SCHEMBL204786

SCHEMBL204786

C=C(C)C(=O)OCOCCCC

nearest known ligand 0.61

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.61
THRB P10828 1/20 0.53
ALDH1A1 P00352 3/20 0.47
CES2 O00748 2/20 0.41
HPGD P15428 1/20 0.41
POLB P06746 1/20 0.40
APEX1 P27695 1/20 0.40
HTT P42858 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
ATM Q13315 1/20 0.39
HCAR2 Q8TDS4 1/20 0.35
NAAA Q02083 1/20 0.34
CYP3A4 P08684 1/20 0.34
DGKA P23743 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19583204 0.96 TSHR (0.62) TSHRTHRBALDH1A1CES2HPGD
SCHEMBL2339472 0.93 TSHR (0.73) TSHRTHRBALDH1A1CES2POLB
SCHEMBL11965992 0.90 TSHR (0.57) TSHRTHRBALDH1A1CES2POLB
SCHEMBL13302398 0.90 THRB (0.53) TSHRTHRBALDH1A1CES2POLB
SCHEMBL1902057 0.88 THRB (0.57) TSHRTHRBALDH1A1CES2HPGD
SCHEMBL8400045 0.86 TSHR (0.75) TSHRTHRBALDH1A1HPGDPOLB
SCHEMBL5521699 0.86 THRB (0.63) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL887794 0.85 THRB (0.69) TSHRTHRBALDH1A1CES2HPGD
SCHEMBL34027 0.85 THRB (0.69) TSHRTHRBALDH1A1CES2HPGD
SCHEMBL36708 0.85 THRB (0.69) TSHRTHRBALDH1A1CES2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 481 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250206861-A1 COPOLYMER FOR SUPPRESSING PROTEIN ADSORPTION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM, AND ARTICLE MITSUBISHI CHEMICAL CORPORATION (JP) 2025-06-26 US claimed
US-12264212-B2 Copolymer for suppressing protein adsorption, method for producing copolymer, resin modifier, molding material, copolymer-containing composition, coating film, and article MITSUBISHI CHEMICAL CORPORATION (JP) 2025-04-01 US claimed
EP-3858879-B1 COPOLYMER FOR SUPPRESSING PROTEIN ADSORPTION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM AND ARTICLE MITSUBISHI CHEM CORP (JP) 2025-01-01 EP claimed
EP-3858879-A1 COPOLYMER FOR SUPPRESSING PROTEIN ADHESION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM AND ARTICLE Mitsubishi Chemical Corporation (JP) 2021-08-04 EP claimed
US-20210206896-A1 COPOLYMER FOR SUPPRESSING PROTEIN ADSORPTION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM, AND ARTICLE MITSUBISHI CHEMICAL CORPORATION (JP) 2021-07-08 US claimed
CN-112771090-A Copolymer for inhibiting protein adhesion, method for producing copolymer, resin modifier, molding material, composition containing copolymer, coating film, and article 三菱化学株式会社 2021-05-07 CN claimed
WO-2020066685-A1 COPOLYMER FOR SUPPRESSING PROTEIN ADHESION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM AND ARTICLE 三菱ケミカル株式会社 2020-04-02 WO claimed
US-9956324-B2 Medical material, and medical device using the medical material TERUMO KABUSHIKI KAISHA (JP) 2018-05-01 US claimed
US-20170128636-A1 MEDICAL MATERIAL, AND MEDICAL DEVICE USING THE MEDICAL MATERIAL TERUMO KABUSHIKI KAISHA (JP) 2017-05-11 US claimed
CN-101903175-B Multi-layered acrylic retardation film and fabrication method thereof LG CHEMICAL LTD 2015-05-27 CN claimed
US-8865299-B2 Multi-layered acrylic retardation film and fabrication method thereof LG CHEM, LTD. (KR) 2014-10-21 US claimed
EP-1776399-B1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIV GENT (BE) 2012-11-14 EP claimed
US-20110171441-A1 MULTI-LAYERED ACRYLIC RETARDATION FILM AND FABRICATION METHOD THEREOF LG CHEM, LTD. (KR) 2011-07-14 US claimed
JP-2011510352-A 2011-03-31 JP claimed
CN-101990645-A Retardation film, fabrication method thereof, and liquid crystal display comprising the same LG CHEMICAL LTD 2011-03-23 CN claimed
CN-101903175-A Multi-layered acrylic retardation film and fabrication method thereof LG CHEMICAL LTD 2010-12-01 CN claimed
WO-2009093848-A1 RETARDATION FILM, FABRICATION METHOD THEREOF, AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME LG CHEM, LTD. (KR) 2009-07-30 WO claimed
EP-0951896-B1 Radically polymerizable dental material IVOCLAR VIVADENT AG (LI) 2005-12-21 EP claimed
US-6281271-B1 BLEND OF POLYMER AND FILLER IVOCLAR AG (LI) 2001-08-28 US claimed
CN-122037193-A Cured product, optical element, optical device, and imaging device 佳能株式会社 2026-05-15 CN disclosed
US-20260110823-A1 OPTICAL ELEMENT, OPTICAL APPARATUS, IMAGING APPARATUS, AND COMPOUND CANON KK (JP) 2026-04-23 US disclosed
US-20260079398-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) 2026-03-19 US disclosed
US-12529822-B2 Optical element, optical apparatus, imaging apparatus, and compound CANON KABUSHIKI KAISHA (JP) 2026-01-20 US disclosed
US-20260008914-A1 CURABLE COMPOSITION, MOLDED BODY, SILICONE HYDROGEL, AND METHOD FOR PRODUCING SILICONE HYDROGEL MITSUBISHI CHEMICAL CORPORATION (JP) 2026-01-08 US disclosed
US-12479976-B2 Cured product, optical element, optical apparatus, and imaging apparatus CANON KABUSHIKI KAISHA (JP) 2025-11-25 US disclosed
EP-4644444-A1 CURABLE COMPOSITION, MOLDED BODY, SILICONE HYDROGEL, AND METHOD FOR PRODUCING SILICONE HYDROGEL Mitsubishi Chemical Corporation (JP) 2025-11-05 EP disclosed
EP-4617318-A1 RESIN COMPOSITION AND MOLDED BODY MCPP Innovation LLC (JP) 2025-09-17 EP disclosed
US-20250257215-A1 RESIN COMPOSITION AND MOLDED ARTICLE MCPP INNOVATION LLC (JP) 2025-08-14 US disclosed
US-20250206861-A1 COPOLYMER FOR SUPPRESSING PROTEIN ADSORPTION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM, AND ARTICLE MITSUBISHI CHEMICAL CORPORATION (JP) 2025-06-26 US disclosed
US-12280180-B2 Medical device and method for producing medical device TERUMO KABUSHIKI KAISHA (JP) 2025-04-22 US disclosed
US-12264212-B2 Copolymer for suppressing protein adsorption, method for producing copolymer, resin modifier, molding material, copolymer-containing composition, coating film, and article MITSUBISHI CHEMICAL CORPORATION (JP) 2025-04-01 US disclosed
US-12226545-B2 Micro injectable, low chromatic aberration intraocular lens materials BENZ RESEARCH AND DEVELOPMENT CORP (US) 2025-02-18 US disclosed
US-20250034294-A1 CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGE PICKUP APPARATUS CANON KK (JP) 2025-01-30 US disclosed
EP-3858879-B1 COPOLYMER FOR SUPPRESSING PROTEIN ADSORPTION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM AND ARTICLE MITSUBISHI CHEM CORP (JP) 2025-01-01 EP disclosed
US-12146011-B2 Cured product, optical element, optical apparatus, and image pickup apparatus CANON KABUSHIKI KAISHA (JP) 2024-11-19 US disclosed
EP-3591441-B1 OPTICAL ELEMENT, MATERIAL, OPTICAL DEVICE AND COMPOUND CANON KK (JP) 2024-11-06 EP disclosed
EP-4446351-A1 CURABLE COMPOSITION, MOLDED BODY, SILICONE HYDROGEL, METHOD FOR PRODUCING SILICONE HYDROGEL, AND MACROMONOMER Mitsubishi Chemical Corporation (JP) 2024-10-16 EP disclosed
US-20240317908-A1 CURABLE COMPOSITION, MOLDED BODY, SILICONE HYDROGEL, METHOD FOR PRODUCING SILICONE HYDROGEL, AND MACROMONOMER MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-26 US disclosed
US-20240301193-A1 RESIN COMPOSITION, PRODUCTION METHOD OF RESIN COMPOSITION, MOLDING MATERIAL, AND ARTICLE MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-12 US disclosed
EP-4095167-B1 CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGE PICKUP APPARATUS CANON KK (JP) 2024-08-28 EP disclosed
EP-4421120-A1 RESIN COMPOSITION, PRODUCTION METHOD OF RESIN COMPOSITION, MOLDING MATERIAL AND ARTICLE Mitsubishi Chemical Corporation (JP) 2024-08-28 EP disclosed
EP-3819000-B1 BEADS FOR BLOOD PROCESSING ASAHI KASEI MEDICAL CO LTD (JP) 2024-08-21 EP disclosed
EP-3824921-B1 BEADS FOR BLOOD PROCESSING ASAHI KASEI MEDICAL CO LTD (JP) 2024-08-21 EP disclosed
US-12066593-B2 (Meth)acrylate compound CANON KABUSHIKI KAISHA (JP) 2024-08-20 US disclosed
US-20240241441-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
WO-2024143214-A1 CURABLE COMPOSITION, MOLDED BODY, SILICONE HYDROGEL, AND METHOD FOR PRODUCING SILICONE HYDROGEL 三菱ケミカル株式会社 2024-07-04 WO disclosed
CN-113791469-B Ultraviolet-proof polarizer, preparation method and application thereof 深圳市三利谱光电科技股份有限公司 2024-06-21 CN disclosed
CN-114437269-B Optical element, optical device, imaging device, and compound 佳能株式会社 2024-06-07 CN disclosed
CN-118159603-A Resin composition, method for producing resin composition, molding material, and article 三菱化学株式会社 2024-06-07 CN disclosed
WO-2024101418-A1 RESIN COMPOSITION AND MOLDED BODY MCPPイノベーション合同会社 2024-05-16 WO disclosed
CN-117476609-A Display device and polarizer 广州华星光电半导体显示技术有限公司 2024-01-30 CN disclosed
US-20240027905-A1 PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-25 US disclosed
US-20240027904-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-25 US disclosed
US-20240019779-A1 COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-18 US disclosed
CN-112351802-B Bead for blood treatment 旭化成医疗株式会社 2024-01-09 CN disclosed
US-11850345-B2 Beads for blood processing ASAHI KASEI MEDICAL CO., LTD. (JP) 2023-12-26 US disclosed
US-11850346-B2 Beads for blood processing ASAHI KASEI MEDICAL CO., LTD. (JP) 2023-12-26 US disclosed
US-11809077-B2 Photoresist compositions and pattern formation methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-11-07 US disclosed
US-20230314934-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-10-05 US disclosed
CN-110462449-B Optical element, material, optical device and compound 佳能株式会社 2023-08-18 CN disclosed
CN-116589615-A Optical element, material, optical device and compound 佳能株式会社 2023-08-15 CN disclosed
CN-110462448-B Hydrophilic material with high refractive index 宾视研发公司 2023-08-01 CN disclosed
