Hydrochloric Acid

Hydrochloric Acid

SCHEMBL659883

Cc1ccccc1C(C)(C)P.Cl

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
GABRA1 known ✓ P14867 1/20 0.46
GABRB2 known ✓ P47870 1/20 0.46
ACHE known ✓ P22303 2/20 0.43
CA2 known ✓ P00918 3/20 0.37
CASR known ✓ P41180 1/20 0.36
TSHR P16473 3/20 0.43
TDP1 Q9NUW8 2/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2A6 P11509 2/20 0.38
CYP1A2 P05177 2/20 0.38
ALDH1A1 P00352 4/20 0.37
TRPA1 O75762 2/20 0.37
ATM Q13315 1/20 0.37
CA1 P00915 2/20 0.36
CA7 P43166 2/20 0.36
CA9 Q16790 2/20 0.36
CD44 P16070 1/20 0.32
KIF11 P52732 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL470628 0.97 GABRA1 (0.48) GABRA1GABRB2TSHRACHETDP1
Water SCHEMBL2496499 0.95 GABRA1 (0.46) GABRA1GABRB2TSHRACHETDP1
Bromide SCHEMBL660019 0.95 GABRA1 (0.46) GABRA1GABRB2TSHRACHETDP1
Iodide SCHEMBL9504981 0.95 GABRA1 (0.46) GABRA1GABRB2TSHRACHETDP1
SCHEMBL7180493 0.89 GABRA1 (0.47) GABRA1GABRB2TSHRACHETDP1
Boric Acid SCHEMBL7183370 0.89 GABRA1 (0.47) GABRA1GABRB2TSHRACHETDP1
Acetic Acid SCHEMBL9506298 0.85 GABRA1 (0.44) GABRA1GABRB2TDP1CYP3A4CYP1A2
Phosphoric Acid SCHEMBL7178344 0.85 GABRA1 (0.44) GABRA1GABRB2TSHRACHETDP1
SCHEMBL11204082 0.82 TSHR (0.45) GABRA1GABRB2TSHRACHETDP1
SCHEMBL15658394 0.82 TSHR (0.45) GABRA1GABRB2TSHRACHETDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3904416-B1 MACROMONOMERIC STABILIZER, PREPARATION METHOD THEREOF, AND METHOD FOR PREPARING POLYMERIC POLYOL WANHUA CHEMICAL GROUP CO LTD (CN) 2023-04-19 EP claimed
EP-3904416-A1 MACROMONOMERIC STABILIZER, PREPARATION METHOD THEREOF, AND METHOD FOR PREPARING POLYMERIC POLYOL Wanhua Chemical Group Co., Ltd. (CN) 2021-11-03 EP claimed
CN-109836538-B Polymer polyol and method for producing the same 万华化学集团股份有限公司 2021-07-23 CN claimed
CN-111349229-B Stable dispersants and their use in the preparation of copolymer polyols 万华化学集团股份有限公司 2021-06-29 CN claimed
CN-111349229-A Stable dispersants and their use in the preparation of copolymer polyols 万华化学集团股份有限公司 2020-06-30 CN claimed
WO-2020124645-A1 STABLE DISPERSANT AND APPLICATION THEREOF IN PREPARING COPOLYMER POLYOLS 万华化学集团股份有限公司 2020-06-25 WO claimed
US-4013715-A PROCESS FOR THE MANUFACTURE OF 2-HALO-ETHANE-PHOSPHONIC ACID DIHALIDES AND VINYL-PHOSPHONIC ACID DIHALIDES HOECHST AKTIENGESELLSCHAFT (DT) 1977-03-22 US claimed
EP-4467588-A1 MODIFIED EPOXY RESIN, CURABLE RESIN COMPOSITION, AND CURED PRODUCT THEREOF Mitsubishi Chemical Corporation (JP) 2024-11-27 EP disclosed
US-20240368336-A1 MODIFIED EPOXY RESIN, CURABLE RESIN COMPOSITION, AND CURED PRODUCT THEREOF MITSUBISHI CHEMICAL CORPORATION (JP) 2024-11-07 US disclosed
CN-112823175-B Curable resin composition, cured product, and sheet-shaped molded article 三菱化学株式会社 2024-10-18 CN disclosed
US-12060482-B2 Curable resin composition, cured product, and sheet-like formed body MITSUBISHI CHEMICAL CORPORATION (JP) 2024-08-13 US disclosed
CN-113227196-B Phenoxy resin, process for producing the same, resin composition, material for circuit board, cured product, and laminate 日铁化学材料株式会社 2024-08-06 CN disclosed
WO-2024122557-A1 ESTER COMPOUND, AND ESTER COMPOUND COMPOSITION FOR RESIN RAW MATERIAL 本州化学工業株式会社 2024-06-13 WO disclosed
US-4426336-A Process for the preparation of vinylphosphonic acid derivatives and the use thereof HOECHST AKTIENGESELLSCHAFT (DE) 1984-01-17 US disclosed
US-4388252-A Process for the manufacture of vinyl phosphonic acid derivatives HOECHST AKTIENGESELLSCHAFT (DE) 1983-06-14 US disclosed
US-4386036-A Process for the preparation of vinylphosphonic acid HOECHST AKTIENGESELLSCHAFT (DE) 1983-05-31 US disclosed
US-4329417-A OXIDIZERS AND QUATERNARY AMMONIUM SALTS, PHOSPHONIUM SALTS OR SULFONIUM SALTS KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1982-05-11 US disclosed
US-4013715-A PROCESS FOR THE MANUFACTURE OF 2-HALO-ETHANE-PHOSPHONIC ACID DIHALIDES AND VINYL-PHOSPHONIC ACID DIHALIDES HOECHST AKTIENGESELLSCHAFT (DT) 1977-03-22 US disclosed
US-3972923-A FROM AN ACYL HALIDE AND A PHOSPHONIC ACID DERIVATIVE HOECHST AKTIENGESELLSCHAFT (DT) 1976-08-03 US disclosed
US-3962324-A Process for preparing halogenomethane-phosphonic acid dihalides HOECHST AKTIENGESELLSCHAFT (DT) 1976-06-08 US disclosed