Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL867904 | 0.96 | NOS3 (0.42) | — | |
| Hydrochloric Acid SCHEMBL21409696 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL183696 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL167943 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL9847617 | 0.96 | NOS3 (0.42) | — | |
| Hydrochloric Acid SCHEMBL23633179 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL16986249 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL27969636 | 0.92 | NOS3 (0.40) | — | |
| SCHEMBL669306 | 0.92 | — | — | |
| Water SCHEMBL20837969 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100463931-C | Textile finishing agent modified from Nano material and preparation method | CHANGCHUN SAINA NANO TRAPPINGS (CN) | 2009-02-25 | — | — | CN | claimed |
| CN-1539860-A | Textile finishing agent modified from Nano material and preparation method | 长春赛纳纳米服饰有限公司 | 2004-10-27 | — | — | CN | claimed |
| CN-113597439-A | Novel polystyrene-based amphoteric polyelectrolytes having a maximum critical eutectic temperature and uses thereof | 东曹精细化工株式会社 | 2021-11-02 | — | — | CN | disclosed |
| CN-102822731-B | Cationic curing type liquid crystal sealing agent and liquid crystal display cells | DIC CORP. (JP) | 2016-04-20 | — | — | CN | disclosed |
| CN-102822731-A | Cationic curing liquid crystal sealant and liquid crystal display element | DAINIPPON INK & CHEMICALS | 2012-12-12 | — | — | CN | disclosed |
| CN-101617267-B | Curable resin composition for sealing liquid crystal and method for producing liquid crystal display panel using same | MITSU CHEMICALS INC | 2012-08-15 | — | — | CN | disclosed |
| CN-101535350-B | Irritation mitigating polymers and uses therefor | LUBRIZOL ADVANCED MAT INC | 2012-04-04 | — | — | CN | disclosed |
| CN-101617267-A | Curable resin composition for sealing liquid crystal and method for producing liquid crystal display panel using same | MITSUI CHEMICALS INC | 2009-12-30 | — | — | CN | disclosed |
| CN-101535350-A | Irritation mitigating polymers and uses therefor | LUBRIZOL ADVANCED MAT INC (US) | 2009-09-16 | — | — | CN | disclosed |
| CN-1268662-C | Graft polymer with sidechains comprising nitrogen heterocycles | BASF AG (DE) | 2006-08-09 | — | — | CN | disclosed |
| CN-1585787-A | Graft polymer with sidechains comprising nitrogen heterocycles | BASF AG (DE) | 2005-02-23 | — | — | CN | disclosed |
| CN-1172940-C | Metal organic compound and polymer therefrom | 北美埃尔夫爱托化学股份有限公司 | 2004-10-27 | — | — | CN | disclosed |
| CN-1539860-A | Textile finishing agent modified from Nano material and preparation method | 长春赛纳纳米服饰有限公司 | 2004-10-27 | — | — | CN | disclosed |
| CN-1063752-C | Acrylate based cuprous phosphite salt compound | ATOCHEM NORTH AMERICA ELF (US) | 2001-03-28 | — | — | CN | disclosed |