US-20230220183-A1 CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGING APPARATUS CANON KABUSHIKI KAISHA (JP) 2023-07-13 US disclosed
US-20230213862-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-07-06 US disclosed
CN-112827478-B Bead for blood treatment 旭化成医疗株式会社 2023-06-30 CN disclosed
WO-2023106395-A1 CURABLE COMPOSITION, MOLDED BODY, SILICONE HYDROGEL, METHOD FOR PRODUCING SILICONE HYDROGEL, AND MACROMONOMER 三菱ケミカル株式会社 2023-06-15 WO disclosed
US-20230161257-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-25 US disclosed
US-20230152697-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-18 US disclosed
WO-2023068375-A1 RESIN COMPOSITION, PRODUCTION METHOD OF RESIN COMPOSITION, MOLDING MATERIAL AND ARTICLE 三菱ケミカル株式会社 2023-04-27 WO disclosed
CN-110891618-B Microinjectable, low color aberration intraocular lens materials 宾视研发公司 2023-01-03 CN disclosed
US-20220403066-A1 CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGE PICKUP APPARATUS CANON KABUSHIKI KAISHA (JP) 2022-12-22 US disclosed
EP-4095167-A1 CURED PRODUCT, OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGE PICKUP APPARATUS CANON KABUSHIKI KAISHA (JP) 2022-11-30 EP disclosed
US-11500129-B2 Optical element, material, optical apparatus and compound CANON KABUSHIKI KAISHA (JP) 2022-11-15 US disclosed
US-11439733-B2 Method for producing antithrombotic coating material TERUMO KABUSHIKI KAISHA (JP) 2022-09-13 US disclosed
CN-114929756-A Seed resin stabilized high solids emulsion polymers 巴斯夫欧洲公司 2022-08-19 CN disclosed
US-20220249737-A1 MICRO INJECTABLE, LOW CHROMATIC ABERRATION INTRAOCULAR LENS MATERIALS BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2022-08-11 US disclosed
CN-114437269-A Optical element, optical device, imaging device, and compound 佳能株式会社 2022-05-06 CN disclosed
US-20220137261-A1 OPTICAL ELEMENT, OPTICAL APPARATUS, IMAGING APPARATUS, AND COMPOUND CANON KABUSHIKI KAISHA (JP) 2022-05-05 US disclosed
EP-3555677-B1 HIGH REFRACTIVE INDEX HYDROPHILIC MATERIALS BENZ RES AND DEVELOPMENT CORPORATION (US) 2022-04-20 EP disclosed
CN-112118955-B Automatic injection method of mold for monomer for episulfide optical material 可奥熙搜路司有限公司 2022-04-19 CN disclosed
CN-109475660-B Hydrophobic intraocular lenses 宾视研发公司 2022-03-22 CN disclosed
CN-113791469-A Anti-ultraviolet polarizer and preparation method and application thereof 深圳市三利谱光电科技股份有限公司 2021-12-14 CN disclosed
EP-3458118-B1 HYDROPHOBIC INTRAOCULAR LENS BENZ RES AND DEVELOPMENT CORPORATION (US) 2021-10-27 EP disclosed
CN-113412688-A Method for manufacturing conductive pattern 东丽株式会社 2021-09-17 CN disclosed
CN-113412687-A Method for manufacturing conductive pattern 东丽株式会社 2021-09-17 CN disclosed
CN-113272942-A Field-effect transistor, method of manufacturing the same, and wireless communication device using the same 东丽株式会社 2021-08-17 CN disclosed
US-20210247546-A1 (METH)ACRYLATE COMPOUND CANON KABUSHIKI KAISHA (JP) 2021-08-12 US disclosed
WO-2021153943-A1 POLYMERIZATION CURING RATE-ADJUSTED COMPOSITION FOR HIGHLY REFRACTIVE EPISULFIDE-BASED OPTICAL MATERIAL AND METHOD FOR MANUFACTURING OPTICAL MATERIAL BY USING SAME 주식회사 케이오씨솔루션 2021-08-05 WO disclosed
EP-3858879-A1 COPOLYMER FOR SUPPRESSING PROTEIN ADHESION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM AND ARTICLE Mitsubishi Chemical Corporation (JP) 2021-08-04 EP disclosed
US-20210206896-A1 COPOLYMER FOR SUPPRESSING PROTEIN ADSORPTION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM, AND ARTICLE MITSUBISHI CHEMICAL CORPORATION (JP) 2021-07-08 US disclosed
US-20210205781-A1 BEADS FOR BLOOD PROCESSING ASAHI KASEI MEDICAL CO., LTD. (JP) 2021-07-08 US disclosed
US-20210170362-A1 BEADS FOR BLOOD PROCESSING ASAHI KASEI MEDICAL CO., LTD. (JP) 2021-06-10 US disclosed
EP-3234035-B1 RADIATION CURABLE COMPOSITION COMPRISING HYDROPHILIC NANOPARTICLES BASF COATINGS GMBH (DE) 2021-06-02 EP disclosed
EP-3824921-A1 BEADS FOR BLOOD PROCESSING Asahi Kasei Medical Co., Ltd. (JP) 2021-05-26 EP disclosed
CN-112827478-A Blood treatment bead 旭化成医疗株式会社 2021-05-25 CN disclosed
EP-3819000-A1 BEADS FOR BLOOD PROCESSING Asahi Kasei Medical Co., Ltd. (JP) 2021-05-12 EP disclosed
CN-112771090-A Copolymer for inhibiting protein adhesion, method for producing copolymer, resin modifier, molding material, composition containing copolymer, coating film, and article 三菱化学株式会社 2021-05-07 CN disclosed
CN-112351802-A Blood treatment bead 旭化成医疗株式会社 2021-02-09 CN disclosed
US-10899862-B2 Hydrophobic intraocular lens BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2021-01-26 US disclosed
US-10894111-B2 High refractive index hydrophilic materials BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2021-01-19 US disclosed
CN-107109083-B Radiation curable compositions comprising hydrophilic nanoparticles 巴斯夫涂料有限公司 2021-01-08 CN disclosed
US-20210001012-A1 MEDICAL DEVICE AND METHOD FOR PRODUCING MEDICAL DEVICE TERUMO KABUSHIKI KAISHA (JP) 2021-01-07 US disclosed
CN-112118955-A Automatic injection method of mold for monomer for episulfide optical material 可奥熙搜路司有限公司 2020-12-22 CN disclosed
US-20200330643-A1 MICRO INJECTABLE, LOW CHROMATIC ABERRATION INTRAOCULAR LENS MATERIALS BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2020-10-22 US disclosed
WO-2020197156-A1 COMPOSITION FOR EPISULFIDE-BASED HIGH REFRACTIVE OPTICAL MATERIAL, AND METHOD FOR MANUFACTURING OPTICAL MATERIAL USING SAME 주식회사 케이오씨솔루션 2020-10-01 WO disclosed
WO-2020116821-A1 NOVEL EPISULFIDE COMPOUND, COMPOSITION CONTAINING SAME FOR EPISULFIDE-BASED OPTICAL MATERIAL, AND METHOD FOR MANUFACTURING OPTICAL MATERIAL 주식회사 케이오씨솔루션 2020-06-11 WO disclosed
EP-2497791-B1 METHOD FOR PRODUCING INTERNAL MOLD RELEASE AGENT FOR OPTICAL MATERIAL, INTERNAL MOLD RELEASE AGENT FOR OPTICAL MATERIAL, AND POLYMERIZABLE COMPOSITION INCLUDING THE SAME MITSUI CHEMICALS INC (JP) 2020-05-13 EP disclosed
EP-2756014-B1 HYDROPHOBIC INTRAOCULAR LENS BENZ RES AND DEVELOPMENT CORPORATION (US) 2020-04-08 EP disclosed
WO-2020066685-A1 COPOLYMER FOR SUPPRESSING PROTEIN ADHESION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM AND ARTICLE 三菱ケミカル株式会社 2020-04-02 WO disclosed
EP-3624861-A1 MICRO INJECTABLE, LOW CHROMATIC ABERRATION INTRAOCULAR LENS MATERIALS Benz Research And Development Corporation (US) 2020-03-25 EP disclosed
US-10590291-B2 Radiation curable composition comprising hydrophilic nanoparticles BASF COATINGS GMBH (DE) 2020-03-17 US disclosed
CN-110891618-A Microinjectable, low color aberration intraocular lens materials 宾视研发公司 2020-03-17 CN disclosed
WO-2020045938-A1 HIGHLY REFRACTIVE EPISULFIDE-BASED OPTICAL MATERIAL STABILIZER, OPTICAL MATERIAL COMPOSITION USING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL 주식회사 케이오씨솔루션 2020-03-05 WO disclosed
WO-2020046005-A1 HIGHLY REFRACTIVE EPISULFIDE-BASED OPTICAL MATERIAL STABILIZER, OPTICAL MATERIAL COMPOSITION USING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL 주식회사 케이오씨솔루션 2020-03-05 WO disclosed
WO-2020045974-A1 HIGHLY REFRACTIVE EPISULFIDE-BASED OPTICAL MATERIAL STABILIZER, OPTICAL MATERIAL COMPOSITION USING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL 주식회사 케이오씨솔루션 2020-03-05 WO disclosed
WO-2020040486-A1 STABILIZER FOR EPISULFIDE-BASED OPTICAL MATERIAL HAVING HIGH REFRACTIVE INDEX, COMPOSITION FOR OPTICAL MATERIAL USING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL 주식회사 케이오씨솔루션 2020-02-27 WO disclosed
WO-2020040485-A1 STABILIZER FOR EPISULFIDE-BASED OPTICAL MATERIAL HAVING HIGH REFRACTIVE INDEX, COMPOSITION FOR OPTICAL MATERIAL USING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL 주식회사 케이오씨솔루션 2020-02-27 WO disclosed
CN-108701509-B Laminated member and touch panel 东丽株式会社 2020-02-07 CN disclosed
WO-2020009008-A1 BEADS FOR BLOOD PROCESSING 旭化成メディカル株式会社 2020-01-09 WO disclosed
EP-2899188-B1 METHOD FOR STORING EPISULFIDE COMPOUND AND METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL USING SAID EPISULFIDE COMPOUND KOC SOLUTION CO LTD (KR) 2020-01-08 EP disclosed
CN-110462448-A Hydrophilic material with high refractive index BENZ RES & DEV CORP 2019-11-15 CN disclosed
CN-110462449-A Optical element, material, optical device and compound CANON KK 2019-11-15 CN disclosed
CN-105137508-B Compound, optical material and optical element used for optical elements 佳能株式会社 2019-11-08 CN disclosed
EP-3555677-A1 HIGH REFRACTIVE INDEX HYDROPHILIC MATERIALS Benz Research And Development Corporation (US) 2019-10-23 EP disclosed
WO-2019187860-A1 MEDICAL APPLIANCE AND PRODUCTION METHOD FOR MEDICAL APPLIANCE テルモ株式会社 2019-10-03 WO disclosed
EP-3111969-B1 MEDICAL MATERIAL AND MEDICAL INSTRUMENT USING MEDICAL MATERIAL TERUMO CORP (JP) 2019-09-11 EP disclosed
US-10370474-B2 Optical composition, cured product, and optical element CANON KABUSHIKI KAISHA (JP) 2019-08-06 US disclosed
US-RE47556-E1 Optical element compound, optical material, and optical element CANON KABUSHIKI KAISHA (JP) 2019-08-06 US disclosed
EP-2682430-B2 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY KOC SOLUTION CO LTD (KR) 2019-07-17 EP disclosed
EP-2390684-B1 OPTICAL ELEMENT COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT CANON KK (JP) 2019-04-24 EP disclosed
US-20190099525-A1 METHOD FOR PRODUCING ANTITHROMBOTIC COATING MATERIAL TERUMO KABUSHIKI KAISHA (JP) 2019-04-04 US disclosed
