Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 known ✓ | P00918 | 2/20 | 0.54 |
| ▸ | TTR known ✓ | P02766 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.58 |
| ▸ | TSHR | P16473 | 3/20 | 0.58 |
| ▸ | TP53 | P04637 | 1/20 | 0.58 |
| ▸ | CASP1 | P29466 | 1/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.58 |
| ▸ | CA1 | P00915 | 2/20 | 0.54 |
| ▸ | CA12 | O43570 | 1/20 | 0.54 |
| ▸ | CA3 | P07451 | 1/20 | 0.54 |
| ▸ | CA4 | P22748 | 1/20 | 0.54 |
| ▸ | CA6 | P23280 | 1/20 | 0.54 |
| ▸ | CA5A | P35218 | 1/20 | 0.54 |
| ▸ | CA7 | P43166 | 1/20 | 0.54 |
| ▸ | CA9 | Q16790 | 1/20 | 0.54 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.54 |
| ▸ | CISD1 | Q9NZ45 | 1/20 | 0.54 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.54 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.54 |
| ▸ | AKR1C4 | P17516 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL944411 | 1.00 | ALDH1A1 (0.58) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 | |
| SCHEMBL68449 | 0.97 | ALDH1A1 (0.61) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 | |
| SCHEMBL28534088 | 0.94 | ALDH1A1 (0.58) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 | |
| SCHEMBL10825837 | 0.92 | ALDH1A1 (0.56) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 | |
| SCHEMBL2818580 | 0.92 | CA1 (0.57) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 | |
| SCHEMBL69107 | 0.88 | CA1 (0.59) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL7705494 | 0.86 | ALDH1A1 (0.47) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 | |
| SCHEMBL1154451 | 0.85 | TSHR (0.59) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 | |
| SCHEMBL30061803 | 0.85 | TSHR (0.56) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 | |
| SCHEMBL2478971 | 0.85 | TSHR (0.56) | ALDH1A1TSHRTP53CASP1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080132673-A1 | Of aromatic polyamides, aromatic polyimides, or aromatic polyamideimides and a liquid crystal polymer showing optical anisotropy in molten state; depositing the aromatic polymer under humidification, dipping, heating, pressurizing; light weight, high strength, low expansion, waterproof; printed circuits | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-06-05 | — | — | US | disclosed |
| US-20070031663-A1 | Wholly aromatic polyamide fiber and process for producing the same | TEIJIN TECHNO PRODUCTS LIMITED (JP) | 2007-02-08 | — | — | US | disclosed |
| EP-1666648-A1 | WHOLLY AROMATIC POLYAMIDE FIBER AND PROCESS FOR PRODUCING THE SAME | TEIJIN LIMITED (JP) | 2006-06-07 | — | — | EP | disclosed |
| US-20060019110-A1 | Films | SUMITOMO CHEMICAL COMPANY, LIMITED | 2006-01-26 | — | — | US | disclosed |
| EP-0768334-B1 | Prepreg, process for producing the same and printed circuit substrate using the same | SUMITOMO CHEMICAL CO (JP) | 2004-02-18 | — | — | EP | disclosed |
| US-6033765-A | HAVING UNIFORM FORMATION, LOW LINEAR THERMAL EXPANSION COEFFICIENT AND GOOD MECHANICAL STRENGTH, COMPRISING A POROUS PARA-ORIENTED AROMATIC POLYAMIDE FILM AND A THERMOPLASTIC RESIN AND/OR A THERMOSETTING RESIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-07 | — | — | US | disclosed |
| US-5851646-A | Prepreg, process for producing the same and printed circuit substrate/board using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-12-22 | — | — | US | disclosed |
| EP-0768334-A2 | Prepreg, process for producing the same and printed circuit substrate using the same | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1997-04-16 | — | — | EP | disclosed |
| US-4172938-A | Process for producing polyamides with lactam or urea solvent and CaCl2 | TEIJIN LIMITED (JP) | 1979-10-30 | — | — | US | disclosed |