Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Thioglycolic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Thioglycolic Acid SCHEMBL9357335 | 1.00 | LMNA (0.43) | — | |
| Thioglycolic Acid SCHEMBL9357348 | 1.00 | — | — | |
| Thioglycolic Acid SCHEMBL8404154 | 0.96 | — | — | |
| Thioglycolic Acid SCHEMBL8404153 | 0.96 | — | — | |
| Thioglycolic Acid SCHEMBL21017 | 0.95 | — | — | |
| Thioglycolic Acid SCHEMBL134322 | 0.95 | LMNA (0.46) | — | |
| Thioglycolic Acid SCHEMBL1275214 | 0.91 | — | — | |
| Thioglycolic Acid SCHEMBL3273734 | 0.91 | — | — | |
| Thioglycolic Acid SCHEMBL16760983 | 0.91 | — | — | |
| Thioglycolic Acid SCHEMBL10424203 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109402219-B | Sterility inspection method of azithromycin eye drops | 珠海亿胜生物制药有限公司 | 2022-03-11 | — | — | CN | claimed |
| EP-0079972-B1 | PROCESS FOR PRODUCING TERTIARY SULFONIUM MONTMORRILLONITES, AND THEIR USE | C.F. Spiess & Sohn GmbH & Co. Chemische Fabrik (DE) | 1985-05-02 | — | — | EP | claimed |
| CN-109402219-B | Sterility inspection method of azithromycin eye drops | 珠海亿胜生物制药有限公司 | 2022-03-11 | — | — | CN | disclosed |
| US-8614283-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2013-12-24 | — | — | US | disclosed |
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8049042-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20110144295-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-6361872-B1 | CORROSION RESISTANCE FOR METAL SURFACES WITH MERCAPTO COMPOUNDS AND CURING AGENTS | METAL COATINGS INTERNATIONAL INC. | 2002-03-26 | — | — | US | disclosed |
| US-6103882-A | PRODUCING A PEPTIDE LIGAND, AMIDE OR SALT BY SUBJECTING FUSION PROTEIN OR PEPTIDE TO CLEAVAGE OF THE PEPTIDE BOND ON THE AMINO TERMINAL SIDE OF A CYSTEINE IN THE HETEROLOGOUS PEPTIDE | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 2000-08-15 | — | — | US | disclosed |
| WO-1999060187-A1 | METAL SURFACE TREATMENT AGENTS, METHODS OF TREATING METAL SURFACES AND PRE-COATED STEEL SHEETS | DACRAL S.A. (FR) | 1999-11-25 | — | — | WO | disclosed |
| EP-0293908-B1 | Molding material for optics | MITSUBISHI GAS CHEMICAL CO (JP) | 1994-04-06 | — | — | EP | disclosed |
| US-5071993-A | Bis(dibenzoxayzoyl) thiophene fluorescent brighteners | CIBA-GEIGY CORPORATION (US) | 1991-12-10 | — | — | US | disclosed |
| US-4888401-A | GRAFT POLYMERS OF STYRENE WITH MALEIC ANHYDRIDE OR MALEIMIDE AND AROMATIC POLYCARBONATES | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 1989-12-19 | — | — | US | disclosed |
| EP-0293908-A2 | Molding material for optics | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1988-12-07 | — | — | EP | disclosed |
| EP-0079972-B1 | PROCESS FOR PRODUCING TERTIARY SULFONIUM MONTMORRILLONITES, AND THEIR USE | C.F. Spiess & Sohn GmbH & Co. Chemische Fabrik (DE) | 1985-05-02 | — | — | EP | disclosed |
| EP-0079972-A1 | Process for producing tertiary sulfonium montmorrillonites, and their use | C.F. Spiess & Sohn GmbH & Co. Chemische Fabrik (DE) | 1983-06-01 | — | — | EP | disclosed |