EP-3458118-A1 HYDROPHOBIC INTRAOCULAR LENS Benz Research And Development Corporation (US) 2019-03-27 EP disclosed
CN-109475660-A Hydrophobicity intraocular lens 宾视研发公司 2019-03-15 CN disclosed
EP-2835670-B1 OPTICAL FILM WITH EXCELLENT ULTRAVIOLET CUT-OFF FUNCTION AND POLARIZING PLATE INCLUDING SAME LG CHEMICAL LTD (KR) 2019-02-13 EP disclosed
US-10196470-B2 Hydrophobic intraocular lens BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2019-02-05 US disclosed
US-10188774-B2 Method for producing antithrombotic coating material TERUMO KABUSHIKI KAISHA (JP) 2019-01-29 US disclosed
US-20180334520-A1 HYDROPHOBIC INTRAOCULAR LENS BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2018-11-22 US disclosed
WO-2018213240-A1 MICRO INJECTABLE, LOW CHROMATIC ABERRATION INTRAOCULAR LENS MATERIALS BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2018-11-22 WO disclosed
US-10106660-B2 Film containing a resin having a thiourethane bond and uses thereof MITSUI CHEMICALS, INC. (JP) 2018-10-23 US disclosed
US-10067266-B2 Method of producing resin for thiourethane-based optical material using general-purpose polyisocyanate compound, resin composition for thiourethane-based optical material and thiourethane-based optical material including resin produced by the method KOC SOLUTION CO., LTD. (KR) 2018-09-04 US disclosed
US-RE47000-E1 Optical element compound, optical material, and optical element CANON KABUSHIKI KAISHA (JP) 2018-08-21 US disclosed
EP-2213707-B1 INK COMPOSITION SEIKO EPSON CORP (JP) 2018-07-18 EP disclosed
US-10022478-B2 Medical device TERUMO KABUSHIKI KAISHA (JP) 2018-07-17 US disclosed
WO-2018112180-A1 HIGH REFRACTIVE INDEX HYDROPHILIC MATERIALS BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2018-06-21 WO disclosed
US-20180169296-A1 HIGH REFRACTIVE INDEX HYDROPHILIC MATERIALS BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2018-06-21 US disclosed
EP-3088014-B1 MEDICAL DEVICE TERUMO CORP (JP) 2018-06-20 EP disclosed
US-9956324-B2 Medical material, and medical device using the medical material TERUMO KABUSHIKI KAISHA (JP) 2018-05-01 US disclosed
CN-107667126-A Thioopoxy-based ultrahigh-refractive-index optical resin composition and preparation method of thioepoxy-based optical material 可奥熙搜路司有限公司 2018-02-06 CN disclosed
EP-2295484-B1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2018-01-17 EP disclosed
US-20170342183-A1 RADIATION CURABLE COMPOSITION COMPRISING HYDROPHILIC NANOPARTICLES ROLIC AG (CH) 2017-11-30 US disclosed
WO-2017200934-A1 HYDROPHOBIC INTRAOCULAR LENS BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2017-11-23 WO disclosed
US-20170327615-A1 HYDROPHOBIC INTRAOCULAR LENS BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2017-11-16 US disclosed
EP-2407498-B1 Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material MITSUI CHEMICALS INC (JP) 2017-11-15 EP disclosed
US-20170320984-A1 OPTICAL COMPOSITION, CURED PRODUCT, AND OPTICAL ELEMENT CANON KABUSHIKI KAISHA (JP) 2017-11-09 US disclosed
EP-3234035-A1 RADIATION CURABLE COMPOSITION COMPRISING HYDROPHILIC NANOPARTICLES Rolic AG (CH) 2017-10-25 EP disclosed
EP-2806295-B1 OPTICAL FILM HAVING SUPERIOR ULTRAVIOLET RAY PROTECTION FUNCTION AND POLARIZING PLATE COMPRISING SAME LG CHEMICAL LTD (KR) 2017-10-04 EP disclosed
CN-107109083-A The composition of radiation-hardenable comprising hydrophilic nano 罗利克有限公司 2017-08-29 CN disclosed
US-9725608-B2 Ink jet recording ink, ink jet recording ink set, recording method, recorded matter and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-08-08 US disclosed
EP-2516414-B1 HETEROAROMATIC COMPOUND, OPTICAL MATERIAL AND OPTICAL ELEMENT CANON KK (JP) 2017-08-02 EP disclosed
CN-103365023-B Electrophoresis particle, the manufacture method of electrophoresis particle, electrophoresis dispersion, electrophoretic sheet, electrophoretic apparatus and electronic equipment 精工爱普生株式会社 2017-07-21 CN disclosed
US-9694117-B2 Antithrombotic medical materials and medical apparatus using the same materials TERUMO KABUSHIKI KAISHA (JP) 2017-07-04 US disclosed
US-9690138-B2 Retardation film, manufacturing method thereof, and liquid crystal display device including the same LG CHEM, LTD. (KR) 2017-06-27 US disclosed
US-9690020-B2 Optical film exhibiting excellent blocking properties for ultraviolet light and polarizing plate including the same LG CHEM, LTD. (KR) 2017-06-27 US disclosed
CN-103946251-B Hydrophobic intraocular lenses 宾视研发公司 2017-06-23 CN disclosed
US-9658364-B2 Method for storing episulfide compound and method for preparing thioepoxy-based optical material using said episulfide compound KOC SOLUTION CO., LTD. (KR) 2017-05-23 US disclosed
US-20170128636-A1 MEDICAL MATERIAL, AND MEDICAL DEVICE USING THE MEDICAL MATERIAL TERUMO KABUSHIKI KAISHA (JP) 2017-05-11 US disclosed
CN-104053657-B Process for producing thioepoxy optical material and polymerizable composition thereof 可奥熙搜路司有限公司 2017-04-26 CN disclosed
CN-104662012-B The preparation method of the keeping method of episulfide compound and the thio epoxiess optical material using above-mentioned episulfide compound 可奥熙搜路司有限公司 2017-04-05 CN disclosed
US-9581734-B2 Optical film exhibiting excellent blocking properties for ultraviolet light and polarizing plate including the same LG CHEM, LTD. (KR) 2017-02-28 US disclosed
US-20170027685-A1 HYDROPHOBIC INTRAOCULAR LENS BENZ RESEARCH AND DEVELOPMENT CORPORATION (US) 2017-02-02 US disclosed
EP-2116558-B1 POLYMERIZABLE COMPOSITION CONTAINING A CATALYST, OPTICAL MATERIAL OBTAINED FROM THE COMPOSITION, AND METHOD FOR PRODUCING THE OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2017-01-18 EP disclosed
EP-1988110-B1 INTERNAL MOLD RELEASE AGENT FOR PRODUCTION OF POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2017-01-04 EP disclosed
EP-3111969-A1 MEDICAL MATERIAL AND MEDICAL INSTRUMENT USING MEDICAL MATERIAL Terumo Kabushiki Kaisha (JP) 2017-01-04 EP disclosed
US-9517290-B2 Polymers for intraocular lenses BENZ RESEARCH AND DEVELOPMENT CORPORATION (US) 2016-12-13 US disclosed
EP-3088014-A1 MEDICAL DEVICE Terumo Kabushiki Kaisha (JP) 2016-11-02 EP disclosed
US-20160303296-A1 MEDICAL DEVICE TERUMO KABUSHIKI KAISHA (JP) 2016-10-20 US disclosed
CN-105968409-A Polymeric composition for thioepoxy-based optical material and method of manufacturing thioepoxy-based optical material 可奥熙搜路司有限公司 2016-09-28 CN disclosed
US-20160263294-A1 METHOD FOR PRODUCING ANTITHROMBOTIC COATING MATERIAL TERUMO KABUSHIKI KAISHA (JP) 2016-09-15 US disclosed
US-20160264743-A1 FILM CONTAINING A RESIN HAVING A THIOURETHANE BOND AND USES THEREOF MITSUI CHEMICALS, INC. (JP) 2016-09-15 US disclosed
EP-2862012-B1 (METH)ACRYLATE COMPOUND, OPTICAL COMPOSITION, MOLDED ARTICLE, AND OPTICAL ELEMENT CANON KK (JP) 2016-09-14 EP disclosed
CN-103620486-B Retardation film, method of manufacturing the same, and liquid crystal display device including the same LG化学株式会社 2016-09-14 CN disclosed
EP-2805949-B1 METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL AND POLYMERIZABLE COMPOSITION THEREOF KOC SOLUTION CO LTD (KR) 2016-08-17 EP disclosed
US-9381080-B2 Hydrophobic intraocular lens BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2016-07-05 US disclosed
WO-2016096937-A1 RADIATION CURABLE COMPOSITION COMPRISING HYDROPHILIC NANOPARTICLES ROLIC AG (CH) 2016-06-23 WO disclosed
US-9372281-B2 Method for preparing thioepoxy-based optical material and polymerizable composition thereof KOC SOLUTION CO., LTD. (KR) 2016-06-21 US disclosed
CN-104508516-B (meth) acrylate compound, optical composition, molded article, and optical element CANON KABUSHIKI KAISHA (JP) 2016-06-01 CN disclosed
US-9290656-B2 Polymerizable composition for polythiourethane optical material MITSUI CHEMICALS, INC. (JP) 2016-03-22 US disclosed
US-9290597-B2 (Meth)acrylate compound, optical composition, molded article, and optical element CANON KABUSHIKI KAISHA (JP) 2016-03-22 US disclosed
CN-105393145-A Optical film having excellent ultraviolet blocking property and polarizing plate comprising the same LG CHEMICAL LTD 2016-03-09 CN disclosed
US-20160018565-A1 OPTICAL FILM EXHIBITING EXCELLENT BLOCKING PROPERTIES FOR ULTRAVIOLET LIGHT AND POLARIZING PLATE INCLUDING THE SAME LG CHEM, LTD. (KR) 2016-01-21 US disclosed
CN-105137508-A ACRYLATE COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT CANON KK 2015-12-09 CN disclosed
CN-102666676-B Film and uses thereof MITSUI CHEMICALS, INC. (JP) 2015-11-25 CN disclosed
CN-105093773-A Method for preparing electrophoretic particles, electrophoretic particles, electrophoretic dispersion, electrophoretic sheet, electrophoretic apparatus, and electronic device SEIKO EPSON CORP 2015-11-25 CN disclosed
US-20150323850-A1 METHOD FOR PREPARING ELECTROPHORETIC PARTICLES, ELECTROPHORETIC PARTICLES, ELECTROPHORETIC DISPERSION, ELECTROPHORETIC SHEET, ELECTROPHORETIC APPARATUS, AND ELECTRONIC DEVICE SEIKO EPSON CORPORATION (JP) 2015-11-12 US disclosed
US-9176257-B2 Conjugated aromatic compound, optical material, and optical element CANON KABUSHIKI KAISHA (JP) 2015-11-03 US disclosed
EP-2682430-B1 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY KOC SOLUTION CO LTD (KR) 2015-10-21 EP disclosed
CN-102260201-B Compound for optical element, optical material, and optical element CANON KABUSHIKI KAISHA (JP) 2015-10-14 CN disclosed
