-14 | — | — | EP | disclosed |
| EP-0972797-A1 | RUBBER COMPOSITION CONTAINING METAL SALT OF ETHYLENICALLY UNSATURATED CARBOXYLIC ACID | NIPPON ZEON CO., LTD. (JP) | 2000-01-19 | — | — | EP | disclosed |
| EP-0972798-A1 | MIXTURE COMPOSITION OF SYNTHETIC RESIN AND RUBBER | NIPPON ZEON CO., LTD. (JP) | 2000-01-19 | — | — | EP | disclosed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |
| EP-0750010-B1 | Power transmission belt | BANDO CHEMICAL IND (JP) | 1999-11-10 | — | — | EP | disclosed |
| US-5968681-A | Polyether copolymer and polymer solid electrolyte | DAISO CO., LTD (JP) | 1999-10-19 | — | — | US | disclosed |
| US-5962180-A | COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT | JSR CORPORATION (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0943657-A2 | Acrylic elastomer composition | Nippon Mektron, Limited (JP) | 1999-09-22 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0930322-A2 | Pressure-sensitive adhesive sheets and production method thereof | NITTO DENKO CORPORATION (JP) | 1999-07-21 | — | — | EP | disclosed |
| US-5912288-A | GLYCIDYL ETHER TYPE EPOXY COMPOUND; ALUMINUM ACETYLACETONATE DERIVATIVE; REFRIGERATING MACHINE OIL AND FLUOROCARBON RESISTANCE | NICHIAS CORPORATION (JP) | 1999-06-15 | — | — | US | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0897941-A1 | CROSS-LINKED SOLID POLYELECTROLYTE AND USE THEREOF | DAISO CO., LTD. (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0890610-A1 | HIGHLY SATURATED NITRILE COPOLYMER RUBBER, PROCESS FOR THE PRODUCTION THEREOF, HEAT-RESISTANT RUBBER COMPOSITIONS COMPRISING THE RUBBER AND COMPOSITES COMPRISING THE RUBBER AND FIBERS | NIPPON ZEON CO., LTD. (JP) | 1999-01-13 | — | — | EP | disclosed |
| EP-0885913-A1 | COPOLYETHER AND SOLID POLYMER ELECTROLYTE | DAISO CO., LTD. (JP) | 1998-12-23 | — | — | EP | disclosed |
| EP-0506465-B1 | Thermplastic elastomer composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-09-30 | — | — | EP | disclosed |
| EP-0856538-A1 | SOLID POLYELECTROLYTE | DAISO CO., LTD. (JP) | 1998-08-05 | — | — | EP | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
| EP-0838487-A2 | Polyether copolymer and polymer solid electrolyte | DAISO CO., LTD. (JP) | 1998-04-29 | — | — | EP | disclosed |
| EP-0825224-A1 | Vulcanized rubber composition | NICHIAS CORPORATION (JP) | 1998-02-25 | — | — | EP | disclosed |
| EP-0596734-B1 | Thermoplastic elastomer composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-21 | — | — | EP | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0567786-B1 | Pressure-sensitive adhesive having excellent heat-resistance, adhesive sheets thereof, and method for producing them | NITTO DENKO CORP (JP) | 1997-01-02 | — | — | EP | disclosed |
| EP-0750010-A1 | Power transmission belt | Bando Chemical Industries, Ltd. (JP) | 1996-12-27 | — | — | EP | disclosed |
| US-5550190-A | THERMOPLASTIC POLYESTER ELASTOMER DYNAMICALLY CROSSLINKED DURING KNEADING WITH AT LEAST ONE RUBBER | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-08-27 | — | — | US | disclosed |
| US-5529868-A | EXCELLENT PHOTOSENITIVITY, PRINTING, WEAR RESISTANCE, CLEANABILITY AND ENVIRONMENTAL STABILITY | FUJI XEROX CO., LTD. (JP) | 1996-06-25 | — | — | US | disclosed |
| US-5502095-A | HEAT, OIL, WEAR RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5502085-A | PHOTOPOLYMERIZATION OF ACRYLATE MONOMERS, CROSSLINKING AGENTS, RADICAL CHAIN INHIBITORS AND CATALYSTS | NITTO DENKO CORPORATION (JP) | 1996-03-26 | — | — | US | disclosed |
