Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TOP1 known ✓ | P11387 | 3/20 | 0.55 |
| ▸ | MAOA known ✓ | P21397 | 3/20 | 0.43 |
| ▸ | MAOB known ✓ | P27338 | 2/20 | 0.43 |
| ▸ | TTR known ✓ | P02766 | 1/20 | 0.39 |
| ▸ | BCHE known ✓ | P06276 | 1/20 | 0.35 |
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.55 |
| ▸ | MAPT | P10636 | 5/20 | 0.55 |
| ▸ | HPGD | P15428 | 4/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.55 |
| ▸ | RECQL | P46063 | 4/20 | 0.55 |
| ▸ | CDC25B | P30305 | 3/20 | 0.55 |
| ▸ | IDO1 | P14902 | 3/20 | 0.55 |
| ▸ | AURKA | O14965 | 3/20 | 0.55 |
| ▸ | AURKB | Q96GD4 | 3/20 | 0.55 |
| ▸ | MEN1 | O00255 | 3/20 | 0.55 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.55 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2858946 | 0.98 | ALDH1A1 (0.57) | ALDH1A1MAPTHPGDKMT2AKDM4E | |
| Nitrogen SCHEMBL27717856 | 0.94 | ALDH1A1 (0.53) | ALDH1A1MAPTHPGDKMT2AKDM4E | |
| Hydrochloric Acid SCHEMBL27872708 | 0.93 | ALDH1A1 (0.49) | ALDH1A1MAPTHPGDKMT2AKDM4E | |
| SCHEMBL27661265 | 0.91 | ALDH1A1 (0.50) | ALDH1A1MAPTHPGDKMT2AKDM4E | |
| SCHEMBL28804762 | 0.91 | ALDH1A1 (0.50) | ALDH1A1MAPTHPGDKMT2AKDM4E | |
| SCHEMBL1270794 | 0.79 | STAT3 (0.58) | ALDH1A1MAPTHPGDKMT2AKDM4E | |
| SCHEMBL24631333 | 0.79 | TTR (0.47) | ALDH1A1MAPTHPGDKMT2AAURKA | |
| SCHEMBL2855998 | 0.79 | AURKA (0.44) | ALDH1A1MAPTHPGDKMT2AKDM4E | |
| SCHEMBL24631331 | 0.79 | TTR (0.47) | ALDH1A1MAPTHPGDAURKAAURKB | |
| SCHEMBL2747236 | 0.78 | ALDH1A1 (0.52) | ALDH1A1MAPTHPGDKMT2AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110462513-A | Photosensitive polymer combination, cured film, the element for having cured film, the organic EL display device for having cured film, the manufacturing method of the manufacturing method of cured film and organic EL display device | TORAY INDUSTRIES | 2019-11-15 | — | — | CN | disclosed |
| CN-107001629-B | Resin and photosensitive polymer combination | 东丽株式会社 | 2019-09-24 | — | — | CN | disclosed |
| CN-108027562-B | Minus photosensitive composition, cured film, element and display device | 东丽株式会社 | 2019-07-05 | — | — | CN | disclosed |
| CN-109642089-A | Black pigment and its manufacturing method, dispersible pigment dispersion, photosensitive composite and its solidfied material | 东丽株式会社 | 2019-04-16 | — | — | CN | disclosed |
| CN-107428935-B | Diamine compound, heat-resistant resin or heat-resistant resin precursor using it | 东丽株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-104662475-B | The manufacturing method of positive type photosensitive organic compound, semiconductor devices containing the cured film for having used it | 东丽株式会社 | 2019-03-29 | — | — | CN | disclosed |
| CN-109153841-A | Resin combination | 东丽株式会社 | 2019-01-04 | — | — | CN | disclosed |
| CN-109071742-A | Resin combination, its cured film and its manufacturing method and solid photographic device | 东丽株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-107409457-B | Organic EL display device and its manufacturing method | 东丽株式会社 | 2018-11-13 | — | — | CN | disclosed |
| CN-108779331-A | Resin combination, its cure embossed pattern and using its semiconductor electronic part or semiconductor devices manufacturing method | 东丽株式会社 | 2018-11-09 | — | — | CN | disclosed |
| WO-2007007818-A1 | METHOD FOR MANUFACTURING INTERNAL CELL STRUCTURE, INTERNAL CELL STRUCTURE, AND DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2007-01-18 | — | — | WO | disclosed |
| CN-1877449-A | Negative light-sensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2006-12-13 | — | — | CN | disclosed |
| CN-1238203-C | Lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2006-01-25 | — | — | CN | disclosed |
| CN-1218840-C | Support device for lithographic printing plate, its making method and lithographic printing original plate | FUJI PHOTO FILM CO LTD (JP) | 2005-09-14 | — | — | CN | disclosed |
| CN-1583418-A | Supporting body for lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2005-02-23 | — | — | CN | disclosed |
| CN-1186207-C | Support for lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2005-01-26 | — | — | CN | disclosed |
| CN-1367086-A | Support device for lithographic printing plate, its making method and lithographic printing original plate | FUJI PHOTO FILM CO LTD (JP) | 2002-09-04 | — | — | CN | disclosed |
| CN-1341517-A | Lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2002-03-27 | — | — | CN | disclosed |
| CN-1320524-A | Support for lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2001-11-07 | — | — | CN | disclosed |
| US-5040090-A | Capacitive moisture-sensor | SIEMENS AKTIENGESELLSCHAFT (DE) | 1991-08-13 | — | — | US | disclosed |