US-20150247955-A1 METHOD FOR STORING EPISULFIDE COMPOUND AND METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL USING SAID EPISULFIDE COMPOUND MITSUI CHEMICALS, INC. (JP) 2015-09-03 US disclosed
US-20150238664-A1 ANTITHROMBOTIC MEDICAL MATERIALS AND MEDICAL APPARATUS USING THE SAME MATERIALS TERUMO KABUSHIKI KAISHA (JP) 2015-08-27 US disclosed
US-20150226879-A1 METHOD OF MANUFACTURING THIOURETHANE - BASED OPTICAL MATERIAL KOC SOLUTION CO., LTD. (KR) 2015-08-13 US disclosed
EP-2899188-A1 METHOD FOR STORING EPISULFIDE COMPOUND AND METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL USING SAID EPISULFIDE COMPOUND KOC Solution Co. Ltd. (KR) 2015-07-29 EP disclosed
CN-103108918-B Method for manufacturing resin for thiourethane-based optical material using universal polyisocyanate compound, resin composition, and optical material manufactured thereby KOC SOLUTION CO LTD 2015-07-15 CN disclosed
EP-2891672-A1 METHOD FOR MANUFACTURING THIOURETHANE-BASED OPTICAL MATERIAL KOC Solution Co. Ltd. (KR) 2015-07-08 EP disclosed
US-20150175731-A1 (METH)ACRYLATE COMPOUND, OPTICAL COMPOSITION, MOLDED ARTICLE, AND OPTICAL ELEMENT CANON KABUSHIKI KAISHA (JP) 2015-06-25 US disclosed
CN-101903175-B Multi-layered acrylic retardation film and fabrication method thereof LG CHEMICAL LTD 2015-05-27 CN disclosed
CN-104662012-A Method for storing episulfide compound and method for preparing thioepoxy-based optical material using said episulfide compound KOC SOLUTION CO LTD 2015-05-27 CN disclosed
CN-104640900-A Preparation method of thiourethane optical material KOC SOLUTION CO LTD 2015-05-20 CN disclosed
US-9025237-B2 Electrophoresis particle, method of manufacturing electrophoresis particle, electrophoresis dispersion liquid, electrophoresis sheet, electrophoresis device and electronic apparatus SEIKO EPSON CORPORATION (JP) 2015-05-05 US disclosed
EP-2862012-A1 (METH)ACRYLATE COMPOUND, OPTICAL COMPOSITION, MOLDED ARTICLE, AND OPTICAL ELEMENT Canon Kabushiki Kaisha (JP) 2015-04-22 EP disclosed
CN-102977309-B Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material MITSU CHEMICALS INC 2015-04-15 CN disclosed
CN-104508516-A (meth) acrylate compound, optical composition, molded article, and optical element CANON KK 2015-04-08 CN disclosed
US-20150092264-A1 OPTICAL FILM EXHIBITING EXCELLENT BLOCKING PROPERTIES FOR ULTRAVIOLET LIGHT AND POLARIZING PLATE INCLUDING THE SAME LG CHEM, LTD. (KR) 2015-04-02 US disclosed
US-20150061168-A1 POLYMERS FOR INTRAOCULAR LENSES BENZ RESEARCH AND DEVELOPMENT CORPORATION (US) 2015-03-05 US disclosed
EP-2835670-A1 OPTICAL FILM WITH EXCELLENT ULTRAVIOLET CUT-OFF FUNCTION AND POLARIZING PLATE INCLUDING SAME LG Chem, Ltd. (KR) 2015-02-11 EP disclosed
CN-102241188-B Ink jet recording apparatus and ink jet recording method SEIKO EPSON CORP 2014-12-10 CN disclosed
EP-2533100-B1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LIQUID-REPELLENT FILM NISSAN CHEMICAL IND LTD (JP) 2014-12-03 EP disclosed
CN-104185801-A Optical film having excellent ultraviolet blocking property and polarizing plate comprising the same LG CHEMICAL LTD 2014-12-03 CN disclosed
EP-2806295-A1 OPTICAL FILM HAVING SUPERIOR ULTRAVIOLET RAY PROTECTION FUNCTION AND POLARIZING PLATE COMPRISING SAME LG CHEM, LTD. (KR) 2014-11-26 EP disclosed
EP-2805949-A1 METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL AND POLYMERIZABLE COMPOSITION THEREOF KOC Solution Co. Ltd. (KR) 2014-11-26 EP disclosed
EP-1295916-B1 INK-JET RECORDING INK, INK-JET RECORDING INK SET, RECORDING METHOD, PRINT, AND INK-JET RECORDING APPARATUS SEIKO EPSON CORP (JP) 2014-11-26 EP disclosed
US-20140336332-A1 METHOD FOR PREPARING THIOEPOXY-BASED OPTICAL MATERIAL AND POLYMERIZABLE COMPOSITION THEREOF MITSUI CHEMICALS, INC. (JP) 2014-11-13 US disclosed
US-8865299-B2 Multi-layered acrylic retardation film and fabrication method thereof LG CHEM, LTD. (KR) 2014-10-21 US disclosed
CN-101637999-B Recording method, recorded matter, ink jet recording apparatus, and identification method SEIKO EPSON CORP. (JP) 2014-10-15 CN disclosed
CN-104053657-A Process for producing thioepoxy optical material and polymerizable composition thereof KOC SOLUTION CO LTD 2014-09-17 CN disclosed
US-8835526-B2 Polymers for intraocular lenses BENZ RESEARCH AND DEVELOPMENT CORPORATION (US) 2014-09-16 US disclosed
CN-104039860-A Polymerizable composition for thioepoxy-based optical material and method for producing thioepoxy-based optical material KOC SOLUTION CO LTD 2014-09-10 CN disclosed
US-8829230-B2 Optical element compound, optical material, and optical element CANON KABUSHIKI KAISHA (JP) 2014-09-09 US disclosed
CN-104024300-A POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL CONTAINING THIOEPOXY COMPOUND, AND PREPARATION METHOD OF OPTICAL MATERIAL KOC SOLUTION CO LTD 2014-09-03 CN disclosed
CN-101836939-B Composite spherical polymer particles and their production process, and cosmetics using the same DAINICHISEIKA COLOR CHEM 2014-08-20 CN disclosed
CN-102741752-B Positive photosensitive resin composition and liquid-repellent film NISSAN CHEMICAL IND LTD 2014-08-20 CN disclosed
CN-102459354-B Photosensitive composition SANYO CHEMICAL IND LTD 2014-08-20 CN disclosed
EP-2756014-A1 HYDROPHOBIC INTRAOCULAR LENS Benz Research And Development Corporation (US) 2014-07-23 EP disclosed
US-20140171558-A1 Ink Jet Recording Ink, Ink Jet Recording Ink Set, Recording Method, Recorded Matter and Ink Jet Recording Apparatus SEIKO EPSON CORPORATION (JP) 2014-06-19 US disclosed
CN-102666524-B Heteroaromatic-containing compound, optical material and optical element CANON KK 2014-06-11 CN disclosed
US-20140125926-A1 RETARDATION FILM, MANUFACTURING METHOD THEREOF, AND LIQUID CRYSTAL DISPLAY DEVICE INCLUDING THE SAME LG CHEM, LTD. (KR) 2014-05-08 US disclosed
EP-2065414-B1 POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE CATALYST, POLYTHIOURETHANE RESIN OBTAINED FROM THE COMPOSITION, AND METHOD FOR PRODUCING THE RESIN MITSUI CHEMICALS INC (JP) 2014-04-30 EP disclosed
CN-103620486-A Retardation film, method of manufacturing the same, and liquid crystal display device including the same LG CHEMICAL LTD 2014-03-05 CN disclosed
CN-103608902-A Adhesive sheet DENKI KAGAKU KOGYO KK 2014-02-26 CN disclosed
US-8652755-B2 Positive photosensitive resin composition and lyophobic film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-02-18 US disclosed
US-8648130-B2 Resin composition, transparent member obtained from the resin composition, and use of the same MITSUI CHEMICALS, INC. (JP) 2014-02-11 US disclosed
WO-2014021355-A1 (METH)ACRYLATE COMPOUND, OPTICAL COMPOSITION, MOLDED ARTICLE, AND OPTICAL ELEMENT CANON KABUSHIKI KAISHA (JP) 2014-02-06 WO disclosed
US-20140039145-A1 METHOD OF PRODUCING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING GENERAL-PURPOSE POLYISOCYANATE COMPOUND, RESIN COMPOSITION FOR THIOURETHANE-BASED OPTICAL MATERIAL AND THIOURETHANE-BASED OPTICAL MATERIAL INCLUDING RESIN PRODUCED BY THE METHOD KOC SOLUTION CO LTD (KR) 2014-02-06 US disclosed
US-20140031582-A1 OPTICAL ELEMENT COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT CANON KABUSHIKI KAISHA (JP) 2014-01-30 US disclosed
US-8637633-B2 Polymerizable composition, and resin and optical part using the same MITSUI CHEMICALS, INC. (JP) 2014-01-28 US disclosed
EP-2682430-A2 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY Koc Solution Co.,LTD. (KR) 2014-01-08 EP disclosed
US-8609869-B2 Heteroaromatic-containing compound, optical material and optical element CANON KABUSHIKI KAISHA (JP) 2013-12-17 US disclosed
CN-103430345-A Multilayered protective layer, organic opto-electric device and method of manufacturing the same TNO 2013-12-04 CN disclosed
CN-103402781-A Ink jet recording method and printed material FUJIFILM CORP 2013-11-20 CN disclosed
US-8586695-B2 Polymerization catalyst for polythiourethane optical material, polymerizable composition containing the same, polythiourethane resin obtained from the composition, and process for producing the resin MITSUI CHEMICALS, INC. (JP) 2013-11-19 US disclosed
US-8586694-B2 Polymerization catalyst for polythiourethane-based optical material, polymerizable composition containing the catalyst, optical material obtained from the composition, and method for preparing the optical material MITSUI CHEMICALS, INC. (JP) 2013-11-19 US disclosed
CN-102066450-B Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material MITSUI CHEMICALS INC 2013-11-06 CN disclosed
CN-101883825-B Resin composition, transparent member obtained from the resin composition, and use of the same MITSUI CHEMICALS INC 2013-11-06 CN disclosed
US-20130289200-A1 NOVEL HYDROPHILIC CHAIN TRANSFER AGENT AND END-MODIFIED STYRENE-BUTADIENE COPOLYMER USING THEM INSTITUTE FOR RESEARCH & INDUSTRY COOPERATION, PNU (KR) 2013-10-31 US disclosed
US-8569541-B2 Optical element compound, optical material, and optical element CANON KABUSHIKI KAISHA (JP) 2013-10-29 US disclosed
CN-103365023-A Electrophoresis particle, method of manufacturing electrophoresis particle, electrophoresis dispersion liquid, electrophoresis sheet, electrophoresis device and electronic apparatus SEIKO EPSON CORP 2013-10-23 CN disclosed
