Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | STAT3 | P40763 | 1/20 | 0.46 |
| ▸ | BACE1 | P56817 | 3/20 | 0.44 |
| ▸ | ABL1 | P00519 | 1/20 | 0.44 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.44 |
| ▸ | BCR | P11274 | 1/20 | 0.44 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.43 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.43 |
| ▸ | SYK | P43405 | 1/20 | 0.43 |
| ▸ | AURKB | Q96GD4 | 1/20 | 0.43 |
| ▸ | INCENP | Q9NQS7 | 1/20 | 0.43 |
| ▸ | SLC22A12 | Q96S37 | 1/20 | 0.42 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | TP53 | P04637 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL19066712 | 0.97 | STAT3 (0.46) | STAT3BACE1ABL1ABCB1BCR | |
| Iodide SCHEMBL8737221 | 0.85 | LMNA (0.43) | PTGS2SYKALDH1A1LMNAHTT | |
| Iodide SCHEMBL8733602 | 0.85 | PTGS2 (0.46) | STAT3PTGS2FFAR4 | |
| SCHEMBL367003 | 0.85 | DRD2 (0.42) | PTGS2TP53RAB9A | |
| Iodide SCHEMBL8735171 | 0.83 | SLC22A12 (0.49) | STAT3PTGS2SLC22A12PTPN1MAPT | |
| Iodide SCHEMBL8735177 | 0.82 | PTGS2 (0.44) | PTGS2MAPTTP53 | |
| Iodide SCHEMBL8735153 | 0.82 | PTGS2 (0.39) | PTGS2ALDH1A1HPGDFFAR4 | |
| Iodide SCHEMBL21220125 | 0.82 | PTGS2 (0.39) | PTGS2ALDH1A1FFAR4 | |
| Iodide SCHEMBL8005565 | 0.82 | ABL1 (0.49) | STAT3BACE1ABL1ABCB1BCR | |
| Hydrogen Sulfide SCHEMBL27520693 | 0.82 | PTGS2 (0.46) | STAT3PTGS2MAPTMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4968581-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-11-06 | — | — | US | claimed |
| US-4912018-A | High resolution photoresist based on imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| EP-3303057-B1 | METHOD OF BONDING HARDWARE TO GLASS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2026-05-27 | — | — | EP | disclosed |
| US-20260139161-A1 | Electrically Debondable UV Activated Adhesives | 3M INNOVATIVE PROPERTIES CO (US) | 2026-05-21 | — | — | US | disclosed |
| US-20260071098-A1 | ULTRAVIOLET-BLOCKING ADHESIVE COMPOSITION, METHOD FOR PREPARING ADHESIVE RESIN BY USING SAME, AND ADHESIVE FILM MANUFACTURED USING SAME | SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) | 2026-03-12 | — | — | US | disclosed |
| EP-4602109-B1 | ELECTRICALLY DEBONDABLE UV ACTIVATED ADHESIVES | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2026-03-04 | — | — | EP | disclosed |
| EP-4696755-A1 | ULTRAVIOLET-BLOCKING ADHESIVE COMPOSITION, METHOD FOR PREPARING ADHESIVE RESIN BY USING SAME, AND ADHESIVE FILM MANUFACTURED USING SAME | Seoul National University R&DB Foundation (KR) | 2026-02-18 | — | — | EP | disclosed |
| US-12545813-B2 | Electrically debondable UV activated adhesives | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2026-02-10 | — | — | US | disclosed |
| US-20260008941-A1 | ARTICLES COMPRISING CYCLIC OLEFIN, CATALYST, AND SECOND POLYMERIZABLE MATERIAL, METHODS AND COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2026-01-08 | — | — | US | disclosed |
| US-20260008943-A1 | ADHESIVE COMPOSITION COMPRISING POLAR (METH)ACRYLATE MONOMER AND EPOXY RESIN, ARTICLES AND METHODS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2026-01-08 | — | — | US | disclosed |
| US-20250376601-A1 | PHOTOCATALYST COMPOSITION, PHOTOCURABLE COMPOSITION COMPRISING SAME AND METHOD FOR PREPARING PHOTOCURED RESIN BY USING SAME | SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) | 2025-12-11 | — | — | US | disclosed |
| US-7771911-B2 | Process for producing photoresist composition, filter, coater and photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7326512-B2 | Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-02-05 | — | — | US | disclosed |
| US-7179399-B2 | Material for forming protective film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-20060014098-A1 | Process for producing photoresist composition, filter, coater and photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-01-19 | — | — | US | disclosed |
| EP-1574901-A1 | PROCESS FOR PRODUCING PHOTORESIST COMPOSITION, FILTER, COATER AND PHOTORESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-09-14 | — | — | EP | disclosed |
| US-20050130056-A1 | Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound | UBS AG, STAMFORD BRANCH | 2005-06-16 | — | — | US | disclosed |
| US-6693049-B2 | FILLING WITH AN OXYALKYLATED MELAMINE, BENZOGUANAMINE, ACETOGUANAMINE, GLYCOL URYL, UREA, THIOUREA, GUANIDINE, ALKYLENEUREA OR SUCCINYLAMIDE AND HEATING AT 150-250 C, WHEREBY NO BUBBLE IS GENERATED WHEN THE FINE HOLE IS FILLED. | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20030032280-A1 | Method for filling fine hole | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-13 | — | — | US | disclosed |
| US-20020182360-A1 | Material for forming protective film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-12-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260071098-A1 | ULTRAVIOLET-BLOCKING ADHESIVE COMPOSITION, METHOD FOR PREPARING ADHESIVE RESIN BY USING SAME, AND ADHESIVE FILM MANUFACTURED USING SAME | CDH1, ITGAM, ICAM1 | STAT3 4302/4885BACE1 2195/4885ABL1 3103/4885 |
| US-20260008941-A1 | ARTICLES COMPRISING CYCLIC OLEFIN, CATALYST, AND SECOND POLYMERIZABLE MATERIAL, METHODS AND COMPOSITIONS | MAT2A, MAT1A, ALOX12 | STAT3 4606/4885BACE1 1902/4885ABL1 2608/4885 |
| US-20260139161-A1 | Electrically Debondable UV Activated Adhesives | CDH1, ITGB6, ITGA6 | STAT3 3338/4885BACE1 2279/4885ABL1 2722/4885 |
| US-12545813-B2 | Electrically debondable UV activated adhesives | CDH1, ITGB6, ITGA6 | STAT3 3348/4885BACE1 2293/4885ABL1 2217/4885 |
| US-20260008943-A1 | ADHESIVE COMPOSITION COMPRISING POLAR (METH)ACRYLATE MONOMER AND EPOXY RESIN, ARTICLES AND METHODS | CAD, METTL3, MAT1A | STAT3 3537/4885BACE1 4805/4885ABL1 799/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.