| EP-0278890-B1 | Non-staining and slightly-staining antiozonants | GOODYEAR TIRE & RUBBER (US) | 1995-05-24 | — | — | EP | disclosed |
| EP-0596734-A1 | Thermoplastic elastomer composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-05-11 | — | — | EP | disclosed |
| EP-0567786-A1 | Pressure-sensitive adhesive having excellent heat-resistance, adhesive sheets thereof, and method for producing them | NITTO DENKO CORPORATION (JP) | 1993-11-03 | — | — | EP | disclosed |
| US-5219904-A | With organic peroxide | NIPPON MEKTRON LIMITED (JP) | 1993-06-15 | — | — | US | disclosed |
| US-5159026-A | Containing halogen and peroxy compound | NIPPON MEKTRON, LIMITED (JP) | 1992-10-27 | — | — | US | disclosed |
| US-5153331-A | Reacting 6-epoxyethyl-3-oxatricyclo 3.2.1.0(2,4)!octane with a thiocyanate salt and/or a thiourea | NIPPON OIL COMPANY, LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| EP-0506465-A2 | Thermplastic elastomer composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-09-30 | — | — | EP | disclosed |
| US-5059339-A | Glycol, water and antiozonant | TOYODA GOSEI CO., LTD. (JP) | 1991-10-22 | — | — | US | disclosed |
| EP-0452092-A2 | 6-Epithioethyl-3-oxatricyclo (3.2.1.02.4) octane and process for preparation thereof | NIPPON OIL CO. LTD. (JP) | 1991-10-16 | — | — | EP | disclosed |
| US-5019611-A | Tetrahydrotriazinethiones | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1991-05-28 | — | — | US | disclosed |
| EP-0278890-A2 | Non-staining and slightly-staining antiozonants | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1988-08-17 | — | — | EP | disclosed |
| EP-0100793-B1 | AQUEOUS DISPERSIONS COMPRISING COLLOIDAL SIZED PARTICLES OF A POLYMER AND AN ADDITIVE AND A METHOD FOR THEIR PREPARATION | THE DOW CHEMICAL COMPANY (US) | 1986-10-15 | — | — | EP | disclosed |
| EP-0081326-B1 | CURING COMPOSITIONS | Lingner + Fischer GmbH (DE) | 1986-05-21 | — | — | EP | disclosed |
| WO-1984000762-A1 | AQUEOUS DISPERSIONS COMPRISING COLLOIDAL SIZED PARTICLES OF A POLYMER AND AN ADDITIVE AND A METHOD FOR THEIR PREPARATION | DOW CHEMICAL RHEINWERK GMBH (DE) | 1984-03-01 | — | — | WO | disclosed |
| EP-0100793-A1 | Aqueous dispersions comprising colloidal sized particles of a polymer and an additive and a method for their preparation | THE DOW CHEMICAL COMPANY (US) | 1984-02-22 | — | — | EP | disclosed |
| EP-0081326-A1 | Curing compositions | Lingner + Fischer GmbH (DE) | 1983-06-15 | — | — | EP | disclosed |
| EP-0081326-A1 | Curing compositions | Lingner + Fischer GmbH (DE) | 1983-06-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (50 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170131632-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | RER1, RFC4, RFC2 | ALDH1A1 2000/4885ALDH2 3048/4885CA12 488/4885 |
| US-20030194634-A1 | Novel anthracene derivative and radiation-sensitive resin composition | SRSF1, ARL1, ERCC4 | ALDH1A1 1190/4885ALDH2 3124/4885CA12 2042/4885 |
| US-20120148952-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | RAD1, RER1, RPA1 | ALDH1A1 806/4885ALDH2 3332/4885CA12 1025/4885 |
| US-20140363769-A1 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE | FRG1, FGFR1, IGF1R | ALDH1A1 435/4885ALDH2 1788/4885CA12 233/4885 |
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | RER1, XRCC5, F12 | ALDH1A1 2075/4885ALDH2 3043/4885CA12 1254/4885 |
