Hydrochloric Acid

Hydrochloric Acid

SCHEMBL2229191

CN1C=CN(CCCC#N)C1.Cl

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.34
TSHR P16473 2/20 0.33
ALDH1A1 P00352 1/20 0.31
PKM P14618 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28176782 0.92 MAPT (0.42) MAPTTSHRALDH1A1PKM
SCHEMBL28204342 0.90 MAPT (0.31) MAPT
Bromide SCHEMBL9547368 0.89 MAPT (0.40) MAPTTSHR
Hydrochloric Acid SCHEMBL9901410 0.88 MAPT (0.39) MAPTTSHRALDH1A1PKM
SCHEMBL12469758 0.86 ALDH1A1 (0.39) ALDH1A1PKM
SCHEMBL9942137 0.86 MAPT (0.40) MAPTTSHRALDH1A1PKM
SCHEMBL28841371 0.82 ALDH1A1 (0.39) MAPTTSHRALDH1A1PKM
SCHEMBL14993990 0.79
Acetonitrile SCHEMBL29208944 0.77
SCHEMBL12220163 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3275039-B1 ELECTROLYTES AND METAL HYDRIDE BATTERIES BASF CORP (US) 2025-08-27 EP claimed
CN-119677381-A Method for preparing perovskite film by inducing weft seed crystal at buried bottom interface and application of perovskite film 扬州大学 2025-03-21 CN claimed
CN-111117594-B Electrochromic material and electrochromic device based on dynamic metal-ligand complexation 吉林大学 2024-03-26 CN claimed
US-11567385-B2 Electrochromic device THE BOEING COMPANY (US) 2023-01-31 US claimed
EP-3753973-B1 A METHOD FOR SEALING A GAP BETWEEN ADJOINING OR CONNECTED SOLID SURFACES ON AN AIRCRAFT BOEING CO (US) 2022-09-28 EP claimed
CN-115010836-A Electrochromatic polymer, nano particles and device 吉林大学 2022-09-06 CN claimed
US-20220171247-A1 ELECTROCHROMIC DEVICE THE BOEING COMPANY 2022-06-02 US claimed
CN-109280186-B Method and composition for curing the surface of uncured polysulfide rubber 波音公司 2022-05-10 CN claimed
US-11307476-B2 Electrochromic device THE BOEING COMPANY (US) 2022-04-19 US claimed
US-11292853-B2 Methods and compositions for curing a surface of an uncured polysulfide rubber THE BOEING COMPANY (US) 2022-04-05 US claimed
US-20160141726-A1 Electrolytes and Metal Hydride Batteries BASF CORPORATION 2016-05-19 US claimed
US-20160141727-A1 Electrolytes and Metal Hydride Batteries BASF CORPORATION 2016-05-19 US claimed
EP-2797936-B1 SYNTHESIS OF ORGANOHALOSILANE MONOMERS FROM CONVENTIONALLY UNCLEAVABLE DIRECT PROCESS RESIDUE MOMENTIVE PERFORMANCE MAT INC (US) 2016-03-09 EP claimed
EP-2797935-B1 SYNTHESIS OF ORGANOHALOSILANE MONOMERS VIA ENHANCED CLEAVAGE OF DIRECT PROCESS RESIDUE MOMENTIVE PERFORMANCE MAT INC (US) 2016-03-09 EP claimed
US-20140335698-A1 COMPONENT OF A PLASMA PROCESSING APPARATUS HAVING A PROTECTIVE IN SITU FORMED LAYER ON A PLASMA EXPOSED SURFACE LAM RESEARCH CORPORATION (US) 2014-11-13 US claimed
CN-104143494-A Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface LAM RES CORP 2014-11-12 CN claimed
US-8697901-B2 Synthesis of organohalosilane monomers via enhanced cleavage of direct process residue MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2014-04-15 US claimed
US-8637695-B2 Synthesis of organohalosilane monomers from conventionally uncleavable Direct Process Residue MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2014-01-28 US claimed
US-20130172593-A1 Synthesis of Organohalosilane Monomers From Conventionally Uncleavable Direct Process Residue MOMENTIVE PERFORMANCE MATERIALS INC. 2013-07-04 US claimed
US-20130172594-A1 Synthesis of Organohalosilane Monomers Via Enhanced Cleavage of Direct Process Residue MOMENTIVE PERFORMANCE MATERIALS INC. 2013-07-04 US claimed