US-20130265633-A1 ELECTROPHORESIS PARTICLE, METHOD OF MANUFACTURING ELECTROPHORESIS PARTICLE, ELECTROPHORESIS DISPERSION LIQUID, ELECTROPHORESIS SHEET, ELECTROPHORESIS DEVICE AND ELECTRONIC APPARATUS SEIKO EPSON CORPORATION (JP) 2013-10-10 US disclosed
US-20130253159-A1 HYDROPHOBIC INTRAOCULAR LENS BENZ RESEARCH AND DEVELOPMENT CORP. 2013-09-26 US disclosed
CN-103299447-A Opto-electric device and method of manufacturing an opto-electric device TNO 2013-09-11 CN disclosed
US-8524803-B2 Encapsulation product, process for producing the same, and ink composition SEIKO EPSON CORPORATION (JP) 2013-09-03 US disclosed
US-8526099-B2 Method for manufacturing microcapsules, and microcapsule, electrophoretic device and electric apparatus SEIKO EPSON CORPORATION (JP) 2013-09-03 US disclosed
CN-101861367-B Ink composition SEIKO EPSON CORP 2013-08-28 CN disclosed
US-8512822-B2 Retardation film, method for manufacturing the same, and liquid crystal display device including the same LG CHEM, LTD. (KR) 2013-08-20 US disclosed
US-20130178555-A1 POLYMERS FOR INTRAOCULAR LENSES BENZ RESEARCH AND DEVELOPMENT CORPORATION (US) 2013-07-11 US disclosed
CN-103176360-A Photosensitive composition SANYO CHEMICAL IND LTD 2013-06-26 CN disclosed
CN-103155108-A Method for manufacturing electronic component DENKI KAGAKU KOGYO KK 2013-06-12 CN disclosed
US-8461238-B2 Process for producing internal mold release agent for optical material, internal mold release agent for optical material, and polymerizable composition including the same MITSUI CHEMICALS, INC. (JP) 2013-06-11 US disclosed
EP-1988109-B1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2013-05-29 EP disclosed
CN-103109354-A Method for manufacturing electronic component DENKI KAGAKU KOGYO KK 2013-05-15 CN disclosed
CN-103108918-A Method for manufacturing resin for thiourethane-based optical material using universal polyisocyanate compound, resin composition, and optical material manufactured thereby KOC SOLUTION CO LTD 2013-05-15 CN disclosed
CN-101685255-B Coloring photosensitive composition, color filter and liquid crystal display FUJI PHOTO FILM CO LTD 2013-04-03 CN disclosed
WO-2013040434-A1 HYDROPHOBIC INTRAOCULAR LENS BENZ RESEARCH AND DEVELOPMENT CORP. (US) 2013-03-21 WO disclosed
CN-102977309-A Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material MITSUI CHEMICALS INC 2013-03-20 CN disclosed
CN-102971839-A Multilayer adhesive sheet and method for producing electronic component DENKI KAGAKU KOGYO KK 2013-03-13 CN disclosed
US-20130046087-A1 Substituted Cyclodextrin Derivatives Useful As Intermediates For Producing Biologically Active Materials ARCARIOS BV (NL) 2013-02-21 US disclosed
CN-101384636-B Polymerizable composition for polythiourethane optical material MITSU CHEMICALS INC 2013-02-13 CN disclosed
EP-2550299-A2 Substituted cyclodextrin derivatives and process for their preparation Arcarios B.V. (NL) 2013-01-30 EP disclosed
CN-102906355-A Metal mesh reinforced molded body in the form of a dome lamp EVONIK ROEHM GMBH 2013-01-30 CN disclosed
CN-101396909-B Coater and ink-jet recording device using the same FUJIFILM CORP 2013-01-23 CN disclosed
US-20130005934-A1 Polymerizable Composition, and Resin and Optical Part Using the Same MITSUI CHEMICALS, INC (JP) 2013-01-03 US disclosed
US-20120330052-A1 CONJUGATED AROMATIC COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT CANON KABUSHIKI KAISHA (JP) 2012-12-27 US disclosed
EP-2322980-B1 IN-PLANE SWITCHING MODE LIQUID CRYSTAL DISPLAY LG CHEMICAL LTD (KR) 2012-12-26 EP disclosed
EP-2533100-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LIQUID-REPELLENT FILM Nissan Chemical Industries, Ltd. (JP) 2012-12-12 EP disclosed
US-20120301827-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LYOPHOBIC FILM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-11-29 US disclosed
US-8318832-B2 Polymers for intraocular lenses BENZ RESEARCH AND DEVELOPMENT CORPORATION (US) 2012-11-27 US disclosed
CN-101627069-B Polymerization catalyst for polythiourethane optical material, polymerizable composition containing the catalyst, optical material obtained from the composition, and method for producing the optical m MITSU CHEMICALS INC 2012-11-21 CN disclosed
US-8304507-B2 Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material MITSUI CHEMICALS, INC. (JP) 2012-11-06 US disclosed
US-20120270977-A1 TITANIUM DIOXIDE DISPERSION LIQUID, METHOD FOR MANUFACTURING TITANIUM DIOXIDE DISPERSION LIQUID, AND ORGANIC OPTICAL ELEMENT CANON KABUSHIKI KAISHA (JP) 2012-10-25 US disclosed
CN-102741752-A Positive photosensitive resin composition and liquid-repellent film NISSAN CHEMICAL IND LTD 2012-10-17 CN disclosed
EP-2500372-A1 FILM AND APPLICATION THEREOF Mitsui Chemicals, Inc. (JP) 2012-09-19 EP disclosed
EP-2497791-A1 METHOD FOR PRODUCING INTERNAL MOLD RELEASE AGENT FOR OPTICAL MATERIAL, INTERNAL MOLD RELEASE AGENT FOR OPTICAL MATERIAL, AND POLYMERIZABLE COMPOSITION INCLUDING THE SAME Mitsui Chemicals, Inc. (JP) 2012-09-12 EP disclosed
CN-102666524-A Heteroaromatic-containing compound, optical material and optical element CANON KK 2012-09-12 CN disclosed
CN-102666676-A Film and application thereof MITSUI CHEMICALS INC 2012-09-12 CN disclosed
US-20120225996-A1 PROCESS FOR PRODUCING INTERNAL MOLD RELEASE AGENT FOR OPTICAL MATERIAL, INTERNAL MOLD RELEASE AGENT FOR OPTICAL MATERIAL, AND POLYMERIZABLE COMPOSITION INCLUDING THE SAME MITSUI CHEMICALS, INC. (JP) 2012-09-06 US disclosed
US-20120225274-A1 FILM AND USES THEREOF MITSUI CHEMICALS, INC. (JP) 2012-09-06 US disclosed
CN-102640277-A Adhesive sheet and electronic component DENKI KAGAKU KOGYO KK 2012-08-15 CN disclosed
US-8243239-B2 In-plane switching mode liquid crystal display LG CHEM, LTD. (KR) 2012-08-14 US disclosed
US-20120203012-A1 HETEROAROMATIC-CONTAINING COMPOUND, OPTICAL MATERIAL AND OPTICAL ELEMENT CANON KABUSHIKI KAISHA (JP) 2012-08-09 US disclosed
CN-101511895-B Polymerization catalyst for polythiourethane optical material, polymerizable composition containing the catalyst, polythiourethane resin obtained from the composition, and process for producing the polythiourethane resin MITSU CHEMICALS INC 2012-07-18 CN disclosed
CN-102597037-A Method for producing internal mold release agent for optical material, and polymerizable composition containing same MITSUI CHEMICALS INC 2012-07-18 CN disclosed
EP-2014700-B1 POLYMERIZABLE COMPOSITION, RESIN USING THE SAME AND OPTICAL COMPONENT MITSUI CHEMICALS INC (JP) 2012-06-13 EP disclosed
CN-1854210-B Microencapsulated particulate metal material, method for producing the same, and aqueous dispersion and ink jet ink using the same SEIKO EPSON CORP 2012-05-02 CN disclosed
CN-101544863-B Resin composition for printed wiring board, dry film, and printed wiring board TAIYO INK MFG CO LTD 2012-04-25 CN disclosed
CN-101370841-B Internal mold release agent for producing polythiourethane optical material MITSUI CHEMICALS INC 2012-02-29 CN disclosed
EP-2407498-A2 Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material Mitsui Chemicals, Inc. (JP) 2012-01-18 EP disclosed
US-8088486-B2 Microencapsulated particulate metal material, method for producing the same, and aqueous dispersion and ink jet ink using the same SEIKO EPSON CORPORATION (JP) 2012-01-03 US disclosed
EP-2390684-A2 Optical element compound, optical material, and optical element Canon Kabushiki Kaisha (JP) 2011-11-30 EP disclosed
CN-102260201-A Compound for optical element, optical material, and optical element 2011-11-30 CN disclosed
US-20110288330-A1 OPTICAL ELEMENT COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT CANON KABUSHIKI KAISHA (JP) 2011-11-24 US disclosed
CN-102241188-A Ink jet recording apparatus and ink jet recording method SEIKO EPSON CORP 2011-11-16 CN disclosed
US-20110268895-A1 RETARDATION FILM, METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY DEVICE INCLUDING THE SAME SHANJIN OPTOELECTRONICS (SUZHOU) CO., LTD. (CN) 2011-11-03 US disclosed
US-20110262663-A1 RETARDATION FILM, FABRICATION METHOD THEREOF, AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME LG CHEM, LTD 2011-10-27 US disclosed
US-20110257146-A1 Method of Treating Kcnq Related Disorders Using Organozinc Compounds THE JOHNS HOPKINS UNIVERSITY (US) 2011-10-20 US disclosed
WO-2011117317-A2 SUBSTITUTED CYCLODEXTRIN DERIVATIVES USEFUL AS INTERMEDIATES FOR PRODUCING BIOLOGICALLY ACTIVE MATERIALS ARCARIOS BV (NL) 2011-09-29 WO disclosed
US-20110237700-A1 PHOTOPOLYMERIZABLE POLYMER MICELLE, METHOD OF PRODUCING THE SAME, AND INK COMPOSITION CONTAINING PHOTOPOLYMERIZABLE POLYMER MICELLE SEIKO EPSON CORPORATION (JP) 2011-09-29 US disclosed
CN-102199260-A Photopolymerizable polymer micelle, method of producing the same, and ink composition containing photopolymerizable polymer micelle SEIKO EPSON CORP 2011-09-28 CN disclosed
US-8022163-B2 Internal mold release agent for production of polythiourethane optical material MITSUI CHEMICALS, INC. (JP) 2011-09-20 US disclosed
US-20110190466-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2011-08-04 US disclosed
US-20110171441-A1 MULTI-LAYERED ACRYLIC RETARDATION FILM AND FABRICATION METHOD THEREOF LG CHEM, LTD. (KR) 2011-07-14 US disclosed
EP-2322980-A2 IN-PLANE SWITCHING MODE LIQUID CRYSTAL DISPLAY LG Chem, Ltd. (KR) 2011-05-18 EP disclosed
CN-102066450-A Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material MITSUI CHEMICALS INC 2011-05-18 CN disclosed
