Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 known ✓ | Q99720 | 4/20 | 0.71 |
| ▸ | MAOB known ✓ | P27338 | 4/20 | 0.58 |
| ▸ | MAOA known ✓ | P21397 | 1/20 | 0.58 |
| ▸ | ACHE known ✓ | P22303 | 5/20 | 0.57 |
| ▸ | KCNH2 known ✓ | Q12809 | 1/20 | 0.53 |
| ▸ | HTR7 known ✓ | P34969 | 1/20 | 0.52 |
| ▸ | CARM1 | Q86X55 | 1/20 | 0.56 |
| ▸ | PRMT6 | Q96LA8 | 1/20 | 0.56 |
| ▸ | PRMT8 | Q9NR22 | 1/20 | 0.56 |
| ▸ | KDM4A | O75164 | 2/20 | 0.55 |
| ▸ | KDM4C | Q9H3R0 | 2/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL4621618 | 1.00 | SIGMAR1 (0.71) | SIGMAR1MAOBMAOAACHECARM1 | |
| Hydrochloric Acid SCHEMBL631053 | 1.00 | SIGMAR1 (0.71) | SIGMAR1MAOBMAOAACHECARM1 | |
| Hydrochloric Acid SCHEMBL27860635 | 1.00 | SIGMAR1 (0.71) | SIGMAR1MAOBMAOAACHECARM1 | |
| Hydrochloric Acid SCHEMBL11136311 | 1.00 | SIGMAR1 (0.71) | SIGMAR1MAOBMAOAACHECARM1 | |
| Hydrochloric Acid SCHEMBL1160865 | 1.00 | SIGMAR1 (0.71) | SIGMAR1MAOBMAOAACHECARM1 | |
| Hydrochloric Acid SCHEMBL1011467 | 1.00 | SIGMAR1 (0.71) | SIGMAR1MAOBMAOAACHECARM1 | |
| Hydrochloric Acid SCHEMBL28758749 | 1.00 | SIGMAR1 (0.71) | SIGMAR1MAOBMAOAACHECARM1 | |
| Hydrochloric Acid SCHEMBL11138206 | 1.00 | SIGMAR1 (0.71) | SIGMAR1MAOBMAOAACHECARM1 | |
| Ethane SCHEMBL27832435 | 0.98 | SIGMAR1 (0.69) | SIGMAR1MAOBMAOAACHECARM1 | |
| Hydrochloric Acid SCHEMBL441762 | 0.98 | SIGMAR1 (0.69) | SIGMAR1MAOBMAOAACHECARM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1542013-B1 | CHEMILUMINESCENCE ENHANCER | FUJIREBIO KK (JP) | 2016-04-13 | — | — | EP | claimed |
| CN-103936021-A | Method for preparing organobentonite with low viscosity and high settling resistance | UNIV ZHEJIANG TECHNOLOGY | 2014-07-23 | — | — | CN | claimed |
| CN-111698982-B | Hair treatment composition | 株式会社资生堂 | 2024-09-27 | — | — | CN | disclosed |
| CN-111698982-A | Hair treatment composition | 株式会社资生堂 | 2020-09-22 | — | — | CN | disclosed |
| WO-2019155968-A1 | HAIR TREATMENT COMPOSITION | 株式会社資生堂 | 2019-08-15 | — | — | WO | disclosed |
| CN-103936021-A | Method for preparing organobentonite with low viscosity and high settling resistance | UNIV ZHEJIANG TECHNOLOGY | 2014-07-23 | — | — | CN | disclosed |
| CN-102218023-B | Hair conditioning compositions | UNILEVER NV | 2013-01-23 | — | — | CN | disclosed |
| EP-2096497-B1 | Toner production method and toner granulating apparatus | RICOH CO LTD (JP) | 2012-06-13 | — | — | EP | disclosed |
| US-8114565-B2 | Toner production method and toner granulating apparatus | RICOH COMPANY, LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| CN-102218023-A | Hair conditioning compositions | UNILEVER NV | 2011-10-19 | — | — | CN | disclosed |
| CN-101778617-A | Conditioning composition comprising dual cationic surfactant system, aminosilicone and silicone resin | PROCTER & GAMBLE | 2010-07-14 | — | — | CN | disclosed |
| EP-0362859-A2 | Process for producing microcapsule toner | CANON KABUSHIKI KAISHA (JP) | 1990-04-11 | — | — | EP | disclosed |
| US-4900647-A | Process for producing electrophotographic toner comprising micropulverization, classification and smoothing | CANON KABUSHIKI KAISHA (JP) | 1990-02-13 | — | — | US | disclosed |
| US-4845002-A | COMPOUND OR POLYMER HAVING PHENOLIC AND TERTIARY AMINE GROUPS | KAO CORPORATION (JP) | 1989-07-04 | — | — | US | disclosed |
| US-4839255-A | IMPACTING MODIFIER TO BASE PARTICLES | CANON KABUSHIKI KAISHA (JP) | 1989-06-13 | — | — | US | disclosed |
| EP-0285140-A2 | Process for producing toner for developing electrostatic images | CANON KABUSHIKI KAISHA (JP) | 1988-10-05 | — | — | EP | disclosed |
| EP-0274039-A1 | Toner for development of electrostatically charged image | Kao Corporation (JP) | 1988-07-13 | — | — | EP | disclosed |
| EP-0237255-A2 | Curable resin compositions and semiconductor devices coated and sealed with the same | HITACHI, LTD. (JP) | 1987-09-16 | — | — | EP | disclosed |
| US-4640882-A | Image forming method of negative latent images using silica particles | CANON KABUSHIKI KAISHA (JP) | 1987-02-03 | — | — | US | disclosed |
| US-4331447-A | ADDING AN OIL FRACTION AS A BINDER TO AN AQUEOUS SLURRY | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 1982-05-25 | — | — | US | disclosed |