Hydrochloric Acid

Hydrochloric Acid

SCHEMBL6571408

Cl.FC(F)=C(F)[Zn]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL7633138 0.89
Tetrafluoroethylene SCHEMBL11716843 0.68
Tetrafluoroethylene SCHEMBL821995 0.60
Hydrochloric Acid SCHEMBL28037891 0.60
SCHEMBL6832083 0.60
Hydrochloric Acid SCHEMBL28138067 0.60
Tetrafluoroethylene SCHEMBL15536 0.60
Hydrochloric Acid SCHEMBL11722996 0.59
SCHEMBL1115626 0.58
SCHEMBL82518 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115819662-B Fluorine-containing epoxy resin and preparation method thereof 四川轻化工大学 2023-09-12 CN claimed
CN-115819662-A Novel fluorine-containing epoxy resin and preparation method thereof 四川轻化工大学 2023-03-21 CN claimed
US-12612419-B2 Method for producing fluorine-containing (cyclo)alkenyl zinc halide compound DAIKIN INDUSTRIES, LTD. (JP) 2026-04-28 US disclosed
WO-2025124066-A1 PREPARATION METHOD AND PRODUCTION SYSTEM FOR HEXAFLUOROBUTADIENE 中化蓝天电子材料(杭州)有限公司 2025-06-19 WO disclosed
CN-116393092-B Method for separating and purifying hexafluorobutadiene and efficient adsorbent for separating and purifying hexafluorobutadiene 福州绿航环保技术服务有限公司 2024-07-12 CN disclosed
CN-115819662-B Fluorine-containing epoxy resin and preparation method thereof 四川轻化工大学 2023-09-12 CN disclosed
CN-116393092-A Method for separating and purifying hexafluorobutadiene and efficient adsorbent for separating and purifying hexafluorobutadiene 福州绿航环保技术服务有限公司 2023-07-07 CN disclosed
CN-115819662-A Novel fluorine-containing epoxy resin and preparation method thereof 四川轻化工大学 2023-03-21 CN disclosed
US-20220324883-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING (CYCLO)ALKENYL ZINC HALIDE COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2022-10-13 US disclosed
CN-114901667-A Process for producing fluorine-containing (cyclo) alkenyl halide zinc compound 大金工业株式会社 2022-08-12 CN disclosed
WO-2021132011-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING (CYCLO)ALKENYL ZINC HALIDE COMPOUND ダイキン工業株式会社 2021-07-01 WO disclosed
CN-102627534-A Compounds including indene and difluoroethylene bridge bond, preparation method thereof and application thereof JIANGSU HECHENG DISPLAY TECH 2012-08-08 CN disclosed
CN-101525267-A Method for preparing hexachlorobutadiene UNIV HENAN TECHNOLOGY 2009-09-09 CN disclosed
CN-101255090-A Synthesis of alpha, beta, beta-trifluorostyrene via in-situ for mation or trifluorovinyl metal halide BALLARD POWER SYSTEMS (CA) 2008-09-03 CN disclosed
CN-100381409-C Synthesis of alpha, beta-trifluorostyrene by in situ formation of trifluorovinyl metal halide BALLARD POWER SYSTEMS (CA) 2008-04-16 CN disclosed
CN-1829673-A Synthesis of alpha, beta-trifluorostyrene by in situ formation of trifluorovinyl metal halide BALLARD POWER SYSTEMS (CA) 2006-09-06 CN disclosed
EP-1463697-A2 SYNTHESIS OF ALFA,BETA,BETA-TRIFLUOROSTYRENE VIA IN-SITU FORMATION OF TRIFLUOROVINYL METAL HALIDE BALLARD POWER SYSTEMS INC. (CA) 2004-10-06 EP disclosed
US-6653515-B2 One pot process comprising reacting tetrafluoroethylene with bases, metal halides and optionally amines to form trifluorovinyl metal complexes, then arylating in the presence of catalysts to form trifluorophenylethylene BALLARD POWER SYSTEMS INC. (CA) 2003-11-25 US disclosed
US-20030144439-A1 Synthesis of alpha, beta, beta-trifluorostyrene via in-situ formation of trifluorovinyl metal halide BALLARD POWER SYSTEMS INC. (CA) 2003-07-31 US disclosed
WO-2003051801-A2 SYNTHESIS OF ALPHA, BETA, BETA-TRIFLUOROSTYRENE VIA IN-SITU FORMATION OF TRIFLUOROVINYL METAL HALIDE BALLARD POWER SYSTEMS INC. (CA) 2003-06-26 WO disclosed