US-20110112269-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM THE POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2011-05-12 US disclosed
CN-101990645-A Retardation film, fabrication method thereof, and liquid crystal display comprising the same LG CHEMICAL LTD 2011-03-23 CN disclosed
US-20110065884-A1 POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE SAME, POLYTHIOURETHANE RESIN OBTAINED FROM THE COMPOSITION, AND PROCESS FOR PRODUCING THE RESIN MITSUI CHEMICALS, INC. (JP) 2011-03-17 US disclosed
EP-2295484-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2011-03-16 EP disclosed
US-7906567-B2 Process for producing encapsulated product, and encapsulated product SEIKO EPSON CORPORATION (JP) 2011-03-15 US disclosed
EP-1860161-B9 Ink set for ink jet-jet recording, method for ink-jet recording and recorded matter SEIKO EPSON CORP (JP) 2011-03-02 EP disclosed
EP-1860161-B1 Ink set for ink jet-jet recording, method for ink-jet recording and recorded matter SEIKO EPSON CORP (JP) 2010-12-08 EP disclosed
US-20100300516-A1 MULTILAYER STRUCTURE, PHOTOELECTRIC ELEMENT AND ELECTRONIC APPARATUS SEIKO EPSON CORPORATION (JP) 2010-12-02 US disclosed
CN-101903175-A Multi-layered acrylic retardation film and fabrication method thereof LG CHEMICAL LTD 2010-12-01 CN disclosed
US-20100298519-A1 POLYMERIZABLE COMPOSITION, AND RESIN AND OPTICAL PART USING THE SAME MITSUI CHEMICALS, INC. (JP) 2010-11-25 US disclosed
CN-101883825-A Resin composition, transparent member obtained from the resin composition, and use of the same MITSUI CHEMICALS INC 2010-11-10 CN disclosed
CN-101861367-A Ink composition SEIKO EPSON CORP 2010-10-13 CN disclosed
US-7812070-B2 Microencapsulated pigment, preparation process therefor, aqueous dispersion and ink jet recording ink SEIKO EPSON CORPORATION (JP) 2010-10-12 US disclosed
US-20100256271-A1 RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME MITSUI CHEMICALS, INC. (JP) 2010-10-07 US disclosed
CN-101836939-A Composite spherical polymer particles and their production process, and cosmetics using the same DAINICHISEIKA COLOR CHEM 2010-09-22 CN disclosed
US-20100234498-A1 INTERNAL MOLD RELEASE AGENT FOR PRODUCTION OF POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2010-09-16 US disclosed
US-20100222498-A1 INK COMPOSITION SEIKO EPSON CORPORATION (JP) 2010-09-02 US disclosed
EP-2223969-A1 RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME Mitsui Chemicals, Inc. (JP) 2010-09-01 EP disclosed
EP-2213707-A1 INK COMPOSITION Seiko Epson Corporation (JP) 2010-08-04 EP disclosed
US-7754806-B2 Biological substance related article and method of manufacturing the same, and biological substance adsorption preventive coating composition and method of using the same JSR CORPORATION (JP) 2010-07-13 US disclosed
EP-1482002-B1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS INC (JP) 2010-04-28 EP disclosed
CN-101685255-A Coloring photosensitive composition, color filter and liquid crystal display FUJI PHOTO FILM CO LTD 2010-03-31 CN disclosed
US-7683108-B2 Stability and ejection stability and capable of forming images with fastness, abrasion resistance, color developability, and high density with little feathering SEIKO EPSON CORPORATION (JP) 2010-03-23 US disclosed
US-20100053508-A1 In-plane switching mode liquid crystal display SHANJIN OPTOELECTRONICS (SUZHOU) CO., LTD. (CN) 2010-03-04 US disclosed
US-20100029890-A1 POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE SAME, POLYTHIOURETHANE RESIN OBTAINED FROM THE COMPOSITION, AND PROCESS FOR PRODUCING THE RESIN MITSUI CHEMICALS, INC. (JP) 2010-02-04 US disclosed
CN-101637999-A Recording method, recorded matter, ink jet recording apparatus, and identification method SEIKO EPSON CORP JP 2010-02-03 CN disclosed
US-20100016517-A1 POLYMERIZATION CATALYST FOR POLYTHIOURETHANE-BASED OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE CATALYST, OPTICAL MATERIAL OBTAINED FROM THE COMPOSITION, AND METHOD FOR PREPARING THE OPTICAL MATERIAL MITSUI CHEMICALS, INC (JP) 2010-01-21 US disclosed
CN-101627069-A Polymerization catalyst for polythiourethane optical material, polymerizable composition containing the catalyst, optical material obtained from the composition, and method for producing the optical m MITSUI CHEMICALS INC 2010-01-13 CN disclosed
EP-2116558-A1 POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE CATALYST, OPTICAL MATERIAL OBTAINED FROM THE COMPOSITION, AND METHOD FOR PRODUCING THE OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2009-11-11 EP disclosed
US-20090221743-A1 BIOLOGICAL SUBSTANCE RELATED ARTICLE AND METHOD OF MANUFACTURING THE SAME, AND BIOLOGICAL SUBSTANCE ADSORPTION PREVENTIVE COATING COMPOSITION AND METHOD OF USING THE SAME JSR CORPORATION (JP) 2009-09-03 US disclosed
CN-101511895-A Polymerization catalyst for polythiourethane optical material, polymerizable composition containing the catalyst, polythiourethane resin obtained from the composition, and process for producing the polythiourethane resin MITSUI CHEMICALS INC (JP) 2009-08-19 CN disclosed
US-7576903-B2 Microcapsule, method of manufacturing microcapsule, electrophoretic device, and electric apparatus SEIKO EPSON CORPORATION (JP) 2009-08-18 US disclosed
CN-100522339-C Encapsulated product, method for producing same, and ink composition SEIKO EPSON CORP (JP) 2009-08-05 CN disclosed
US-7569622-B2 Biological substance related article and method of manufacturing the same, and biological substance adsorption preventive coating composition and method of using the same JSR CORPORATION (JP) 2009-08-04 US disclosed
WO-2009093848-A1 RETARDATION FILM, FABRICATION METHOD THEREOF, AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME LG CHEM, LTD. (KR) 2009-07-30 WO disclosed
WO-2009082131-A2 MULTI-LAYERED ACRYLIC RETARDATION FILM AND FABRICATION METHOD THEREOF LG CHEM, LTD. (KR) 2009-07-02 WO disclosed
EP-2065414-A1 POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE CATALYST, POLYTHIOURETHANE RESIN OBTAINED FROM THE COMPOSITION, AND METHOD FOR PRODUCING THE RESIN Mitsui Chemicals, Inc. (JP) 2009-06-03 EP disclosed
US-7522333-B2 Method of producing an electrophoretic particle, electrophoretic device, and electric apparatus SEIKO EPSON CORPORATION (JP) 2009-04-21 US disclosed
CN-101396909-A Coater and ink-jet recording device using the same FUJIFILM CORP (JP) 2009-04-01 CN disclosed
CN-101400722-A Polymerizable composition, resin using the same and optical component MITSUI CHEMICALS INC (JP) 2009-04-01 CN disclosed
CN-101384636-A Polymerizable composition for polythiourethane optical material MITSUI CHEMICALS INC (JP) 2009-03-11 CN disclosed
US-20090062462-A1 Encapsulation product, process for producing the same, and ink composition SEIKO EPSON CORPORATION (JP) 2009-03-05 US disclosed
CN-101370841-A Internal mold release agent for producing polythiourethane optical material MITSUI CHEMICALS INC (JP) 2009-02-18 CN disclosed
EP-2014700-A1 POLYMERIZABLE COMPOSITION, RESIN USING THE SAME AND OPTICAL COMPONENT Mitsui Chemicals, Inc. (JP) 2009-01-14 EP disclosed
CN-100432817-C Method for producing electrophoretic particles, electrophoretic dispersion solution, micro-capsule, electrophoresis display device and electronic machine SEIKO EPSON CORP (JP) 2008-11-12 CN disclosed
EP-1988110-A1 INTERNAL MOLD RELEASE AGENT FOR PRODUCTION OF POLYTHIOURETHANE OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2008-11-05 EP disclosed
EP-1988109-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2008-11-05 EP disclosed
US-20080221235-A1 alkoxyalkyl methacrylate and/ or alkoxyalkyl acrylate-co-hydroxyalkyl methacrylate and/or hydroxyalkyl acrylate, optionally crosslinked by di or trifunctional crosslinker such as ethyene glycol, dimethacrylate, trimethylolpropane/1,1,1-/, trimethacrylate; improved folding and unfolding properties BENZ RESEARCH AND DEVELOPMENT CORPORATION 2008-09-11 US disclosed
US-7423076-B2 Microencapsulated pigment, preparation process therefor, aqueous dispersion and ink jet recording ink SEIKO EPSON CORPORATION (JP) 2008-09-09 US disclosed
US-20080182917-A1 Production method of encapsulated material, and encapsulated material SEIKO EPSON CORPORATION 2008-07-31 US disclosed
US-20080146713-A1 comprising colorant of a pigment and/or dye enveloped in a polymer, water, acetylene glycol or acetylene alcohol surfactants, and acyclic alcohols-2, having excellent dispersion and ejection stability, and capable of providing images having colorfastness and wear resistance SEIKO EPSON CORPORATION 2008-06-19 US disclosed
US-7387642-B2 Polymers for intraocular lenses BENZ RESEARCH AND DEVELOPMENT CORPORATION (US) 2008-06-17 US disclosed
US-7354989-B2 Thioepoxy based polymerizable composition and method for production thereof MITSUI CHEMICALS, INC. (JP) 2008-04-08 US disclosed
US-20080039550-A1 Process for producing encapsulated product, and encapsulated product SEIKO EPSON CORPORATION 2008-02-14 US disclosed
EP-1325058-B1 EPISULFIDE BASED POLYMERIZABLE COMPOSITION CATALYZED BY AN (ALKOXYPHENYL)PHOSPHINE ESSILOR INT (FR) 2008-02-13 EP disclosed
US-7307109-B2 Pigment and/or dye enveloped in a polymer, water, and at least one of acetylene alcohol/glycol surfactants, glycol ethers, or 1,2-alkylene glycols; dispersion stability, ejection stability, colorfastness, storage stability SEIKO EPSON CORPORATION (JP) 2007-12-11 US disclosed
