Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 known ✓ | P00918 | 3/20 | 0.48 |
| ▸ | LCK known ✓ | P06239 | 1/20 | 0.46 |
| ▸ | DPP4 known ✓ | P27487 | 1/20 | 0.46 |
| ▸ | TPMT | P51580 | 3/20 | 0.84 |
| ▸ | HCAR1 | Q9BXC0 | 1/20 | 0.70 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.52 |
| ▸ | RXRA | P19793 | 1/20 | 0.52 |
| ▸ | RXRB | P28702 | 1/20 | 0.52 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.50 |
| ▸ | CNR2 | P34972 | 1/20 | 0.48 |
| ▸ | CA12 | O43570 | 3/20 | 0.48 |
| ▸ | CA1 | P00915 | 3/20 | 0.48 |
| ▸ | CA7 | P43166 | 3/20 | 0.48 |
| ▸ | CA9 | Q16790 | 3/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.48 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.46 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.46 |
| ▸ | FYN | P06241 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL4360633 | 1.00 | TPMT (0.84) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 | |
| SCHEMBL40661 | 0.97 | TPMT (0.89) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 | |
| Ethane SCHEMBL27516125 | 0.94 | TPMT (0.84) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL6113419 | 0.94 | TPMT (0.94) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 | |
| SCHEMBL28542863 | 0.94 | TPMT (0.84) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 | |
| SCHEMBL28094411 | 0.94 | TPMT (0.84) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 | |
| Benzene SCHEMBL27458637 | 0.94 | TPMT (0.84) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 | |
| Acetone SCHEMBL27622866 | 0.92 | TPMT (0.80) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 | |
| SCHEMBL221684 | 0.92 | TPMT (1.00) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 | |
| Cyclopropane SCHEMBL28772593 | 0.90 | TPMT (0.76) | TPMTHCAR1HCAR2ALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11820840-B2 | Compound, polymer, pattern forming material, and manufacturing method of semiconductor device | KIOXIA CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230220130-A1 | COMPOUND, POLYMER, PATTERN FORMING MATERIAL, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | KIOXIA CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-11639402-B2 | Polymer for pattern forming material | KIOXIA CORPORATION (JP) | 2023-05-02 | — | — | US | disclosed |
| CN-112479888-A | Compound, polymer, pattern forming material, pattern forming method, and method for manufacturing semiconductor device | 铠侠股份有限公司 | 2021-03-12 | — | — | CN | disclosed |
| US-20210070898-A1 | COMPOUND, POLYMER, PATTERN FORMING MATERIAL, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | KIOXIA CORPORATION (JP) | 2021-03-11 | — | — | US | disclosed |
| US-5128429-A | Low temperature block polymerization without randomization | RAYCHEM LIMITED (GB) | 1992-07-07 | — | — | US | disclosed |
| EP-0154506-B1 | PREPARATION OF ORGANIC POLYMERS | RAYCHEM LIMITED (GB) | 1992-02-05 | — | — | EP | disclosed |
| US-4999411-A | Polythioethers, polythiocarbonates, polythioamides, polythioimides | RAYCHEM LIMITED (GB) | 1991-03-12 | — | — | US | disclosed |
| US-4960835-A | ENGINEERING THERMOPLASTICS | RAYCHEM LIMITED (GB) | 1990-10-02 | — | — | US | disclosed |
| US-4845179-A | CONDENSATION POLYMERIZATION | RAYCHEM LIMITED (GB) | 1989-07-04 | — | — | US | disclosed |
| EP-0154506-A2 | Preparation of organic polymers | RAYCHEM LIMITED (GB) | 1985-09-11 | — | — | EP | disclosed |
| US-3996202-A | Process for the preparation of sulfonate group containing aromatic polyamides | HOECHST AKTIENGESELLSCHAFT (DT) | 1976-12-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11820840-B2 | Compound, polymer, pattern forming material, and manufacturing method of semiconductor device | C9, H1-2, H1-3 | CA2 3431/4885LCK 3703/4885DPP4 4876/4885 |
| US-20210070898-A1 | COMPOUND, POLYMER, PATTERN FORMING MATERIAL, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | H1-2, H1-3, H1-0 | CA2 3375/4885LCK 3782/4885DPP4 4876/4885 |
| US-11639402-B2 | Polymer for pattern forming material | PUF60, METTL14, MECP2 | CA2 4840/4885LCK 3601/4885DPP4 4796/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.