Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | ELANE | P08246 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3102757 | 0.99 | ATM (0.35) | ATMTDP1ELANEALDH1A1CYP3A4 | |
| Hydrochloric Acid SCHEMBL2691422 | 0.88 | — | — | |
| SCHEMBL5184276 | 0.86 | ATM (0.30) | ATMTDP1 | |
| Hydrochloric Acid SCHEMBL5390295 | 0.85 | TSHR (0.34) | ELANEALDH1A1CYP2C19TSHRCYP1A2 | |
| SCHEMBL9144659 | 0.85 | CYP2D6 (0.37) | TDP1ALDH1A1CYP3A4CYP2C19CYP1A2 | |
| Hydrochloric Acid SCHEMBL28361085 | 0.83 | CASP1 (0.33) | ATMTDP1ELANECYP2C19TSHR | |
| Hydrochloric Acid SCHEMBL2470314 | 0.81 | HCAR2 (0.36) | ELANEALDH1A1CYP3A4CYP2C19CYP1A2 | |
| SCHEMBL2743763 | 0.79 | HCAR2 (0.37) | ELANEALDH1A1CYP3A4CYP2C19TSHR | |
| SCHEMBL9144726 | 0.78 | MMP2 (0.31) | ATMTDP1 | |
| SCHEMBL3681971 | 0.76 | ESR1 (0.40) | ELANEALDH1A1CYP2C19TSHRCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 246 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250382516-A1 | CORE-SHELL PARTICLES FOR SUBTERRANEAN OPERATIONS | HALLIBURTON ENERGY SERVICES INC (US) | 2025-12-18 | — | — | US | claimed |
| US-12331246-B2 | Polyacrylamide-based symmetric branched polymer surfactant and a process for preparing the same and use thereof | CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2025-06-17 | — | — | US | claimed |
| EP-3420055-B1 | KINETIC HYDRATE INHIBITORS FOR CONTROLLING GAS HYDRATE FORMATION IN WET GAS SYSTEMS | CHAMPIONX LLC (US) | 2025-04-09 | — | — | EP | claimed |
| US-12163095-B2 | Copolymers useful as water clarifiers and for water-oil separation | BAKER HUGHES OILFIELD OPERATIONS LLC (US) | 2024-12-10 | — | — | US | claimed |
| US-20240067761-A1 | INVERT EMULSION HAVING DOUBLE PARTICLE SIZE DISTRIBUTION, PREPARATION METHOD THEREFOR AND USE THEREOF | JIANGSU FEYMER TECH CO LTD (CN) | 2024-02-29 | — | — | US | claimed |
| CN-117603386-A | Water-soluble cationic acrylic resin and preparation method and application thereof | 广东灵捷制造化工有限公司 | 2024-02-27 | — | — | CN | claimed |
| US-20230392069-A1 | POLYACRYLAMIDE-BASED SYMMETRIC BRANCHED POLYMER SURFACTANT AND A PROCESS FOR PREPARING THE SAME AND USE THEREOF | CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2023-12-07 | — | — | US | claimed |
| EP-4219591-A1 | POLYACRYLAMIDE-BASED SYMMETRICALLY BRANCHED POLYMER TYPE SURFACTANT, PREPARATION METHOD THEREFOR AND APPLICATION THEREOF | China Petroleum & Chemical Corporation (CN) | 2023-08-02 | — | — | EP | claimed |
| WO-2023121739-A1 | WELLBORE STABILITY COMPOSITIONS COMPRISING NANOPARTICLES | HALLIBURTON ENERGY SERVICES, INC. (US) | 2023-06-29 | — | — | WO | claimed |
| US-20230203361-A1 | WELLBORE STABILITY COMPOSITIONS COMPRISING NANOPARTICLES | HALLIBURTON ENERGY SERVICES, INC. | 2023-06-29 | — | — | US | claimed |
| US-7846842-B2 | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios | CABOT MICROELECTRONICS CORPORATION (US) | 2010-12-07 | — | — | US | claimed |
| EP-1379566-B1 | ION-SENSITIVE CATIONIC POLYMERS AND FIBROUS ITEMS USING SAME | KIMBERLY CLARK CO (US) | 2009-07-29 | — | — | EP | claimed |
| US-20090137124-A1 | POLISHING COMPOSITION AND METHOD FOR HIGH SILICON NITRIDE TO SILICON OXIDE REMOVAL RATE RATIOS | CABOT MICROELECTRONICS CORPORATION (US) | 2009-05-28 | — | — | US | claimed |
| EP-1483349-B1 | ANIONIC ABRASIVE PARTICLES TREATED WITH POSITIVELY-CHARGED POLYELECTROLYTES FOR CMP | CABOT MICROELECTRONICS CORP (US) | 2007-12-26 | — | — | EP | claimed |
| EP-1831321-A2 | POLISHING COMPOSITION AND METHOD FOR HIGH SILICON NITRIDE TO SILICON OXIDE REMOVAL RATE RATIOS | Cabot Microelectronics Corporation (US) | 2007-09-12 | — | — | EP | claimed |
| EP-1419897-B1 | Ink jet recording material | AGFA GEVAERT (BE) | 2007-06-27 | — | — | EP | claimed |
| WO-2006052433-A2 | POLISHING COMPOSITION AND METHOD FOR HIGH SILICON NITRIDE TO SILICON OXIDE REMOVAL RATE RATIOS | CABOT MICROELECTRONICS CORPORATION (US) | 2006-05-18 | — | — | WO | claimed |
| US-20060099814-A1 | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios | CABOT MICROELECTRONICS CORPORATION (US) | 2006-05-11 | — | — | US | claimed |
| US-6828014-B2 | Binders for use in water-dispersible personal care products, such as wet wipes | KIMBERLY-CLARK WORLDWIDE, INC. | 2004-12-07 | — | — | US | claimed |
| US-20040072940-A1 | Synthesis of a particulate copolymer containing hydrophilic functionality | FERRANIA, S.P.A., RECORDATION | 2004-04-15 | — | — | US | claimed |