EP-1860161-A1 Ink set for ink jet-jet recording, method for ink-jet recording and recorded matter Seiko Epson Corporation (JP) 2007-11-28 EP disclosed
CN-101076395-A Encapsulation product, process for producing the same, and ink composition SEIKO EPSON CORP (JP) 2007-11-21 CN disclosed
US-7253216-B2 Microencapsulating an anionically surface modified pigment by catalytic emulsion polymerization of a cationic polymerizable monomer; improved dispersion and ejection stability, colorfastness, print density, wear resistance, and image sharpness SEIKO EPSON CORPORATION (JP) 2007-08-07 US disclosed
EP-1808225-A1 ENCAPSULATION PRODUCT, PROCESS FOR PRODUCING THE SAME, AND INK COMPOSITION SEIKO EPSON CORPORATION (JP) 2007-07-18 EP disclosed
US-20070157848-A1 Microencapsulated pigment, preparation process therefor, aqueous dispersion and ink jet recording ink SEIKO EPSON CORPORATION 2007-07-12 US disclosed
EP-1321495-B1 INK SET FOR INK JET-JET RECORDING, METHOD FOR INK-JET RECORDING AND RECORDED MATTER SEIKO EPSON CORP (JP) 2007-07-11 EP disclosed
EP-1291397-B1 INK SET FOR INK-JET RECORDING SEIKO EPSON CORP (JP) 2006-12-27 EP disclosed
EP-1734595-A2 Dye-sensitized multilayer solar cell SEIKO EPSON CORPORATION (JP) 2006-12-20 EP disclosed
US-20060278267-A1 MULTILAYER STRUCTURE, PHOTOELECTRIC ELEMENT AND ELECTRONIC APPARATUS SEIKO EPSON CORPORATION (JP) 2006-12-14 US disclosed
US-20060276606-A1 Polymers for intraocular lenses BENZ RESEARCH AND DEVELOPMENT CORPORATION 2006-12-07 US disclosed
CN-1286883-C Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS INC (JP) 2006-11-29 CN disclosed
US-20060256423-A1 METHOD FOR MANUFACTURING MICROCAPSULES, AND MICROCAPSULE, ELECTROPHORETIC DEVICE AND ELECTRIC APPARATUS SEIKO EPSON CORPORATION (JP) 2006-11-16 US disclosed
EP-1721952-A2 Microencapsulated particulate metal material, method for producing the same, and aqueous dispersion and ink jet ink using the same Seiko Epson Corporation (JP) 2006-11-15 EP disclosed
US-7132501-B2 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2006-11-07 US disclosed
US-20060245037-A1 METHOD OF PRODUCING AN ELECTROPHORETIC PARTICLE, ELECTROPHORETIC DEVICE, AND ELECTRIC APPARATUS SEIKO EPSON CORPORATION (JP) 2006-11-02 US disclosed
CN-1854210-A Microencapsulated particulate metal material, method for producing the same, and aqueous dispersion and ink jet ink using the same SEIKO EPSON CORP (JP) 2006-11-01 CN disclosed
CN-1854873-A Method for producing electrophoretic particles, electrophoretic dispersion solution, micro-capsule, electrophoresis display device and electronic machine SEIKO EPSON CORP (JP) 2006-11-01 CN disclosed
WO-2006113290-A1 POLYMERS FOR INTRAOCULAR LENSES BENZ RESEARCH & DEVELOPMENT CORPORATION (US) 2006-10-26 WO disclosed
US-20060240259-A1 Microencapsulated particulate metal material, method for producing the same, and aqueous dispersion and ink jet ink using the same SEIKO EPSON CORPORATION 2006-10-26 US disclosed
US-20060234053-A1 MICROCAPSULE, METHOD OF MANUFACTURING MICROCAPSULE, ELECTROPHORETIC DEVICE, AND ELECTRIC APPARATUS SEIKO EPSON CORPORATION (JP) 2006-10-19 US disclosed
CN-1272391-C Ink set for inkjet recording, inkjet recording method, and recording material SEIKO EPSON CORP (JP) 2006-08-30 CN disclosed
EP-1395428-A4 CHEMICAL IMAGING OF A LITHOGRAPHIC PRINTING PLATE PISCES PRINT IMAGING SCIENCES (US) 2006-07-19 EP disclosed
CN-1264816-C Mercaptan and sulfenyl-(methyl) acrylate compound and their application MITSUI CHEMICALS INC (JP) 2006-07-19 CN disclosed
US-20060155008-A1 Stability and ejection stability and capable of forming images with fastness, abrasion resistance, color developability, and high density with little feathering SEIKO EPSON CORPORATION 2006-07-13 US disclosed
US-20060155006-A1 Microencapsulated pigment, production process therefor, aqueous dispersion, and ink jet recording ink SEIKO EPSON CORPORATION 2006-07-13 US disclosed
US-7074843-B2 Stability and ejection stability and capable of forming images with fastness, abrasion resistance, color developability, and high density with little feathering SEIKO EPSON CORPORATION (JP) 2006-07-11 US disclosed
US-20060105099-A1 Biological substance related article and method of manufacturing the same, and biological substance adsorption preventive coating composition and method of using the same JSR CORPORATION (JP) 2006-05-18 US disclosed
EP-1125760-B1 RECORDING METHOD COMPRISING PRINTING RECORDING MEDIUM WITH TWO LIQUID COMPONENTS SEIKO EPSON CORP (JP) 2006-05-17 EP disclosed
EP-1655354-A2 A biological substance absorption preventing coating composition, an article coated therewith and a method of using the same JSR Corporation (JP) 2006-05-10 EP disclosed
US-7040747-B2 Recording method for printing using two liquids on recording medium SEIKO EPSON CORPORATION (JP) 2006-05-09 US disclosed
US-7030174-B2 Provides high weather resistance, images having a high printed density by using pigment inks, and have a wide color reproducing range; capable of performing text printing at a high printing density and with excellent abrasion resistance SEIKO EPSON CORPORATION (JP) 2006-04-18 US disclosed
EP-1077238-B1 Ink composition for ink jet recording SEIKO EPSON CORP (JP) 2005-11-02 EP disclosed
US-20050215757-A1 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2005-09-29 US disclosed
EP-1094474-B1 Low temperature-curable connecting material for anisotropically electroconductive connection SONY CHEMICALS CORP (JP) 2005-08-17 EP disclosed
US-20050176877-A1 organic or inorganic pigment particles coated with anionic polymers; inks having dispersion and ejection stability, capable of obtaining images having excellent print density, colorfastness and wear resistance SEIKO EPSON CORPORATION 2005-08-11 US disclosed
US-20050124783-A1 Thioepoxy based polymerizable composition and method for production thereof MITSUI CHEMICALS, INC. (JP) 2005-06-09 US disclosed
EP-0942027-B1 A polymerizable composition MITSUI CHEMICALS INC (JP) 2005-05-18 EP disclosed
EP-1088865-B1 Ink composition and ink jet recording method using the same SEIKO EPSON CORP (JP) 2005-05-11 EP disclosed
US-6869470-B2 Ink set for ink jet recording and ink jet recording process SEIKO EPSON CORPORATION (JP) 2005-03-22 US disclosed
CN-1596276-A Polymerizable composition comprising novel sulfur-containing cyclic compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS INC (JP) 2005-03-16 CN disclosed
US-6866707-B2 Ink set for ink jet recording and ink jet recording process SEIKO EPSON CORPORATION (JP) 2005-03-15 US disclosed
US-6864302-B2 Ink jet recording method and ink set therefor SEIKO EPSON CORPORATION (JP) 2005-03-08 US disclosed
CN-1578802-A Thioepoxy based polymerizable composition and method for production thereof MITSUI CHEMICALS INC (JP) 2005-02-09 CN disclosed
CN-1186320-C Mercaptan and sulfenyl-(methyl) acrylate compound and their application MITSUI CHEMICALS INC (JP) 2005-01-26 CN disclosed
EP-1484352-A1 THIOEPOXY BASED POLYMERIZABLE COMPOSITION AND METHOD FOR PRODUCTION THEREOF MITSUI CHEMICALS, INC. (JP) 2004-12-08 EP disclosed
EP-1482002-A1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS, INC. (JP) 2004-12-01 EP disclosed
US-20040229974-A1 Microencapsulating an anionically surface modified pigment by catalytic emulsion polymerization of a cationic polymerizable monomer; improved dispersion and ejection stability, colorfastness, print density, wear resistance, and image sharpness SEIKO EPSON CORPORATION 2004-11-18 US disclosed
EP-1058133-B1 Polymerizable composition and process for producing optical resin comprising the same MITSUI CHEMICALS INC (JP) 2004-09-22 EP disclosed
US-20040154489-A1 Chemical imaging of a lithographic printing plate MAXRYAN ENTERPRISES, INC. 2004-08-12 US disclosed
US-6767090-B2 Ink set for ink-jet recording SEIKO EPSON CORPORATION (JP) 2004-07-27 US disclosed
CN-1509233-A Chemical imaging of lithographic printing plate Ƥ��˹ӡˢͼ���ѧ��˾ 2004-06-30 CN disclosed
EP-1395428-A1 CHEMICAL IMAGING OF A LITHOGRAPHIC PRINTING PLATE Pisces-print Imaging Sciences, Inc. (US) 2004-03-10 EP disclosed
US-6691618-B2 Chemical imaging of a lithographic printing plate PISCES-PRINT IMAGING SCIENCES, INC. 2004-02-17 US disclosed
US-20040020406-A1 Ink set for ink jet recording and ink jet recording process SEIKO EPSON CORPORATION 2004-02-05 US disclosed
US-20040020407-A1 Ink set for ink jet recording and ink jet recording process SEIKO EPSON CORPORATION 2004-02-05 US disclosed
US-20030195274-A1 Stability and ejection stability and capable of forming images with fastness, abrasion resistance, color developability, and high density with little feathering SEIKO EPSON CORPORATION 2003-10-16 US disclosed
US-6602333-B2 To provide image of high quality, and recorded matter of high image quality SEIKO EPSON CORPORATION (JP) 2003-08-05 US disclosed
EP-1325058-A2 EPISULFIDE BASED POLYMERIZABLE COMPOSITION CATALYZED BY AN (ALKOXYPHENYL)PHOSPHINE ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2003-07-09 EP disclosed
EP-1321495-A1 INK SET FOR INK JET-JET RECORDING, METHOD FOR INK-JET RECORDING AND RECORDED MATTER SEIKO EPSON CORPORATION (JP) 2003-06-25 EP disclosed
