Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 known ✓ | P08172 | 1/20 | 0.47 |
| ▸ | ADRA2A known ✓ | P08913 | 1/20 | 0.47 |
| ▸ | OPRK1 known ✓ | P41145 | 1/20 | 0.47 |
| ▸ | HTR2B known ✓ | P41595 | 1/20 | 0.47 |
| ▸ | SLC6A3 known ✓ | Q01959 | 1/20 | 0.47 |
| ▸ | HDAC6 known ✓ | Q9UBN7 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 5/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.58 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.53 |
| ▸ | TP53 | P04637 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.51 |
| ▸ | LMNA | P02545 | 4/20 | 0.51 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.51 |
| ▸ | MAPT | P10636 | 4/20 | 0.47 |
| ▸ | MEN1 | O00255 | 3/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3862290 | 0.98 | TSHR (0.60) | TSHRL3MBTL1TDP1CYP3A4MAPK1 | |
| SCHEMBL4735018 | 0.83 | TSHR (0.60) | TSHRL3MBTL1TDP1CYP3A4MAPK1 | |
| SCHEMBL16047911 | 0.83 | TSHR (0.81) | TSHRL3MBTL1TDP1CYP3A4MAPK1 | |
| SCHEMBL5317844 | 0.81 | TSHR (0.58) | TSHRL3MBTL1TDP1CYP3A4MAPK1 | |
| SCHEMBL5597642 | 0.79 | TSHR (0.55) | TSHRL3MBTL1TDP1CYP3A4MAPK1 | |
| SCHEMBL16044537 | 0.78 | TSHR (0.81) | TSHRL3MBTL1TDP1CYP3A4MAPK1 | |
| Water SCHEMBL27487586 | 0.77 | TSHR (0.59) | TSHRL3MBTL1TDP1CYP3A4MAPK1 | |
| SCHEMBL4409283 | 0.77 | TSHR (0.61) | TSHRL3MBTL1TDP1CYP3A4MAPK1 | |
| SCHEMBL9095382 | 0.77 | CES2 (0.56) | TSHRL3MBTL1TDP1CYP3A4MAPK1 | |
| Dibutyl Phthalate SCHEMBL27484998 | 0.76 | TSHR (0.96) | TSHRL3MBTL1TDP1CYP3A4MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0997777-B1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | HITACHI CHEM DUPONT MICROSYS (JP) | 2003-06-04 | — | — | EP | disclosed |
| EP-1028354-B1 | Positive photosensitive resin composition, method of forming relief pattern, and use of a relief pattern | HITACHI CHEM DUPONT MICROSYS (JP) | 2003-05-02 | — | — | EP | disclosed |
| US-6514658-B2 | Polyimide or precursor thereof soluble in alkaline solution, a photosensitive acid generator, and a compound having a phenolic hydroxyl group; positive-type, heat resistance | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-6365306-B2 | ADDING A DISSOLUTION INHIBITOR TO A POLYMER SOLUBLE IN AN AQUEOUS ALKALINE DEVELOPER AND A QUINONEDIAZIDE PHOTOSENSITIZER TO INCREASE THE SOLUBILITY DIFFERENCE BETWEEN THE EXPOSED AND UNEXPOSED PARTS; FINENESS; RESOLUTION; FILMS | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. | 2002-04-02 | — | — | US | disclosed |
| US-6340546-B1 | WHICH, ON HEATING, BECOME HEAT-RESISTANT POLYIMIDE POLYMERS SUITABLE FOR SURFACE-PROTECTING FILMS, INTERLAYER INSULATING FILMS | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2002-01-22 | — | — | US | disclosed |
| US-6329110-B1 | POSITIVES, POLYIMIDE SOLUBLE IN AN AQUEOUS ALKALINE SOLUTION; QUINONEDIAZIDE CAPABLE OF GENERATING AN ACID WHEN EXPOSED TO LIGHT; COMPOUND HAVING A PHENOLIC HYDROXYL GROUP; | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) | 2001-12-11 | — | — | US | disclosed |
| US-20010031419-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | NUNOMURA MASATAKA (JP) | 2001-10-18 | — | — | US | disclosed |
| US-20010009746-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | NUNOMURA MASATAKA (JP) | 2001-07-26 | — | — | US | disclosed |
| US-6232032-B1 | MIXTURE OF POLYBENZOXAZOLE AND POLYAMIDE | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. | 2001-05-15 | — | — | US | disclosed |
| EP-1028354-A1 | Positive photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-08-16 | — | — | EP | disclosed |
| EP-0997777-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-05-03 | — | — | EP | disclosed |
| EP-0961169-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 1999-12-01 | — | — | EP | disclosed |