| US-20120156612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER | RER1, PRMT1, REV1 | ALDH1A1 2002/4885ALDH2 4411/4885CA12 2559/4885 |
| US-20120276482-A1 | RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND | RAD51, MRE11, RER1 | ALDH1A1 1414/4885ALDH2 4067/4885CA12 1284/4885 |
| US-20230393469-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND | RER1, RAD51, RFT1 | ALDH1A1 1974/4885ALDH2 4194/4885CA12 2742/4885 |
| US-20120251947-A1 | CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | MRE11, SLC11A2, CROCC | ALDH1A1 4300/4885ALDH2 3899/4885CA12 606/4885 |
| US-20260079396-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | SRMS, RAD1, SLC11A2 | ALDH1A1 3009/4885ALDH2 4302/4885CA12 474/4885 |
| US-11480877-B2 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | SLC11A2, ABCC1, FBL | ALDH1A1 1809/4885ALDH2 3310/4885CA12 3727/4885 |
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | RARA, H1-0, NR2E3 | ALDH1A1 1014/4885ALDH2 3271/4885CA12 348/4885 |
| US-20090280433-A1 | RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN | ACP1, PLG, ALG1 | ALDH1A1 3007/4885ALDH2 3214/4885CA12 101/4885 |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | ALDH1A1 3830/4885ALDH2 4599/4885CA12 2546/4885 |
| US-20090221751-A1 | Rubber Mixtures | RER1, RIF1, REV1 | ALDH1A1 365/4885ALDH2 2206/4885CA12 3557/4885 |
| US-20120045719-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | RFT1, RER1, ZYX | ALDH1A1 1997/4885ALDH2 4162/4885CA12 1724/4885 |
| US-10303055-B2 | Resist composition and method for forming resist pattern | HEATR1, ABCC1, HEATR6 | ALDH1A1 1770/4885ALDH2 1778/4885CA12 3056/4885 |
| US-20140248561-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | ADH1C, ADH1A, FABP6 | ALDH1A1 114/4885ALDH2 98/4885CA12 2360/4885 |
| US-20080081813-A1 | Lipid Lowering Biphenylcarboxamides | LIPC, PNLIP, LIPA | ALDH1A1 807/4885ALDH2 439/4885CA12 4397/4885 |
| US-12617885-B2 | Ionomer resin, resin sheet, and laminated glass | EED, MMAB, ASIC1 | ALDH1A1 1839/4885ALDH2 2666/4885CA12 723/4885 |
| US-20190285983-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METHOD FOR FORMING RESIST PATTERN | RER1, RFT1, RAD51 | ALDH1A1 3186/4885ALDH2 4568/4885CA12 1997/4885 |
| US-20150323866-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND | RER1, RPA1, RFT1 | ALDH1A1 1025/4885ALDH2 4021/4885CA12 1790/4885 |
| US-20150079520-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | RER1, RFC4, RFC2 | ALDH1A1 2000/4885ALDH2 3048/4885CA12 488/4885 |
| US-20250362596-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | RAD1, RER1, RPA1 | ALDH1A1 1491/4885ALDH2 3737/4885CA12 455/4885 |
| US-11256170-B2 | Compound, resist composition, and method for forming resist pattern using it | RDX, SLC11A2, FBL | ALDH1A1 2889/4885ALDH2 4035/4885CA12 4094/4885 |
| US-20200409261-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | C9, C1R, RAD51 | ALDH1A1 1553/4885ALDH2 3162/4885CA12 1263/4885 |
| US-11747725-B2 | Radiation-sensitive resin composition and method for forming resist pattern | RER1, AFF1, RAD51 | ALDH1A1 2008/4885ALDH2 3708/4885CA12 1235/4885 |
| US-20110117489-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | ERCC2, RAD51, ATM | ALDH1A1 1835/4885ALDH2 3047/4885CA12 1459/4885 |
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“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.