US-20030106462-A1 Pigment and/or dye enveloped in a polymer, water, and at least one of acetylene alcohol/glycol surfactants, glycol ethers, or 1,2-alkylene glycols; dispersion stability, ejection stability, colorfastness, storage stability SEIKO EPSON CORPORATION (JP) 2003-06-12 US disclosed
US-20030097961-A1 Ink set for ink-jet recording SEIKO EPSON CORPORATION (JP) 2003-05-29 US disclosed
US-20030078320-A1 Ink set for ink jet-jet recording , method for ink-jet recording and recorded matter SEIKO EPSON CORPORATION (JP) 2003-04-24 US disclosed
US-20030069329-A1 Recording method for printing using two liquids on recording medium SEIKO EPSON CORPORATION 2003-04-10 US disclosed
EP-1295916-A1 INK-JET RECORDING INK, INK-JET RECORDING INK SET, RECORDING METHOD, PRINT, AND INK-JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2003-03-26 EP disclosed
US-6538047-B1 Encapsulated in polymerized surfactant and ligand; dispersion and ejection stability SEIKO EPSON CORPORATION (JP) 2003-03-25 US disclosed
EP-1291397-A1 INK SET FOR INK-JET RECORDING SEIKO EPSON CORPORATION (JP) 2003-03-12 EP disclosed
US-6527984-B1 Low temperature-curable anisotropically electroconductive connecting material for connecting and bonding electronic radical polymerization and cross-linking with itself; SONY CHEMICALS CORPORATION (JP) 2003-03-04 US disclosed
US-20030029355-A1 Ink set for ink-jet recording, process for producing same, method of image recording, and print SEIKO EPSON CORPORATION (JP) 2003-02-13 US disclosed
CN-1396945-A Ink set for inkjet recording, inkjet recording method, and recording material SEIKO EPSON CORP (JP) 2003-02-12 CN disclosed
WO-2002081212-A1 CHEMICAL IMAGING OF A LITHOGRAPHIC PRINTING PLATE PISCES-PRINT IMAGING SCIENCES, INC. (US) 2002-10-17 WO disclosed
US-6458917-B2 CURABLE; POLYSULFIDES MITSUI CHEMICALS, INC. (JP) 2002-10-01 US disclosed
US-20020104455-A1 Chemical imaging of a lithographic printing plate MAXRYAN ENTERPRISES, INC. 2002-08-08 US disclosed
US-6417322-B1 HIGH SPEED CATALYSIS; POLYTHIOETHERS; OPHTHALMIC LENSES; TRANSPARENT ESSILOR INTERNATIONAL COMPAGNIE GENERAL D'OPTIQUE (FR) 2002-07-09 US disclosed
US-20020077385-A1 Ink jet recording method and ink set therefor SEIKO EPSON CORPORATION 2002-06-20 US disclosed
US-6369269-B2 Thiol and sulfur-containing O-(meth)acrylate compounds and use thereof MITSUI CHEMICALS, INC. (JP) 2002-04-09 US disclosed
US-6365707-B1 CATALYTIC POLYEPOXIDES OR POLYTHIOEPOXIDES AND AMINO COMPOUNDS MITSUI CHEMICALS, INC. (JP) 2002-04-02 US disclosed
WO-2002024786-A2 EPISULFIDE BASED POLYMERIZABLE COMPOSITION CATALYZED BY AN (ALKOXYPHENYL)PHOSPHINE ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2002-03-28 WO disclosed
US-20020019511-A1 Polymerizable composition MORIJIRI HIROYUKI (JP) 2002-02-14 US disclosed
EP-0716102-B1 TRANSPARENT PLASTIC MATERIAL, OPTICAL ARTICLE MADE THEREFROM, AND PRODUCTION PROCESS SEIKO EPSON CORP (JP) 2002-02-06 EP disclosed
US-20010044555-A1 Thiol and sulfur-containing O-(meth)acrylate counpounds and use thereof KOBAYASHI SEIICHI (JP) 2001-11-22 US disclosed
EP-1153991-A1 INK SET FOR INK-JET RECORDING, PROCESS FOR PRODUCING THE SAME, METHOD OF IMAGE RECORDING, AND PRINT SEIKO EPSON CORPORATION (JP) 2001-11-14 EP disclosed
US-6300464-B2 HIGH HEAT RESISTANCE AND REFRACTIVE INDEX, LOW SPECIFIC GRAVITY; POLYMERS CONTAINING THIO(EPOXY) AND AT LEAST ONE DISULFIDE BOND MITSUI CHEMICAL, INC. (JP) 2001-10-09 US disclosed
US-6281271-B1 BLEND OF POLYMER AND FILLER IVOCLAR AG (LI) 2001-08-28 US disclosed
EP-1125760-A1 RECORDING METHOD COMPRISING PRINTING RECORDING MEDIUM WITH TWO LIQUID COMPONENTS SEIKO EPSON CORPORATION (JP) 2001-08-22 EP disclosed
CN-1308060-A Mercaptan and sulfenyl-(methyl) acrylate compound and their application MITSUI CHEMICALS INC (JP) 2001-08-15 CN disclosed
CN-1308061-A Mercaptan and sulfenyl-(methyl) acrylate compound and their application MITSUI CHEMICALS INC (JP) 2001-08-15 CN disclosed
US-6265510-B1 OPTICS; LENSES MITSUI CHEMICALS, INC. (JP) 2001-07-24 US disclosed
US-20010002413-A1 Polymerizable composition MORIJIRI HIROYUKI (JP) 2001-05-31 US disclosed
CN-1065528-C Thiol and sulfur-containing O- (meth) acrylate compound and use thereof MITSUI TOATSU CHEMICALS (JP) 2001-05-09 CN disclosed
EP-1094474-A2 Low temperature-curable connecting material for anisotropically electroconductive connection SONY CHEMICALS CORPORATION (JP) 2001-04-25 EP disclosed
EP-1088865-A1 Ink composition and ink jet recording method using the same SEIKO EPSON CORPORATION (JP) 2001-04-04 EP disclosed
US-6204311-B1 (THIO)EPOXY COMPOUND HAVING AT LEAST ONE INTRAMOLECULAR DISULFIDE BOND AND A CURING CATALYST. MITSUI CHEMICALS, INC. (JP) 2001-03-20 US disclosed
EP-1077238-A1 Ink composition for ink jet recording SEIKO EPSON CORPORATION (JP) 2001-02-21 EP disclosed
EP-0810210-B1 Thiol and sulfur-containing o-(meth)acrylate compounds and use thereof MITSUI CHEMICALS INC (JP) 2001-01-10 EP disclosed
EP-1058133-A2 Polymerizable composition and process for producing optical resin comprising the same Mitsui Chemicals, Inc. (JP) 2000-12-06 EP disclosed
US-6114485-A STARTING MATERIAL FOR A RESIN COMPOSITION USED IN OPTICAL APPLICATIONS SUCH AS A LENS MITSUI CHEMICALS, INC. (JP) 2000-09-05 US disclosed
EP-0942027-A2 A polymerizable composition Mitsui Chemicals, Inc. (JP) 1999-09-15 EP disclosed
US-5916987-A OPTICAL RESIN; LENSES MITSUI CHEMICALS, INC. (JP) 1999-06-29 US disclosed
US-5792822-A COMPRISING A METAL COMPLEXES AS ULTRAVIOLET LIGHT ADSORBER AND BLOCKING AGENT; RADIATION RESISTANCE, LIGHTWEIGHT, STABILITY; EYEGLASS LENS, CONTACT LENS, DISPLAY FILTER SEIKO EPSON CORPORATION (JP) 1998-08-11 US disclosed
CN-1173490-A Thiol and sulfur-containing 0- (meth) acrylate compound and use thereof MITSUI TOATSU CHEMICALS (JP) 1998-02-18 CN disclosed
EP-0810210-A2 Thiol and sulfur-containing o-(meth)acrylate compounds and use thereof MITSUI TOATSU CHEMICALS, INC. (JP) 1997-12-03 EP disclosed
US-5576406-A ACRYLATE POLYMERS FOR PAINTS, ADHESIVES OR SEALS DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-11-19 US disclosed
EP-0716102-A1 TRANSPARENT PLASTIC MATERIAL, OPTICAL ARTICLE MADE THEREFROM, AND PRODUCTION PROCESS SEIKO EPSON CORPORATION (JP) 1996-06-12 EP disclosed
US-4108666-A USED AS ETCHING RESIST AND METAL PLATING RESIST HITACHI CHEMICAL CO., LTD. (JP) 1978-08-22 US disclosed
US-4108666-A USED AS ETCHING RESIST AND METAL PLATING RESIST HITACHI CHEMICAL CO., LTD. (JP) 1978-08-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (17 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260110823-A1 OPTICAL ELEMENT, OPTICAL APPARATUS, IMAGING APPARATUS, AND COMPOUND RAD51, PIEZO1, ZYX TSHR 3260/4885THRB 3328/4885ALDH1A1 1504/4885
US-20240019779-A1 COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME CRY1, CCNT1, CCNA1 TSHR 3135/4885THRB 3729/4885ALDH1A1 382/4885
US-20260079398-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS ARCN1, SMC4, CCT4 TSHR 2944/4885THRB 3109/4885ALDH1A1 1499/4885
US-20230314934-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS CRY1, CBR3, C1S TSHR 1483/4885THRB 2490/4885ALDH1A1 810/4885
US-20120203012-A1 HETEROAROMATIC-CONTAINING COMPOUND, OPTICAL MATERIAL AND OPTICAL ELEMENT AR, AHR, ARNT TSHR 3386/4885THRB 2636/4885ALDH1A1 304/4885
US-20210247546-A1 (METH)ACRYLATE COMPOUND MTX1, METTL3, MET TSHR 1040/4885THRB 922/4885ALDH1A1 183/4885
US-20100029890-A1 POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE SAME, POLYTHIOURETHANE RESIN OBTAINED FROM THE COMPOSITION, AND PROCESS FOR PRODUCING THE RESIN OXGR1, HRH3, HRH4 TSHR 1625/4885THRB 872/4885ALDH1A1 1488/4885
US-12066593-B2 (Meth)acrylate compound MTX1, METTL3, MET TSHR 1040/4885THRB 922/4885ALDH1A1 183/4885
US-20010044555-A1 Thiol and sulfur-containing O-(meth)acrylate counpounds and use thereof MSRB3, BHMT2, HBS1L TSHR 1745/4885THRB 2106/4885ALDH1A1 1031/4885
US-20120330052-A1 CONJUGATED AROMATIC COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT AHR, AXIN2, NR2E3 TSHR 4020/4885THRB 4568/4885ALDH1A1 605/4885
US-20110065884-A1 POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYMERIZABLE COMPOSITION CONTAINING THE SAME, POLYTHIOURETHANE RESIN OBTAINED FROM THE COMPOSITION, AND PROCESS FOR PRODUCING THE RESIN OXGR1, HRH3, HRH4 TSHR 1625/4885THRB 872/4885ALDH1A1 1488/4885
US-20150175731-A1 (METH)ACRYLATE COMPOUND, OPTICAL COMPOSITION, MOLDED ARTICLE, AND OPTICAL ELEMENT SMYD2, ZYX, MMAB TSHR 3946/4885THRB 2988/4885ALDH1A1 921/4885
US-20260008914-A1 CURABLE COMPOSITION, MOLDED BODY, SILICONE HYDROGEL, AND METHOD FOR PRODUCING SILICONE HYDROGEL SMCHD1, CRYAA, SMC2 TSHR 435/4885THRB 698/4885ALDH1A1 1283/4885
US-12529822-B2 Optical element, optical apparatus, imaging apparatus, and compound RAD51, SEM1, PSMA3 TSHR 3808/4885THRB 3666/4885ALDH1A1 1261/4885
US-20240027904-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS C1S, C1R, CRY2 TSHR 839/4885THRB 2348/4885ALDH1A1 3079/4885
US-20110257146-A1 Method of Treating Kcnq Related Disorders Using Organozinc Compounds KCNQ3, KCNQ1, KCNQ5 TSHR 2961/4885THRB 2759/4885ALDH1A1 2097/4885
US-20110288330-A1 OPTICAL ELEMENT COMPOUND, OPTICAL MATERIAL, AND OPTICAL ELEMENT CENPE, AXIN2, CCNE2 TSHR 4463/4885THRB 4553/4885ALDH1A1 1823/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.