Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL6689660 | 1.00 | ADRA2A (0.50) | — | |
| Hydrochloric Acid SCHEMBL1690425 | 1.00 | ADRA2A (0.50) | — | |
| Hydrochloric Acid SCHEMBL30725530 | 0.98 | ADRA2A (0.49) | — | |
| Hydrochloric Acid SCHEMBL30463297 | 0.98 | ADRA2A (0.49) | — | |
| SCHEMBL112179 | 0.97 | — | — | |
| SCHEMBL28353595 | 0.95 | — | — | |
| Water SCHEMBL27801507 | 0.95 | ADRA2A (0.47) | — | |
| Hydrochloric Acid SCHEMBL29439275 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL27384560 | 0.86 | NOS3 (0.43) | — | |
| Hydrochloric Acid SCHEMBL27681160 | 0.86 | NOS3 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022172054-A1 | A NEW HYPERBRANCHED-POLYCARBOXYLATE SUPERPLASTICIZER AND ITS PREPARATION | SHARBAF MOHAMMADREZA (IR) | 2022-08-18 | — | — | WO | claimed |
| CN-112011010-A | Low-temperature type waterproof and oil-proof agent and preparation method and application thereof | 浙江辉凯鼎瑞新材料有限公司 | 2020-12-01 | — | — | CN | claimed |
| EP-3044351-A1 | PHOTONIC CRYSTAL MICROSPHERE | Institute of Chemistry, Chinese Academy of Science (CN) | 2016-07-20 | — | — | EP | claimed |
| WO-2015027880-A1 | PHOTONIC CRYSTAL MICROSPHERE | INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) | 2015-03-05 | — | — | WO | claimed |
| CN-122029989-A | Additive for CMP polishing and composition for CMP polishing containing the same | 日油株式会社 | 2026-05-12 | — | — | CN | disclosed |
| US-20260028459-A1 | SURFACTANT COMPOSITION, COMPOSITION FOR EMULSION POLYMERIZATION, METHOD OF PRODUCING POLYMER EMULSION, AND POLYMER EMULSION | ADEKA CORPORATION (JP) | 2026-01-29 | — | — | US | disclosed |
| EP-4685199-A1 | SURFACTANT COMPOSITION, COMPOSITION FOR EMULSION POLYMERIZATION, METHOD OF PRODUCING POLYMER EMULSION, AND POLYMER EMULSION | ADEKA CORPORATION (JP) | 2026-01-28 | — | — | EP | disclosed |
| US-12497700-B2 | Aqueous surface treatment agent and surface-treated metal | NIPPON PAINT SURF CHEMICALS CO., LTD. (JP) | 2025-12-16 | — | — | US | disclosed |
| US-20250263842-A1 | AQUEOUS SURFACE TREATMENT AGENT AND SURFACE-TREATED METAL | NIPPON PAINT SURF CHEMICALS CO., LTD. (JP) | 2025-08-21 | — | — | US | disclosed |
| EP-4592422-A1 | AQUEOUS SURFACE TREATMENT AGENT AND SURFACE-TREATED METAL | Nippon Paint Surf Chemicals Co., Ltd. (JP) | 2025-07-30 | — | — | EP | disclosed |
| EP-4491762-A1 | SUBSTRATE TREATMENT AGENT AND METAL MATERIAL | Nippon Paint Surf Chemicals Co., Ltd. (JP) | 2025-01-15 | — | — | EP | disclosed |
| US-20250003077-A1 | AQUEOUS SURFACE TREATMENT AGENT AND SURFACE-TREATED METAL | NIPPON PAINT SURF CHEMICALS CO., LTD. (JP) | 2025-01-02 | — | — | US | disclosed |
| WO-2009119911-A1 | FLUORINE-CONTAINING POLYMER AND WATER- AND OIL-REPELLENT AGENT | DAIKIN INDUSTRIES, LTD. (JP) | 2009-10-01 | — | — | WO | disclosed |
| WO-2009119913-A1 | FLUORINE-CONTAINING COPOLYMER AND WATER- AND OIL-REPELLENT AGENT | DAIKIN INDUSTRIES, LTD. (JP) | 2009-10-01 | — | — | WO | disclosed |
| CN-101329420-A | Thermosetting resin composition for preparing color filter and color filter as well as sensor | CHEIL IND INC (KR) | 2008-12-24 | — | — | CN | disclosed |
| CN-100427978-C | One solution-type thermosetting compositions for color filter protective films and color filters using the same | CHEIL IND INC (KR) | 2008-10-22 | — | — | CN | disclosed |
| CN-101032001-A | CMP polishing agent and method for polishing substrate | HITACHI CHEMICAL CO LTD (JP) | 2007-09-05 | — | — | CN | disclosed |
| CN-1985361-A | CMP polishing slurry and method for polishing substrate | HITACHI CHEMICAL CO LTD (JP) | 2007-06-20 | — | — | CN | disclosed |
| CN-1932559-A | One solution-type thermosetting compositions for color filter protective films and color filters using the same | CHEIL IND INC (KR) | 2007-03-21 | — | — | CN | disclosed |
| CN-1760702-A | Thermosetting one-solution type composition for protective film of color filter and color filter using the same | CHEIL IND INC (KR) | 2006-04-19 | — | — | CN | disclosed |